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98%
97%
95%
≥95%
99%
≥98%
≥97%
96%
90%
99.5%
10mm in dmso
99.9%
≥99%
>98.0%(gc)
≥98%(gc)
99.99% metals basis
99.9% metals basis
≥98%(hplc)
standard for gc, ≥99.8%(gc)
>97%
85%
standard for gc, ≥99.9%(gc)
98%(gc)
standard for gc, ≥99.6%(gc)
≥96%
试剂级
standard for gc, ≥99.7%(gc)
试剂级, 98%
99.99%
93%
94%
≥98%(t)
≥90%
99.999% metals basis
≥98%(gc)(t)
standard for gc, ≥99.5%(gc)
试剂级, 99%
80%
>95%
≥97%(gc)
≥98.0%
98.0%
98%(gc)(t)
≥95%(gc)
>98%
98%(t)
99.9% trace metals basis
92%
97%, 99% e.e.
98%(hplc)
≥99%(gc)
99.95% metals basis
试剂级, 99.0%
>99%
≥98.0%(gc)
98 atom % d
≥98%(t)(hplc)
>95.0%(gc)
97%(hplc)
97%(gc)
99.9% (reo)
100μg/ml in methanol, 不确定度3%
99.99% (reo)
99.99% trace metals basis
≥98 %
≥98%(hplc)(t)
≥99.5%
>97.0%(gc)
>98%(hplc)
97 %
99% trace metals basis
95%(gc)
95%(hplc)
98% (hplc)
98%, 98 atom % d
99.5% trace metals basis
97%, 99%e.e.
99% metals basis
99%(gc)
≥98% (hplc)
≥98%(hplc)(n)
1000μg/ml in methanol, 不确定度2%
98%(hplc)(t)
98%,gc
analytical standard
≥97%(t)
≥97.0%
试剂级, 98.0%
>98.0%(t)
100μg/ml in acetonitrile, 不确定度3%
10mm in water
99.999%
≥90%(gc)
≧95%
超干级, 99.99%
>98%(gc)
>99.0%(gc)
70%
75%
95% mix tbc as stabilizer
95%(t)
99.999% trace metals basis
≥95%(hplc)
无水, 粉末, 99.99% metals basis
试剂级, 95%
>98%(lc)
>98.0%(gc)(t)
>99.5%
98%, 99%e.e.
99.5% metals basis
99.7%
99.8%
≥97%(hplc)
≥98.0%(hplc)
优级试剂
试剂级, 99.5%
>99% (hplc)
1000μg/ml in acetonitrile, 不确定度2%
40%
91%
96%(gc)
98%,t
98.0%(gc)
98.5%
99%(t)
99.6%
99.995% metals basis
>98%
≥95%(t)
≥97%(gc)(t)
≥98%(n)
试剂级, 97%
超干级, 99.99% metals basis
>90.0%(gc)
>97%(hplc)
>98.0%(hplc)
>98.0%
90%(gc)
97.0%
98%(mixture)
98%,ee99%
98%,lc&t
98%,顺反混合物
>95%
≥95.0%(gc)
≥95.0%(hplc)
≥95.0%(t)(hplc)
≥96%(gc)
≥98%(lc)
≥99.0%
≥99.5%(gc)
≥99.9% trace metals basis
优级试剂, 99%
分析对照品, ≥98%
分析对照品, ≥99%
>96%
>96.0%(gc)
>98.0%(hplc)(t)
95%(stabilized with tbc)
97%(gc)(t)
98%(n)
98%,mixture of isomers
99.8% metals basis
99.9% (metals basis)
99.9% trace rare earth metals basis
≥95.0%
≥97%(hplc)(t)
≥99.9%
≥99.99% metals basis
分析对照品
试剂级, 96%
>90%
10% in h2o
30% in h2o
96.0%(gc)
97%, 99%ee
98 %
98%(lc)
98%(stabilized with mehq)
98%, mixture of isomers
98%, 异构体混合物
98%,gc&t
99%(hplc)
99.995% trace metals basis
≥80%
≥85%
≥95%(gc)(t)
≥95%(stabilized with tbc)
≥95%(t)(hplc)
≥95.0%(hplc)(qnmr)
≥97 %
无水,99.9% metals basis
超干级, 99.99%(reo)
>95.0%(t)
>97.0%(hplc)
>98.0%(n)
40% in water
50% in h2o
50%
50%水溶液
95%(mixture)
95%(nmr)
95%,gc
97% mix tbc as stabilizer
97%(stabilized with tbc)
98% trace metals basis
98%(hplc)(n)
98%(mixture of isomers)
98%,异构体混合物
>97%
br
tech. 90%
≥85%(gc)
≥90%(t)
≥94%(gc)
≥95%(lc&t)
≥96%(hplc)
≥98%(gc&t)
≥98%(lc&n)
≥98%,gc
≥98.0%(t)(hplc)
≥99 %
≥99%(hplc)
≥99%(t)
无水, 粉末, 99.9% metals basis
无水,99.99% metals basis
粉末,99.9% metals basis
试剂级, 90%
试剂级, 98.5%
>95%(gc)
>95.0%(hplc)
>97%(gc)
>98%(gc&t)
>98%(lc&t)
>99.0%(lc)
1000ug/ml in purge and trap methanol
1000μg/ml in methanol
100μg/ml in acetonitrile
100μg/ml in methanol
20% in h2o
30% in water
400目
5% in h2o
50% w/w 水溶液
60%水溶液
65%
90%(hplc)
90%(mixture)
93%(gc)
95% (hplc)
95%, mixture of isomers
95%, stabilized with tbc
95%, 异构体混合物
95%,stabilized with tbc
95%,顺反混合物
96%(t&lc)
96%(t)
97% (hplc)
97%(t)
97%, contains tbc as stabilizer
97%,gc
98%(gc&t)
98%(stabilized with copper chip)
98%, mixture of cis and trans isomers
98%, stabilized with mehq
98%,lc&n
98.0% (hplc)
99 %
99%,gc
99%,含稳定剂mehq
99.0%
99.9 % metals basis
99.98% metals basis
99.98%
99.999% (metals basis)
99.9999% metals basis
acs
sp
standard for gc, 99.5%(gc)
usp级
≥40%
≥80%(gc)
≥80%(hplc)
≥92%
≥93%(gc)
≥93%
≥95 %
≥97 % sum of enantiomers
≥97%(lc&n)
≥97%(n)(t)
≥98%(t&lc)
≥98.0% (hplc)
≥98.0%(gc)(t)
≥98.0%(hplc)(n)
≥98.5%
≥99%(tlc)
≥99.9% metals basis
分析对照品, 98%
分析对照品, 99%(hplc)
分析对照品,98%
分析对照品,99.5%
用于合成
>85.0%(gc)
>94.0%(gc)
>95%(hplc)
>95%(lc&t)
>95%(lc)
>95%(t)
>96%(gc)
>97.0%(hplc)(t)
>97.0%(t)
>97.0%
>98%(t)
>98.0%(hplc)(n)
>99%(gc)
>99%(hplc)
>99%, ee >98%
>99.0%
0.85-1.7mm, 元素分析仪专用
1% in h2o
1.0 m solution in thf, mkseal
1000ug/ml, 5% hno3
100μg/ml in hexane, 不确定度3%
10g/l in h2o
10mm in h2o
14% in h2o
20 wt. % in h2o
200目
30%
35wt.% in h2o
40目
45%水溶液
50 wt. % in water
50% in chlorocyclohexane
50% in water
50% solution in h2o
70% in water
80%(gc)
80-85%
80.0%(t)
82%
85%(gc)
85%(t)
85%, 异构体混合物
88%
89%
90%(nmr)
90%,t
90.0%(gc)
92%,含有稳定剂mehq
95 %
95% (stabilized with tbc)
95%(hplc)(t)
95%(stabilized with mehq)
95%, contains tbc as stabilizer
95%,98%ee
95%,gc&t
95.0% (gc)
95.0%(gc)
96%(gc)(t)
96%(mixture of isomers)
96%,gc
97% 99%ee
97%(mixture of isomers)
97%(n)
97%(nmr)
97%(stabilized with hq)
97%(stabilized with mehq)
97%, stabilized with tbc
97%, 粉末
97%,含铜稳定剂
97%,异构体混合物
97%,顺反混合物
97.0% (gc)
97.0% (hplc)
97.0%(gc)
98 atom % d, 98% (cp)
98 atom % d,98%
98 atom% d
98% (mixture of isomers)
98% (tlc)
98%(cis- and trans- mixture)
98%(mehq作为稳定剂)
98%(metals basis)
98%(n)(t)
98%(stabilized with bht)
98%(stabilized with tbc)
98%(t)(hplc)
98%, 99%ee
98%, stabilized with tbc
98%, 用于合成
98%,stabilized
98%,含稳定剂hq
98%,顺反异构混合物
98.0 %
98.0%(hplc)
99% (metals basis)
99%(gc)(t)
99%(sum of mixtures)
99%, stabilized with bht
99%,2-4μm
99%,50nm
99%,升华纯化
99.5% (reo)
99.5% trace metals basis excluding hf
99.9%(metals basis)
99.9%(reo)
99.9%,2-5um
99.9%,粉末
99.95% trace metals basis
99.95%
99.99% (metals basis)
99.99% metals basis,200目
99.99% trace rare earth metals basis
99.99%(reo)
99.997% metals basis
99.998% metals basis
99.9985% (metals basis)
99.999% metals basis,200目
99.999% metals basis,for perovskite precursor
fe2o3≤2ppm
reagent grade, 98%
reagent grade, 99%
reagent grade
technical grade
≥60%
≥85.0%
≥88%(gc)
≥90%(hplc)
≥93.0%(gc)
≥94%
≥95% (hplc)
≥95%(lc&n)
≥95%, contains tbc as stabilizer
≥95.0% (hplc)
≥96%(gc)(t)
≥97% (hplc)
≥97%(hplc)(n)
≥97%(lc)
≥97.0% (hplc)
≥97.0%(gc)
≥97.0%(t)
