全部 麦克林(Macklin) Aladdin/阿拉丁

全部 100mg 1g 250mg 500mg 5g 25g 100g 500g 2.5kg 50mg 10g 1ml 200mg 25mg 10kg 5ml 10mg 5mg 100ml 25ml 2.5l 500ml 1mg 12x500g 1kg 250g 50g 1.2ml 1l 10l 2g 12x500ml 5kg 250ml 5l 25kg 20mg 50ml 10ml 2ml 20x500g 200μl 25×25mm 4l 2.5g 20kg 25l 0.5g 20ml 50mm 0.25g 100μg 200g 2kg 400g 100cm 25cm 20g 100μl 20l 2mg 1ea 2cm 50×50mm 5m 0.1g 0.5mg 0.5ml 10×100μl 10×10cm 6x500g 150g 170g 158g 176g 5x1g 75g 80g 85g 90g 250μl 12ml 200ml 20x500ml 2l 400ml 100x100mm 500μg 10mm2/ea 10m 250m 50m 10x20cm 10μg 110g 114g 46g 15g 15ml 160mm 1cm 250 mg 1ku 200u 5ku 1m 250cm 25m 50cm 3m 2.5ml 2.5m 26g 60g 70g 95g 300mg 5cm 90x90mm

全部 97% 98% 95% ≥95% 99% ≥98% ≥97% 96% 99.5% 90% 10mm in dmso 99.99% metals basis 99.9% metals basis 99.9% ≥99% >98.0%(gc) 试剂级, 98% 试剂级, 99% ≥98%(gc) ≥98%(hplc) 99.999% metals basis standard for gc, ≥99.8%(gc) 试剂级 试剂级, 99.0% 85% 99.99% >97% standard for gc, ≥99.9%(gc) standard for gc, ≥99.7%(gc) 98%(gc) standard for gc, ≥99.6%(gc) ≥96% ≥90% 93% 94% ≥98%(t) 试剂级, 99.5% 99.95% metals basis 80% standard for gc, ≥99.5%(gc) >95% 98.0% ≥98%(gc)(t) ≥98.0% 99.9% trace metals basis ≥97%(gc) >98% 92% 98%(gc)(t) 98%(t) ≥99%(gc) 98%(hplc) ≥95%(gc) 97%, 99% e.e. ≥98.0%(gc) >99% >99.0%(gc) 98 atom % d ≥99.5% >95.0%(gc) 97%(gc) 97%(hplc) 99% metals basis 99.5% metals basis 99.99% trace metals basis 99.9% (reo) ≥98 % 超干级, 99.99% 100μg/ml in methanol, 不确定度3% 99.995% metals basis sp 试剂级, 97% 试剂级, 98.0% 99.8% metals basis ≥98%(hplc)(t) >98%(hplc) 95%(hplc) 99% trace metals basis 99.7% 99.99% (reo) acs ≥99.99% metals basis 优级试剂, 99% 试剂级, 95% >97.0%(gc) 97 % 98% (hplc) 99%(gc) 99.8% 95%(gc) 98%, 98 atom % d 99.5% trace metals basis 99.999% trace metals basis ≥97%(t) ≥98% (hplc) ≥98%(t)(hplc) >98.0%(t) 1000μg/ml in methanol, 不确定度2% 97%, 99%e.e. 98%(hplc)(t) 98%,gc 99.999% ≥99.5%(gc) >98%(gc) 10mm in water analytical standard ≥90%(gc) ≥97.0% ≥99.9% trace metals basis 优级试剂, 99.5% 试剂级, 98.5% 超干级, 99.99% metals basis >99.5% 100μg/ml in acetonitrile, 不确定度3% 75% 98.5% ≧95% 1000μg/ml in acetonitrile, 不确定度2% 70% 95% mix tbc as stabilizer 95%(t) 99.6% 99.998% metals basis ≥95%(hplc) 优级试剂 无水, 粉末, 99.99% metals basis >98%(lc) >98.0%(gc)(t) >99% (hplc) 10% in h2o 91% 98%(mixture) 98%, 99%e.e. >98% ≥97%(hplc) ≥98.0%(hplc) 分析对照品, ≥98% 试剂级, 96% >97%(hplc) 40% 96%(gc) 97.0% 98%,ee99% 98%,t 98.0%(gc) 99%(t) 99.995% trace metals basis ≥98%(lc) ≥99.9% 分析对照品, ≥99% >90.0%(gc) >98.0%(hplc) >98.0% 5% in h2o 90%(gc) 98%,lc&t 98%,mixture of isomers 98%,顺反混合物 >95% ≥95%(t) ≥95.0%(gc) ≥95.0%(hplc) ≥95.0%(t)(hplc) ≥98%(hplc)(n) ≥99.0% 分析对照品 环保级 >96% >96.0%(gc) >98.0%(hplc)(t) 30% in h2o 95%(stabilized with tbc) 97%(gc)(t) 98%(lc) 98%(n) 99.0% 99.9% (metals basis) 99.9% trace rare earth metals basis 99.98% metals basis 99.997% metals basis ≥85% ≥95.0%(hplc)(qnmr) ≥95.0% ≥97 % ≥97%(gc)(t) ≥97%(hplc)(t) ≥98%(lc&n) ≥98%(n) 用于合成 电子up级 试剂级, 90% >90% >95.0%(t) >98.0%(n) >99%(gc) 50% in h2o 50%水溶液 95%(mixture) 96.0%(gc) 97%(stabilized with tbc) 97%, 99%ee 98 % 98%(stabilized with mehq) 98%, mixture of isomers 98%, 异构体混合物 98%,gc&t 99%(hplc) acs,≥99.5% ≥80% ≥95%(stabilized with tbc) ≥96%(gc) ≥97%(lc) 无水, 粉末, 99.9% metals basis 无水,99.9% metals basis 试剂级, 97.0% 试剂级, 99.8% 试剂级, ≥99% 试剂级, ≥99.5% 超干级, 99.99%(reo) >97.0%(hplc) >99.0% (gc) >99.5%(gc) 1% in h2o 1000μg/ml in methanol 10g/l in h2o 20% in h2o 300-400目 40% in water 50% 50g/l in h2o 95%(nmr) 95%, 异构体混合物 95%,gc 97% mix tbc as stabilizer 98% (tlc) 98% trace metals basis 98%(hplc)(n) 98%(mixture of isomers) 98%(stabilized with tbc) 98%,异构体混合物 99.9% metals basis,10μm 99.98% 99.99% metals basis,200目 99.999% (metals basis) 99.9999% metals basis >97% br meets usp testing specifications reagent grade tech. 90% usp级 ≥85%(gc) ≥90%(t) ≥94%(gc) ≥95%(gc)(t) ≥95%(lc&t) ≥98%(gc&t) ≥98%,gc ≥98.0%(t)(hplc) ≥99 % ≥99%(hplc) ≥99%(t) ≥99.9% metals basis ≥99.9%(gc) 优级试剂, 99.9% 分析对照品,99.5% 无水,99.99% metals basis 电池级, 99.9%, water≤20 ppm 符合usp测试规范 粉末,99.9% metals basis 药典专用 超干级, 99.99% (reo) >95%(gc) >95.0%(hplc) >97%(gc) >98%(gc&t) >98%(lc&t) >98%(t) >99.0%(lc) >99.0% 1.0 m solution in thf, mkseal 10% (v/v) in h2o 100-200目 1000ug/ml in purge and trap methanol 100μg/ml in acetonitrile 100μg/ml in methanol 10mm in h2o 2g/l in h2o 30% in water 400目 50% in water 50% w/w 水溶液 60%水溶液 65% 75-150目 88% 90%(hplc) 90%(mixture) 90%(nmr) 93%(gc) 95% (hplc) 95% (stabilized with tbc) 95%, mixture of isomers 95%, stabilized with tbc 95%,stabilized with tbc 95%,顺反混合物 96%(t&lc) 96%(t) 97% (hplc) 97%(t) 97%, contains tbc as stabilizer 97%,gc 97%,异构体混合物 98%(gc&t) 98%(stabilized with copper chip) 98%, mixture of cis and trans isomers 98%, stabilized with mehq 98%,lc&n 98%,顺反异构混合物 98.0% (hplc) 99 % 99%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99%,gc 99%,含稳定剂mehq 99%,粉末 99.9 % metals basis 99.9% metals basis,50nm 99.9% metals basis,粉末 99.9%,200目 99.95% 99.99% metals basis,粉末 acs, ≥99.0% min. 99.5% reagent grade, 98% reagent grade, 99% spectrophotometric grade, 99% standard for gc, 99.5%(gc) ≥40% ≥80%(gc) ≥92% ≥93% ≥95 % ≥95% (hplc) ≥95%(t)(hplc) ≥96%(hplc) ≥97 % sum of enantiomers ≥97%(lc&n) ≥97%(n)(t) ≥97.0%(t) ≥98% (hplc), powder ≥98%(lc&t) ≥98%(t&lc) ≥98.0% (hplc) ≥98.0%(gc)(t) ≥98.0%(hplc)(n) ≥98.5% ≥99% (gc) ≥99%(tlc) ≥99.0% (gc) ≥99.0%(gc) ≥99.5% (gc) ≥99.99% 优级试剂, 98% 优级试剂, 99.8% 分析对照品, 98% 分析对照品, 99%(hplc) 分析对照品, 99% 分析对照品, ≥99.5%(gc) 分析对照品,98% 基质:sio2,表面基团:-cooh,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-cooh,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-cooh,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:3-4μm,单位:10mg/ml 工业级 试剂级, >99.0%(gc) 试剂级, 94% >85.0%(gc) >90%(hplc) >94.0%(gc) >95%(hplc) >95%(lc&t) >95%(lc) >95%(t) >96%(gc) >97.0%(hplc)(t) >97.0%(t) >97.0% >98.0%(hplc)(n) >98.5%(gc) >99%(hplc) >99%, ee >98% 0.1m in h2o 0.1mol/l 介质:h2o 0.5 m solution in thf, mkseal 0.5% in h2o 0.85-1.7mm, 元素分析仪专用 1000ug/ml, 5% hno3 1000μg/ml, in purge and trap methanol 100μg/ml in hexane, 不确定度3% 100μg/ml in mtbe 100目 10m in h2o 1250目 14% in h2o 1m in h2o 1m 2.0 m solution in thf,mkseal 20 wt. % in h2o 200-300目 200g/l in h2o 200mm 200目 20g/l in h2o 2mm in dmso 30% 30g/l in h2o 30nm 球形,99.5% 35% 35wt.% in h2o 40 wt. % in h2o 40nm 球形,99.5% 40目 45%水溶液 5.0% pd basis 50 wt. % in h2o 50 wt. % in water 50% in chlorocyclohexane 50% solution in h2o 50% w/w in h2o 50μm 60 wt. % in h2o 65 wt. % in h2o 6m in h2o 70 wt. % in h2o 70% in water 70%水溶液 80% in water 80%(gc) 80-85% 80.0%(t) 82% 83% 85%(gc) 85%(t) 85%, 异构体混合物 89% 90%,t 90.0%(gc) 92%,含有稳定剂mehq 95 % 95%(hplc)(t) 95%(stabilized with mehq) 95%, contains tbc as stabilizer 95%,98%ee 95%,gc&t 95.0% (gc) 95.0%(gc) 96%(gc)(t) 96%(mixture of isomers) 96%,gc 96.5% 97% 99%ee 97%(mixture of isomers) 97%(n) 97%(nmr) 97%(stabilized with hq) 97%(stabilized with mehq) 97%, stabilized with tbc 97%, 粉末 97%,含铜稳定剂 97%,顺反混合物 97.0% (gc) 97.0% (hplc) 97.0% (t) 97.0%(gc) 98 atom % d, 98% (cp) 98 atom % d,98% 98 atom% d 98% (mixture of isomers) 98% metals basis 98% 异构体混合物 98%(cis- and trans- mixture) 98%(mehq作为稳定剂) 98%(metals basis) 98%(n)(t) 98%(stabilized with bht) 98%(t)(hplc) 98%, 99%ee 98%, stabilized with tbc 98%, 用于合成 98%,100目 98%,300目 98%,99%ee 98%,stabilized 98%,含稳定剂hq 98%,异构体的混合物 98.0 % 98.0%(hplc) 99% (gc) 99% (metals basis) 99%(gc)(t) 99%(sum of mixtures) 99%, -325目 99%, stabilized with bht 99%,2-4μm 99%,300目 99%,50nm 99%,water≤50 ppm (by k.f.),mkseal 99%,升华纯化 99.5% (reo) 99.5% trace metals basis excluding hf 99.9% metals basis, -200目 99.9% metals basis,100nm 99.9% metals basis,200nm 99.9% metals basis,200目 99.9%(metals basis) 99.9%(reo) 99.9%,2-5um 99.9%,325目 99.9%,500目 99.9%,50nm 99.9%,粉末 99.90% 99.95% trace metals basis 99.99% (metals basis) 99.99% metals basis,10μm 99.99% metals basis,50nm 99.99% trace rare earth metals basis 99.99%(reo) 99.9985% (metals basis) 99.999% metals basis,200目 99.999% metals basis,for perovskite precursor 99.9995% metals basis 99.9999% metals basis,块状 acs reagent,99% acs,≥99.0% fe2o3≤2ppm min. 98.5% standard for gc, ≥99.5% technical grade, 90 % technical grade ulc-ms,0.1% in water ≥60% ≥70% ≥80%(hplc) ≥85.0% ≥88%(gc) ≥90%(hplc) ≥93%(gc) ≥93.0%(gc) ≥94% ≥95%(lc&n) ≥95%(n) ≥95%, contains tbc as stabilizer ≥95.0% (hplc) ≥95.0%(gc)(t) ≥97% (hplc) ≥97.0% (hplc) ≥97.0%(gc) ≥98%(gc), 用于生化研究 ≥98%(n)(t) ≥98.0%(t) ≥98.5 % sum of enantiomers ≥99%,gc ≥99%,hplc ≥99.0% (hplc) ≥99.5%(4 times purification) ≥99.8%(gc) ≥99.8% 优级试剂, 85% 优级试剂,适用于分析,acs,iso,reag.ph eur 分析对照品, 98%(hplc) 分析对照品, 99.5% 分析对照品,99% 分析对照品,≥98% 分析对照品,≥99.5% 分析标准品,98% 分析标准品 制备色谱级, 99.9% 