查看>全部品牌 麦克林(macklin)

查看>全部规格（包装） 100mg 1g 250mg 5g 25g 100g 500g 2.5kg 500mg 50mg 5ml 10kg 100ml 2.5l 25ml 500ml 10g 25mg 12x500g 10mg 5mg 1ml 200mg 1kg 250g 50g 10l 12x500ml 1mg 2g 5kg 1l 250ml 5l 50ml 25kg 25×25mm 10ml 20kg 4l 20x500g 25l 2ml 50mm 20mg 0.25g 0.5g 100cm 25cm 20l 1ea 2mg 200μl 2kg 400g 5m 0.5ml 10×10cm 6x500g 150g 170g 158g 176g 20g 75g 80g 85g 90g 12ml 250μl 20ml 20x500ml 2l 400ml 100x100mm 100μl 10m 250m 50m 110g 114g 46g 15g 15ml 160mm 1cm 1m 250cm 25m 50cm 2.5ml 200g 26g 60g 70g 95g 2cm 50×50mm 5cm 90x90mm

查看>全部纯度（尺码） 95% 98% 97% 99% ≥95% ≥98% 96% ≥97% 99.5% 90% standard for gc, ≥99.8%(gc) 99.99% metals basis standard for gc, ≥99.6%(gc) standard for gc, ≥99.9%(gc) 99.9% metals basis standard for gc, ≥99.7%(gc) >98.0%(gc) 99.9% standard for gc, ≥99.5%(gc) ≥98%(gc) ≥99% 97%, 99% e.e. 99.999% metals basis 试剂级, 98% 85% 试剂级 >97% 80% 93% 98%(gc) 99.99% ≥99%(gc) ≥96% 试剂级, 99% ≥98.0% 94% 98%,gc 试剂级, 99.0% 92% 97%(gc) 99%(gc) ≥95%(gc) ≥97%(gc) ≥98%(gc)(t) >95.0%(gc) 99.95% metals basis ≥98%(hplc) 超干级, 99.99% 98%(hplc) 98.0% 99.9% trace metals basis >99.0%(gc) 95%(gc) 97%(hplc) 99.7% 99.8% ≥99.5% 试剂级, 95% >97.0%(gc) >98%(lc) >99% (hplc) 98%(gc)(t) 99.999% ≥90%(gc) ≥90% ≥99.5%(gc) >90.0%(gc) >98%(gc) 90%(gc) 97 % 98% (hplc) 98%,gc&t 99% metals basis 99% trace metals basis 99.5% metals basis 99.6% >95% 优级试剂, 99% 分析对照品 无水, 粉末, 99.99% metals basis 试剂级, 99.5% >96.0%(gc) >98.0%(gc)(t) 95% mix tbc as stabilizer 95%(t) 95%,gc 98%,lc&t 98%,t 98.5% 99.995% metals basis ≥97.0% ≥98 % ≥98%,gc ≥99.99% metals basis 无水,99.9% metals basis 粉末,99.9% metals basis >95%(gc) >98%(hplc) 50% 70% 75% 95%(nmr) 97%, contains tbc as stabilizer 97%,gc 97.0% 98%, mixture of cis and trans isomers 98%, 异构体混合物 99%,含稳定剂mehq 99.9% (reo) 99.99% trace metals basis 99.999% trace metals basis 99.9999% metals basis analytical standard sp standard for gc, 99.5%(gc) ≥85%(gc) ≥95%(gc)(t) ≥97 % ≥98%(t) ≥99.0% 试剂级, 96% 试剂级, 97% 超干级, 99.99% metals basis >90% >95% >97%(gc) >98% >99%(gc) >99%, ee >98% 1.0 m solution in thf, mkseal 1000ug/ml, 5% hno3 10mm in dmso 30% in water 50 wt. % in water 50% in h2o 50%水溶液 60%水溶液 85%, 异构体混合物 90%,t 90.0%(gc) 93%(gc) 95%(hplc) 95%(mixture) 95%, contains tbc as stabilizer 95%, stabilized with tbc 95%,gc&t 95%,顺反混合物 96%(gc) 96%,gc 97%(mixture of isomers) 97%,含铜稳定剂 98 atom % d,98% 98 atom% d 98% (mixture of isomers) 98%(gc&t) 98%(mixture of isomers) 98%(mixture) 98%, mixture of isomers 98%, stabilized with mehq 98%,lc&n 98%,stabilized 