≥98% (hplc), powder
≥98%(gc)(n)
≥98%(gc), 用于生化研究
≥98%(lc&t)
≥98%(n)(t)
≥98.0%(t)
≥98.5 % sum of enantiomers
≥99% (gc)
≥99%,gc
≥99%,hplc
≥99.5%(4 times purification)
≥99.9%(gc)
≥99.99%
优级试剂, 98%
优级试剂, 99.5%
分析对照品, 98%(hplc)
分析对照品, 99%
分析对照品,99%
分析对照品,≥98%
分析对照品,≥99.5%
分析标准品,98%
分析标准品
无水、粉末、99.99%
电池级, 99.9%, water≤20 ppm
电池级, 99.99%, water≤20 ppm
试剂级, 95.0%
试剂级, 97.0%
试剂级, 99.8%
试剂级, fe:16.5-18.5%
超干, 99.99% (reo)
超干, 99.999% metals basis
超干,99.999% metals basis
超干级, 99.95% metals basis
超干级, 99.99% (reo)
超纯级,99.0%
>52%(gc)
>60.0%(gc)
>75%(gc)
>80.0%(gc),含200-650ppm mehq稳定剂
>80.0%(gc)
>80.0%(t)
>85%(gc)
>90%(gc),含100 ppm 对叔丁基邻苯二酚稳定剂
>90%(hplc)
>90%(t)
>93%(gc)
>93%(hplc)
>93%(t)
>93.0%(gc)
>93.0%(lc),顺反混合物
>94%
>95% (gc),approximately ~15% wt/vol in ethyl acetate
>95%(lc-ms)
>95%, 含稳定剂bht
>95.0%(gc&t)
>95.0%(gc) ,含0.2 % caco3/mgo (1:1)稳定剂
>95.0%(gc)(t)
>95.0%(hplc)(n)
>95.0%(lc&t)
>95.0%(lc)
>95.0%(n)
>95.0%(t),硬型,混合物
>95.0%
>96%(gc&t)
>96%(hplc)
>96.0%(lc&t)
>97%(t&lc)
>97%(t)
>97.0%(gc&t)
>97.0%(gc)(t)
>97.0%(lc)
>97.0%(n)
>97.0%,total of isomer
>97.5%
>98% usp
>98%(gc&n)
>98%(gc) , 含铜作稳定剂
>98%(hplc), unsublimate
>98%(lc&n)
>98%(t&lc)
>98.0%(w)
>99% (gc)
>99.0% (gc), 无色液体
>99.0% (gc)
>99.0% (hplc)
>99.0%(gc) ,含100ppm 4-叔丁基邻苯二酚稳定剂
>99.0%(gc)(t)
>99.0%(gc),含mehq稳定剂
>99.0%(gc),用于hplc荧光标记
>99.0%(hplc)
<1% diethylene glycol monobutyl ether
<100 μm, ≥99.98% trace metals basis
<45 μm
(1mg/ml的甲醇溶液)[用于水分析]
(99.99%-ce) (reo)
(99.99%-pr)(reo)
(mixture of 3- and 4-isomers) stabilised with 4-tert-butylpyrocatechol for synthesis: ≥ 98.0 % (a/a)
(w/w=7/3)
(顺式+ 反式), ≥92%(gc)
-100 目, 99.9% metals basis
-100 目, 99.999% (metals basis)
-200+325目, 99.95% metals basis
-200目,97%
-200目粒径
-22 目,99.999% (metals basis)
-325目, 99.5% metals basis
-325目,99.99% (metals basis去除ta), ta <500ppm
-40 目, 99.9% (reo)
0.001mol/l
0.001m
0.015mm 直径, 99.95% metals basis
0.016mol/l(0.016m) in h2o
0.01mol/l(0.01m) in h2o
0.025mm 厚, 99.985% metals basis
0.05%((w/v) in h2o
0.05%(w/v)in water
0.05mm 直径,99.995% metals basis
0.1%(w/v) in h2o
0.1%(w/v)in water
0.1-0.5mg/ml in water
0.127mm (0.005in) 厚, 退火, 99.8% (metals basis)
0.1m in thf
0.1m,ph7.5
0.1mm 厚, 99.9% (reo)
0.1mm 厚,≥99.995% metals basis
0.2% in h2o
0.22g/l
0.25m solution in thf, mkseal
0.25mm 直径, 99.99% (metals basis 去除 ta)
0.2g/l
0.2m,ph7.2
0.2m,ph7.5
0.2m,ph7.6
0.2mg/ml, 混合溶剂
0.3-0.8mm, 水封
0.3m in h2o
0.3mm 厚, 99.9% (reo)
0.4±0.008mol/l in h2o,trace metal grade
0.5 m solution in thf, mkseal
0.5% in h2o
0.5% solution in water,stabilized with sodium hypochlorite
0.5%(w/v) in h2o
0.5-3μm, 92% (eds)
0.50 m in 2-methf
0.53%
0.5m solution in thf, mkseal
0.5m,ph7.5
0.5m,ph8.0
0.5mol/l in water
0.5msolutioninthf,mkseal
0.5wt%la, 300目
0.6m in thf, mkseal
0.7 m solution in thf,water≤1000ppm, mkseal
0.8mg/ml solution (ph 10)
1% (w/v) in h2o
1%(w/v)in water
1-10 μm,98%
1-3mm (0.04-0.1in),99.9997% (metals basis)
1.0 m in h2o
1.0 m in methylene chloride
1.0 m in thf, mkseal
1.0 m in thf/hexanes, mkseal
1.0 m solution in h2o
1.0 m in ethyl acetate
1.0 m in heptane
1.0 mg/ml in methanol
1.00mg/ml,基体:甲醇
1.0mm 直径, 99.8% metals basis
1.3 m in thf, mkseal
1.3m lifsi in ec:pc=1: 1 wt%
1.5 m in h2o
1.9-2.1%, for determination of hydrogen peroxyde (h 15), according to din 38 409, part 15, dev-18
10 % 溶液
10 nm diameter, λmax, 780 nm, dispersion in h2o
10 wt. % in h2o
10% (v/v) in h2o
10% in acetonitrile
10% in propanediol
10% pd(oh)2
10% solution in h2o
10% 水溶液
10%lipf6+2.5%lifsi in ec:emc:dec=3:5:2
10%水溶液
10%的水溶液,约2.4mol
l
10-30 nm, 25% in h2o
100 mesh,99.9%
100 nm 粒径, 20 wt. % 异丙醇溶液
100 μg/ml in acetonitrile
1000mg/l于叔丁基甲醚
1000ug/ml, 1%hno3
1000μg/ml in acetonitrile, uncertainty 2%
1000μg/ml in acetonitrile,uncertainty 2%
1000μg/ml in ethanol
1000μg/ml in hexane, 不确定度2%
1000μg/ml, in purge and trap methanol
1000μg/ml, 溶剂:甲醇
1000分子量
100g/l in h2o
100g/l, 介质: h2o
100mg/l in methanol
100mg/ml in ethanol
100nm,99.5% metals basis
100ug/ml, 溶剂: 正己烷
100ug/ml,1% hno3
100μg/ml in acetonitrile, uncertainty 3%
100μg/ml in ethanol, 98% (cp)
100μg/ml in ethanol
100μg/ml in h2o
100μg/ml, 溶剂: 甲醇
100目
10m in h2o
10mm in ethanol
10mm in h2o, suitable for hplc
10mm in methanol
10μg/ml in acetonitrile
10μg/ml in ethanol
12% (w/v) in water
12% zr in mineral spirits
12.0-14.5% fe basis
1250目
13 wt. % in h2o
13%于四氢呋喃中, 约0.8mol/l
13-14% active oxygen
14% solution in h2o
15% mo
15%水溶液
15.3% pt
150g/l, 介质: h2o
15cm或更小, 99.999% metals basis
15wt.% in h2o
16.5%(w/v), stabilized
17-23%钒
182.3μg/ml in h2o
19-23% ce basis
19mm 或更小, 99% metals basis
1:1比例
1:3水溶液
1g/l in h2o
1m in methf
1m in water
1m lipf6 in ec:dec=1:1 vol% with 10% fec
1m lipf6 in fec:femc:hfe=1:1:1 wt%
1m lipf6 in dec:dmc:ec=1:1:1 vol%
1m lipf6 in dmc:ec:emc=1:1:1 vol% with 1%vc
1mg/ml in water
1mg/ml, 基体:冰乙酸
1mol/l, 介质: h2o
1wt. % loading(dry basis), 4-8mesh, (wetted with ca. 30-40% water)
1μg/ml, 5% hno3
2 % cross-linked with divinylbenzene
2% (w/v) in h2o
2%水溶液
2-5mm (0.08-0.20in) 直径, 99.9999% (metals basis)
2-5um/99.5%
2.0 m solution in thf, mkseal
2.0 m solution in thf,mkseal
2.00 m in h2o
2.0mm直径, 99.999% metals basis
2.5% in h2o
20 wt. % 正丙醇溶液
20% in water
20% w/w in h2o
20%-26% in h2o
20%甲醇溶液,~20% in methanol (t)
20-25% 乙醇溶液
20-40目, gc
2000 μg/ml in methanol
2000ug/ml in purge and trap methanol
2000μg/ml in h2o
2000目
200nm,99%
200nm,99.5% metals basis
20g/l in h2o
20mg/ml
20nm~160nm,100od(±5od) in h2o
20目
22%-25% w/v in isopropanol
22.5%水溶液
22mm (0.9in) 直径, 99% (metals basis), sr ≤0.8%
2400分子量
25% (v/v) in h2o
25% w/w in 1-methoxy-2-propanol
25% w/w in hexane
25-30 mpa·s
250g/l, 介质: h2o
25g/l in h2o
28% in water
28% k2o,粉末
2m in h2o
2m in thf
2mm in dmso
2mol/l in etoh
2na salt, 95%
3-5mm,吸附剂,催化剂及载体
3.175mm 直径 x 6.35mm 长, 99.95% (metals basis去除ta)
3.4um
3.6g/l in h2o
30 nm 粒径, 20 wt. % 水溶液
30 wt. % in h2o
30% (w/w) in h2o
30% solution in h2o
30% w/w 水溶液