基质:sio2,表面基团:-cooh,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-cooh,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-nh2,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:4-5μm,单位:10mg/ml 无水、粉末、99.99% 无水级, 99.99% metals basis 用于药物研究 用于钙钛矿电池 电子el级 电子ups级 电子级, 99.9999% metals basis 电池级, 99.99%, water≤20 ppm 粉末 试剂级, 50 wt. % in h2o 试剂级, 85% 试剂级, 95.0% 试剂级, 96.0% 试剂级, 99% metals basis 试剂级, 99.5%(gc) 试剂级, 99.7% 试剂级, fe:16.5-18.5% 试剂级, ≥98% 试剂级, ≥99.0% 超干, 99.99% (reo) 超干, 99.99% metals basis 超干, 99.999% metals basis 超干,99.999% metals basis 超干级, 99.9% metals basis 超干级, 99.95% metals basis 超纯级,99.0% 重蒸馏,99.5% 颗粒 基础级试剂,适用于制备 >52%(gc) >60.0%(gc) >75%(gc) >80.0%(gc),含200-650ppm mehq稳定剂 >80.0%(gc) >80.0%(lc) >80.0%(t) >85%(gc) >90%(gc),单脂 >90%(gc),含100 ppm 对叔丁基邻苯二酚稳定剂 >90%(lc) >90%(t) >93%(gc) >93%(hplc) >93%(t) >93.0%(gc) >93.0%(lc),顺反混合物 >94% >95% (gc),approximately ~15% wt/vol in ethyl acetate >95%(lc-ms) >95%, 含稳定剂bht >95.0%(gc&t) >95.0%(gc) ,含0.2 % caco3/mgo (1:1)稳定剂 >95.0%(gc)(t) >95.0%(hplc)(n) >95.0%(lc&t) >95.0%(lc) >95.0%(n) >95.0%(t),硬型,混合物 >95.0% >96%(gc&t) >96%(hplc) >96.0%(lc&t) >97%(gc),包含180-200 ppm mehq 稳定剂 >97%(t&lc) >97%(t) >97.0%(gc&t) >97.0%(gc)(t) >97.0%(lc) >97.0%(n) >97.0%,total of isomer >97.5% >98% usp >98%(gc&n) >98%(gc) , 含铜作稳定剂 >98%(hplc), unsublimate >98%(lc&n) >98%(t&lc) >98.0% (gc) >98.0%(lc&n) >98.0%(t&lc) >98.0%(w) >99% (gc) >99%(gc)(mixture of isomers) >99%(gc),包含180-200 ppm mehq 稳定剂 >99.0% (gc), 无色液体 >99.0% (hplc) >99.0%(gc) ,含100ppm 4-叔丁基邻苯二酚稳定剂 >99.0%(gc)(t) >99.0%(gc),250ppm mehq做稳定剂 >99.0%(gc),含mehq稳定剂 >99.0%(gc),用于hplc荧光标记 >99.0%(hplc) >99.0%(t) >99.5% (gc) >99.9% (gc) >99.998% <1% diethylene glycol monobutyl ether <100 μm, ≥99.98% trace metals basis <100nm(tem),20 wt. % in h2o <100nm,99.9% metals basis <45 μm (1mg/ml的甲醇溶液)[用于水分析] (99.99%-ce) (reo) (99.99%-pr)(reo) (mixture of 3- and 4-isomers) stabilised with 4-tert-butylpyrocatechol for synthesis: ≥ 98.0 % (a/a) (w/w=7/3) (顺式+ 反式), ≥92%(gc) -100 目, 99.9% (metals basis) -100 目, 99.9% metals basis -100 目, 99.999% (metals basis) -200+325目, 99.95% metals basis -200目,97% -200目粒径 -22 目, 99.995% metals basis -22 目,99.998% metals basis -22 目,99.999% (metals basis) -325目, 99.5% metals basis -325目,99.99% (metals basis去除ta), ta <500ppm -40 目, 99.9% (reo) 0.001mol/l 0.001m 0.01 g/ml的硫酸铜水溶液 0.0100m in h2o 0.015mm 直径, 99.95% metals basis 0.015mol/l 介质:h2o 0.016mol/l(0.016m) in h2o 0.01m in h2o 0.01mol/l 介质:h2o 0.01mol/l(0.01m) in h2o 0.025mm 厚, 99.985% metals basis 0.02m in h2o 0.05 mol/l naoh(0.05摩尔/升 氢氧化钠) 0.05% (w/v) in h2o 0.05%((w/v) in h2o 0.05%(w/v)in water 0.05000mol/l(0.05m) 0.05m in h2o 0.05mm 直径,99.995% metals basis 0.05mol/l 介质:h2o 0.05mol/l,介质:h2o 0.085 wt. % in h2o 0.085% phosphoric acid in ethanol 0.085% phosphoric acid in ipa 0.085% phosphoric acid in methanol 0.1 g/ml的氢氧化钠水溶液 0.1% (v/v) in h2o 0.1%(w/v) in h2o 0.1%(w/v)in water 0.1%乙醇溶液 0.1-0.5mg/ml in water 0.100 m in h2o 0.100 n in h2o 0.1000mol/l(0.1m) 0.1001mol/l 介质:95%乙醇 0.127mm (0.005in) 厚, 退火, 99.8% (metals basis) 0.13%(0.044n) in h2o 0.15m in h2o 0.1m in thf 0.1m,ph7.5 0.1mm 厚, 99.9% (reo) 0.1mm 厚, 99.9% metals basis 0.1mm 厚, 99.99% metals basis 0.1mm 厚,≥99.995% metals basis 0.1mm 直径, 99.99% metals basis 0.1mm, 99.999% metals basis 0.1mm,99.9% metals basis 0.1mm,99.99% metals basis 0.1mol/l(0.1m) in h2o 0.1mol/l, 介质: h2o 0.1mol/l 0.2 mm,99.9% metals basis 0.2 mm,99.99% metals basis 0.2 n in h2o 0.2% in h2o 0.22g/l 0.25m in h2o 0.25m solution in thf, mkseal 0.25mm 厚, 99.994% metals basis 0.25mm 直径, 99.99% (metals basis 去除 ta) 0.2g/l 0.2m in h2o 0.2m,ph7.2 0.2m,ph7.5 0.2m,ph7.6 0.2mg/ml, 混合溶剂 0.2mm直径,99.999% metals basis 0.2mol/l 介质:h2o 0.2μg/ml, 5% hno3 0.3-0.8mm, 水封 0.300mol/l in h2o 0.35m in h2o 0.3m in h2o 0.3mm 厚, 99.9% (reo) 0.4 m solution in 1,4-dioxane, mkseal 0.4±0.008mol/l in h2o,trace metal grade 0.5 m in h2o 0.5 m in thf, mkseal 0.5% (w/v) in h2o 0.5% solution in water,stabilized with sodium hypochlorite 0.5%(w/v) in h2o 0.5-3μm, 92% (eds) 0.50 m in 2-methf 0.53% 0.5m solution in thf, mkseal 0.5m,ph10 0.5m,ph7.2 0.5m,ph7.5 0.5m,ph8.0 0.5mm 厚, 99.998% metals basis 0.5mm 厚,99.9975% metals basis 0.5mm 直径, 99.998% metals basis 0.5mol/l in water 0.5mol/l 介质:h2o 0.5msolutioninthf,mkseal 0.5wt%la, 300目 0.6%(w/v)in water 0.600 m in h2o 0.600mol/l in h2o 0.6m in thf, mkseal 0.7 m solution in thf,water≤1000ppm, mkseal 0.8-12mm (0.03-0.47in), 99.98% (metals basis) 0.8mg/ml solution (ph 10) 0.9% (w/w) in h2o 1 mol/l 1 μm,98.5% 1% (v/v) in h2o 1% (w/v) in h2o 1% on titania(anatase)(surfactant and reactant-free),≤100nm 1%(w/v)in water 1%(w/w) in h2o 1% 1%乙醇溶液 1-1.5mm 厚, 保存在石蜡油里, 99.9% (reo) 1-10 μm,98% 1-3mm (0.04-0.1in),99.9997% (metals basis) 1-3mm,99.999% metals basis 1-3μm, ≥99% metals basis 1.0 m in h2o 1.0 m in methylene chloride 1.0 m in thf, mkseal 1.0 m in thf/hexanes, mkseal 1.0 m solution in h2o 1.0 mol/l in h2o 1.0 m in ethyl acetate 1.0 m in heptane 1.0 mg/ml in methanol 1.00 m in h2o 1.00 n in h2o 1.00mg/ml,基体:甲醇 1.0mm 厚, 99.99% metals basis 1.0mm 直径, 99.8% metals basis 1.0mm 直径, 退火,99.995% metals basis 1.0mm 直径,99.999% metals basis 1.0mm直径, 99.9% metals basis 1.1% in h2o, surfactant-free, high-conductivity grade 1.3 m in thf, mkseal 1.3 wt % dispersion in h2o, conductive grade 1.3%-1.5% in isopropanol 1.3m lifsi in ec:pc=1: 1 wt% 1.45% (v/v) in h2o 1.5 m in h2o 1.5 m in thf 1.5% (v/v) in h2o 1.5% in h2o, neutral ph, high-conductivity grade 1.50 n in h2o 1.5mm 直径, 退火,99.995% metals basis 1.6μg/ml in methanol 1.9-2.1%, for determination of hydrogen peroxyde (h 15), according to din 38 409, part 15, dev-18 1.90% (v/v) in h2o 10 % 溶液 10 nm diameter, λmax, 780 nm, dispersion in h2o 10 wt. % in h2o 10% in acetonitrile 10% in propanediol 10% pd basis 10% pd(oh)2 10% pd,contains 40-60% h2o 10% solution in h2o 10% 水溶液 10%lipf6+2.5%lifsi in ec:emc:dec=3:5:2 10%水溶液 10%的水溶液,约2.4mol l 10-30 nm, 25% in h2o 10.0mg/ml,基体:纯水 100 mesh,99.9% 100 nm 粒径, 20 wt. % 异丙醇溶液 100 nm 粒径, 20 wt. % 水溶液 100 μg/ml in acetonitrile 100-300nm, 99.5% metals basis 1000mg/l于叔丁基甲醚 1000ug/ml, 1%hno3 1000μg/ml in acetonitrile, uncertainty 2% 1000μg/ml in acetonitrile,uncertainty 2% 1000μg/ml in ethanol 1000μg/ml in h2o 1000μg/ml in hexane, 不确定度2% 1000μg/ml in mtbe 1000μg/ml, 溶剂:甲醇 1000分子量 100g/l in h2o 100g/l, 介质: h2o 100g/l,介质:h2o 100mg/l in methanol 100mg/l,溶剂:水 100mg/ml in ethanol 100nm,99.5% metals basis 100ug/ml, 溶剂: 正己烷 100ug/ml,1% hno3 100μg/ml in acetonitrile, uncertainty 3% 100μg/ml in ethanol, 98% (cp) 100μg/ml in ethanol 100μg/ml in h2o(以三氯乙醛计) 100μg/ml in h2o 100μg/ml, 溶剂: 甲醇 10g/l, 介质: h2o 10g/l,用于氧化还原反应 10mm in ethanol 10mm in h2o, suitable for hplc 10mm in methanol 10μg/ml in acetonitrile 10μg/ml in ethanol 12% (v/v) in h2o 12% (w/v) in water 12% zr in mineral spirits 12-16目 12.0-14.5% fe basis 12.1±1.1μg/l 13 wt. % in h2o 13%于四氢呋喃中, 约0.8mol/l 13-14% active oxygen 14% solution in h2o 140g/l in h2o 15 wt. % in h2o 15% (v/v) in h2o 15% mo 15%水溶液 15%水胶体分散液 15.3% pt 150g/l, 介质: h2o 150nm, 99.9%, α型 150μm 15cm或更小, 99.999% metals basis 15g/l in h2o 15wt.% in h2o 16.5%(w/v), stabilized 17% (v/v) in h2o 17-23%钒 18 wt. % in h2o,含5-8% 甲醇稳定剂 182.3μg/ml in h2o 19-23% ce basis 19mm 或更小, 99% metals basis 1:1比例 1:1水溶液 1:2水溶液 1:3水溶液 1:4水溶液 1g/l in h2o 1g/l in water 1g/l 1m in methf 1m in water 1m lipf6 in ec:dec=1:1 vol% with 10% fec 1m lipf6 in ec:emc=3:7 vol% 1m lipf6 in fec:femc:hfe=1:1:1 wt% 1m litfsi in dmc:ec:emc=1:1:1 vol% 1m lipf6 in dec:dmc:ec=1:1:1 vol% 1m lipf6 in dmc:ec:emc=1:1:1 vol% with 1%vc 1m lipf6 in dmc:ec:emc=1:1:1 vol% with 5%fec,1%vc 1m litfsi in tetraethylene glycol dimethyl ether 1mg/ml in water 1mg/ml, 基体:冰乙酸 1mg/ml,基体:水 1mm 直径, 99.998% metals basis 1mol/l in etoh 1mol/l 介质:h2o 1mol/l, 介质: h2o 1wt. % loading(dry basis), 4-8mesh, (wetted with ca. 30-40% water) 1μg/ml, 5% hno3 2 % cross-linked with divinylbenzene 2% (w/v) in ethanol 2% (w/v) in h2o 2% (w/w) in h2o 2%水溶液 2-5mm (0.08-0.20in) 直径, 99.9999% (metals basis) 2-5um/99.5% 2.0 m solution in methanol,mkseal 2.0 m solution in thf, mkseal 2.00 m in h2o 2.0mm 厚,99.9985% metals basis 2.0mm 直径, 99.999% metals basis 2.0mm直径, 99.999% metals basis 2.5% in h2o 20 wt. % in ethanol 20 wt. % 正丙醇溶液 20% (v/v) in h2o 20% in h2o,cod≥17万mg/l 20% in water 20% pd(oh)2 20% w/w in h2o 20%(v/v) in h2o 20%-26% in h2o 20%水溶液 20%甲醇溶液,~20% in methanol (t) 20-25% 乙醇溶液 20-30nm,99.99% metals basis 20-40目, gc 20-40目 200-300 目 2000 μg/ml in methanol 2000ug/ml in purge and trap methanol 2000μg/ml in h2o 2000目 200nm,99% 200nm,99.5% metals basis 20mg/ml 20nm 球形,99.5%,γ型 20nm-100nm,99.9% metals basis 20nm-50nm 球形,99.5% 20nm~160nm,100od(±5od) in h2o 20~30 nm 粒径, 30 wt. % 异丙醇溶液 20~30 nm 粒径, 30 wt. % 水溶液 20目 219g/l in h2o 22%-25% w/v in isopropanol 22.5%水溶液 22mm (0.9in) 直径, 99% (metals basis), sr ≤0.8% 2400分子量 25 ug/ml in acetonitrile 25 wt. % in h2o,含9-11% 甲醇稳定剂 25% (v/v) in h2o 25% (v/v) in h2o 25% in h2o 25% w/w in 1-methoxy-2-propanol 25% w/w in hexane 25-28%, 蒸发残渣≤0.002% 25-28%, 蒸发残渣≤0.004% 25-30 mpa·s 250g/l, 介质: h2o 25g/l in h2o 25mg/5ml in pbs,非磁性,1um 27.5g/l in h2o 28 wt. % in h2o, 含10-12% 甲醇稳定剂 28% in water 28% k2o,粉末 2m in h2o 2m in thf 2mol/l in etoh 2m 2na salt, 95% 2um 2μm,医用研究级 3% nh3 in h2o 3%溶液 3-5mm,吸附剂,催化剂及载体 3.175mm 直径 x 3.175mm 长, 99.9999% (metals basis) 3.175mm 直径 x 3.175mm 长,99.9999% metals basis 3.175mm 直径 x 6.35mm 长, 99.95% (metals basis去除ta) 3.4um 3.5%溶液 3.6g/l in h2o 30 nm 粒径, 20 wt. % 异丙醇溶液 30 nm 粒径, 20 wt. % 水溶液 30 wt. % in h2o 30% (v/v) in h2o 30% (w/w) in h2o 30% solution in h2o 30% w/w 水溶液 30%,cod≥25万mg/l 30%乙二醇溶液 30%水溶液 30±2% in h2o 30-35 wt. % in 200#paint solvent 30-35 wt. % in ethanol, mkseal 30-35% in h2o 30.6-39.0%cu 300目,99% 30nm 球形 纯度:99% trace metals basis 30nm 球形 纯度≥97% trace metals basis 30nm 球形,99.5%,α型 30nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 30nm,98%,α型 30nm,99.5% 31% in h2o 32-36% 325目, 99.5% metals basis 33 wt.