98%,异构体混合物 98.0%(gc) 99 % 99%, stabilized with bht 99%,50nm 99%,gc 99%,升华纯化 99.5% trace metals basis excluding hf 99.5% trace metals basis 99.8% metals basis 99.9 % metals basis 99.9% (metals basis) 99.9%(reo) 99.9%,粉末 99.99% metals basis,200目 99.995% trace metals basis 99.997% metals basis 99.998% metals basis 99.999% (metals basis) 99.999% metals basis,200目 99.999% metals basis,for perovskite precursor ≥40% ≥80%(gc) ≥80% ≥88%(gc) ≥93%(gc) ≥93.0%(gc) ≥94%(gc) ≥95%(lc&t) ≥95%(stabilized with tbc) ≥95%, contains tbc as stabilizer ≥95.0% ≥97 % sum of enantiomers ≥98%(gc&t) ≥98%(lc&t) ≥98%(t&lc) ≥98.5 % sum of enantiomers ≥99.9% metals basis ≥99.9% 分析标准品,98% 无水,99.99% metals basis 试剂级, 98.5% 超干,99.999% metals basis 超干级, 99.99% (reo) >52%(gc) >80.0%(gc) >80.0%(t) >85.0%(gc) >90%(gc),含100 ppm 对叔丁基邻苯二酚稳定剂 >93%(gc) >94.0%(gc) >95%(hplc) >95%(lc&t) >95%, 含稳定剂bht >95.0%(gc) ,含0.2 % caco3/mgo (1:1)稳定剂 >96%(gc) >97%(hplc) >97%(t) >97.0% >98%(gc&t) >98%(gc) , 含铜作稳定剂 >98%(lc&n) >98.0% >99% (gc) >99%(hplc) >99.0% (gc), 无色液体 >99.0%(gc),含mehq稳定剂 <1% diethylene glycol monobutyl ether <100 μm, ≥99.98% trace metals basis <45 μm (w/w=7/3) (顺式+ 反式), ≥92%(gc) -100 目, 99.999% (metals basis) -200+325目, 99.95% metals basis -200目,97% -200目粒径 -22 目,99.999% (metals basis) -325目, 99.5% metals basis -40 目, 99.9% (reo) 0.015mm 直径, 99.95% metals basis 0.025mm 厚, 99.985% metals basis 0.1mm 厚, 99.9% (reo) 0.3mm 厚, 99.9% (reo) 0.5 m solution in thf, mkseal 0.5msolutioninthf,mkseal 0.85-1.7mm, 元素分析仪专用 1-10 μm,98% 1-3mm (0.04-0.1in),99.9997% (metals basis) 1.0 m in h2o 1.0 m in methylene chloride 1.0 m in thf, mkseal 1.0 mg/ml in methanol 1.5 m in h2o 10 % 溶液 100 mesh,99.9% 1000ug/ml, 1%hno3 100nm,99.5% metals basis 100ug/ml,1% hno3 13 wt. % in h2o 15cm或更小, 99.999% metals basis 19mm 或更小, 99% metals basis 1m in water 2-5mm (0.08-0.20in) 直径, 99.9999% (metals basis) 2-5um/99.5% 2.0mm直径, 99.999% metals basis 20 wt. % in h2o 20%甲醇溶液,~20% in methanol (t) 20-40目, gc 200nm,99% 200nm,99.5% metals basis 22mm (0.9in) 直径, 99% (metals basis), sr ≤0.8% 25% w/w in 1-methoxy-2-propanol 25% w/w in hexane 25-30 mpa·s 3-5mm,吸附剂,催化剂及载体 30 wt. % in h2o 300目,99% 30nm 球形 纯度:99% trace metals basis 30nm 球形 纯度≥97% trace metals basis 30nm 球形,99.5% 30nm,99.5% 33-35% tio2 35 wt. % in h2o 36%,固体 40 wt. % in h2o 40% 水溶液 40-60%,工业级 40nm 球形,99.5% 45%水溶液 45.0 - 50.0% 45um,-325 目, 99.9% metals basis 46% 48-50%溶液 48~50% au basis 4n,靶材专用 5 % 溶液 50 wt. % in h2o 50 wt.