30%水溶液
30±2% in h2o
30-35 wt. % in 200#paint solvent
30-35 wt. % in ethanol, mkseal
30.6-39.0%cu
300-400目
300目,99%
30g/l in h2o
30nm 球形 纯度:99% trace metals basis
30nm 球形 纯度≥97% trace metals basis
30nm 球形,99.5%
30nm,99.5%
32-36%
33-35% tio2
35 wt. % in h2o
35 μg/ml in isooctane
35% in h2o
35% in water
35%
36%,固体
36.0-40.0% ru basis
39-44% b2o3 basis, 31-37% cao basis, powder
3m,ph5.2
3m,ph5.5,溶剂:h2o
3mm in dmso
4 wt. % in h2o
4% ca
4.00mg/l in water
40 wt. % in h2o
40% (w/w) in h2o
40% w/w in water
40% w/w 水溶液
40% 水溶液
40%水溶液
40 wt. % in isopropanol
40-47%mgo
40-60%,工业级
40-60目 gc
40.5%-42.5% pb
40nm 球形,99.5%
42%
43.6%(wt) in dichloromethane
430g/l
45-55% in water
45-60%, mixture of isomers
45.0 - 50.0%
45mg/ml in h2o
45um,-325 目, 99.9% metals basis
45wt.% aqueous solution
46%
47%
48-50%溶液
48~50% au basis
49 wt. % in 2-ethylhexanoic acid
49 wt. % in hexane, ce: 12%
4n,靶材专用
5 % 溶液
5% pt, 99.95% metals basis
5%载量,粉末
5 m in thf
5-10 nm 粒径, 20 wt. % 异丙醇溶液
5-10 nm 粒径, 20 wt. % 水溶液
5.4mg/l,1-5层
50 wt%己烷溶液
50 wt. % in h2o, 99.9% trace metals basis
50 wt. % in h2o
50 wt. % in mineral spirits
50 wt. % 水溶液
50 wt.% solution in water
50% in dichloromethane
50% w/w in h2o
50% w/w solution in methanol, mkseal
50% w/w 水溶液, 试剂级
50%(gc), 异构体混合物
50%aqueoussolution(99.9%-eu)(reo)
50%溶液
50%甲醇溶液
50 wt. % in ethanol
50 μg/ml in isooctane, analytical standard
50-100 mesh, extent of labeling: 3-4 mmol/g loading, 1 % cross-linked
50-55% w/w hbf4
50-60% tio2, 35-40% k2o
500g/l in h2o
500nm
500μg/ml in water
50nm 近球形,99.5%
50nm,99%
50wt%水溶液
50wt.% in h20
50μg/ml, 5% hno3
55 wt. % in h2o
55% in water
55%
59%
5g/l in h2o
5m in h2o
5um/99.5%
5wt. %(dry basis), matrix activated alumina
6.5%
60 wt. % in h2o
60 wt. % 水溶液
60 wt. %水溶液
60% (w/v) in h2o
60% in h2o
60% in n-butoxide, hf: 22.6 wt%
60% in water,300-500ppm mehq
60% 水溶液
60%,gc
60%
60-200目
60-64%, fe≤10ppm
60-70% 水溶液
60-80目 gc
60.0%
600目
60nm,99.9% metals basis
61%min in mineral spirits ,pb 24%
62 wt. % in h2o
625目
64-66%的水溶液
65 wt. % in h2o
65 wt. % in mineral spirits
65-72% in water
68-70%, mixtures
6mm 直径, 99.99999% metals basis
7.5% (v/v) in h2o
70 wt. % in h2o
70 wt. % 正丙醇溶液
70% hf
70% in etoh
70%(hplc)
70%,含异构体和邻苯二甲酸
70%,块状
70%甲醇溶液
73%水溶液
74-76% in water
75 wt. % in h2o
75% (contains ca. 23% isomer)
75% in h2o
75-80 wt. % in water
78% in 2-ethylhexanoic acid
80 % in water
80 wt. % in h2o, contains 600 ppm monomethyl ether hydroquinone as inhibitor
80% (contains 5% phenol at maximum)
80% (hplc)
80% in ethanol
80% in water,稳定剂:聚乙二醇5-10%
80% in water
80% metals basis
80% 水溶胶
80%(mixture of monoester, diester, triester)
80%(mixture)
80%(mixtures of isomers)
80%, mixture of isomers
80%,gc
80%,天然
80-100目 gc
80.0%(gc), 含约20%反-异构体
80.0%
800nm 球形 纯度>99.5%
800目
80nm, 99.5% metals basis
83%,gc
83%
83.5-86.5% tio2, 13.5-16.5% k2o
84%
85%, cont. ca 10% 2-cyclohexylidenecyclohexanone
85%,gc
85%,stabilized with tbc
85%,含100ppm mehq稳定剂
85-90%,工业级
85.0%(gc)
87%,顺反异构体混和物
88% (m- and p- mixture)(stabilized with tbc + onp + o-nitrocresol)
88% (uv-vis)
88.5%
90% (gc), mixture of isomers
90% (hplc),用于荧光分析
90% stabilized with 60-100 ppm mehq
90%(stabilized with tbc)
90%(t)
90%, stabilized with mehq
90%, 包含对苯二酚稳定剂
90%, 含有~6%氯化铵
90%, 来源于鲨鱼
90%,gc
90%,lc&n
90%,lc
90%,可溶于水
90%,异构体混合物
90%,异构体的混合物
90%,顺反异构体混和物
90%,顺反混合物
90%-98%
90g/l in h2o(cp)
90nm,0.03mg/ml,溶剂:超纯水
90nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液
91%, 浊点61°c
91%,浊点90℃
92%(gc)
92%(hplc)
92%, stabilized with mehq
92%,97%(mixture of isomers)
92-94 %
92-94%
93% (gc)
93% (hplc)
93%(hplc)
93%(t)
93%,t
93%,含200 ppm tbc 阻聚剂
93%,含稳定剂吩噻嗪
93%,外消旋和内消旋混合物
93%,异构体混合物
93%,黄相
94% (hplc)
94% (oligomer purity)
94%(hplc)
94%,含0.2% topanol 稳定剂
95% (dry basis)
95% (mixture of isomers)
95% (stabilized with 1%bht)
95% (stabilized with copper chip)
95% (tlc)
95% ,stabilized with mehq
95% anhydrous basis
95% contains ≤10%h2o
95% h4p2o7 basis
95% stabilized with tbc
95%(gc)(mixture)
95%(gc)(t)
95%(hplc)(n)
95%(min 90%)
95%(stabilized with bht)
95%(stabilized with dcm)
95%(stabilized with k2co3)
95%(sum of mixtures) (tbc作为稳定剂)
95%(tlc)
95%(含碳酸钾稳定剂)
95%(含约40%的十八烷基醚硫酸钠)
95%, 0.1% 4-甲氧基苯酚稳定剂
95%, 10 mg/ml in ethanol
95%, 200ppm 4-甲氧基苯酚稳定剂
95%, 98 atom % d
95%, 98% e.e.
95%, contains 0.1% bht as stabilizer
95%, contains 0.1% hq as stabilizer
95%, contains h2o
95%, stabilized with 0.2% tbc
95%, stabilized with hq
95%, stabilized with mehq
95%, total of isomers
95%, wetted with ca. 20% water
95%, ~1 m in h2o
95%, ~400mesh
95%, 含k2co3稳定剂
95%, 含有mehq作为抑制剂
95%, 含有稳定剂mehq
95%, 邻位~40%, 对位~60%
95%,(双酯≥75%,单酯≥20%)
95%,200 ppm monomethyl ether hydroquinone as inhibitor
95%,ee99%
95%,lc&t
95%,lc
95%,mixture of cis and trans isomers,with 200ppm 4-methoxyphenol
95%,mixture of trimers and monomer of piperideine
95%,nmr
95%,stabilized with 60-100 ppm mehq
95%,trans-isomer >92%
95%,t
95%,≤1.0% water
95%,含0.01 % 柠檬酸稳定剂
95%,含100-500 ppm tbc稳定剂
95%,含100ppm mehq稳定剂
95%,含250ppm bht 稳定剂
95%,含稳定剂mehq
95%,含稳定剂tbc
95%,含稳定剂铜屑
95%,异构体混合物
95%,异构体的混合物
95%,顺反异构体混和物
95%;mw~4.5w
bioreagent, 无dna酶和rna酶, pcr试剂, 分子生物学级, 无菌, for dna and rna applications, ≥99%, 100mm
96 atom % d, 98% (cp)
96% dry weight,5-10% 甲醇做稳定剂
96%(gc&t)
96%(gc), contanins ≤200ppm mehq as inhibitor
96%(isomers mixture)
96%(酯含量)
96%, contains nahco3 as stabilizer
96%, contains tbc as stabilizer
96%, mixture of isomers
96%, mkseal
96%, stabilized with 100ppm 4-methoxyphenol
96%, 含有200 ppm mehq阻聚剂
96%,sum of branched isomer,0.01% mehq
96%,上层覆保护剂
96%,含30 - 70 ppm mehq 稳定剂
96%,含稳定剂铜屑
96%,溶于油
固含量: 96%,溶于油
96(含3%diea)
96.0% (gc)
96.5%
97 %,200 ppm mehq
97% (hplc), white powder
97% (stabilized with tbc)
97% (tlc)
97% 25-27% solution in ethyl acetate
97% 99%ee(contains ~10%solvents)
97% contains ≤10%h2o
97% rel-(1r-2e-ps)-axial
97% trace metals basis, 300-500nm
97%(cis- and trans- mixture)
97%(hplc), 99%e.e.