% in acetic acid 33 wt.% solution in acetic acid, mkseal 33-35% tio2 35 wt. % in h2o 35 μg/ml in isooctane 35% in h2o 35% in water 36%,固体 36.0-40.0% ru basis 37 wt. % in h2o,含10-15% 甲醇稳定剂 39-44% b2o3 basis, 31-37% cao basis, powder 399.6 mosmol·kg-1 3m,ph4.5,溶剂:h2o 3m,ph5.2 3m,ph5.5,溶剂:h2o 3mm in dmso 3mol/l in etoh 3m 4 wt. % in h2o 4% ca 4-6mm,99.999% metals basis 4.00% (w/w) in h2o 4.00mg/l in water 4.5-6.5% (al) 4.76% (v/v) in h2o 40 wt. % in h2o (8.8 m) 40 wt. % in h2o, 含0.01%的乙酸铵阻聚剂 40% (w/w) in h2o 40% w/w in water 40% w/w 水溶液 40% 水溶液 40%水溶液 40%溶液,电子级 40 wt. % in isopropanol 40-47%mgo 40-50nm, ≥99.95% metals basis 40-60%,工业级 40-60目 gc 40.5%-42.5% pb 40g/l in h2o 40g/l, 介质: h2o 40nm,99.5% metals basis 40nm,99.5% 42% 43.6%(wt) in dichloromethane 430g/l 45% in h2o 45-55% in water 45-60%, mixture of isomers 45.0 - 50.0% 45mg/ml in h2o 45um,-325 目, 99.9% metals basis 45wt.% aqueous solution 46% 47% 47-49°c 48-50%溶液 48~50% au basis 49 wt. % in 2-ethylhexanoic acid 49 wt. % in hexane, ce: 12% 4mol/l in h2o 4n,靶材专用 5 % 溶液 5 wt. % in h2o 5% (v/v) in h2o 5% on carbon black (surfactant and reactant-free) 5% pd, 50-70% wetted powder 5% pt, 99.95% metals basis 5%(v/v) in h2o 5%(w/v) in h2o 5%载量,粉末 5 m in thf 5-10 nm 粒径, 20 wt. % 异丙醇溶液 5-10 nm 粒径, 20 wt. % 水溶液 5-10nm,自分散 5.00 n in h2o 5.00mol/l in h2o 5.4mg/l,1-5层 50 wt%己烷溶液 50 wt. % in h2o, 99.9% trace metals basis 50 wt. % in mineral spirits 50 wt. % 水溶液 50 wt. %水溶液 50 wt.% solution in water 50% in dichloromethane 50% w/w in water 50% w/w solution in methanol, mkseal 50% w/w 水溶液, 试剂级 50%(gc), 异构体混合物 50%aqueoussolution(99.9%-eu)(reo) 50%溶液 50%甲醇溶液 50%邻苯二甲酸二辛酯溶液 50 wt. % in ethanol 50 μg/ml in isooctane, analytical standard 50-100 mesh, extent of labeling: 3-4 mmol/g loading, 1 % cross-linked 50-55% w/w hbf4 50-60% tio2, 35-40% k2o 500g/l in h2o 500g/l, 介质: h2o 500nm 500μg/ml in water 50g/l, 介质: h2o 50nm 近球形,99.5% 50nm,20-30% in water 50nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 50nm,40 wt. % in h2o 50nm,40 wt. % 异丙醇 50nm,50 wt. % in h2o 50nm,99% 50nm,球形, 99.9% metals basis 50wt%水溶液 50wt.% in h20 50μg/ml, 5% hno3 55 wt. % in h2o 55% in water 55% 55.0 - 58.0 %, 不含稳定剂, acs试剂 55.0 - 58.0 % 59% 5g/l in h2o 5m in h2o 5m,ph4.8,溶剂:h2o 5mm (0.2in) 直径,99.995% (metals basis) 5mm 或更小, 99.9999% metals basis 5mm 直径,99.995% metals basis 5mm 直径,99.999% metals basis 5mm 直径,99.9999% metals basis 5um/99.5% 5wt. %(dry basis), matrix activated alumina 6.35mm 厚, 99.9% metals basis 6.5% 60 wt. % 水溶液 60 wt. %水溶液 60% (w/v) in h2o 60% in h2o 60% in n-butoxide, hf: 22.6 wt% 60% in water,300-500ppm mehq 60% 水溶液 60%,gc 60% 60%溶液 60-200目 60-64%, fe≤10ppm 60-70% 水溶液 60-80目 gc 60.0% 600目 60nm 球形,98.0% 60nm,99.9% metals basis 61%min in mineral spirits ,pb 24% 62 wt. % in h2o 625目 64-66%的水溶液 65 wt. % in mineral spirits 65% in h2o 65-72% in water 68-70%, mixtures 68.0-72.0% in h2o 6mm 直径, 99.99999% metals basis 6mm 直径,99.9% metals basis 7.5% (v/v) in h2o 7.50 m in h2o 70 wt. % 正丙醇溶液 70% hf 70% in etoh 70% in h2o 70%(hplc) 70%,含异构体和邻苯二甲酸 70%,块状 70%甲醇溶液 72-82%, 粒径≤40mm 73%水溶液 74%,光球状,3-5mm 74%,片状 74-76% in water 75 wt. % in h2o 75% (contains ca. 23% isomer) 75% (v/v) in h2o 75% in h2o 75%(v/v),消毒用 75-80 wt. % in water 78% in 2-ethylhexanoic acid 8 wt. % in h2o 8% (v/v) in h2o 8-15nm, ≥99.95% metals basis 80 % in water 80 g/l aqueous 80 wt. % in h2o, contains 600 ppm monomethyl ether hydroquinone as inhibitor 80% (contains 5% phenol at maximum) 80% (hplc) 80% in ethanol 80% in water,稳定剂:聚乙二醇5-10% 80% metals basis 80% 水溶胶 80%(mixture of monoester, diester, triester) 80%(mixture) 80%(mixtures of isomers) 80%, mixture of isomers 80%,gc 80%,天然 80-100目 gc 80.0%(gc), 含约20%反-异构体 80.0% 800nm 球形 纯度>99.5% 800目 80g/l, 介质: h2o 80nm, 99.5% metals basis 83%,gc 83.5-86.5% tio2, 13.5-16.5% k2o 84% 85%, cont. ca 10% 2-cyclohexylidenecyclohexanone 85%, 医药级ph eur,bp,jpe,nf,e338 85%,gc 85%,stabilized with tbc 85%,含100ppm mehq稳定剂 85-90%,工业级 85.0%(gc) 87%,顺反异构体混和物 87% 88% (m- and p- mixture)(stabilized with tbc + onp + o-nitrocresol) 88% (uv-vis) 88.5% 8m in h2o 8m 9 wt. % in h2o 9.5mm 直径,99.97% metals basis 9.5mm 直径,99.999% metals basis 90% (gc), mixture of isomers 90% (hplc),用于荧光分析 90% stabilized with 60-100 ppm mehq 90%(mixture of c-16 and c-18 isomers), 工业级 90%(stabilized with tbc) 90%(t) 90%(以干基计) 90%, mixture, stabilized with tbc 90%, stabilized with mehq 90%, γ型 90%, 包含对苯二酚稳定剂 90%, 含有~6%氯化铵 90%, 来源于鲨鱼 90%, 片状 90%,gc 90%,lc&n 90%,lc 90%,异构体混合物 90%,异构体的混合物 90%,溶于水 90%,顺反异构体混和物 90%,顺反混合物 90%-98% 90.0% 90g/l in h2o(cp) 90nm,0.03mg/ml,溶剂:超纯水 90nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 90nm,40 wt. % 乙醇 91%, 浊点61°c 91%,浊点90℃ 92%(gc) 92%(hplc) 92%, stabilized with mehq 92%,97%(mixture of isomers) 92-94 % 92-94% 93% (gc) 93% (hplc) 93%(hplc) 93%(t) 93%,t 93%,含200 ppm tbc 阻聚剂 93%,含稳定剂吩噻嗪 93%,外消旋和内消旋混合物 93%,异构体混合物 93%,黄相 94% (hplc) 94% (oligomer purity) 94%(hplc) 94%,刺球状,1-3mm 94%,刺球状,3-5mm 94%,含0.2% topanol 稳定剂 95% (dry basis) 95% (mixture of isomers) 95% (stabilized with 1%bht) 95% (stabilized with copper chip) 95% (tlc) 95% ,stabilized with mehq 95% anhydrous basis 95% contains ≤10%h2o 95% h4p2o7 basis 95% stabilized with tbc 95%(gc)(mixture) 95%(gc)(t) 95%(hplc)(n) 95%(min 90%) 95%(mixtures) 95%(stabilized with bht) 95%(stabilized with copper chip) 95%(stabilized with dcm) 95%(stabilized with k2co3) 95%(tlc) 95%(含碳酸钾稳定剂) 95%(含约40%的十八烷基醚硫酸钠) 95%, 0.1% 4-甲氧基苯酚稳定剂 95%, 10 mg/ml in ethanol 95%, 200ppm 4-甲氧基苯酚稳定剂 95%, 98 atom % d 95%, 98% e.e. 95%, contains 0.1% bht as stabilizer 95%, contains 0.1% hq as stabilizer 95%, contains h2o 95%, stabilized with 0.2% tbc 95%, stabilized with hq 95%, stabilized with mehq 95%, total of isomers 95%, wetted with ca. 20% water 95%, ~1 m in h2o 95%, ~400mesh 95%, 含k2co3稳定剂 95%, 含有mehq作为抑制剂 95%, 含有稳定剂mehq 95%, 邻位~40%, 对位~60% 95%,(双酯≥75%,单酯≥20%) 95%,-100目 95%,200 ppm monomethyl ether hydroquinone as inhibitor 95%,200-300目 95%,2000目 95%,40-60目 95%,ee99% 95%,lc&t 95%,lc 95%,mixture of cis and trans isomers,with 200ppm 4-methoxyphenol 95%,mixture of isomers 95%,mixture of trimers and monomer of piperideine 95%,nmr 95%,stabilized with 60-100 ppm mehq 95%,trans-isomer >92% 95%,t 95%,≤1.0% water 95%,含0.01 % 柠檬酸稳定剂 95%,含100-500 ppm tbc稳定剂 95%,含100ppm mehq稳定剂 95%,含250ppm bht 稳定剂 95%,含稳定剂mehq 95%,含稳定剂tbc 95%,含稳定剂铜屑 95%,异构体混合物 95%,异构体的混合物 95%,蓝相 95%,顺反异构体混和物 95%,颗粒状 95%;mw~4.5w bioreagent, 无dna酶和rna酶, pcr试剂, 分子生物学级, 无菌, for dna and rna applications, ≥99%, 100mm 95%混合(tbc作为稳定剂) 96 atom % d, 98% (cp) 96% ,含80- 120 ppm hydroquinone 稳定剂 96% dry weight,5-10% 甲醇做稳定剂 96%(gc&t) 96%(gc), contanins ≤200ppm mehq as inhibitor 96%(isomers mixture) 96%(stabilized with tbc) 96%(酯含量) 96%, contains nahco3 as stabilizer 96%, contains tbc as stabilizer 96%, mixture of isomers 96%, mkseal 96%, stabilized with 100ppm 4-methoxyphenol 96%, 含有200 ppm mehq阻聚剂 96%, 粒径: 10 μm 96%,sum of branched isomer,0.01% mehq 96%,上层覆保护剂 96%,含250ppmmehq稳定剂 96%,含30 - 70 ppm mehq 稳定剂 96%,含稳定剂铜屑 96%,溶于油 96%,片状 96(含3%diea) 96.0% (gc) 97 %,200 ppm mehq 97 atom % d, 95%(cp) 97% (hplc), white powder 97% (stabilized with tbc) 97% (tlc) 97% 25-27% solution in ethyl acetate 97% 99%ee(contains ~10%solvents) 97% contains ≤10%h2o 97% metals basis 97% rel-(1r-2e-ps)-axial 97% trace metals basis, 300-500nm 97% trace metals basis, 50-300nm 97%(cis- and trans- mixture) 97%(hplc), 99%e.e. 97%(mix) 97%(mixtures) 97%(n)(t) 97%(nmr)(mixtures) 