% solution in water 50% in chlorocyclohexane 50%aqueoussolution(99.9%-eu)(reo) 50%甲醇溶液 50-55% w/w hbf4 50-60% tio2, 35-40% k2o 500nm 50nm 近球形,99.5% 50nm,99% 50wt%水溶液 50wt.% in h20 59% 5um/99.5% 60 wt. % in h2o 60%,gc 60% 60-64%, fe≤10ppm 60nm,99.9% metals basis 62 wt. % in h2o 65 wt. % in h2o 65% 6mm 直径, 99.99999% metals basis 70 wt. % in h2o 70 wt. % 正丙醇溶液 70%甲醇溶液 74-76% in water 75% (contains ca. 23% isomer) 75% in h2o 80 wt. % in h2o, contains 600 ppm monomethyl ether hydroquinone as inhibitor 80% in water,稳定剂:聚乙二醇5-10% 80% in water 80% metals basis 80%(gc) 80%(mixtures of isomers) 80%, mixture of isomers 80%,天然 80-100目 gc 80-85% 800nm 球形 纯度>99.5% 83%,gc 83% 83.5-86.5% tio2, 13.5-16.5% k2o 84% 85%(gc) 85%,stabilized with tbc 85-90%,工业级 90% (gc), mixture of isomers 90% stabilized with 60-100 ppm mehq 90%(mixture) 90%, stabilized with mehq 90%, 包含对苯二酚稳定剂 90%,gc 90%,lc&n 90%,异构体混合物 90%,顺反混合物 90%-98% 90nm,0.03mg/ml,溶剂:超纯水 92%, stabilized with mehq 92%,97%(mixture of isomers) 92%,含有稳定剂mehq 92-94 % 92-94% 93% (gc) 93% (hplc) 94%,含0.2% topanol 稳定剂 95 % 95% (hplc) 95% (mixture of isomers) 95% (stabilized with copper chip) 95% (stabilized with tbc) 95% ,stabilized with mehq 95%(gc)(mixture) 95%(gc)(t) 95%(min 90%) 95%(stabilized with bht) 95%(stabilized with k2co3) 95%(stabilized with tbc) 95%(含碳酸钾稳定剂) 95%, 0.1% 4-甲氧基苯酚稳定剂 95%, 200ppm 4-甲氧基苯酚稳定剂 95%, 98% e.e. 95%, contains 0.1% bht as stabilizer 95%, mixture of isomers 95%, stabilized with 0.2% tbc 95%, stabilized with hq 95%, total of isomers 95%, wetted with ca. 20% water 95%, ~1 m in h2o 95%, 含k2co3稳定剂 95%, 含有mehq作为抑制剂 95%, 含有稳定剂mehq 95%, 异构体混合物 95%,200 ppm monomethyl ether hydroquinone as inhibitor 95%,lc 95%,mixture of cis and trans isomers,with 200ppm 4-methoxyphenol 95%,stabilized with 60-100 ppm mehq 95%,含0.01 % 柠檬酸稳定剂 95%,含100-500 ppm tbc稳定剂 95%,含250ppm bht 稳定剂 95.0% (gc) 95.0%(gc) 96%(gc&t) 96%(gc)(t) 96%(isomers mixture) 96%(t&lc) 96%(t) 96%(酯含量) 96%, contains nahco3 as stabilizer 96%, contains tbc as stabilizer 96%, mkseal 96%, 含有200 ppm mehq阻聚剂 96.0%(gc) 97 %,200 ppm mehq 97% mix tbc as stabilizer 97% rel-(1r-2e-ps)-axial 97%(mix) 97%(mixtures) 97%(nmr)(mixtures) 97%(stab. with hydroquinone) 97%(stabilized with bht) 97%(stabilized with hq) 97%(stabilized with mehq) 97%(stabilized with tbc) 97%(sum of mixtures) 97%(含200-300ppmmehq稳定剂) 97%(基于干物质)in 25% h2o 97%, 99%ee 97%, mixture of 2- and 4-isomers 97%, mixture of cis and trans 97%, mixture of isomers,stabilizer:100-300ppm mehq 97%, mixtures of c16&c18 97%, stabilized with