97%(mix)
97%(mixtures)
97%(n)(t)
97%(nmr)(mixtures)
97%(stab. with hydroquinone)
97%(stabilized with bht)
97%(sum of mixtures)
97%(tbc作为稳定剂)
97%(w)
97%(含200-300ppmmehq稳定剂)
97%(基于干物质)in 25% h2o
97%, (e)+(z)
97%, mixture of 2- and 4-isomers
97%, mixture of cis and trans
97%, mixture of isomers,stabilizer:100-300ppm mehq
97%, mixture of isomers
97%, mixtures of c16&c18
97%, stabilized 250 ppm bht
97%, stabilized with 0.5% calcium carbonate
97%, stabilized with 500-1000 ppm tbc
97%, stabilized with cao
97%, stabilized with mehq
97%, sum of c16 c18 c20
97%, water ca 10%
97%, water ≤ 3.0%
97%, 含0.1% koh稳定剂
97%, 含有稳定剂mehq
97%, 含稳定剂tbc
97%, 含稳定剂铜屑
97%, 异构体混合物
97%, 来源于山苍子油
97%, 白色到淡黄色粉末
97%, 精制级
97%,0.01% 氢醌稳定剂
97%,0.1% 对叔丁基邻苯二酚作稳定剂
97%,10%h2o
97%,10mg/ml solution in water
97%,99%ee
97%,bet surface area 8~16 m2/g
97%,ee97%
97%,gc&t
97%,hq as inhibitor
97%,lc&t
97%,mixture of isomers
97%,pd 10%
97%,stab. with <1% magnesium oxide
97%,含0.02% 4-methoxyphenol 稳定剂
97%,含0.1 % 对苯二酚 稳定剂
97%,含0.1% tbc稳定剂
97%,含0.1%对叔丁基邻苯二酚(tbc)稳定剂
97%,含100-200ppm bht稳定剂
97%,含100ppm bht稳定剂
97%,含60-100ppm bht稳定剂
97%,含tbc稳定剂
97%,含含稳定剂氢醌
97%,含有数量不等的酸酐
97%,含稳定剂mehq
97%,含稳定剂mgo
97%,含稳定剂tbc
97%,含稳定剂水滑石
97%,含稳定剂铜屑
97%,顺式 + 反式
97.0 % gc
97.0% (sum of isomers, gc)
97.0% (t)
97.0% (tlc)
97.00%盐酸盐
97.5%
98 atom % 13c
98 atom % 15n, 98%(cp)
98 atom % d(deuterated from d0-d8), 95%
98 atom % d, 95%
98 atom % d, 99% (cp)
98 atom % d,95%
98 atom % d,96%
98 atom %, 98%(cp)
98 atom %d
98 atom% 15n
98 atom%d
98 atom%
98% (enzymatic)
98% (mixtures)
98% (stabilized with mehq)
98% ,含5-10 ppm tert-butylcatechol 稳定剂
98% 99%ee
98% dry weight
98% gc
98% ir 53%
98% metal basis, rh 19.32%最低
98% metals basis
98% trace metals basis excluding zr
98% 异构体混合物
98%(cis+trans)
98%(gc&n)
98%(gc), 顺反混合物, stabilized with mehq
98%(gc),含稳定剂bht
98%(gc),含稳定剂mehq
98%(gc),含稳定剂tbc
98%(hplc), solid
98%(lc&n)
98%(lc&t)
98%(lc&w)
98%(m- and p- mixture)(stabilized with tbc)
98%(mixture of isomers)
98%(mixture of isomer)
98%(mixture of isomeric branched chain hexanes)
98%(mixtures of isomers)
98%(mixtures)
98%(stabilized with koh)
98%(stabilized with methylhydroquinone)
98%(sum of isomers)
98%(t&lc)
98%(total of isomer)
98%(w)
98%(混合物)
98%, 325目
98%, 400nm-1μm
98%, 95 atom % d
98%, 98 atom % 13c
98%, 99 atom % d
98%, chloride≤0.002%
98%, contains 10-15%acoh
98%, contains mehq as stabilizer
98%, contains potassium carbonate as stabilizer
98%, contains tbc as stabilizer
98%, ee≥98%
98%, isomer mixture
98%, ni:22.5%
98%, ph<7 (33.3% in water)
98%, ru≥25.8%
98%, stabilized with bht
98%, ~20nm
98%, 含<1%正丁硫醇稳定剂
98%, 含200 ppm tbc稳定剂
98%, 含k2co3稳定剂
98%, 有效氧含量: ≥7.18 %
98%, 游离态
98%, 白色粉末, 用于生化研究
98%, 立体异构体混合物
98%, 粒径: 0-2μm
98%, 粒径: 1-2μm
98%, 粒径: 100-300nm
98%, 粒径: 600-800nm
98%, 粒径; 100-500nm
98%, 粒径; 400-700nm
98%, 粒径; 800-1000nm
98%,(stabilized with mehq)
98%,-325目
98%,100-200 ppm bht as inhibitor
98%,200 ppm monomethyl ether hydroquinone as inhibitor
98%,300目
98%,4 ~ 8μm
98%,99%ee
98%,ee 99%
98%,ee92%
98%,gc&n
98%,hplc
98%,lc
98%,mix tbc as stabilizer
98%,mixture of cis and trans
98%,n
98%,pd 15%
98%,pd>13.3%
98%,pd>36.2%
98%,pt:55.0 ± 1.3%
98%,rh>42%
98%,stabilized with 200ppm mehq
98%,stabilized with hq
98%,stabilized with tbc
98%,光学纯 70%
98%,含0.01% koh稳定剂
98%,含0.1% 对苯二酚稳定剂
98%,含0.10% alpha-tocopherol 抗氧化剂
98%,含0.3 % mgo稳定剂
98%,含100ppmmehq稳定剂
98%,含50 - 100 ppm bht 稳定剂
98%,含90 - 110 ppm mehq 稳定剂
98%,含有数量不等的酸酐
98%,含水约20% ,单位重量以干重计
98%,含稳定剂0.1% dea
98%,含稳定剂0.1%koh
98%,含稳定剂mehq
98%,含稳定剂tbc
98%,含稳定剂铜屑
98%,异构体的混合物
98%,支链异构体类的混和物
98%,棕色结晶粉末
98%,深蓝紫色结晶粉末
98%,用于过氧化物酶试验
98%,粒径:100-300nm
98%,约含0.5% mehq 稳定剂
98%,细胞培养级
98%,蓝相
98%,非对映异构体混合物
98%,顺反异构体混合物
98%,黄相
98%purity,99%e.e.