97%(stab. with hydroquinone) 97%(stabilized with bht) 97%(sum of mixtures) 97%(tbc作为稳定剂) 97%(w) 97%(含200-300ppmmehq稳定剂) 97%(基于干物质)in 25% h2o 97%, (e)+(z) 97%, 30-45kda 97%, mixture of 2- and 4-isomers 97%, mixture of cis and trans 97%, mixture of isomers,stabilizer:100-300ppm mehq 97%, mixture of isomers 97%, mixtures of c16&c18 97%, stabilized 250 ppm bht 97%, stabilized with 0.5% calcium carbonate 97%, stabilized with 500-1000 ppm tbc 97%, stabilized with cao 97%, stabilized with mehq 97%, sum of c16 c18 c20 97%, water ca 10% 97%, water ≤ 3.0% 97%, 含0.1% koh稳定剂 97%, 含有稳定剂mehq 97%, 含稳定剂tbc 97%, 含稳定剂铜屑 97%, 异构体混合物 97%, 来源于山苍子油 97%, 白色到淡黄色粉末 97%, 精制级 97%, 约含150ppm 4-甲氧基苯酚稳定剂 97%,0.01% 氢醌稳定剂 97%,0.1% 对叔丁基邻苯二酚作稳定剂 97%,10%h2o 97%,10mg/ml solution in water 97%,1μm 97%,300目 97%,40-100kda 97%,99%ee 97%,bet surface area 8~16 m2/g 97%,ee97% 97%,gc&t 97%,hq as inhibitor 97%,lc&t 97%,mixture of isomers 97%,pd 10% 97%,stab. with <1% magnesium oxide 97%,含0.02% 4-methoxyphenol 稳定剂 97%,含0.1 % 对苯二酚 稳定剂 97%,含0.1% tbc稳定剂 97%,含0.1%对叔丁基邻苯二酚(tbc)稳定剂 97%,含100-200ppm bht稳定剂 97%,含100ppm bht稳定剂 97%,含100ppmmehq稳定剂 97%,含60-100ppm bht稳定剂 97%,含tbc稳定剂 97%,含含稳定剂氢醌 97%,含有数量不等的酸酐 97%,含稳定剂mehq 97%,含稳定剂mgo 97%,含稳定剂tbc 97%,含稳定剂水滑石 97%,含稳定剂铜屑 97%,片状 97%,顺式 + 反式 97.0 % gc 97.0% (sum of isomers, gc) 97.0% (tlc) 97.00%盐酸盐 97.5% 98 atom % 13c, 98 atom % 15n, ≥98% 98 atom % 13c 98 atom % 15n, 98%(cp) 98 atom % d(deuterated from d0-d8), 95% 98 atom % d, 95% 98 atom % d, 99% (cp) 98 atom % d,95% 98 atom % d,96% 98 atom %, 98%(cp) 98 atom %d 98 atom% 15n 98 atom%d 98 atom% 98% (as sncl4) 98% (enzymatic) 98% (mixtures) 98% (stabilized with mehq) 98% ,含5-10 ppm tert-butylcatechol 稳定剂 98% 99%ee 98% dry weight 98% gc 98% ir 53% 98% metal basis, rh 19.32%最低 98% mixture of isomers 98% trace metals basis excluding zr 98%(cis+trans) 98%(gc&n) 98%(gc), 顺反混合物, stabilized with mehq 98%(gc),含稳定剂bht 98%(gc),含稳定剂mehq 98%(gc),含稳定剂tbc 98%(hplc), solid 98%(lc&n) 98%(lc&t) 98%(lc&w) 98%(m- and p- mixture)(stabilized with tbc) 98%(mixture of isomers) 98%(mixture of isomer) 98%(mixture of isomeric branched chain hexanes) 98%(mixtures of isomers) 98%(mixtures) 98%(stabilized with koh) 98%(stabilized with methylhydroquinone) 98%(sum of mixtures) 98%(t&lc) 98%(t)(hplc), 用于生化研究 98%(total of isomer) 98%(w) 98%(混合物) 98%, 1800-2000目 98%, 325目 98%, 400nm-1μm 98%, 95 atom % d 98%, 98 atom % 13c 98%, 99 atom % d 98%, chloride≤0.002% 98%, contains 10-15%acoh 98%, contains mehq as stabilizer 98%, contains potassium carbonate as stabilizer 98%, contains tbc as stabilizer 98%, d50≤80nm 98%, ee≥98% 98%, for analysis, acs,iso,reag. ph eur 98%, isomer mixture 98%, ni:22.5% 98%, ph<7 (33.3% in water) 98%, ru≥25.8% 98%, stabilized with bht 98%, stabilized with copper chip 98%, ~20nm 98%, 含<1%正丁硫醇稳定剂 98%, 含200 ppm tbc稳定剂 98%, 含250ppmmehq稳定剂 98%, 含k2co3稳定剂 98%, 有效氧含量: ≥7.18 % 98%, 游离态 98%, 白色粉末, 用于生化研究 98%, 立体异构体混合物 98%, 粉末 98%, 粒径: 0-2μm 98%, 粒径: 1-2μm 98%, 粒径: 100-300nm 98%, 粒径: 600-800nm 98%, 粒径; 100-500nm 98%, 粒径; 400-700nm 98%, 粒径; 800-1000nm 98%, 颗粒 98%, stabilized with bht 98%,(stabilized with mehq) 98%,-325目 98%,-40目 98%,10-20目 98%,100-200 ppm bht as inhibitor 98%,1250目 98%,200 ppm monomethyl ether hydroquinone as inhibitor 98%,200目 98%,4 ~ 8μm 98%,400目 98%,ee 99% 98%,ee92% 98%,gc&n 98%,hplc 98%,lc 98%,mix tbc as stabilizer 98%,mixture of cis and trans 98%,n 98%,pd 15% 98%,pd>13.3% 98%,pd>36.2% 98%,pt:55.0 ± 1.3% 98%,rh>42% 98%,stabilized with 200ppm mehq 98%,stabilized with 5-20 ppm hydroquinone 98%,stabilized with hq 98%,stabilized with tbc 98%,光学纯 70% 98%,含0.01% koh稳定剂 98%,含0.1% 对苯二酚稳定剂 98%,含0.10% alpha-tocopherol 抗氧化剂 98%,含0.3 % mgo稳定剂 98%,含100ppmmehq稳定剂 98%,含50 - 100 ppm bht 稳定剂 98%,含90 - 110 ppm mehq 稳定剂 98%,含有数量不等的酸酐 98%,含水约20% ,单位重量以干重计 98%,含稳定剂0.1% dea 98%,含稳定剂0.1%koh 98%,含稳定剂mehq 98%,含稳定剂tbc 98%,含稳定剂铜屑 98%,支链异构体类的混和物 98%,无水 98%,晶体 98%,棕色结晶粉末 98%,深蓝紫色结晶粉末 98%,片状 98%,球状 98%,用于过氧化物酶试验 98%,白色固体 98%,粒径:100-300nm 98%,约含0.5% mehq 稳定剂 98%,细胞培养级 98%,蓝相 98%,非对映异构体混合物 98%,顺反异构体混合物 98%,黄相 98%purity,99%e.e. 98%混合物(tbc作为稳定剂) 98-101% 98.0% (nt) 98.0% (sum of enantiomers, gc) 98.0%(hplc)(t), 用于高效液相色谱标记 98.0%(t) 98.0-102.0% anhydrous basis (hplc) 98.00%lc 98.5%, mixture of isomers 98atom % d, 98% 99 %,stab. with 0.1% tbc 99 atom % 13c, 98% (cp) 99 atom % 13c 99 atom % d 99% (dry wt.), water <2% 99% (hplc), 98% 99% (metals basis excluding ba) 99% (purity excludes ~1% zr) 99% (reo) 99% ,粒径≤1μm 99% 10-50微米 99% au assay:39.91 ± 0.8% 99% metals basis, 25μm 99% metals basis, ≥325 mesh 99% metals basis, 含有约10%的nicro3 99% metals basis,2-10 μm 99% metals basis,20-40nm,锐钛, 亲水 99% trace metals basis, 20nm, 球形 99% trace metals basis,sba-15 99%(gc), contanins ≤200ppm mehq as inhibitor 99%(gc), 工业级, 浅黄色晶体 99%(lc-ms) 99%(mixture) 99%(mixtures), 包含~0.006%对苯二酚稳定剂 99%(mixtures) 99%(n) 99%(stabilized with tbc), mkseal 99%(二甲苯异构体+乙基苯) 99%(含200-300ppmmehq稳定剂) 99%(天然) 99%(支链异构体类的混合物总和) 99%, -100目 99%, 0.1-1mm 99%, 0.2-0.5μm 99%, 0.5-1μm 99%, 1-3mm 99%, 10-20目 99%, 100±5nm 99%, 100-300nm 99%, 10μm 99%, 2-4mm 99%, 20-60目 99%, 200目 99%, 3-5μm 99%, 300-500nm 99%, 4-16mesh 99%, 4-7mm 99%, 400目 99%, crystalline 99%, d50: 3-4μm 99%, in 100mg/ml ethanol 99%, mixture of isomers 99%, mixture 99%, stabilized with mehq 99%, suitable for determination of sulfhydryl groups 99%, with molecular sieves,water≤50 ppm (by k.f.), mkseal 99%, β型 99%, ≥99.99% trace metals basis 99%, 发酵工艺 99%, 含0.01%的乙酸铵阻聚剂 99%, 无色液体 99%, 用于合成 99%, 用于药物研究 99%, 粉末 99%, 粒径: 5-10μm 99%, 粒径<10μm 99%, 顺式含量: ~20%, 反式含量: ~80% 99%, 顺式含量: ~40%, 反式含量: ~60% 99%,-100目 99%,0.1%单杂 99%,0.5~0.7um 99%,1-4mm 99%,1-5μm 99%,15nm,疏水性 99%,1~2μm 99%,1μm 99%,200目 99%,30-60nm 99%,30-80nm 99%,500目 99%,50目 99%,6-10μm 99%,6μm 99%,7-9μm,高白度 99%,<500nm 99%,anhydride group content≥41.0% 99%,bp 99%,ee 98% 99%,for spectrophotometric det. of ta 99%,hplc 99%,hq as inhibitor 99%,metals basis 99%,mixture of isomers 99%,p≥27% 99%,t 99%,water≤50 ppm (by k.f.), mkseal 99%,≤100nm 99%,≤325 目,粉末 99%,凝固点: ≥76°c 99%,单杂<0.1% 99%,含0.01 % bht 稳定剂 99%,含0.1 % koh 稳定剂 99%,含10 - 20 ppm mehq 稳定剂 99%,含10-100ppm 4-methoxyphenol 稳定剂 99%,含10-15ppm 4-叔-丁基邻苯二酚稳定剂 99%,含10-20 ppm mehq 作为稳定剂 99%,含15 - 20 ppm mehq稳定剂 99%,含150-400 ppm bht 稳定剂 99%,含20ppm mehq稳定剂 99%,含50-150 ppm tbc 稳定剂 99%,含50ppm bht 稳定剂 99%,含水20% 99%,总杂<0.1% 99%,水分≤1.0% 99%,用于生化研究 99%,粉红色到淡紫色 99%,粒径<1.2um 99%,粒状 99%,适用于分析 99%,锐钛,100nm 99%,锐钛,d50: 0.4-1um 99%,锐钛 99%,闪烁级 99%,颗粒 99%,高纯级 99%,黄色结晶针状固体 99.0% (at) 99.0% (t) 99.0% metals basis 99.0%(gc) 99.0%,stabilized with 5-20 ppm hydroquinone 99.0-100.5% (in dried substance), meets analytical specification of e 282 99.3wt%,粒径:5-10nm 99.5% metals basis 99.5% (metals basis excluding sr), sr <500ppm 99.5% (metals basis 去除ni), ni < 0.2% 99.5% (metals basis 去除铪) ,325目 99.5% (metals basis,锆除外), zr<1% 99.5% ,粒径:1-2um 99.5% metals basis (去除铪),1-3μm 99.5% metals basis(镁、铝除外), d50≈3μm 99.5% metals basis, 100-200nm 99.5% metals basis, 40nm, 近球形 99.5% metals basis, 50-100nm 99.5% metals basis, d50: 1-1.5um 99.5% metals basis, d50: 1-3μm 99.5% metals basis, d50: 2-3μm 99.5% metals basis, ≤6um 99.5% metals basis,<100 nm 99.5% metals basis,<100nm 99.5% metals basis,-300目 99.5% metals basis,10μm 99.5% metals basis,150nm,锐钛,亲水 99.5% metals basis,2.0μm 99.5% metals basis,25μm 99.5% metals basis,2μm 99.5% metals basis,5 μm 99.5% metals basis,5μm 99.5% metals basis,<15μm 99.5% metals basis,≤45um 99.5% metals basis,≥200目 99.5% metals basis,粉末, 2 μm 99.5% metals basis,粉末,<3 μm 99.5%( based on diamine), mixture of isomers 99.5%(4 times purification) 99.5%(gc) 99.5%(metals basis), -200目 99.5%, 10-80目 99.5%, acid <200 ppm, h2o <100 ppm 99.5%, hafnium chloride<50ppm 99.5%, mixture of isomers 99.5%, water≤50 ppm(by k.f.), mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.5%, 含<1%正丁硫醇稳定剂 99.5%, 含0.01%的乙酸铵阻聚剂 99.5%, 含有稳定剂mehq 99.5%, 颗粒 99.5%,-100目 99.5%,-325mesh 99.5%,1-3μm 99.5%,100-200nm,球形 99.5%,100nm 99.5%,100目 99.5%,10um 99.5%,15±5nm 99.5%,150-200目 99.5%,2-3μm 99.5%,20±5nm 99.5%,20-80nm 99.5%,200目 99.5%,30±5nm 99.5%,300目 99.5%,40-100nm 99.5%,50±5nm 99.5%,500nm 99.5%,50nm 99.5%,60-120nm 99.5%,metals basis 99.5%,stabilized with 5-20 ppm hydroquinone 99.5%,trace metals basis 99.5%,water< 0.005% (by k.f.), mkseal 99.5%,≤3 μm 99.5%,≤30μm 99.5%,≥100目 99.5%,升华纯化 99.5%,单杂<0.1% 99.5%,含0.1 % koh 稳定剂 99.5%,异构体混合物 99.5%,片状 99.5%,生物技术级 99.5%,粉末 99.5%,重蒸馏 99.5%metals basis 99.6%,25μm 99.7% metal basis 99.7% metals basis 99.7%,含100ppmmehq稳定剂 99.75% metals basis 99.8% trace metals basis 99.8% metal basis, 1μm, 近球形 99.8% metals basis, 10nm-25nm, 锐钛, 亲水 99.8% metals basis, 20nm, 金红, 亲油(kh-570处理) 99.8% metals basis, 300±50nm 