mehq 97%, stabilized with tbc 97%, 含有稳定剂mehq 97%, 异构体混合物 97%, 来源于山苍子油 97%, 白色到淡黄色粉末 97%, 粉末 97%, 精制级 97%,0.01% 氢醌稳定剂 97%,bet surface area 8~16 m2/g 97%,gc&t 97%,hq as inhibitor 97%,lc&t 97%,mixture of isomers 97%,含0.02% 4-methoxyphenol 稳定剂 97%,含0.1% tbc稳定剂 97%,含0.1%对叔丁基邻苯二酚(tbc)稳定剂 97%,含100-200ppm bht稳定剂 97%,含60-100ppm bht稳定剂 97%,含含稳定剂氢醌 97%,异构体混合物 97%,顺式 + 反式 97.0% (gc) 97.0% (hplc) 97.0% (sum of isomers, gc) 97.0% (t) 97.0%(gc) 97.5% 98 atom % 15n, 98%(cp) 98 atom % d 98 atom% 15n 98% ,含5-10 ppm tert-butylcatechol 稳定剂 98% ir 53% 98% trace metals basis excluding zr 98% trace metals basis 98%(cis+trans) 98%(cis- and trans- mixture) 98%(gc),含稳定剂bht 98%(gc),含稳定剂tbc 98%(lc) 98%(m- and p- mixture)(stabilized with tbc) 98%(mixture of isomers) 98%(mixture of isomer) 98%(mixture of isomeric branched chain hexanes) 98%(mixtures of isomers) 98%(stabilized with copper chip) 98%(stabilized with koh) 98%(stabilized with tbc) 98%(t)(hplc) 98%(total of isomer) 98%, 400nm-1μm 98%, 98 atom % d 98%, contains 10-15%acoh 98%, contains mehq as stabilizer 98%, contains potassium carbonate as stabilizer 98%, contains tbc as stabilizer 98%, ee≥98% 98%, isomer mixture 98%, ni:22.5% 98%, ~20nm 98%, 含<1%正丁硫醇稳定剂 98%, 含200 ppm tbc稳定剂 98%, 含k2co3稳定剂 98%, 有效氧含量: ≥7.18 % 98%, 立体异构体混合物 98%,(stabilized with mehq) 98%,-325目 98%,100-200 ppm bht as inhibitor 98%,200 ppm monomethyl ether hydroquinone as inhibitor 98%,300目 98%,4 ~ 8μm 98%,ee92% 98%,gc&n 98%,mixture of cis and trans 98%,mixture of isomers 98%,n 98%,stabilized with 200ppm mehq 98%,stabilized with hq 98%,光学纯 70% 98%,含0.01% koh稳定剂 98%,含0.1% 对苯二酚稳定剂 98%,含100ppmmehq稳定剂 98%,含90 - 110 ppm mehq 稳定剂 98%,含稳定剂0.1% dea 98%,含稳定剂0.1%koh 98%,棕色结晶粉末 98%,粒径:100-300nm 98%,约含0.5% mehq 稳定剂 98-101% 98.0% (hplc) 98.0% (sum of enantiomers, gc) 98.0-102.0% anhydrous basis (hplc) 98.00%lc 98.5%, mixture of isomers 99% (gc) 99% (hplc), 98% 99% (metals basis) 99% (purity excludes ~1% zr) 99% (reo) 99% metals basis,2-10 μm 99%(mixture) 99%(mixtures), 包含~0.006%对苯二酚稳定剂 99%(sum of mixtures) 99%(含200-300ppmmehq稳定剂) 99%(支链异构体类的混合物总和) 99%, 0.2-0.5μm 99%, 0.5-1μm 99%, 100-300nm 99%, 10μm 99%, 3-5μm 99%, 300-500nm 99%, 4-16mesh 99%, stabilized with mehq 99%, 发酵工艺 99%, 无色液体 99%, 粉末 99%,-100目 99%,0.5~0.7um 99%,1-5μm 99%,1~2μm 99%,1μm 99%,2-4μm 99%,50目 99%,6-10μm 99%,anhydride group content≥41.0% 99%,ee 98% 99%,hq as inhibitor 99%,t 99%,含0.01 % bht 稳定剂 99%,含0.1 % koh 稳定剂 99%,含10 - 20 ppm mehq 稳定剂 99%,含10-100ppm 4-methoxyphenol 稳定剂 99%,含10-20 