98%混合物(tbc作为稳定剂)
98-101%
98.0% (nt)
98.0% (sum of enantiomers, gc)
98.0%(hplc)(t), 用于高效液相色谱标记
98.0%(t)
98.0-102.0% anhydrous basis (hplc)
98.00%lc
98.5%, mixture of isomers
98atom % d, 98%
99 %,stab. with 0.1% tbc
99 atom % 13c, 98% (cp)
99 atom % 13c
99 atom % d
99% (dry wt.), water <2%
99% (gc)
99% (hplc), 98%
99% (purity excludes ~1% zr)
99% (reo)
99% 10-50微米
99% au assay:39.91 ± 0.8%
99% metals basis, 含有约10%的nicro3
99% metals basis,2-10 μm
99% trace metals basis, 20nm, 球形
99%(gc), contanins ≤200ppm mehq as inhibitor
99%(lc-ms)
99%(mixture)
99%(mixtures), 包含~0.006%对苯二酚稳定剂
99%(mixtures)
99%(n)
99%(stabilized with tbc), mkseal
99%(含200-300ppmmehq稳定剂)
99%(天然)
99%(支链异构体类的混合物总和)
99%, 0.2-0.5μm
99%, 0.5-1μm
99%, 10-20目
99%, 100-300nm
99%, 10μm
99%, 3-5μm
99%, 300-500nm
99%, 4-16mesh
99%, in 100mg/ml ethanol
99%, mixture of isomers
99%, mixture
99%, stabilized with mehq
99%, suitable for determination of sulfhydryl groups
99%, ≥99.99% trace metals basis
99%, 发酵工艺
99%, 无色液体
99%, 用于药物研究
99%, 粉末
99%, 粒径: 5-10μm
99%,-100目
99%,0.1%单杂
99%,0.5~0.7um
99%,1-5μm
99%,1~2μm
99%,1μm
99%,50目
99%,6-10μm
99%,anhydride group content≥41.0%
99%,bp
99%,ee 98%
99%,for spectrophotometric det. of ta
99%,hplc
99%,hq as inhibitor
99%,metals basis
99%,t
99%,单杂<0.1%
99%,含0.01 % bht 稳定剂
99%,含0.1 % koh 稳定剂
99%,含10 - 20 ppm mehq 稳定剂
99%,含10-100ppm 4-methoxyphenol 稳定剂
99%,含10-20 ppm mehq 作为稳定剂
99%,含15 - 20 ppm mehq稳定剂
99%,含150-400 ppm bht 稳定剂
99%,含50-150 ppm tbc 稳定剂
99%,含水20%
99%,总杂<0.1%
99%,粉末
99%,粒径<1.2um
99%,粒状
99%,锐钛,d50: 0.4-1um
99%,闪烁级
99%,高纯级
99%,黄色结晶针状固体
≥98%(hplc)(qnmr)
99.0% (at)
99.0% (t)
99.0% metals basis
99.0-100.5% (in dried substance), meets analytical specification of e 282
99.5% metals basis
99.5% (metals basis excluding sr), sr <500ppm
99.5% (metals basis 去除ni), ni < 0.2%
99.5% (metals basis 去除铪) ,325目
99.5% (metals basis,锆除外), zr<1%
99.5% metals basis (去除铪),1-3μm
99.5% metals basis, 40nm, 近球形
99.5% metals basis, d50: 1-3μm
99.5% metals basis, ≤6um
99.5% metals basis,<100 nm
99.5% metals basis,2.0μm
99.5% metals basis,25μm
99.5% metals basis,5 μm
99.5% metals basis,<15μm
99.5% metals basis,≥200目
99.5% metals basis,粉末, 2 μm
99.5%( based on diamine), mixture of isomers
99.5%(4 times purification)
99.5%(gc)
99.5%(metals basis), -200目
99.5%, acid <200 ppm, h2o <100 ppm
99.5%, mixture of isomers
99.5%, 含<1%正丁硫醇稳定剂
99.5%, 含有稳定剂mehq
99.5%,-325mesh
99.5%,1-3μm
99.5%,10um
99.5%,2-3μm
99.5%,metals basis
99.5%,trace metals basis
99.5%,≤3 μm
99.5%,单杂<0.1%
99.5%,含0.1 % koh 稳定剂
99.5%,异构体混合物
99.7% metals basis
99.7%,含100ppmmehq稳定剂
99.75% metals basis
99.8% trace metals basis
99.8% metals basis,300目
99.8% metals basis,60nm
99.8% metals basis,rh 81%
99.8% trace metals basis,粒径: 2 μm, 粉末
99.8% trace metals basis
99.8%, fe≤0.2%, d50:3-10μm
99.8%,6.35mm (0.25in) dia x 6.35mm (0.25in) length
99.85% (metals basis)
99.9% metals basis, ≤1μm
99.9% (metals basis), pt 44.9% min
99.9% metal basis
99.9% metals basis ,无水
99.9% metals basis, -200目
99.9% metals basis, 1-3cm
99.9% metals basis, 1000目
99.9% metals basis, 600-800nm
99.9% metals basis, 600目
99.9% metals basis, 800目
99.9% metals basis, 900目
99.9% metals basis, <100nm particle size
99.9% metals basis, d50=200nm
99.9% metals basis, d50≤40nm
99.9% metals basis, ≤0.8μm
99.9% metals basis, ≤10um(fsss)
99.9% metals basis, ≤150nm
99.9% metals basis, ≤500目
99.9% metals basis,0.5μm
99.9% metals basis,1-5μm
99.9% metals basis,100-200 mesh
99.9% metals basis,100目
99.9% metals basis,1μm
99.9% metals basis,2-3μm
99.9% metals basis,200目,粉末
99.9% metals basis,20nm
99.9% metals basis,400nm
99.9% metals basis,40nm
99.9% metals basis,50nm
99.9% metals basis,60-80nm
99.9% metals basis,ir ≥84.5%
99.9% metals basis,pd 29%
99.9% metals basis,≤1μm
99.9% metals basis,无水
99.9% metals basis,粉末,100-200 mesh
99.9% metals basis,粉末,≥200目
99.9% metals basis,粒径(d50)10-20μm
99.9% rare earth metals basis,200目
99.9% trace metals basis, 50-80nm
99.9% trace metals basis,-325mesh
99.9%(200ppm mehq as inhibitor)
99.9%(metals basis), 白色
99.9%, 0.5-2μm
99.9%, 1600-2000目
99.9%, 1um
99.9%, 200nm
99.9%, 200目
99.9%, 20nm
99.9%, 300±5nm
99.9%, 50nm
99.9%, 60-100目
99.9%,1-2um
99.9%,1-3um
99.9%,100nm
99.9%,200目
99.9%,30nm
99.9%,325目
99.9%,3~4um
99.9%,40nm
99.9%,50nm
99.9%,80-100nm
99.9%,metals basis
99.9%,颗粒,锆≤0.15%
99.9%-ni
99.9%metal basis,d1=1μm
99.9%metals basis
99.90%
99.95 % metals basis
99.95% (metals basis), pt 51.5% min
99.95% metal basis, ru 25.3%最低
99.95% metals basis, -150目
99.95% metals basis, -80目
99.95% metals basis, os 37%最低
99.95% metals basis, 钌 10.2% 最低
99.95% trace metal basis
99.95%,1um
99.98% trace metals basis
99.99 % metals basis
99.99% (metals basis 去除ni), ni < 0.2%
99.99% (metals basis), au 84.2% 最低
99.99% metal basis, ru 23%最低
99.99% metal basis, 无气味的粉末
99.99% metal basis
99.99% metals basis 0.5-2mm
99.99% metals basis, 3.3-5μm
99.99% metals basis, 300目, o≤0.5%
99.99% metals basis, 40目
99.99% metals basis, 800目
99.99% metals basis, os 52-56%
99.99% metals basis, rh 46.2% 最低
99.99% metals basis, water≤0.2%
99.99% metals basis, φ3mm, 长:3mm
99.99% metals basis, φ6mm, 长:6mm
99.99% metals basis, 无水
99.99% metals basis, 用于镀膜
99.99% metals basis, 直径0.1-2mm
99.99% metals basis,-400目
99.99% metals basis,0.1mm 直径
99.99% metals basis,0.25mm 直径
99.99% metals basis,0.5mm 直径
99.99% metals basis,1-3mm,powder
99.99% metals basis,1-3mm
99.99% metals basis,150目
99.99% metals basis,1mm 直径
99.99% metals basis,300目
99.99% metals basis,40-200目
99.99% metals basis,γ晶型,60nm
99.99% metals basis,不规则块状
99.99% metals basis,无水级
99.99% metals basis,晶粒
99.99% metals basis,用于光学玻璃或单晶
99.99% metals basis,粉末
99.99% trace metals basis, d50=2~3μm
99.99% trace metals basis, ≤10 μm
99.99% trace metals basis, 无水级
99.99% trace metals basis,<20 μm,
99.99%, d50≈10um
99.99%,1-3mm
99.99%,1-3μm
99.99%,4n
99.99%,metals basis
99.99%,water:0.5-0.8%
99.99%-sn
99.99%metalsbasis
99.995% metals basis, φ3mm, 长:3mm
99.995% metals basis, φ6mm, 长:6mm
99.995% metals basis,≤80目
99.998% trace metals basis,结晶,粉末