99.8% metals basis, 30nm, 锐钛, 亲水 99.8% metals basis, 40nm, 金红, 亲油(kh-570处理) 99.8% metals basis, 60nm, 金红, 亲油(kh-570处理) 99.8% metals basis, ≤150nm 99.8% metals basis, ≥100目 99.8% metals basis,100-300nm,金红,亲水 99.8% metals basis,100nm,金红,亲水 99.8% metals basis,100nm,金红,亲油 99.8% metals basis,100nm,锐钛,亲水 99.8% metals basis,100nm,锐钛,亲油 99.8% metals basis,25nm,金红,亲水 99.8% metals basis,25nm,锐钛,亲水 99.8% metals basis,300目 99.8% metals basis,40nm,金红,亲水 99.8% metals basis,40nm,锐钛,亲水 99.8% metals basis,5-10nm,锐钛,亲水亲油型 99.8% metals basis,5-10nm,锐钛,亲水型 99.8% metals basis,50±10nm 99.8% metals basis,60nm,金红,亲水 99.8% metals basis,60nm,锐钛,亲水 99.8% metals basis,60nm,锐钛,亲油(硬脂酸处理) 99.8% metals basis,60nm 99.8% metals basis,90±10nm 99.8% metals basis,rh 81% 99.8% trace metals basis,粒径: 2 μm, 粉末 99.8% trace metals basis 99.8%, fe≤0.2%, d50:3-10μm 99.8%,10μm 99.8%,1μm,,高白度 99.8%,200目 99.8%,6.35mm (0.25in) dia x 6.35mm (0.25in) length 99.8%,d50 0.5-1.5μm 99.8%,pb:0.0005% 99.8%,pb:0.001% 99.8%,water≤30 ppm (by k.f.), mkseal 99.8%,water≤50 ppm (by k.f.),mkseal 99.8%,比表面积(bet): 260m2/g;粒径:7-40nm 99.8%,比表面积(bet):100m2/g;粒径:7-40nm 99.8%,比表面积(bet):115m2/g;粒径:7-40nm 99.8%,比表面积(bet):120m2/g;粒径:7-40nm 99.8%,比表面积(bet):150m2/g;粒径:7-40nm 99.8%,比表面积(bet):170m2/g;粒径:7-40nm 99.8%,比表面积(bet):200m2/g;氯化物:0.0125 99.8%,比表面积(bet):200m2/g;粒径:7-40nm 99.8%,比表面积(bet):230m2/g;粒径:7-40nm 99.8%,比表面积(bet):300m2/g;粒径:7-40nm 99.8%,比表面积(bet):380m2/g;粒径:7-40nm 99.85% (metals basis) 99.9% metals basis, ≤1μm 99.9% (metals basis), pt 44.9% min 99.9% metal basis, d50≤10μm 99.9% metal basis 99.9% metals basis ,无水 99.9% metals basis(镁、铝除外) 99.9% metals basis, -300目 99.9% metals basis, 1-3cm 99.9% metals basis, 1000目 99.9% metals basis, 150-250目 99.9% metals basis, 1μm 99.9% metals basis, 20-60nm 99.9% metals basis, 200-300nm 99.9% metals basis, 2~5μm 99.9% metals basis, 50-300nm 99.9% metals basis, 600-800nm 99.9% metals basis, 600目 99.9% metals basis, 800目 99.9% metals basis, 900目 99.9% metals basis, <100nm particle size 99.9% metals basis, d50=200nm 99.9% metals basis, d50=40nm, 近球形 99.9% metals basis, d50≈1-1.5μm, 不规则片状(sem) 99.9% metals basis, d50≈30μm 99.9% metals basis, d50≤40nm 99.9% metals basis, α相, 100nm, 亲油型 99.9% metals basis, ≤0.8μm 99.9% metals basis, ≤10um(fsss) 99.9% metals basis, ≤150nm 99.9% metals basis, ≤500目 99.9% metals basis, 平均粒径:10 μm, 近球形 99.9% metals basis, 斜方晶 99.9% metals basis, 棕色固体 99.9% metals basis, 粒径: ~20nm, 比表面积:~100 m2/g 99.9% metals basis, 粒径: ~20nm, 比表面积:~240 m2/g 99.9% metals basis, 粒径<500nm 99.9% metals basis,<50 nm 99.9% metals basis,-250目 99.9% metals basis,-300目,近球形 99.9% metals basis,0.5μm 99.9% metals basis,1-2μm 99.9% metals basis,1-5μm 99.9% metals basis,10-20μm 99.9% metals basis,10-30nm 99.9% metals basis,100-200 mesh 99.9% metals basis,100目 99.9% metals basis,1~2μm 99.9% metals basis,1μm 99.9% metals basis,2 μm 99.9% metals basis,2-3μm 99.9% metals basis,200目,粉末 99.9% metals basis,20nm 99.9% metals basis,2μm 99.9% metals basis,30±10nm 99.9% metals basis,30nm 99.9% metals basis,400nm 99.9% metals basis,40nm 99.9% metals basis,4mm,颗粒 99.9% metals basis,50-70nm 99.9% metals basis,500nm 99.9% metals basis,5~10μm 99.9% metals basis,60-100nm,黑色粉末 99.9% metals basis,60-100nm 99.9% metals basis,60-80nm 99.9% metals basis,<200nm 99.9% metals basis,ir ≥84.5% 99.9% metals basis,pd 29% 99.9% metals basis,α相,100nm,亲水型 99.9% metals basis,α相,30nm,亲水型 99.9% metals basis,α相,30nm,亲油型 99.9% metals basis,α相,<20nm 99.9% metals basis,≤1μm 99.9% metals basis,≤40μm 99.9% metals basis,不规则片状 99.9% metals basis,宽:13 mm, 厚:0.3 mm 99.9% metals basis,无水 99.9% metals basis,粉末,100-200 mesh 99.9% metals basis,粉末,≥200目 99.9% metals basis,粒径<5mm 99.9% metals basis,粒径(d50)10-20μm 99.9% metals basis,粒径≤1μm 99.9% metals basis,颗粒 99.9% metals basis,黄色 99.9% rare earth metals basis,200目 99.9% trace metals basis, 100目 99.9% trace metals basis, 50-100 nm 99.9% trace metals basis, 50-80nm 99.9% trace metals basis,-325mesh 99.9% trace metals basis,−325目 99.9%(200ppm mehq as inhibitor) 99.9%(metals basis), 白色 99.9%, 0.5-2μm 99.9%, 100±5nm 99.9%, 100nm, 单斜相 99.9%, 100nm, 沉淀法 99.9%, 100nm, 立方相 99.9%, 1600-2000目 99.9%, 1um 99.9%, 1μm, 单斜相 99.9%, 200-300nm, 四方相 99.9%, 200nm, 单斜相 99.9%, 200nm 99.9%, 200目, 四方相 99.9%, 200目 99.9%, 20nm, 单斜相 99.9%, 20nm 99.9%, 300±5nm 99.9%, 5-10nm, 沉淀法 99.9%, 500nm, 单斜相 99.9%, 50nm, 单斜相 99.9%, 50nm 99.9%, 60-100目 99.9%, d50≈8μm, 球形 99.9%, water≤0.2% 99.9%, ≤30μm 99.9%, ≤50nm 99.9%, 不含甲醇 99.9%, 无甲醇、无甲醛、无酯、无杂醇油 99.9%, 深蓝色, 用作透明隔热薄膜 99.9%, 球型, d50=0.6-1um, 四方晶体-铁电体 99.9%, 球型, d50=0.6-1um 99.9%, 粒径: 500nm 99.9%, 锐钛, 500nm, 近球形 99.9%,1-2um 99.9%,1-3um 99.9%,100nm 99.9%,100目 99.9%,105-250um 99.9%,1250目 99.9%,12~16um 99.9%,15-45um 99.9%,15-53um 99.9%,17um 99.9%,1~5mm 99.9%,23um 99.9%,27um 99.9%,300目 99.9%,30nm 99.9%,3~4um 99.9%,40nm 99.9%,53-105um 99.9%,53-120um 99.9%,53-150um 99.9%,80-100nm 99.9%,800目 99.9%,8~10um 99.9%,d50(0.2~0.55μm) 99.9%,metals basis 99.9%,total metallic impuriyies≤1000 ppm 99.9%,平均粒径:0.3-0.6 μm 99.9%,平均粒径≤100 nm,粉末 99.9%,比表面积≥120m2/g;粒径:30nm 99.9%,生物技术级 99.9%,颗粒,锆≤0.15% 99.9%-ni 99.9%metal basis,d1=1μm 99.9%metals basis 99.95 % metals basis 99.95% (metals basis), pt 51.5% min 99.95% metal basis, ru 25.3%最低 99.95% metal basis 99.95% metals basis ,白色 99.95% metals basis, -150目 99.95% metals basis, -80目 99.95% metals basis, os 37%最低 99.95% metals basis, 钌 10.2% 最低 99.95% metals basis,1-5mm 99.95% metals basis, 99.95% metals basis,α相,d90≤30μm,亲水型 99.95% metals basis,无水级,粉末 99.95% trace metal basis 99.95%, 蒸馏, 57wt. % in h2o, 含<1.5 % h3po2 稳定剂 99.95%,1um 99.97% metals basis 99.98% trace metals basis 99.99 % metals basis 99.99% (metals basis 去除ni), ni < 0.2% 99.99% (metals basis), au 84.2% 最低 99.99% metal basis, ru 23%最低 99.99% metal basis, 无气味的粉末 99.99% metal basis 99.99% metals basis ,50nm 99.99% metals basis 0.5-2mm 99.99% metals basis, -2000目 99.99% metals basis, 120mm×100mm×0.3mm 99.99% metals basis, 3.3-5μm 99.99% metals basis, 300目, o≤0.5% 99.99% metals basis, 40目 99.99% metals basis, 800目 99.99% metals basis, au≥39.3%最低 99.99% metals basis, d50: 15-25μm 99.99% metals basis, d50≈2μm 99.99% metals basis, os 52-56% 99.99% metals basis, rh 46.2% 最低 99.99% metals basis, water<10 ppm (by k.f.) 99.99% metals basis, water≤0.2% 99.99% metals basis, α相, d50: 5-6μm 99.99% metals basis, γ相, 40nm 99.99% metals basis, φ3mm, 长:3mm 99.99% metals basis, φ6mm, 长:6mm 99.99% metals basis, 平均粒径: 100nm 99.99% metals basis, 无水 99.99% metals basis, 用于镀膜 99.99% metals basis, 直径0.1-2mm 99.99% metals basis, 锐钛矿 99.99% metals basis,-120目 99.99% metals basis,-200目 99.99% metals basis,-400目 99.99% metals basis,0.1mm 直径 99.99% metals basis,0.25mm 直径 99.99% metals basis,0.5mm 直径 99.99% metals basis,0.5um 99.99% metals basis,1-3mm,powder 99.99% metals basis,1-3mm 99.99% metals basis,100nm 99.99% metals basis,150-250目 99.99% metals basis,150目 99.99% metals basis,1mm 直径 99.99% metals basis,1um 99.99% metals basis,200nm 99.99% metals basis,2~10μm 99.99% metals basis,2μm 99.99% metals basis,300目 99.99% metals basis,30nm-50nm 99.99% metals basis,40-200目 99.99% metals basis,4mm颗粒 99.99% metals basis,50-70nm 99.99% metals basis,5μm 99.99% metals basis,80%α相,30nm-50nm 99.99% metals basis,d50=10μm, 不规则球形 99.99% metals basis,α晶型,60nm 99.99% metals basis,α晶型约90%,晶型γ约10%,50nm 99.99% metals basis,α相,300nm,亲水型 99.99% metals basis,α相,30nm,亲水型 99.99% metals basis,α相,30nm 99.99% metals basis,α相,50nm,亲水型 99.99% metals basis,α相,d90≤30μm,亲水型 99.99% metals basis,γ晶型,60nm 99.99% metals basis,γ相,10nm 99.99% metals basis,γ相,20nm 99.99% metals basis,≤0.1μm 99.99% metals basis,不规则块状 99.99% metals basis,无水级 99.99% metals basis,晶体颗粒 99.99% metals basis,晶型α,0.20μm 99.99% metals basis,晶型γ,20nm 99.99% metals basis,晶粒 99.99% metals basis,用于光学玻璃或单晶 99.99% metals basis,粒径<5mm 99.99% metals basis,粒径:10μm 99.99% metals basis,粒径:2μm 99.99% metals basis,粒径:5μm 99.99% metals basis,粒状,1-3mm 99.99% trace metals basis, <100 nm 99.99% trace metals basis, d50=2~3μm 99.99% trace metals basis, ≤10 μm 99.99% trace metals basis, 无水级 99.99% trace metals basis, 蒸馏, 57wt. % in h2o, 不含稳定剂 99.99% trace metals basis, 超干 99.99% trace metals basis,<20 μm, 99.99% trace metals basis,颗粒 99.99%, 1μm 99.99%, 2um 99.99%, 30μm, 球形 99.99%, d50=1μm 99.99%, d50≈10um 99.99%, 黑色颗粒, 1-3mm 99.99%,1-3mm 99.99%,1-3μm 99.99%,1~5mm 99.99%,1μm 99.99%,3-5um 99.99%,4n 99.99%,metals basis 99.99%,water:0.5-0.8% 99.99%,白色粉末,锆≤0.15% 99.99%-sn 99.99%-zr (reo) 99.99%metalsbasis 99.995% metals basis, φ3mm, 长:3mm 99.995% metals basis, φ6mm, 长:6mm 99.995% metals basis,α相,d90≤30μm,亲水型 99.995% metals basis,≤60目 99.995% metals