ppm mehq 作为稳定剂 99%,含15 - 20 ppm mehq稳定剂 99%,含150-400 ppm bht 稳定剂 99%,含50-150 ppm tbc 稳定剂 99%,粒径<1.2um 99%,粒状 99%,闪烁级 99.0% metals basis 99.0% 99.5% (metals basis excluding sr), sr <500ppm 99.5% (metals basis 去除ni), ni < 0.2% 99.5% (metals basis 去除铪) ,325目 99.5% (metals basis,锆除外), zr<1% 99.5% (reo) 99.5% metals basis (去除铪),1-3μm 99.5% metals basis, 40nm, 近球形 99.5% metals basis, ≤6um 99.5% metals basis,<100 nm 99.5% metals basis,2.0μm 99.5% metals basis,25μm 99.5% metals basis,5 μm 99.5% metals basis,<15μm 99.5% metals basis,粉末, 2 μm 99.5%( based on diamine), mixture of isomers 99.5%(gc) 99.5%, 含<1%正丁硫醇稳定剂 99.5%,-325mesh 99.5%,1-3μm 99.5%,10um 99.5%,2-3μm 99.5%,metals basis 99.5%,含0.1 % koh 稳定剂 99.5%,异构体混合物 99.7%,含100ppmmehq稳定剂 99.75% metals basis 99.8% metals basis,300目 99.8% trace metals basis 99.9% metals basis ,无水 99.9% metals basis, -200目 99.9% metals basis, 1000目 99.9% metals basis, 600-800nm 99.9% metals basis, 800目 99.9% metals basis, 900目 99.9% metals basis, <100nm particle size 99.9% metals basis, d50=200nm 99.9% metals basis, ≤10um(fsss) 99.9% metals basis, ≤150nm 99.9% metals basis, ≤500目 99.9% metals basis,0.5μm 99.9% metals basis,1-5μm 99.9% metals basis,100-200 mesh 99.9% metals basis,100目 99.9% metals basis,1μm 99.9% metals basis,2-3μm 99.9% metals basis,200目,粉末 99.9% metals basis,20nm 99.9% metals basis,40nm 99.9% metals basis,50nm 99.9% metals basis,无水 99.9% metals basis,粉末,100-200 mesh 99.9% metals basis,粉末,≥200目 99.9% metals basis,粒径(d50)10-20μm 99.9% rare earth metals basis,200目 99.9% trace rare earth metals basis 99.9%(200ppm mehq as inhibitor) 99.9%, 1um 99.9%, 200nm 99.9%, 20nm 99.9%, 50nm 99.9%,1-2um 99.9%,1-3um 99.9%,200目 99.9%,30nm 99.9%,40nm 99.9%-ni 99.9%metal basis,d1=1μm 99.95% metals basis, -80目 99.95% trace metals basis 99.95% 99.98% metals basis 99.98% 99.99% (metals basis 去除ni), ni < 0.2% 99.99% (reo) 99.99% metal basis, 无气味的粉末 99.99% metal basis 99.99% metals basis 0.5-2mm 99.99% metals basis, 3.3-5μm 99.99% metals basis, 300目, o≤0.5% 99.99% metals basis, 40目 99.99% metals basis, 800目 99.99% metals basis, water≤0.2% 99.99% metals basis, φ6mm, 长:6mm 99.99% metals basis, 无水 99.99% metals basis, 用于镀膜 99.99% metals basis,-400目 99.99% metals basis,0.1mm 直径 99.99% metals basis,0.25mm 直径 99.99% metals basis,0.5mm 直径 99.99% metals basis,1-3mm,powder 99.99% metals basis,1-3mm 99.99% metals basis,150目 99.99% metals basis,1mm 直径 99.99% metals basis,300目 99.99% metals basis,40-200目 99.99% metals basis,不规则块状 