99.998% trace metals basis
99.998%
99.9985% (metals basis), (去除最高25ppm的碱土金属)
99.9985% metals basis
99.999% metals basis
99.999% metals basis, -800目
99.999% metals basis, 200目
99.999% metals basis,-300目
99.999% metals basis,1-6 mm,beads
99.999% metals basis,powder
99.999% metals basis,无水级
99.999%(metalsbasis去除ni),ni<0.2%
99.999%,5n
99.9995% trace metals basis
99.9999% trace metals basis
99.9999%
99.99999% metals basis,块状
99.99999% metals basis,棒状或块状
<100nm,99%
>70%
>90%
>97%(hplc)
>98%(gc)
acid terminated,lactide:glycolide 50:50,mw 24000-38000
acid terminated,lactide:glycolide 50:50,mw 38000-54000
acid terminated,mw 38000-54000
acid value (koh mg/g): 200~235
acid value(koh mg/g):286~326
acs reagent, chips, 33.5-36.5%
acs, ≥98.0% (rt)
acs,>98%
acs,97.0%
acs,98.0-102.0%
acs,99%
acs,99.0-101.0%
acs,≥99.0%
al2o3 30-40%, -600目
al2o3≥30%
al2o3≥50%
al: 16-20%, stabilized with boric acid
alkylating agent, 90%
al≥8.4%
al≥9.8%
analytical standard 99.0% (gc)
analytical standard, 99.5%
anhydrous, 99.9% metals basis
anhydrous, 98%
anhydrous, 99.5%
anhydrous, 99.999% trace metals basis
anhydrous, powder, 99.9% metals basis
anhydrous,98%
anhydrous,99.9% trace rare earth metals basis
anhydrous,99.998% trace metals basis
anhydrous
aps≈2微米, 99.9% metals basis
au 23.5~23.8% in h2o
au 48-50%
au ≥35%
au≥51%
average m.w. 2000
average m.w. 5000
average mn 2,000
average mn 2500
average mn 40,000
average mn 500
average mn 600
average mn ~2,600
average mn ~330
average mn ~683
average mn ~50,000
average mn ~7,200
average mn~1124
average mn~432,84wt.% in 1-butanol
average mw 5000
average mw ~1,080,000, average mn ~311,000
average mw ~160,000
average mw ~2,000 by gpc, 61-65 wt. % in h2o
average mw ~216000, average mn ~80,000
average mw ~60,000
average mw ~2,200, average mn ~1,200, allyl alcohol 40 mol %
ba ≥30.0 %
basichydrate
battery grade 99.99% trace metals basis
bi: 210g/l, 溶剂: 水
biochemika, ≥96.0%(tlc)
biochemika, ≥99%
bioxtra, 98.0% (tlc)
black granular
br,10-20u/mg
br,28%
br,99%
bs
c14-c17混标, 42% cl, 100 μg/ml in cyclohexane
c16: 54%-62%; c18: 38%-44%
c18:80-90%
ca. 10% in isopropyl ether,mkseal
ca. 15% in tetrahydrofuran,mkseal
ca. 15% in water
ca. 8% in dichloromethane,mkseal
ca. 9% in hexane,mkseal
caco3≥90%
carbon 44%-45%
cd ≥75%
cis and trans,94%
cis and trans,98%
cis and trans,99%
co 43.0 - 47.0 %
co 7.8 - 8.2%,溶剂:40%-80%的石脑油
co 9%-10%
co:43-47%
contains 75-125 ppm monomethyl ether hydroquinone as inhibitor, >90%
contains ≤2% bht as stabilizer, 98%
contains ≤6000 ppm hydroquinone as stabilizer
content(1-mcp): ≥4.0%,carrier cyclodextrin
crystalline
cu>36%
cu: 33.0-42.8%
cu:8%
cu:9.5%-10.9%,200目
d,≥98%
diam. 3 mm, ≥99.95% metals basis
doped, conductivity 0.5-1.5 s/cm (pressed pellet, typical), extent of labeling: ~5 wt. % loading, coated on titanium dioxide
dye content 30 %
dye content 30%
dye content 85 %
dye content 90 %
dye content 95 %
dye content,~90%
electronic grade, 99.999% trace metals basis
electronic grade
epoxy value:0.43
epoxy value:0.65~0.70
epoxy value~4
ester terminated, lactide: caprolactone 70:30
ester terminated,lactide:glycolide 50:50,mw 24000-38000
ester terminated,lactide:glycolide 50:50,mw 38000-54000
ester terminated,lactide:glycolide 50:50,mw 50000-75000
ester terminated,lactide:glycolide 50:50,mw 7000-17000
ester terminated,lactide:glycolide 75:25,mw 76000-115000
ester terminated,lactide:glycolide 85:15,mw 190000-240000
ester terminated,mw 50000-75000
ester terminated,mw 54000-69000
extent of labeling: 12-15 mol per mol β-cd
fe>26%, powder
fe>30.5%
fe, 24%
fe2o3≥85%
fe: 19%-24%
fe: 20%
fe: 24%-30%
feso4 ~87%
fe≈70%, mixture
fe≥21%
fe≥50%
for enzymic, spectrophotometric determination
for fluorescence
for microbiology
for spectrophotometric det. of au, no2-, ce(iv), for the detection of au, co, cu, scn-, v, 97%
for spectrophotometric det. of au,tl(iii),w, 99%
for spectrophotometric det. of cu, 99%
for spectrophotometric det. of cu, fe
for spectrophotometric det. of fe(iii), ≥98.5%
for spectrophotometric det. of fe, 97%
for spectrophotometric det. of metal ions, ≥99%
for spectrophotometric det. of nitrate and nitrite, 99%
for spectrophotometric det. of s2-,cl2, 99%
for spectrophotometric det. of so42-, s2-, ≥97%
for spectrophotometric det. of transition metals, 95%
for spectrophotometric det. of zn(ii), cu(ii), fe(ii), co(ii), h2o2, 95%
for spectrophotometric det., 99%
for spectrophotometric detection, 99.5%(hplc)
for synthesis, mixture of isomers
for use in transformations, x-ray crystallography and nmr
formicroscopy
free macrogoly, 25-40%
free, 90%
grade 135
granular
hcl salt, 97%
hlb值:16~17
hplc≥98%
hpo3≥38%
hpo3≥43%
in 2mm dmso
ind
ir 48.0 - 55.0 %
ir:73%
lactide:glycolide(50:50),mol wt 30000-60000
lactide:glycolide(75:25),mol wt 66000-107000, 羧基封端
m.w 1000
m.w 11000-12000
m.w 2000
m.w 3000
m.w 7000-7500
m.w :30000-100000
m.w.10000
m.w.1500
m.w.20000
m.w.2000
meets usp testing specifications
mgo:45%
min. 98.0%
min. 99.5%
min. 99.7%
min. 99.8%
mixture of cmi and mi,1.50-1.75% in water,ph:2.0-4.0
mixture of cmi and mi,2.5-3.5% in water,ph:2.5-5.0
mixture of isomers,90%
mixture of oligomers,98%
mixture of perfluoroadamantane adn perfluoro(1-methyladamantane)
mixtures of cob&co2b
mn 27,000
mn 30%
mn 40,000
mn 4000,50%溶液
mn 6,000
mn ca. 6%
mn ~492 (n≈6)
mn ≥71.0%,bet surface area 5~7 m2/g
mn~3000
mn≥15.1%
mo 56.5%
moistened with water, 10% pd basis (based on dry substance)
mol wt 15,000-20,000 da
mo≥50 %
mo≥61.1 %
mw 130000-200000
mw 2000 da
mw 3400
mw ~120,000, mn ~50,000
mw ~25,000 20.0 wt% in thf 溶液
mw ~280,000
mw ~35,000 10 wt% in thf溶液
mw ~45,000 20.0 wt% in thf 溶液
mw ~65,000 15.0 wt% in thf溶液
mw ~80,000 15.0 wt% in thf溶液
mw-25000
mw=5000
mw~1000
mw~38,000;甲基丙烯酸羟乙酯 10mol%
mw~48,000, mn~15,000
mw~55,000, mn~20,000
n 8%
n>32.5 %, d50=5.0μm
nanoparticles, dispersion, in h2o
nanopowder, <100 nm particle size (bet), >97% trace metals basis
nco content ~30%, 粘度~200mpa·s(25℃)
nd2o3/treo≥99.5%,treo≥44%
nd: 28-34%
ni 61%
ni:8%
ni≥180g/l