basis,≤80目 99.995%,直径:6mm,长度:6mm 99.998% (metals basis 去除 w), w 300ppm 最高 99.998% metals basis,-100目 99.998% metals basis,≤60目 99.998% trace metals basis,结晶,粉末 99.998% trace metals basis 99.998% 99.9985% (metals basis), (去除最高25ppm的碱土金属) 99.9985% metals basis 99.999% metals basis 99.999% metals basis, -800目 99.999% metals basis, 200目 99.999% metals basis, 60目 99.999% metals basis, si 10ppm 最高 99.999% metals basis,-300目 99.999% metals basis,1-5mm 99.999% metals basis,1-6 mm,beads 99.999% metals basis,1-6mm,颗粒 99.999% metals basis,beads,1-6 mm 99.999% metals basis,powder 99.999% metals basis,无水级 99.999% metals basis,粒状,1-3mm 99.999%(metalsbasis去除ni),ni<0.2% 99.999%,5n 99.999%,≤45μm,粉末 99.9995% trace metals basis 99.9999% metals basis,1-5mm 99.9999% metals basis,单晶棒状 99.9999% trace metals basis 99.9999% 99.99999% metals basis,块状 99.99999% metals basis,棒状或块状 <100nm,99% >40% in h2o >70% >90% >97%(hplc) >98%(gc) >99%metals basis,粒径:15nm,比表面积(bet):300±50m2/g >99.0% metals basis,2μm acid terminated,lactide:glycolide 50:50,mw 24000-38000 acid terminated,lactide:glycolide 50:50,mw 38000-54000 acid terminated,lactide:glycolide 75:25,mw 4000-15000 acid terminated,mw 38000-54000 acid terminated,mw 7000-17000 acid value (koh mg/g): 200~235 acid value(koh mg/g):286~326 acs ,≥99.5% acs reagent, chips, 33.5-36.5% acs reagent, mixture of cuo and cu2o acs spectrophotometric grade, ≥99.9% acs, 99% acs, 99.0% (gc) acs, pt 37.5% min acs, ≥85% acs, ≥90% acs, ≥98.0% (rt) acs, ≥99% acs, ≥99.4% acs, ≥99.5% acs,>98% acs,48%,无色液体 acs,48% acs,97%,片状 acs,97.0% acs,98% acs,98.0-102.0% acs,98.0-103.0% acs,99% acs,99.0% acs,99.0-100.5% acs,99.0-101% acs,99.0-101.0% acs,99.5-101.0% acs,≥98% acs,≥99.5%(gc) acs,≥99.7% al2o3 30-40%, -600目 al2o3≥30% al2o3≥50% al: 16-20%, stabilized with boric acid alkylating agent, 90% al≥8.4% al≥9.8% analytical standard 99.0% (gc) analytical standard, 99.5% anhydrous, 99.9% metals basis anhydrous, 98% anhydrous, 99.5% anhydrous, 99.999% trace metals basis anhydrous, powder, 99.9% metals basis anhydrous,98% anhydrous,99.0% anhydrous,99.9% trace rare earth metals basis anhydrous,99.995% trace metals basis anhydrous,99.998% trace metals basis anhydrous,≥99% anhydrous aps≈2微米, 99.9% metals basis au 23.5~23.8% in h2o au 48-50% au ≥35% au≥51% available chlorine 4.0 % average m.w. 2000 average m.w. 5000 average mn 2,000 average mn 2500 average mn 40,000 average mn 500 average mn 5500 average mn 600 average mn 750, contains 900-1100 ppm mehq as inhibitor average mn ~2,600 average mn ~330 average mn ~683 average mn ~50,000 average mn ~7,200 average mn~1124 average mn~428, 含100-350ppm mehq稳定剂 average mn~432,84wt.% in 1-butanol average mn~692,含100ppm mehq稳定剂 average mn~912 average mw 5000 average mw ~1,080,000, average mn ~311,000 average mw ~160,000 average mw ~2,000 by gpc, 61-65 wt. % in h2o average mw ~216000, average mn ~80,000 average mw ~60,000 average mw ~2,200, average mn ~1,200, allyl alcohol 40 mol % average mw~693 ba ≥30.0 % basichydrate battery grade 99.99% trace metals basis bi: 210g/l, 溶剂: 水 biochemika, ≥96.0%(tlc) biochemika, ≥99% bioreagent plus, ≥98% bioxtra, 98.0% (tlc) black granular br,10-20u/mg br,28% br,99% bs c(cdta-2na)=0.05mol/l c14-c17混标, 42% cl, 100 μg/ml in cyclohexane c16: 54%-62%; c18: 38%-44% c16:65-75%, c18:16-26% c18:80-90% ca 6.6-7.4% ca. 10% in isopropyl ether,mkseal ca. 15% in tetrahydrofuran,mkseal ca. 15% in water ca. 8% in dichloromethane,mkseal ca. 9% in hexane,mkseal caco3≥90% carbon 44%-45% cd ≥75% cis and trans,94% cis and trans,98% cis and trans,99% co 43.0 - 47.0 % co 7.8 - 8.2%,溶剂:40%-80%的石脑油 co 9%-10% co ≥31% co:43-47% contains 75-125 ppm monomethyl ether hydroquinone as inhibitor, >90% contains ≤2% bht as stabilizer, 98% contains ≤6000 ppm hydroquinone as stabilizer content(1-mcp): ≥4.0%,carrier cyclodextrin co≥12% cp,88% crystalline cu>36% cu: 33.0-42.8% cu:8% cu:9.5%-10.9%,200目 d,≥98% d50: 3~5μm d50~300nm diam. 3 mm, ≥99.95% metals basis diameter 2.0 - 2.9μm,2.5% w/v,正电位 doped, conductivity 0.5-1.5 s/cm (pressed pellet, typical), extent of labeling: ~5 wt. % loading, coated on titanium dioxide dye content 30 % dye content 30% dye content 85 % dye content 90 % dye content 95 % dye content,~90% electronic grade, 99.999% trace metals basis electronic grade ep,bp,jp,usp级 epoxy value:0.43 epoxy value:0.5 epoxy value:0.65~0.70 epoxy value~4 ep级,平均粒径:0.1-0.3μm ester terminated, lactide: caprolactone 70:30 ester terminated,lactide:glycolide 50:50,mw 24000-38000 ester terminated,lactide:glycolide 50:50,mw 38000-54000 ester terminated,lactide:glycolide 50:50,mw 50000-75000 ester terminated,lactide:glycolide 50:50,mw 7000-17000 ester terminated,lactide:glycolide 75:25,mw 76000-115000 ester terminated,lactide:glycolide 85:15,mw 190000-240000 ester terminated,mw 50000-75000 ester terminated,mw 54000-69000 extent of labeling: 12-15 mol per mol β-cd extent of labeling: 30 wt. % loading, matrix activated carbon support fe>26%, powder fe>30.5% fe, 24% fe,60.0 - 72.0 % fe2o3≥85% fe: 19%-24% fe: 20% fe: 24%-30% feso4 ~87% fe≈70%, mixture fe≥21% fe≥50% for analysis acs,iso,reag. ph eur for analysis for benchmarking research, 99.5% for enzymic, spectrophotometric determination for esr-spectroscopy, 99% for fluorescence for gc-hs,≥99.9%(gc) for gc-hs,≥99.9% for hplc,0.1% (v/v) in h2o for hplc,0.25 m in h2o for hplc,99.0%(t) for hplc,99.8% (gc) for hplc,≥99.5% for hplc,≥99.9% for ir-spectroscopy for lc-ms, ≥99.8% for lc-ms,≥25% in h2o for lc-ms,≥99.0% for lc-ms for microbiology for molecular biology,99% for nmr spectroscopy,≥99.9%(gc) for plant cell culture,98%(hplc) for plant cell culture,≥96% for plant cell culture,≥99% for spectrophotometric det. of amino sugars, 99% for spectrophotometric det. of au, no2-, ce(iv), for the detection of au, co, cu, scn-, v, 97% for spectrophotometric det. of au,tl(iii),w, 99% for spectrophotometric det. of cu, 99% for spectrophotometric det. of cu, fe for spectrophotometric det. of fe(iii), ≥98.5% for spectrophotometric det. of fe, 97% for spectrophotometric det. of metal ions, ≥99% for spectrophotometric det. of nitrate and nitrite, 99% for spectrophotometric det. of s2-,cl2, 99% for spectrophotometric det. of so42-, s2-, ≥97% for spectrophotometric det. of transition metals, 95% for spectrophotometric det. of zn(ii), cu(ii), fe(ii), co(ii), h2o2, 95% for spectrophotometric det., 99% for spectrophotometric det., bi,71-74% bi basis (kt) for spectrophotometric detection, 99.5%(hplc) for synthesis, mixture of isomers for use in transformations, x-ray crystallography and nmr formicroscopy free macrogoly, 25-40% free, 90% grade 135 granular hcl salt, 97% hlb值:16~17 hplc≥98% hpo3≥38% hpo3≥43% in 2mm dmso ind ir 48.0 - 55.0 % ir:73% lactide:glycolide(50:50),mol wt 30000-60000 lactide:glycolide(65:35),mw 40000-75000 lactide:glycolide(75:25),mol wt 66000-107000, 羧基封端 large,粒径: 900-1000 nm,表面积:550m2/g lc-ms m.w 1000 m.w 11000-12000 m.w 2000 m.w 3000 m.w 7000-7500 m.w :30000-100000 m.w. 2000,不含酯基 m.w.10000 m.w.1500 m.w.20000 m.w.2000 m.w.4000 medium,粒径: 400-450 nm, 表面积: 400m2/g mgo:45% min. 85.0% min. 94.0% min. 98.0% min. 99.0% (m/m) min. 99.0% min. 99.00% min. 99.3%(w/w) min. 99.7% min. 99.8% min. 99.9 wt% mixture of cmi and mi,1.50-1.75% in water,ph:2.0-4.0 mixture of cmi and mi,2.5-3.5% in water,ph:2.5-5.0 mixture of isomers,90% mixture of oligomers,98% mixture of perfluoroadamantane adn perfluoro(1-methyladamantane) mixtures of cob&co2b mn >44% mn 27,000 mn 30% mn 40,000 mn 4000,50%溶液 mn 6,000 mn ca. 6% mn ~300,000 mn ~492 (n≈6) mn ≥71.0%,bet surface area 5~7 m2/g mn~266 mn~3000 mn≥15.1% mn≥4.0%水溶液 mo 56.5% moistened with water, 10% pd basis (based on dry substance) mol wt 15,000-20,000 da mo≥46.3% mo≥50 % mo≥61.1 % mw 130000-200000 mw 2000 da mw 3400 mw ~120,000, mn ~50,000 mw ~25,000 20.0 wt% in thf 溶液 mw ~280,000 mw ~35,000 10 wt% in thf溶液 mw ~45,000 20.0 wt% in thf 溶液 mw ~65,000 15.0 wt% in thf溶液 mw ~80,000 15.0 wt% in thf溶液 mw-25000 mw<5000 mw=5000 mw~1000 mw~38,000;甲基丙烯酸羟乙酯 10mol% mw~48,000, mn~15,000 mw~55,000, mn~20,000 n 8% n>32.5 %, d50=5.0μm na2o:18.7-23.4% nacl含量: ≥99%, 近球形 nanoparticles, dispersion, in h2o nanopowder, <100 nm particle size (laser psa), 99.8% trace metals basis nanopowder, <100 nm particle size (bet), >97% trace metals basis nanopowder, <200 nm particle size (bet), >99% nanopowder, 21 nm primary particle size (tem) , ≥99.5% trace metals basis nco content ~30%, 粘度~200mpa·s(25℃) nd2o3/treo≥99.5%,treo≥44% nd: 28-34% ni 61% ni:8% ni≥180g/l nominally 75% in ethanol n≈100 n≈15 n≈40 os 38.7% os 38.7%最低 os 42.5% os 83% p2o5: 