99.99% metals basis,无水级 99.99% metals basis,晶粒 99.99% metals basis,用于光学玻璃或单晶 99.99% metals basis,粉末 99.99% trace metals basis, d50=2~3μm 99.99% trace metals basis, 无水级 99.99% trace metals basis,<20 μm, 99.99%(reo) 99.99%,1-3mm 99.99%,1-3μm 99.99%,metals basis 99.99%-sn 99.995% metals basis, φ3mm, 长:3mm 99.995% metals basis, φ6mm, 长:6mm 99.995% metals basis,≤80目 99.998% trace metals basis,结晶,粉末 99.998% 99.9985% (metals basis), (去除最高25ppm的碱土金属) 99.999% metals basis 99.999% metals basis, -800目 99.999% metals basis,-300目 99.999% metals basis,1-6 mm,beads 99.999%(metalsbasis去除ni),ni<0.2% 99.9999% 99.99999% metals basis,棒状或块状 >90% >98% acid value (koh mg/g): 200~235 acs reagent, chips, 33.5-36.5% acs,97.0% acs,98.0-102.0% al2o3 30-40%, -600目 al2o3≥50% alkylating agent, 90% al≥8.4% al≥9.8% analytical standard, 99.5% anhydrous, 99.5% anhydrous, 99.999% trace metals basis anhydrous,99.9% trace rare earth metals basis anhydrous,99.998% trace metals basis aps≈2微米, 99.9% metals basis au 48-50% average mn 40,000 average mn 600 average mn ~2,600 average mn ~330 average mn ~683 average mn ~7,200 average mn~1124 average mn~432,84wt.% in 1-butanol bioxtra, 98.0% (tlc) black granular c16: 54%-62%; c18: 38%-44% c18:80-90% cd ≥75% cis and trans,94% cis and trans,99% co 43.0 - 47.0 % co 7.8 - 8.2%,溶剂:40%-80%的石脑油 co 9%-10% co:43-47% contains 75-125 ppm monomethyl ether hydroquinone as inhibitor, >90% contains ≤2% bht as stabilizer, 98% cu:8% diam. 3 mm, ≥99.95% metals basis doped, conductivity 0.5-1.5 s/cm (pressed pellet, typical), extent of labeling: ~5 wt. % loading, coated on titanium dioxide electronic grade, 99.999% trace metals basis electronic grade epoxy value:0.43 epoxy value:0.65~0.70 epoxy value~4 feso4 ~87% fe≥50% for spectrophotometric det. of au,tl(iii),w, 99% for spectrophotometric det. of so42-, s2-, ≥97% for spectrophotometric det. of transition metals, 95% for synthesis, mixture of isomers for use in transformations, x-ray crystallography and nmr free macrogoly, 25-40% free, 90% grade 135 granular hcl salt, 97% hpo3≥38% hpo3≥43% min. 98.0% min. 99.5% min. 99.7% min. 99.8% mixture of isomers,90% mixture of perfluoroadamantane adn perfluoro(1-methyladamantane) mn 27,000 mn 30% mn ~492 (n≈6) mn ≥71.0%,bet surface area 5~7 m2/g mn~3000 mw ~120,000, mn ~50,000 mw ~280,000 mw~1000 n>32.5 %, d50=5.0μm nanopowder, <100 nm particle size (bet), >97% trace metals basis ni 61% os 42.5% pb ≥82% powder, <5 μm powder, 60 mesh, 99% powder, 99.5% metals basis