nominally 75% in ethanol
n≈100
n≈15
n≈40
os 38.7%
os 38.7%最低
os 42.5%
os 83%
p2o5: 30-42%
p2o5≥30%
p2o5≥60%
pb ≥82%
pb:59.35~61.36%
pb≥26.7%
pd 23.9%
pd 44.8%
pd ≥20.5%
pd ≥44%
pd ≥85%
peh-15
peh-3
peh-6
ph eur
ph值:5.0~7.0, 浊点:70~85℃
powder, <5 μm
powder, 60 mesh, 99%
powder, 99.5% metals basis
powder,1-2 μm,99%
powder
ppg-2000do
protease substrate
pt 34.0%
pt 50.5%
pt 59.0%
pt 65%
pt basis ≥73%
pt ≥57%
pt ≥64.5%
pt,18.02%
pt≥18%
pt≥43.4%
purum, 98.0%(hplc),粉末,红棕色
purum, ≥98.0% (tlc)
re: 80g/l
reagent grade, co 43.0 - 47.0 %
reagent grade,98.0%
red(hematite)(99.8%-fe)
research grade, 99 atom % 13c
rh 17.1%
rh 18.5 - 21.3%
rh 21%
rh 21.3%
rh 27.5%
rh 30% min
rh ≥23.3%
ru 1.5% w/v
ru 10%
ru 29% min
ru 31.3%
ru 35.8-36.1%
ru 5%
ru>44%
sio2,44-47%
sn≥17%
sn≥42%
sn≥46%
sn≥57%
solution complete
solution incomplete
stabilized with bht 1 % w/w
standard for gc, 99.5%
standard for gc, 99.9% (gc)
standard for gc, 99.9%
standard for gc, ≥99.5% (gc)
standard for gc, ≥99.9% (gc)
standard for gc, ≥99.9%
standard for gc,≥99.5%(gc,stabilized with 1000ppm mehq)
statsafe 6000
sublimed,>99%
suitable for fluorescence, ≥75% (hplc)
t-98%
tech. 80%
tech. 85%
technical grade, 70%
technical grade, 75%
technical grade, 80 %
technical grade, 80%
technical grade, 85 %
technical grade, 90 %
technical grade, 90%
technical grade,90%
technical, 0.5-1.5 m in diethylene glycol diethyl ether
technical, 90 %
technical, ≥80%
technical, ≥85% (gc) ,含铜屑稳定剂
technical, ≥90% (gc,mixture of isomers)
technical,75%
technical,85 %
technical,90 % sum of enantiomers
technical,90 %
technical,90%,ee 99%
technical,≥90 %
tetraacrylate≥80%, 含有稳定剂mehq
tfa salt, 98%
tfa salt, ≥94%
ticl3:76.0-78.5%
ulc-ms,0.1% in acetonitrile
ulc-ms,0.1% in water
ultra dry
usp,ph eur
usp级,cross-linked,粉末
viscosity 1.4dl/g
w(k2cro4)=20g/l
w(k2cro4)=40g/l
white granular, viscosity:0.8-0.83 dl/g
with indicator, 10-20 mesh
wo3≥85%
zn: 15%
zno≥61%, cro3≥19%
zr, 40.4-43.3% gravimetric
zro2≥20%
~0.5 m in 2-methyltetrahydrofuran, 95.0%
~100 μg/ml in ethanol, 97%
~13% in water
~17% aromatics basis
~20% in h2o
~200 mesh, 99%
~30% in h2o
~40% active ingredients in h2o
~40% in h2o
~5% in h2o
~70% in h2o
~75%(al)
~85% (kt)
α-phase≥90%,-325 mesh
α相, 99.9% metals basis, 40nm
α相,99.9% metals basis,100nm
α相,99.9% metals basis,200nm
α相,99.9% metals basis
β-phase,95%,1-3μm
β相, 99.9% metals basis, d50=500nm
β相,99.9% metals basis,200nm
β相,99.9% metals basis
φ4mm-6mm, 干燥剂用
φ5mm 高2.5mm 圆柱体,ge≥99.999%
−60 mesh
≤10% water
≤100nm, 99% metals basis
≤20mm, 99.9% (reo)
≤3% water
≤500 nm, 99.9% metals basis
≤65μm,分散在水中
≥ 98%
≥100u/mg
≥20.0% in thf
≥200 mesh particle size
≥29% ti (as tio2) basis, technical
≥300g/l in water
≥37% ru basis
≥40% zro2 basis
≥40.0%
≥400 mesh particle size, ≥97.5%
≥400 u/mg
≥400目
≥45%(e)
≥50%
≥50.0% pt basis
≥52%
≥55%(hplc)
≥57%
≥60%(gc)
≥62%(gc), 顺反混合物, 含≤38%的3-氯-1-丁烯
≥64%
≥65%(gc)
≥65%(hplc)
≥65%,含有异构体
≥69%
≥70%,α-和β-位的混和物
≥70%
≥72%
≥75%(gc)
≥75%(hplc)
≥75%
≥83%(gc)
≥85%(gc)(n)
≥85%(hplc)(t)
≥85%(hplc)
≥85%(t)(hplc)
≥85%,nmr
≥85.0%(gc)
≥87%
≥88%,顺反异构体混和物
≥88%
≥89%(gc)
≥90% (gc)
≥90% (hplc),用于荧光分析
≥90%(gc,stabilized with 1%na2co3)
≥90%, contains 900-1100 ppm mehq as inhibitor
≥90%, stabilized with mehq
≥90%,gc
≥90%,n=9
≥90.0%(gc)
≥90.0%(hplc)(qnmr)
≥90.0%(qnmr)
≥90.0%,顺反异构体混和物
≥90.0%
≥93%(t)
≥93.0%(qnmr)
≥94%(t)
≥94.0%(gc)
≥95% (gc)
≥95% (oligomer purity)
≥95% ,异构体混合物
≥95%(gc&t)
≥95%(hg)
≥95%(hpce)
≥95%(hplc)(n)
≥95%(hplc)(qnmr)
≥95%(hplc)(t)
≥95%(lc)
≥95%(n)
≥95%(t)(n)
≥95%(t),非对映异构体混合物
≥95%(含有部分二盐酸盐)
≥95%, mixture of isomers
≥95%, stabilized with mehq
≥95%, stabilized, fg
≥95%, 异构体混合物(主要以反式形式存在)
≥95.0% (h-nmr)
≥95.0%(gc)(t)
≥95.0%(gc),含稳定剂氢氧化钾
≥95.0%(qnmr)
≥95.0%(t)
≥96%(hplc)(t)
≥96%(lc)
≥96%(n)
≥96%(t)
≥96%, mw11.0 w,st:bma=4:1
≥96%, mw~10.0w,st:bma=1:1
≥96%, mw~8.5w,n(st) : n(bma) = 1:1
≥96%, mw~8.5w,n(st) : n(bma) = 4:1
≥96.0%(t)
≥96.0%
≥96.5% (hplc); 97%
≥97%(enaymatic)
≥97%(gc&n)
≥97%(gc&t)
≥97%(gc), stabilized with 2.5% k2co3
≥97%(gc), stabilized with tbc
≥97%(gc), 含稳定剂koh
≥97%(gc/ch)
≥97%(nt)
≥97%(pure)
≥97%(qnmr), 含稳定剂mehq
≥97%(stabilized with tbc)
≥97%(t)(hplc)
≥97%(t), hplc标记用
≥97%, stabilized with mehq
≥97%, 异构体混合物
≥97%,hplc
≥97.0% (calc. based on dry substance, nt)
≥97.0% (tlc)
≥97.0%(gc)(qnmr)
≥97.0%(rt)
≥97.5% (hplc)
≥98 atom % d, ≥98%(cp)
≥98 atom% d
≥98% (gc), ~10 mg/ml in methanol
≥98% (mixture of regioisomers)
≥98% sum of enantiomers
≥98%(gc), 异构体的混合物
≥98%(gc), 顺反异构体混合物
≥98%(hplc)(t
≥98%(hplc), 用于生化研究
≥98%(mixture of isomers)
≥98%(mixture)
≥98%(nmr)
≥98%(sum of enantiomers)
≥98%(t)(gc)
≥98%(t), 用于生化研究
≥98%, 99%e.e.
≥98%, hplc
≥98%, hplc标记用
≥98%, lc-ms用离子对试剂
≥98%, 含0.01%柠檬酸稳定剂
≥98%, 异构体混合物
≥98%,hplc
≥98%,异构体混合物
≥98%,白色
≥98.0% (at)
≥98.0%(gc)(qnmr)
≥98.0%(gc),mixture of isomers
≥98.0%(hplc)(qnmr)
≥98.0%(qnmr)
≥98.5% (nmr); 99%
≥98.5%, 200-400nm
≥99 atom % d, ≥99%(cp)
≥99 atom% d, ≥99%
≥99% (sum of isomers)
≥99% metals basis, powder, ≤3μm
≥99% metals basis
≥99%(75% in ethyl acetate solution)
≥99%(gc)(t)
≥99%, 200-300目
≥99%, d50≤10μm
≥99%, ≤1μm(fsss)
≥99%, ≥96%e.e.
≥99%, 升华提纯
≥99%, 同分异构体混合物
≥99%, 无水级, 同分异构体混合物
≥99%, 用于gc衍生化
≥99%,300目
≥99%,含200ppm mehq稳定剂
≥99%,含50 - 100 ppm bht 稳定剂
≥99%,水分≤0.3%,d50≤3μm
≥99.0% (gc)
≥99.0%(hplc)
≥99.0%(t)(hplc)
≥99.5 %
≥99.5% (4 times purification)
≥99.5% (metals basis)
≥99.5% trace metals basis,20-80nm
≥99.5% trace metals basis,平均粒径25 nm
≥99.5%(hplc)
≥99.5%(电子级)
≥99.5%, 98 atom % d
≥99.5%, 升华提纯
≥99.5%, 用于有机电子
≥99.5%, 直径: 0.38mm
≥99.5%, 直径: 0.6mm
≥99.5%, 直径: 1mm
≥99.5%, 直径: 2mm
≥99.5%,gc
≥99.5%,适用于植物细胞培养
≥99.5(gc),含0.01% koh稳定剂
≥99.6% trace metals basis,-10目
≥99.8%
≥99.9% metals basis,excludes ~1% zirconium
≥99.9% trace metals basis, water≤1%
≥99.9% trace metals basis,<250 nm particle size (tem), 粉末
≥99.9%, 直径: 5mm
≥99.99 %
丰度:98atom%;化学纯度:≥98.5%
乙烯含量:53%;enb:4.0%
乙烯含量:55%;enb:9.5%
乙烯含量:60%;enb:7.8%
乙烯含量:68%;enb:5.7%
乙烯含量:69%;enb:4.5%
乙烯含量:72%;enb:4%
乳化型, 99%(mixtures)
二氧化硅:38.0%~42.0%
二氧化硅含量:29%~31%
二聚,三聚和四聚甘油 ≥75 w/%,七聚甘油以上 ≤10w/%
亲油性
从紫胶所得
优级试剂, 85%
优级试剂, 97%
优级试剂, 99.8%