30-42% p2o5≥30% p2o5≥60% pb ≥82% pb:59.35~61.36% pb≥26.7% pd 23.9% pd 44.8% pd ≥20.5% pd ≥44% pd ≥85% peh-15 peh-3 peh-6 ph eur ph. eur.,bp,usp,99-100.5% ph. eur. ph值:5.0~7.0, 浊点:70~85℃ pieces, 3-6 mm, 99.9% trace metals basis (excluding na) powder, <5 μm powder, 60 mesh, 99% powder, 99.5% metals basis powder,1-2 μm,99% powder ppg-2000do proclin 8020 防腐剂 protease substrate pt >99.9% metals basis, ≤20 μm pt 34.0% pt 50.5% pt 59.0% pt 65% pt basis ≥73% pt ≥57% pt ≥64.5% pt,18.02% pt≥18% pt≥43.4% purified by redistillation,≥99.5% puriss. p.a., acs reagent, reag. iso, reag. ph. eur., ≥99.5% puriss., ≥99% purum, 98.0%(hplc),粉末,红棕色 purum, ≥98.0% (tlc) re: 80g/l reagent grade, co 43.0 - 47.0 % reagent grade,98.0% red(hematite)(99.8%-fe) research grade, 99 atom % 13c rh 17.1% rh 18.5 - 21.3% rh 21% rh 21.3% rh 27.5% rh 30% min rh ≥23.3% ru 1.5% w/v ru 10% ru 29% min ru 31.3% ru 35.8-36.1% ru 5% ru>44% sio2,44-47% sn≥17% sn≥42% sn≥46% sn≥57% solution complete solution incomplete spectrophotometric grade, ≥99% spectrophotometric grade stabilized with bht 1 % w/w standard for gc, >99.5% standard for gc, 99.9% (gc) standard for gc, 99.9% standard for gc, ≥99.5% (gc) standard for gc, ≥99.9% (gc) standard for gc, ≥99.9% standard for gc,≥99.5%(gc,stabilized with 1000ppm mehq) standard for gc,≥99.5% statsafe 6000 sublimed,>99% suitable for fluorescence, ≥75% (hplc) t-98% tech. 80% tech. 85% technical grade, 70% technical grade, 75% technical grade, 80 % technical grade, 80% technical grade, 85 % technical grade, 90% technical grade,90% technical, 0.5-1.5 m in diethylene glycol diethyl ether technical, 90 % technical, ≥80% technical, ≥85% (gc) ,含铜屑稳定剂 technical, ≥90% (gc,mixture of isomers) technical,75% technical,85 % technical,90 % sum of enantiomers technical,90 % technical,90%,ee 99% technical,≥85% technical,≥90 % tetraacrylate≥80%, 含有稳定剂mehq tfa salt, 98% tfa salt, ≥94% ticl3:76.0-78.5% ulc-ms,0.04% in water ulc-ms,0.1% in acetonitrile ulc-ms,0.3% in water ultra dry ultra pure,99.0% usp,ep usp,ph eur usp级,cross-linked,粉末 v/v viscosity 1.4dl/g v≥50% (mixture of ⅲ&ⅴ) w(k2cro4)=20g/l w(k2cro4)=40g/l white granular, viscosity:0.8-0.83 dl/g with indicator, 10-20 mesh wo3≥85% zn 10-12%,200目 zn 10-12%,325目 zn 10-12% zn: 15% zn: 19%-22% zno≥61%, cro3≥19% zn≥ 35.5% zr, 40.4-43.3% gravimetric zro2≥20% ~0.5 m in 2-methyltetrahydrofuran, 95.0% ~100 μg/ml in ethanol, 97% ~13% in water ~17% aromatics basis ~2 m in 1-methyl-2-pyrrolidinone ~20% in h2o ~200 mesh, 99% ~30% in h2o ~40% active ingredients in h2o ~40% in h2o ~5% in h2o ~50% in h2o ~70% in h2o ~75%(al) ~85% (kt) α-phase≥90%,-325 mesh α型, 99.9% metals basis, d50: 1.5-3.5μm α相, 99.9% metals basis, 40nm α相,99.9% metals basis,100nm α相,99.9% metals basis,200nm α相,99.9% metals basis β-phase,95%,1-3μm β型, 99.9% metals basis β相, 99.9% metals basis, d50=500nm β相,99.9% metals basis,200nm β相,99.9% metals basis φ4mm-6mm, 干燥剂用 φ5mm 高2.5mm 圆柱体,ge≥99.999% −60 mesh ≤10% water ≤100nm, 99% metals basis ≤20mm, 99.9% (reo) ≤3% water ≤500 nm, 99.9% metals basis ≤65μm,分散在水中 ≥ 98% ≥100u/mg ≥18% na (as na2o) basis, ≥60% si (as sio2) basis, powder ≥20.0% in thf ≥200 mesh particle size ≥28% nh3 in h2o,电子级 ≥29% ti (as tio2) basis, technical ≥300g/l in water ≥37% ru basis ≥40% zro2 basis ≥40%,含菜油甾醇乙酸酯 ≥40.0% ≥400 mesh particle size, ≥97.5% ≥400 u/mg ≥400目 ≥45%(e) ≥50% h4p207 basis ≥50% ≥50.0% pt basis ≥52% ≥55%(hplc) ≥57% ≥60%(gc) ≥62%(gc), 顺反混合物, 含≤38%的3-氯-1-丁烯 ≥64% ≥65%(gc) ≥65%(hplc) ≥65%,含有异构体 ≥69% ≥70%,α-和β-位的混和物 ≥72% ≥75%(gc) ≥75%(hplc) ≥75% ≥85%(gc)(n) ≥85%(hplc)(t) ≥85%(hplc) ≥85%(t)(hplc) ≥85%, 粉末 ≥85%,nmr ≥85.0%(gc) ≥87% ≥88%,顺反异构体混和物 ≥88% ≥89%(gc) ≥90% (gc) ≥90% (hplc),用于荧光分析 ≥90%(gc,stabilized with 1%na2co3) ≥90%, contains 900-1100 ppm mehq as inhibitor ≥90%, stabilized with mehq ≥90%,gc ≥90%,n=9 ≥90.0%(gc) ≥90.0%(hplc)(qnmr) ≥90.0%(qnmr) ≥90.0%,顺反异构体混和物 ≥90.0% ≥92%(gc) ≥92%,80-150目,中性 ≥92%,80-150目,碱性 ≥92%,80-150目,酸性 ≥93.0%(qnmr) ≥94%(t) ≥94.0%(gc) ≥95% (gc) ≥95% (oligomer purity) ≥95% ,异构体混合物 ≥95%(gc&t) ≥95%(hg) ≥95%(hpce) ≥95%(hplc)(n) ≥95%(hplc)(t) ≥95%(lc) ≥95%(t)(n) ≥95%(t),非对映异构体混合物 ≥95%(titration) ≥95%(含有部分二盐酸盐) ≥95%, 1250-2500目 ≥95%, 3500-5000目 ≥95%, 400-800目 ≥95%, mixture of isomers ≥95%, stabilized with mehq ≥95%, stabilized, fg ≥95%, 异构体混合物(主要以反式形式存在) ≥95%,≥250g/l in water ≥95.0% (h-nmr) ≥95.0%(gc),含稳定剂氢氧化钾 ≥95.0%(qnmr) ≥96%(gc)(t) ≥96%(hplc)(t) ≥96%(lc) ≥96%(t) ≥96%, mw11.0 w,st:bma=4:1 ≥96%, mw~10.0w,st:bma=1:1 ≥96%, mw~20.0w,n(st) : n(bma) = 4:1 ≥96%, mw~8.5w,n(st) : n(bma) = 1:1 ≥96%, mw~8.5w,n(st) : n(bma) = 4:1 ≥96%, n≤0.0005% ≥96.0% (hplc) ≥96.0%(t) ≥96.0% ≥96.5% (hplc); 97% ≥97%(enaymatic) ≥97%(gc&n) ≥97%(gc&t) ≥97%(gc), stabilized with 2.5% k2co3 ≥97%(gc), stabilized with tbc ≥97%(gc), 含稳定剂koh ≥97%(gc/ch) ≥97%(hplc)(n) ≥97%(nt) ≥97%(pure) ≥97%(qnmr), 含稳定剂mehq ≥97%(stabilized with tbc) ≥97%(t), hplc标记用 ≥97%, stabilized with mehq ≥97%, 异构体混合物 ≥97%, 用于昆虫细胞培养 ≥97%,<50nm(bet),粉末 ≥97%,hplc ≥97.0% (calc. based on dry substance, nt) ≥97.0% (tlc) ≥97.0%(gc)(qnmr) ≥97.0%(rt) ≥97.5% (hplc) ≥98 atom % d, ≥98%(cp) ≥98 atom %, ≥95%(cp) ≥98 atom% d ≥98% (gc), ~10 mg/ml in methanol ≥98% (mixture of regioisomers) ≥98% sum of enantiomers ≥98%(gc)(n) ≥98%(gc), 顺反异构体混合物 ≥98%(hplc)(t ≥98%(hplc), 用于生化研究 ≥98%(mixture of isomers) ≥98%(mixture) ≥98%(nmr) ≥98%(sum of enantiomers) ≥98%(t)(gc) ≥98%(t), 用于生化研究 ≥98%, 99%e.e. ≥98%, hplc ≥98%, hplc标记用 ≥98%, hplc用 ≥98%, lc-ms用离子对试剂 ≥98%, mixtures ≥98%, powder, ~180 mesh ≥98%, powder, ~325 mesh ≥98%, powder, ~80 mesh ≥98%, 含0.01%柠檬酸稳定剂 ≥98%, 异构体混合物 ≥98%,hplc ≥98%,pellets(anhydrous) ≥98%,异构体混合物 ≥98%,白色 ≥98.0% (at) ≥98.0% (gc) ≥98.0%(gc)(qnmr) ≥98.0%(gc),mixture of isomers ≥98.0%(hplc)(qnmr) ≥98.5% (nmr); 99% ≥98.5%(hplc) ≥98.5%, 200-400nm ≥99 atom % d, ≥99%(cp) ≥99 atom% d, ≥99% ≥99% (sum of isomers) ≥99% metals basis, powder, ≤3μm ≥99% metals basis ≥99%(75% in ethyl acetate solution) ≥99%(gc)(t) ≥99%, -325 mesh ≥99%, 200-300目 ≥99%, d50≤10μm ≥99%, ph(50g/l, h2o, 20°c): 4-5 ≥99%, ≤1μm(fsss) ≥99%, ≥96%e.e. ≥99%, 升华提纯 ≥99%, 同分异构体混合物 ≥99%, 无水级, 同分异构体混合物 ≥99%, 用于gc衍生化 ≥99%, 用于合成 ≥99%, 蓖麻油裂解制取 ≥99%,300目 ≥99%,含200ppm mehq稳定剂 ≥99%,含50 - 100 ppm bht 稳定剂 ≥99%,水分≤0.3%,d50≤3μm ≥99%,用于合成 ≥99%,粒度:>10um,白色粉末 ≥99.0% (sum of enantiomers, gc) ≥99.0%(hplc) ≥99.0%(t)(hplc) ≥99.5 % ≥99.5% (4 times purification) ≥99.5% (metals basis) ≥99.5% trace metals basis,20-80nm ≥99.5% trace metals basis,平均粒径25 nm ≥99.5%(hplc) ≥99.5%(电子级) ≥99.5%, 1250目 ≥99.5%, 2500目 ≥99.5%, 5000目 ≥99.5%, 98 atom % d ≥99.5%, d50≈6μm ≥99.5%, ≤50nm ≥99.5%, 升华提纯 ≥99.5%, 用于有机电子 ≥99.5%, 直径: 0.38mm ≥99.5%, 直径: 0.6mm ≥99.5%, 直径: 1mm ≥99.5%, 直径: 2mm ≥99.5%,100nm ≥99.5%,gc ≥99.5%,适用于植物细胞培养 ≥99.5(gc),含0.01% koh稳定剂 ≥99.6% trace metals basis,-10目 ≥99.7 wt.% ≥99.7% metals basis, α相, d50≈45μm ≥99.7% ≥99.9% metals basis,excludes ~1% zirconium ≥99.9% trace metals basis, water≤1% ≥99.9% trace metals basis,<250 nm particle size (tem), 粉末 ≥99.9%, 直径: 5mm ≥99.9%,粒径:≥1 μm,孔径:6-10 nm,总孔容:≥0.6 cm³/g,比表面积(bet):≥500 m²/g ≥99.9%,粒径≤0.2 μm,孔径:≥4.0 nm,总孔容≥0.7 cm³/g,比表面积(bet):≥500 m²/g ≥99.95% metals basis ≥99.95% trace metals basis, loss on drying≤0.5% ≥99.98% metals basis ≥99.98% ≥99.99 % ≥99.99% metals basis, fe,cu,pb,zn,ni,mg,mn,cd,al各≤1ppm, ca≤5ppm, 硫酸根≤20ppm ≥99.99% metals basis,200目 ≥99.99% metals basis,99.7-100.5% dry basis ≥99.999% metals basis,28% in h2o ≥99.999% metals basis,粒径:1-6mm ≥99.999%(metals basis) ≥99.9995% metals basis 丙酮离子≥60% 丰度:98atom%;化学纯度:≥98.5% 乙烯含量:53%;enb:4.0% 乙烯含量:55%;enb:9.5% 乙烯含量:60%;enb:7.8% 乙烯含量:68%;enb:5.7% 乙烯含量:69%;enb:4.5% 乙烯含量:72%;enb:4% 乳化型, 99%(mixtures) 二氧化硅:38.0%~42.0% 二氧化硅含量:29%~31% 二氧化钛:17wt% 溶剂:水 二聚,三聚和四聚甘油 ≥75 w/%,七聚甘油以上 ≤10w/% 亲水,比表面积:150 m2/g 亲油性 介孔,粒径:0.5μm, 孔径:2nm 介孔,粒径:1μm, 孔径:4nm 介质: h3po4(cp) 从紫胶所得 优级试剂 , 适用于分析, acs, iso, reag. ph eur 优级试剂 , 适用于分析, acs,reag. ph eur 优级试剂, 70% 优级试剂, 97% 优级试剂, 99.7% 优级试剂, ≥60% 优级试剂, ≥85 wt. % in h2o 优级试剂, ≥90% 优级试剂, ≥99.0%(gc),用于测定醛 优级试剂, ≥99.0%(t) 优级试剂, ≥99.5%(gc) 优级试剂, ≥99.5%(rt) 优级试剂, ≥99.8% 优级试剂,99.8% 元素分析仪专用 光玻级,99.99% metals basis 光致抗蚀剂级,99% 光谱级, ≥99.5% 光谱纯, 99.9% 光谱纯,99%(gc) 冶金级,99.95% metals basis 分子生物学级,≥99 % 分子量1000 分子量2000 分子量3000 分子量:10-20万 分子量:150-250万 分子量:20-40万 分子量:40-80万 分子量:80-150万 分子量~3000 分子量~4000 分析对照品, 97%(含水约40%) (单位重量以湿重计) 分析对照品, hplc≥98% 分析对照品, standard for gc, 99.5% 分析对照品, ≥99%(gc) 分析对照品, ≥99%(hplc) 分析对照品, ≥99.5% 分析对照品, ≥99.6%(hplc) 分析对照品,>99.7% 分析对照品,99.95% 分析对照品,≥99.5%(gc) 分析对照品,≥99.8%(gc) 分析对照品,混合物 分析标准品,1000μg/ml甲醇溶液 分析标准品,99.93% 分析标准品,99.95% 分析滴定液,2.0m 分析滴定液,4.0m 分析滴定液,8.0m 制备色谱级, 99.5% 制备色谱级,99.8% 助滤剂 包含 200 ppm naoh 稳定剂, 97% 包含 200 ppm naoh 稳定剂, 99% 包含 200 ppm naoh 稳定剂, 99.9% 包含50-185 ppm mehq稳定剂, 98% 包含有200 