powder,1-2 μm,99% ppg-2000do pt 65% reagent grade, 98% reagent grade, 99% reagent grade, co 43.0 - 47.0 % reagent grade ru 1.5% w/v ru 5% sio2,44-47% sn≥57% standard for gc, 99.9% (gc) standard for gc, ≥99.9% (gc) standard for gc, ≥99.9% tech. 90% technical grade, 70% technical grade, 90 % technical grade, 90% technical grade technical, 0.5-1.5 m in diethylene glycol diethyl ether technical, ≥85% (gc) ,含铜屑稳定剂 technical, ≥90% (gc,mixture of isomers) technical,75% technical,90 % sum of enantiomers technical,90%,ee 99% tetraacrylate≥80%, 含有稳定剂mehq tfa salt, 98% viscosity 1.4dl/g white granular, viscosity:0.8-0.83 dl/g ~17% aromatics basis ~40% active ingredients in h2o ~70% in h2o α-phase≥90%,-325 mesh α相,99.9% metals basis,100nm α相,99.9% metals basis,200nm α相,99.9% metals basis β-phase,95%,1-3μm β相, 99.9% metals basis, d50=500nm β相,99.9% metals basis,200nm β相,99.9% metals basis φ4mm-6mm, 干燥剂用 φ5mm 高2.5mm 圆柱体,ge≥99.999% ≤100nm, 99% metals basis ≤3% water ≤500 nm, 99.9% metals basis ≥20.0% in thf ≥200 mesh particle size ≥29% ti (as tio2) basis, technical ≥60%(gc) ≥60% ≥62%(gc), 顺反混合物, 含≤38%的3-氯-1-丁烯 ≥65%(gc) ≥75%(gc) ≥85% ≥90% (gc) ≥90%(t) ≥90%, contains 900-1100 ppm mehq as inhibitor ≥90.0%(gc) ≥92% ≥93% ≥95 % ≥95% (hplc) ≥95%(hplc) ≥95%(lc) ≥95%, stabilized, fg ≥95.0% (hplc) ≥95.0%(gc),含稳定剂氢氧化钾 ≥95.0%(gc) ≥96%(gc)(t) ≥96%(gc) ≥96%(lc) ≥97%(gc&n) ≥97%(gc)(t) ≥97%(gc), stabilized with tbc ≥97%(gc), 含稳定剂koh ≥97%(pure) ≥97%(stabilized with tbc) ≥97%(t) ≥98 atom % d, ≥98%(cp) ≥98% (hplc) ≥98% sum of enantiomers ≥98%(gc), 顺反异构体混合物 ≥98%(mixture of isomers) ≥98%(nmr) ≥98%(t)(gc) ≥98%, hplc ≥98%, hplc标记用 ≥98%, 异构体混合物 ≥98%,白色 ≥98.0% (at) ≥98.0% (hplc) ≥98.0%(gc),mixture of isomers ≥98.0%(gc) ≥98.5%, 200-400nm ≥99 % ≥99 atom % d, ≥99%(cp) ≥99% (gc) ≥99% metals basis, powder, ≤3μm ≥99% metals basis ≥99%(hplc) ≥99%, d50≤10μm ≥99%, ≤1μm(fsss) ≥99%, 无水级, 同分异构体混合物 ≥99%, 用于gc衍生化 ≥99%,gc ≥99.0% (gc) ≥99.5 % ≥99.5% (4 times purification) ≥99.5% (metals basis) ≥99.5%, 98 atom % d ≥99.5%, 直径: 0.38mm ≥99.5%, 直径: 0.6mm ≥99.5%, 直径: 1mm ≥99.5%, 直径: 2mm ≥99.5(gc),含0.01% koh稳定剂 ≥99.6% trace metals basis,-10目 ≥99.9% trace metals basis, water≤1% ≥99.9% trace metals basis ≥99.9%(gc) ≥99.99% 乙烯含量:53%;enb:4.0% 乙烯含量:55%;enb:9.5% 乙烯含量:60%;enb:7.8% 乙烯含量:68%;enb:5.7% 乙烯含量:69%;enb:4.5% 乙烯含量:72%;enb:4% 二氧化硅:38.0%~42.0% 优级试剂, 85% 优级试剂, 98% 优级试剂, 99.5% 元素分析仪专用 光致抗蚀剂级,99% 分析对照品, hplc≥98% 分析对照品, ≥98% 分析对照品, ≥99% 分析对照品, ≥99.5%(gc) 分析对照品, ≥99.5% 分析对照品,>99.7% 分析对照品,99% 分析对照品,99.5% 