优级试剂, 99.9%
优级试剂, ≥99.0%(gc),用于测定醛
优级试剂,适用于分析,acs,iso,reag.ph eur
元素分析仪专用
光致抗蚀剂级,99%
分子量1000
分子量2000
分子量3000
分子量:80-150万
分子量~3000
分子量~4000
分析对照品, 97%(含水约40%) (单位重量以湿重计)
分析对照品, hplc≥98%
分析对照品, ≥99%(gc)
分析对照品, ≥99%(hplc)
分析对照品, ≥99.5%(gc)
分析对照品, ≥99.5%
分析对照品, ≥99.6%(hplc)
分析对照品,>99.7%
分析对照品,≥99.5%(gc)
分析对照品,≥99.8%(gc)
分析对照品,混合物
助滤剂
包含 200 ppm naoh 稳定剂, 97%
包含 200 ppm naoh 稳定剂, 99%
包含 200 ppm naoh 稳定剂, 99.9%
包含50-185 ppm mehq稳定剂, 98%
包含有200 ppm mehq阻聚剂, 99%
十二水合物, 99%(sum of mixtures)
升华, 99.9% (reo)
升华提纯, 98.0%(t)
升华树枝状, 99.9% (reo)
含10%淫羊藿苷
含固量:40±2%
含有部分滑石粉
含量(h3po4):115%
含量52.5~56.5
含量测定
含铂量:27%
固含量: 98%
固含量:95%
固含量:99%
固含量~70%
固含量≥99%
块状,99.9% metals basis
型号: p-df-03-ls
型号:6501(1:1)
基质:uf,表面基团:-cooh,粒径:1-2μm,单位:10mg/ml
基质:uf,表面基团:-epoxy,粒径:1-2μm,单位:10mg/ml
基质:uf,表面基团:-nh2,粒径:1-2μm,单位:10mg/ml
基质:uf,表面基团:-nh2,粒径:2-3μm,单位:10mg/ml
基质:uf,表面基团:-nh2,粒径:3-4μm,单位:10mg/ml
基质:uf,表面基团:-nh2,粒径:5-7μm,单位:10mg/ml
天然来源,≥98%
天然矿物,晶粒,大约 0.06-19in
孔间距:65±10nm直径13mm
季铵盐含量:≥45%
工业用
工业级
平均分子量 ~400
平均分子量2000, 含~300 ppm mehq
平均分子量4000, 含~300 ppm mehq
平均分子量~500, 含900 ppm mehq作稳定剂
平均粒径:300-600nm
异构体混合物, 40 wt. % in h2o
异构体混合物,80%
异构体混合物,97%
异构体混合物,99%
异构体混合物
异构体的混和物
总胺值(mg koh/g): 115±4
总胺值(mg koh/g): 49±2
总胺值(mg koh/g): 60±3
总胺值(mg koh/g):173~183
总胺值:178-188mgkoh/g, 酸值<10mgkoh/g
总胺值mgkoh/g 18~22,叔胺值mgkoh/g 18~22
总胺值mgkoh/g 28~32,叔胺值mgkoh/g 28~32
总胺值mgkoh/g 44~50,叔胺值mgkoh/g 44~50
总胺值mgkoh/g 50~60,叔胺值mgkoh/g 50-60
总胺值mgkoh/g 75~85,叔胺值mgkoh/g 75~85
总酰胺:375-450 mg/g
技术级90%
无孔,粒径:500nm
无定形, 0.5-2μm, 99.9%
无定形,<5μm,98%
无定形,99%,粒径(d50) 10-20um
无水 99.9%(reo)
无水, 99.95%
无水, 99.99% metal basis
无水, 99.995% metals basis
无水, 99.995%
无水, ≥98%
无水, 粉末, 99.5% metals basis
无水, 粉末, 99.9%
无水, 粉末, 99.95% metals basis
无水, 粉末, 99.999% metals basis
无水, 粉末, ≥99.9%
无水,-10目,99.99% trace metals basis
无水,99.5% metals basis
无水,99.999% metals basis
无水,99.999%
无水,≥98%
无水,片状,99.9% metals basis
无水,粉末,99.9% trace metals basis
无水,粉末,99.99% metals basis
无水,鳞片, 99.99% metals basis
无水级, acs, ≥99%
无水级, ≥99%
无水级,≥99.9%,含50ppm bht 抑制剂
晶体, aps ≈100nm, 99%, 等离子合成
晶状, -4+40 目,99.9999% (metals basis)
有效氧: 9-11%
来源于细菌
染料含量: 80%
模数:2.3-2.5
比表面积10-15m2/g,粒度20nm-100nm,99.9%
氮≥19.5 %
沸程80-120°c, 水分<50ppm
油状50%
活性物: 50%, 主要溶剂: 烷烃
活性物: 70%, 主要溶剂: 异丁醇
活性物: 70%, 主要溶剂: 甲醇
活性组分(以pbtca计): ≥30%
浊点:17~21°c, ph值:5.0~7.0
浊点:21~26°c, ph值:5.0~7.0
浊点:45~55°c, ph值:5.0~7.0
浊点:57~61°c, ph值:5.0~7.0
浊点:≥95°c, ph值:5.0~7.0
浓度范围:0.124±0.008mg/l
混合异构体, 60%间位, 40%对位, mw 160,000-220,000
混合物,含有部分ni单质
溶剂:水
滴熔点142,中粒径25μm
熔融指数: ≥1.0g/10min
环保试剂,96%
环氧值: 0.65~0.70eq/100g
环氧值: 0.74-0.78 eq/100g, 粘度:10-25 mpa.s
环氧值eq/100g:0.70
环氧当量: 125-145
环氧当量:160-180 g/eq
珠子, 98%
生物制剂,适用于细胞培养,适用于昆虫细胞培养
生物基含量33%-100%
用于gc衍生化, 98.0%
用于gc衍生化,99%
用于hplc,2.0 mol/l in h2o
用于hplc衍生化, ≥99.0%(t)
用于组氨酸甲基化
用于蛋白质分离,层析
电子级, 99.9999% metals basis
电池级, 99.8%, water≤50 ppm
电池级,99.9%
电镀级,99%
白色,al2o3≥30%
皂化值:160-170 mgkoh/g
皂化值:84-94mgkoh/g, hlb值:13-14
皂化值mgkoh/g:235~245
盐水溶液
直径:0.1-0.3μm, 长度:3-5μm
直径:0.1-0.5μm, 长度:10-50μm
直径:0.2-0.5μm, 长度:5-15μm
直径:0.2-0.7μm,长度:10-35μm
直径:20-100nm, 长度:≈1μm
直径:3-5μm, 长度:10-30μm
直径:80-150nm, 长度:0.5-8μm
着色强度:100%
石化用芳烃油脱烯烃吸附剂, 圆柱体
石化用芳烃油脱烯烃吸附剂, 圆球形
硬脂酸和棕榈酸:≥ 90.0%
硬脂酸和甲基丙烯酸十六酯的混合物,含有mehq作为抑制剂
碱性, 二氧化硅含量 : 30%, 平均粒径: 100nm, 氧化钠含量<0.1wt%
碱性, 二氧化硅含量 : 30%, 平均粒径: 100nm, 氧化钠含量<0.5wt%
碲粒 2-3mm 99.999%
碳含量:61-67%
磷含量: 23%-24%
离子对色谱专用,≥99.0%
粉末, <5μm, ≥99.5% metals basis
粉末, 98%
粉末, 99.99% metals basis
粉末, ≤45μm, ≥99.5% metals basis
粉末, ≥99.9% metals basis
粉末,99.5%
粉末,99.99% metals basis,-200目
粉末,99.99% metals basis,-325目
粉末,99.99% metals basis,100目
粉末,99.99% metals basis
粉末
粒度:2-20μm
粒径1.5-5μm
粒径: 8-12μm
粒径:100nm~3.5μm,机械化学法
粒径≤50μm
粒状,1-4mm,99.999% metals basis
粘度: 40-80 cps
粘度:130-180 mpa.s
粘度:300-800 mpa.s(25℃), 环氧当量:125-173 gm/eq
粘度:~300 cps,环氧当量:95-115 gm/eq
约12.5%于四氢呋喃中, 约1.5mol/l
约13%于四氢呋喃中, 约2mol/l
约15%于己烷中
约16.5%于n,n-二甲基甲酰胺中, 约2mol/l
约20%于水中
约63%于异丙醇中
约70%的水溶液
纳米粉末, <50nm 粒径 (bet), 99% trace metals basis
纳米粉末, 粒径<150nm(bet)
纳米纤维,d<2.5μm,l/d≥20,98% trace metals basis
结晶, aps ≤50nm, 98%, 气相激光合成
结晶, 医药级, ph.eur.,bp,usp
羟值(mg koh/g):133~148
羟值(mg koh/g):23.0-25.0
羟值: 35-50 mgkoh/g
羟值mgkoh/g:28±3
羟值mgkoh/g:40±4
羟值mgkoh/g:52±6
羟值mgkoh/g:67±5
羟值mgkoh/g:≤15,皂化值mgkoh/g:180~190
羟值≤4 mgkoh/g
羟基值54-62 mg koh/g
聚乙二醇分子量:2000
聚乙二醇分子量:3400
脱色率≥90 %, 活性度≥180 h+mmol/kg, 水分≤10 %
脱色率≥90%, 比表面积≥180 m2/g, 水分≤3.0 %, 颗粒平均抗压力≥1 n, 抗水型
脱色率≥90%, 比表面积≥180 m2/g, 水分≤5.0 %, 颗粒平均抗压力≥1 n, 脱氮型
脱色率≥90%, 比表面积≥180 m2/g, 水分≤5.0%, 颗粒平均抗压力≥0.7 n
脱色率≥90%, 比表面积≥300 m2/g, 水分≤8.0%, 颗粒平均抗压力≥1 n
脱色率≥92 %, 活性度≥100 h+mmol/kg, 水分≤12 %
脱色率≥98%
色谱级, ≥99.9%, 含有0.10 % (v/v) 甲酸
苛性比≥1.3, fe≤15ppm
苛性比≥1.35
苯酚含量:40-60%
荧光级,>97%(hplc)
荧光级
药典专用
药用级
药用试剂级
蒸馏枝形片状 99.95% metals basis
蒸馏树枝状, 99.9% (reo)
试剂级, 2000目
试剂级, 49%
试剂级, 57.5%
试剂级, 60%
试剂级, 85%
试剂级, 85.0%
试剂级, 90%(contains acetic acid)
试剂级, 92%
试剂级, 93%
试剂级, 94%
试剂级, 96.0%
试剂级, 96.5%
试剂级, 99.7%
试剂级, cr≈32%
试剂级, fe 21-23%
试剂级, mg≈14%
试剂级, pd 46.0 - 48.0 %
试剂级, ratio(mgo/al2o3)=3-1,含水率:≤8.5% (100℃,1h)
试剂级, ≥ 44.0%
试剂级, ≥60%
试剂级, ≥98%
试剂级, ≥99%
试剂级, ≥99.0%(rt)
试剂级, 含0.025% bht 稳定剂
试剂级, 含~75 ppm bht稳定剂
试剂级, 硅改性
试剂级, 硝酸法
试剂级, 硫酸铝法
试剂级, 碳化法
试剂级, 磷改性
试剂级, 镧改性
试剂级,ir>52%
超干, 99.9% (reo)
超干, 99.99% metals basis
超干, 99.998% metals basis
超干,99.995% metals basis
超干级, 99.9% metals basis
超干级, 99.99%metals basis
超干级,99.99% metals basis
软型,直链异构体的混和物
适用于hplc,99.0-101.0%
适用于maldi-ms,50%acn+47.5%h2o+2.5%tfa
适用于电化学分析,≥99.0%
适用于荧光, ≥90%(hplc)
通常92%, 溶于2-二乙基己酸
酐:90%酸:10%
酰胺含量:≥95%
酸值(mg koh/g) ≤0.5, 皂化值(mg koh/g): 325~360
酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 100~130
酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 85~105
酸值mgkoh/g ≤10,皂化值mgkoh/g 212~222
酸性, 二氧化硅含量 : 30%, 平均粒径: 100nm, 氧化钠含量<0.1wt%
酸性, 二氧化硅含量:20 %-30 %
金黄色,al2o3≥30%
铂含量:52.0%
铑含量(wt%) ,5%
铝含量:38%-41%
铱含量:43.0%
铱含量≥39%
锑含量≥60%
锭, 99.9% metals basis,,液体石蜡保存
锭, 99.9% metals basis
锭, 存放于油中,99.9% metals basis
锭,99.5%
镀膜级,颗粒,99.9% metals basis
镍 45.0 - 52.5 %
非离子剂, 酸值<5.5mgkoh/g
非离子剂
顺反异构体混和物
馏程: 161-179 °c
馏程: 186-202 °c
馏程: 270-311 °c
高纯级
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