ppm mehq阻聚剂, 99% 医用研究级,白色 医用研究级,红色 医药级(usp/ep/bp/jp/cp) 医药级, ph. eur..bp, chp, jp, usp 十二水合物, 99%(sum of mixtures) 升华, 99.9% (reo) 升华提纯, 98.0%(t) 升华树枝状, 99.9% (reo) 合成洗涤剂助洗剂用 含10%淫羊藿苷 含固量:40±2% 含有部分滑石粉 含量(h3po4):105% 含量(h3po4):115% 含量(p2o5)% ≥85% 含量52.5~56.5 含量测定 含铂量:27% 四方相, 100-350nm, 99wt% 固含量(以氧化铝计)10% 固含量(以氧化铝计)15% 固含量(以氧化铝计)20% 固含量(以氧化铝计)25% 固含量: 98% 固含量:95% 固含量:99% 固含量~70% 固含量≥99% 块状,99.9% metals basis 型号: p-df-03-ls 型号:6501(1:1) 基质:sio2,表面基团:-epoxy,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-nh2,粒径:3-4μm,单位10mg/ml 基质:sio2,表面基团:-nh2,粒径:4-5μm,单位10mg/ml 基质:sio2,表面基团:-sioh,粒径:0.1-1μm,单位:5mg/1ml 基质:sio2,表面基团:-sioh,粒径:0.1-1μm,单位:5mg/ml 基质:uf,表面基团:-cooh,粒径:1-2μm,单位:10mg/ml 基质:uf,表面基团:-epoxy,粒径:1-2μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:1-2μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:2-3μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:3-4μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:5-7μm,单位:10mg/ml 天然来源,≥98% 天然矿物,晶粒,大约 0.06-19in 孔间距:65±10nm直径13mm 季铵盐含量:≥45% 容量法,0.1000mol/l(0.1n) 对照品,99.8% 尺寸:2-3nm,浓度:0.2mg/ml 工业用 工业级, 98% 工业级, 以cu计54-56% 平均分子量 ~400 平均分子量2000, 含~300 ppm mehq 平均分子量4000, 含~300 ppm mehq 平均分子量~500, 含900 ppm mehq作稳定剂 平均粒径:300-600nm 异构体混合物, 40 wt. % in h2o 异构体混合物,80% 异构体混合物,97% 异构体混合物,99% 异构体混合物 异构体的混和物 总胺值(mg koh/g): 115±4 总胺值(mg koh/g): 40±2 总胺值(mg koh/g): 49±2 总胺值(mg koh/g): 60±3 总胺值(mg koh/g): 79±3 总胺值(mg koh/g):173~183 总胺值:178-188mgkoh/g, 酸值<10mgkoh/g 总胺值mgkoh/g 18~22,叔胺值mgkoh/g 18~22 总胺值mgkoh/g 28~32,叔胺值mgkoh/g 28~32 总胺值mgkoh/g 44~50,叔胺值mgkoh/g 44~50 总胺值mgkoh/g 50~60,叔胺值mgkoh/g 50-60 总胺值mgkoh/g 75~85,叔胺值mgkoh/g 75~85 总酰胺:375-450 mg/g 技术级90% 摩擦片专用,97%,1250目 无孔,粒径:1μm 无孔,粒径:500nm 无孔,粒径:50μm 无定型, 2-6mm (0.08-0.2in),99.999% (metals basis) 无定形, 0.5-2μm, 99.9% 无定形,<5μm,98% 无定形,99%,粒径(d50) 10-20um 无水 99.9%(reo) 无水, 99.95% 无水, 99.99% metal basis 无水, 99.995% metals basis 无水, 99.995% 无水, ≥98% 无水, 粉末, 99.5% metals basis 无水, 粉末, 99.9% 无水, 粉末, 99.95% metals basis 无水, 粉末, 99.999% metals basis 无水, 粉末, ≥99.9% 无水, 粉末, ≥99.99% metals basis 无水,-10目,99.99% trace metals basis 无水,99.5% metals basis 无水,99.999% metals basis 无水,99.999% 无水,acs,≥98% 无水,≥98% 无水,≥99% 无水,片状,99.9% metals basis 无水,粉末,99.9% trace metals basis 无水,粉末,99.99% metals basis 无水,鳞片, 99.99% metals basis 无水级, 99.99% trace metals basis 无水级, acs, ≥99% 无水级, ≥99% 无水级,acs试剂, ≥99% 无水级,reagent plus, ≥99% 无水级,≥99.9%,含50ppm bht 抑制剂 无水草酸钙,99% 昆虫细胞培养级, ≥99% 晶体, aps ≈100nm, 99%, 等离子合成 晶状, -4+40 目,99.9999% (metals basis) 有效氧: 9-11% 来源于细菌 染料含量: 80% 树脂专用 植物细胞培养级, ≥98% 植物细胞培养级,≥99.5% 模数:2.3-2.5 母液, 4.00mg/ml 比表面积10-15m2/g,粒度20nm-100nm,99.9% 比表面积3-8m2/g,粒度80nm,99.9% 氮≥19.5 % 沉淀碳酸钙, 欧洲药典 沸程80-120°c, 水分<50ppm 油状50% 活性物: 50%, 主要溶剂: 烷烃 活性物: 70%, 主要溶剂: 异丁醇 活性物: 70%, 主要溶剂: 甲醇 活性组分(以pbtca计): ≥30% 浊点:17~21°c, ph值:5.0~7.0 浊点:21~26°c, ph值:5.0~7.0 浊点:45~55°c, ph值:5.0~7.0 浊点:57~61°c, ph值:5.0~7.0 浊点:≥95°c, ph值:5.0~7.0 浓度:1mg/ml溶剂:水稳定剂:lioh 浓度范围:0.124±0.008mg/l 涂料专用型,98.5%,6000目 混合异构体, 60%间位, 40%对位, mw 160,000-220,000 混合物,含有部分ni单质 混合物,黄腐酸fa ≥60% 溶剂:水 滴熔点142,中粒径25μm 照相一级 熔融指数: ≥1.0g/10min 环保试剂,96% 环氧值: 0.65~0.70eq/100g 环氧值: 0.74-0.78 eq/100g, 粘度:10-25 mpa.s 环氧值eq/100g:0.70 环氧当量: 125-145 环氧当量:160-180 g/eq 环氧当量:540-580 玻璃钢专用 珠子, 98% 生物制剂,适用于细胞培养,适用于昆虫细胞培养 生物基含量33%-100% 生物技术级,≥99% 生物技术级,≥99.9% 生物技术级 用于gc衍生化, 98.0% 用于gc衍生化, ≥99.0% (gc) 用于gc衍生化,99% 用于hplc,2.0 mol/l in h2o 用于hplc衍生化, ≥99.0%(t) 用于分子生物学,99.0%(t) 用于分子生物学,≥99.5%(gc) 用于分子生物学,≥99.5% 用于基准化研究, 99.8% 用于基准化研究, 99.9% 用于基准化研究, 99.99% 用于昆虫细胞培养,用于植物细胞培养, 96.0% 用于植物细胞培养,99.5% 用于电池,粒度:7-10um,99.9% metals basis 用于组氨酸甲基化 用于细胞与昆虫细胞培养,≥99.0%(t) 用于细胞和昆虫细胞培养, 81-83% as moo3 用于细胞和昆虫细胞培养,≥99%(t) 用于荧光分析,99.7% 用于药物研究, ≥98%(gc) 用于萃取分析, 优级试剂, acs,reag. ph eur 用于蛋白质分离,层析 电子mos级 电子级, 99.9% metals basis 电子级,0.5~1um,99.5% 电子级,99.9% 电子级,99.98% metals basis 电子级,99.999% metals basis,钠除外 电子级 电子陶瓷专用 电池级, 99.4%, water≤200 ppm 电池级, 99.8%, water≤50 ppm 电池级, 99.99%, water≤50 ppm 电池级,99.9% 电泳专用级 电泳级,≥99% 电镀级,99% 白色,al2o3≥30% 皂化值:160-170 mgkoh/g 皂化值:84-94mgkoh/g, hlb值:13-14 皂化值mgkoh/g:235~245 盐水溶液 直径:0.1-0.3μm, 长度:3-5μm 直径:0.1-0.5μm, 长度:10-50μm 直径:0.2-0.5μm, 长度:5-15μm 直径:0.2-0.7μm,长度:10-35μm 直径:1.0mm, 退火, 99.9995% metals basis 直径:20-100nm, 长度:≈1μm 直径:3-5μm, 长度:10-30μm 直径:80-150nm, 长度:0.5-8μm 着色强度:100% 石化用芳烃油脱烯烃吸附剂, 圆柱体 石化用芳烃油脱烯烃吸附剂, 圆球形 石油催化剂专用 硬脂酸和棕榈酸:≥ 90.0% 硬脂酸和甲基丙烯酸十六酯的混合物,含有mehq作为抑制剂 碱性, 二氧化硅含量 : 30%, 平均粒径: 100nm, 氧化钠含量<0.1wt% 碱性, 二氧化硅含量 : 30%, 平均粒径: 100nm, 氧化钠含量<0.5wt% 碲粒 2-3mm 99.999% 碳含量:43-48% 碳含量:61-67% 磷含量: 23%-24% 离子对色谱专用,≥99.0% 筹码专用,98%,3000目 粉末, <5μm, ≥99.5% metals basis 粉末, 98% 粉末, 99.99% metals basis 粉末, ≤45μm, ≥99.5% metals basis 粉末, ≥99.9% metals basis 粉末,99.5% 粉末,99.99% metals basis,-200目 粉末,99.99% metals basis,-325目 粉末,99.99% metals basis,100目 粉末,99.99% metals basis 粉煤灰活化剂用 粒度 6~10μm,防腐级 粒度:2-20μm 粒径1.5-5μm 粒径: 8-12μm 粒径:0.7±0.15μm 粒径:100nm~3.5μm,机械化学法 粒径:50nm 粒径≤50μm 粒状,1-4mm,99.999% metals basis 粘度: 40-80 cps 粘度:130-180 mpa.s 粘度:300-800 mpa.s(25℃), 环氧当量:125-173 gm/eq 粘度:600-1200mpa.s(25℃),环氧当量:150-180 g/mol 粘度:~300 cps,环氧当量:95-115 gm/eq 红外分析用,99% 约12.5%于四氢呋喃中, 约1.5mol/l 约13%于四氢呋喃中, 约2mol/l 约15%于己烷中 约16.5%于n,n-二甲基甲酰胺中, 约2mol/l 约20%于水中 约63%于异丙醇中 约70%的水溶液 纯度标准物质100.00%±0.02% 纯度标准物质99.96%±0.02% 纳米粉末<50纳米粒径(tem) 纳米粉末, <50nm 粒径 (bet), 99% trace metals basis 纳米粉末, 粒径<150nm(bet) 纳米粉末,≤100nm粒径(bet),≥99% trace metals basis 纳米纤维,d<2.5μm,l/d≥20,98% trace metals basis 细胞培养级, 99% 细胞培养级, ≥98% 细胞培养级,98-101% 结晶, aps ≤50nm, 98%, 气相激光合成 结晶, 医药级, ph.eur.,bp,usp 羟值(mg koh/g):133~148 羟值(mg koh/g):23.0-25.0 羟值: 35-50 mgkoh/g 羟值mgkoh/g:28±3 羟值mgkoh/g:40±4 羟值mgkoh/g:52±6 羟值mgkoh/g:67±5 羟值mgkoh/g:≤15,皂化值mgkoh/g:180~190 羟值≤4 mgkoh/g 羟基值54-62 mg koh/g 耐火材料粘结剂用 聚乙二醇分子量:2000 聚乙二醇分子量:3400 脱色率≥90 %, 活性度≥180 h+mmol/kg, 水分≤10 % 脱色率≥90%, 比表面积≥180 m2/g, 水分≤3.0 %, 颗粒平均抗压力≥1 n, 抗水型 脱色率≥90%, 比表面积≥180 m2/g, 水分≤5.0 %, 颗粒平均抗压力≥1 n, 脱氮型 脱色率≥90%, 比表面积≥180 m2/g, 水分≤5.0%, 颗粒平均抗压力≥0.7 n 脱色率≥90%, 比表面积≥300 m2/g, 水分≤8.0%, 颗粒平均抗压力≥1 n 脱色率≥92 %, 活性度≥100 h+mmol/kg, 水分≤12 % 脱色率≥98% 色谱级, 99.9%, carbonyl≤0.005% 色谱级, ≥99.9%, 含有0.10 % (v/v) 甲酸 色谱级, ≥99.9% 苛性比≥1.3, fe≤15ppm 苛性比≥1.35 苯酚含量:40-60% 荧光粉专用 荧光级,>97%(hplc) 荧光级 药用级,99.5% 药用级,≥99.5%(gc) 药用级 药用试剂级 蒸馏枝形片状 99.95% metals basis 蒸馏树枝状, 99.9% (reo) 蒸馏纯化,≥99.5% 试剂级, >98.0%(gc) 试剂级, >98.5%(gc) 试剂级, >99.0%(t) 试剂级, 10-15ppm tbc as stabilizer 试剂级, 100nm 试剂级, 2000目 试剂级, 3% in h2o 试剂级, 325目, 白色 试剂级, 36% 试剂级, 40% 试剂级, 40-45% mgo basis 试剂级, 49% 试剂级, 5% in h2o 试剂级, 54-57% cu basis 试剂级, 55.3% sno2 试剂级, 57.5% 试剂级, 60% 试剂级, 65% 试剂级, 75 wt. % in h2o 试剂级, 77% 试剂级, 85 wt. % in h2o 试剂级, 85-90% 试剂级, 85.0% 试剂级, 90%(contains acetic acid) 试剂级, 90.0% 试剂级, 92% 试剂级, 93% 试剂级, 96.5% 试剂级, 97.0%(gc) 试剂级, 98.5%(mixture of isomers) 试剂级, 99 % 试剂级, 99% (titration) 试剂级, 99%,含10ppm bht稳定剂 试剂级, 99.00% 试剂级, 99.5% metals basis 试剂级, 99.5%,低温煅烧 试剂级, 99.5%,粉末 试剂级, 99.9% 试剂级, co 13.5~14.5% 试剂级, cr≈32% 试剂级, fe 21-23 % 试剂级, fe 21-23% 试剂级, mg 4.0-5.0% 试剂级, mg≈14% 试剂级, mn >47% 试剂级, pd 46.0 - 48.0 % 试剂级, pt ≥37.5% 试剂级, ratio(mgo/al2o3)=3-1,含水率:≤8.5% (100℃,1h) 试剂级, so2≥6% 试剂级, ≥ 44.0% 试剂级, ≥47.0%,含≤1.5 % h3po2 稳定剂 试剂级, ≥60% 试剂级, ≥80%,gc 试剂级, ≥85.0% moo3 basis 试剂级, ≥98.0% 试剂级, ≥98.5 %(gc) 试剂级, ≥99.0%(rt) 试剂级, ≥99.5%(gc) 试剂级, ≥99.5%,200目 试剂级, 含0.025% bht 稳定剂 试剂级, 含~75 ppm bht稳定剂 试剂级, 块状 试剂级, 模数:2.00-2.20 试剂级, 模数:2.30-2.50 试剂级, 模数:2.80-3.00 试剂级, 模数:3.10-3.40 试剂级, 白色粉末 试剂级, 硅改性 试剂级, 硝酸法 试剂级, 硫酸铝法 试剂级, 碳化法 试剂级, 磷改性 试剂级, 镧改性 试剂级,1μm 试剂级,ir>52% 负载于二氧化硅-氧化铝, ni: 61-71% 超干, 99.9% (reo) 超干, 99.9% metals basis 超干, 99.998% metals basis 超干,99.995% metals basis 超干级, 99%metals basis 超干级, 99.9% (reo) 超干级, 99.99%metals basis 超干级, 99.999% metals basis 超干级,99.99% metals basis 超灵敏,用于 elisa 超纯生物试剂级,2m in h2o 超纯级, ≥99.0%(kt) 超纯级,99% 超纯级,99.5%(gc) 软型,直链异构体的混和物 轻质,99% 适用于hplc,99.0-101.0% 适用于maldi-ms,50%acn+47.5%h2o+2.5%tfa 适用于发光,超纯生物试剂级,≥99.5%(gc) 适用于电化学分析,≥99.0% 适用于荧光, ≥90%(hplc) 通常92%, 溶于2-二乙基己酸 造影级 酐:90%酸:10% 酰胺含量:≥95% 酸值(mg koh/g) ≤0.5, 皂化值(mg koh/g): 325~360 酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 100~130 酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 85~105 酸值mgkoh/g ≤10,皂化值mgkoh/g 120~140 酸值mgkoh/g ≤10,皂化值mgkoh/g 212~222 酸性, 二氧化硅含量 : 30%, 平均粒径: 100nm, 氧化钠含量<0.1wt% 酸性, 二氧化硅含量:20 %-30 % 重蒸馏, ≥99.5% 重蒸馏,≥99.5% 金黄色,al2o3≥30% 钻井液和完井液助剂用 铂含量,>99.9%,粒径10 nm 铂含量:52.0% 铑含量(wt%) ,5% 铝含量:38%-41% 铱含量:43.0% 铱含量≥39% 锑含量≥60% 锭, 99.9% metals basis,,液体石蜡保存 锭, 99.9% metals basis 锭, 存放于油中,99.9% metals basis 锭,99.5% 镀膜级,99.99% metals basis,3.5-5 mm 镀膜级,颗粒,99.9% metals basis 镁含量:57% 镍 45.0 - 52.5 % 闪烁纯,99% 阴离子型,1800万分子量,水解度:20-30% 阴离子型,1800万分子量,水解度:5-17% 阴离子型,2500-3000万分子量,水解度:5-17% 非离子剂, 酸值<5.5mgkoh/g 非离子剂 非离子型,分子量:1600万 非离子型,分子量:1800万 非离子型,分子量:2000万 顺反异构体混和物 饱和水溶液 饱和溶液 馏程: 161-179 °c 馏程: 186-202 °c 馏程: 270-311 °c 高纯级,>99.5%(gc) 高纯级 黄腐酸fa ≥90%