分析对照品,≥98% 分析对照品,≥99.5%(gc) 分析对照品,≥99.8%(gc) 包含 200 ppm naoh 稳定剂, 97% 包含 200 ppm naoh 稳定剂, 99% 包含 200 ppm naoh 稳定剂, 99.9% 包含50-185 ppm mehq稳定剂, 98% 包含有200 ppm mehq阻聚剂, 99% 升华, 99.9% (reo) 升华树枝状, 99.9% (reo) 块状,99.9% metals basis 天然来源,≥98% 天然矿物,晶粒,大约 0.06-19in 孔间距:65±10nm直径13mm 季铵盐含量:≥45% 平均分子量 ~400 平均分子量2000, 含~300 ppm mehq 平均分子量4000, 含~300 ppm mehq 异构体混合物,97% 异构体混合物,99% 无定形, 0.5-2μm, 99.9% 无定形,<5μm,98% 无定形,99%,粒径(d50) 10-20um 无水, 粉末, 99.5% metals basis 无水, 粉末, 99.9% 无水, 粉末, 99.95% metals basis 无水, 粉末, 99.999% metals basis 无水,99.5% metals basis 无水,99.999% 无水,粉末,99.99% metals basis 无水、粉末、99.99% 无水级, ≥99% 晶体, aps ≈100nm, 99%, 等离子合成 晶状, -4+40 目,99.9999% (metals basis) 染料含量: 80% 比表面积10-15m2/g,粒度20nm-100nm,99.9% 氮≥19.5 % 沸程80-120°c, 水分<50ppm 油状50% 浓度范围:0.124±0.008mg/l 混合物,含有部分ni单质 环氧值: 0.74-0.78 eq/100g, 粘度:10-25 mpa.s 环氧值eq/100g:0.70 用于gc衍生化, 98.0% 用于gc衍生化,99% 用于合成 电池级, 99.8%, water≤50 ppm 电池级, 99.9%, water≤20 ppm 直径:0.1-0.3μm, 长度:3-5μm 直径:0.2-0.5μm, 长度:5-15μm 直径:0.2-0.7μm,长度:10-35μm 直径:20-100nm, 长度:≈1μm 直径:3-5μm, 长度:10-30μm 硬脂酸和甲基丙烯酸十六酯的混合物,含有mehq作为抑制剂 碲粒 2-3mm 99.999% 粉末, <5μm, ≥99.5% metals basis 粉末, 98% 粉末, ≤45μm, ≥99.5% metals basis 粉末, ≥99.9% metals basis 粉末,99.5% 粉末,99.99% metals basis,-200目 粉末,99.99% metals basis,-325目 粉末,99.99% metals basis,100目 粒状,1-4mm,99.999% metals basis 纳米粉末, <50nm 粒径 (bet), 99% trace metals basis 纳米粉末, 粒径<150nm(bet) 纳米纤维,d<2.5μm,l/d≥20,98% trace metals basis 结晶, aps ≤50nm, 98%, 气相激光合成 羟值(mg koh/g):133~148 羟值mgkoh/g:28±3 羟值mgkoh/g:40±4 羟值mgkoh/g:52±6 羟值mgkoh/g:67±5 羟值mgkoh/g:≤15,皂化值mgkoh/g:180~190 羟基值54-62 mg koh/g 荧光级,>97%(hplc) 药用试剂级 蒸馏枝形片状 99.95% metals basis 蒸馏树枝状, 99.9% (reo) 试剂级, 60% 试剂级, 85% 试剂级, 90%(contains acetic acid) 试剂级, 90% 试剂级, 92% 试剂级, 94% 试剂级, 95.0% 试剂级, 97.0% 试剂级, 98.0% 试剂级, 99.7% 试剂级, cr≈32% 试剂级, mg≈14% 试剂级, ratio(mgo/al2o3)=3-1,含水率:≤8.5% (100℃,1h) 试剂级, ≥99% 试剂级, 含0.025% bht 稳定剂 试剂级, 含~75 ppm bht稳定剂 超干, 99.99% (reo) 超干, 99.99% metals basis 超干, 99.998% metals basis 超干, 99.999% metals basis 超干,99.995% metals basis 超干级, 99.95% metals basis 超干级, 99.99%metals basis 超干级,99.99% metals basis 酐:90%酸:10% 酸值(mg koh/g) ≤0.5, 皂化值(mg koh/g): 325~360 酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 100~130 酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 85~105 酸值mgkoh/g ≤10,皂化值mgkoh/g 212~222 锑含量≥60% 锭, 99.9% metals basis,,液体石蜡保存 锭, 99.9% metals basis 锭, 存放于油中,99.9% metals basis 锭,99.5% 镀膜级,颗粒,99.9% metals basis 非离子剂, 酸值<5.5mgkoh/g 非离子剂 顺反异构体混和物 馏程: 161-179 °c 馏程: 186-202 °c 馏程: 270-311 °c