全部 麦克林(Macklin) 源叶 Aladdin/阿拉丁

全部 100mg 1g 250mg 5g 25g 500mg 100g 500g 2.5kg 10g 50mg 200mg 1ml 25mg 5mg 5ml 100ml 25ml 10kg 500ml 2.5l 10mg 1mg 1l 20mg 1.2ml 10l 12x500g 250g 50g 1kg 2g 5kg 50ml 12x500ml 250ml 5l 25kg 10ml 800ml 2ml 0.5g 20x500g 20kg 4l 2.5g 25l 200μl 25×25mm 2mg 0.25g 20ml 0.2ml 0.6ml 10x0.6ml 12×500ml 100μg 2.5mg 50mm 0.5ml 10x0.5ml 12×500g 5*500g 200g 1个 2kg 400g 0.1g 0.5mg 100cm 25cm 20g 100μl 20l 1ea 2cm 300mg 50×50mm 500g*20 500μg 500μl 5m 0.1ml 250μl 0.25ml 0.55ml 10x0.55ml 10x1g 10x0.75ml 10×100μl 10×10cm 10×1ml 1000mg 6x500g 150g 170g 158g 176g 15kg 5x1g 6×250g 20×500g 75g 80g 85g 90g 500g*5 700g 800g 30g 125mg 5x100mg 4×5l 12×100ml 6×1l 12ml 200ml 20x500ml 2l 400ml 4×25ml 100ug 50ug 100x100mm 500ug 10mm2/ea 10m 250m 50m 10x20cm 10x5g 10μg 110g 114g 46g 4×1kg 4×2.5kg 15g 15ml 160mm 1cm 250 mg 25x1g 52g 1ku 200u 5ku 4x4l 1m 250cm 25m 50cm 3m 2.5ml 2.5m 20×50ml 200μg 25μg 26g 60g 70g 95g 2x1ml 30mg 450g 5cm 50μg 5μg 90x90mm

全部 98% 97% 95% ≥95% 99% ≥98% ≥97% 96% ≥98%(gc) 90% ≥99% ≥97%(gc) ≥98%(hplc) 99.5% 10mm in dmso ≥96% ≥95%(gc) 99.99% metals basis 99.9% metals basis ≥98%(t) 99.9% 97%(hplc) >98.0%(gc) ≥98%,99%e.e. ≥98.0% 试剂级, 98% 98%(gc) ≥99%(gc) ≥90% ≥96%(gc) 试剂级, 99% ≥98%(gc)(t) 85% 试剂级 93% 98.0% 80% 94% ≥98%,≥99%e.e. >98% >97% >98%(gc) standard for gc, ≥99.8%(gc) 99.999% metals basis standard for gc, ≥99.5%(gc) ≥97%(hplc) 试剂级, 99.0% 98 atom % d ≥98%(hplc)(t) 99.99% standard for gc, ≥99.7%(gc) >95% standard for gc, ≥99.9%(gc) ≥98%,≥99% e.e. 97%(gc) ≥97%(t) standard for gc, ≥99.6%(gc) ≥90%(gc) 分析对照品,>98% 98%(hplc) 92% >98%(hplc) 98%,ee99% ≥95%(hplc) ≥97.0% 试剂级, 99.5% 99.95% metals basis 95%(gc) 95%(hplc) 98 atom% d br,98% 98%(gc)(t) >99% ar,99% 98%(t) ≥99.5% ≥95%,99%e.e. ar,98% ≥99.99% metals basis 98%,99%e.e. >99.0%(gc) 99.9% trace metals basis ≥98%(hplc)(n) 分析对照品,98% 99%(gc) ≥95%(t) 100 ug/ml in isooctane ≥97%(gc)(t) 98%,99% e.e. ≥93% ≥98.0%(gc) 98% (hplc) 98%(hplc)(t) 97% 99%ee 97%, 99% e.e. acs ≥85% ≥93%(gc) ≥95.0% ≥98%(n) >95.0%(gc) 1.0 m solution in thf, mkseal 100μg/ml in methanol, 不确定度3% 98%, 98 atom % d 99% metals basis 99%,water≤50 ppm (by k.f.), mkseal ≥95%,≥99%e.e. ≥98% (hplc) 试剂级, 97% 0.5 m solution in thf, mkseal 96%(gc) br,99% ≥94%(gc) 优级试剂, 99% >97%(gc) 75% ≥98 % ≥99%(hplc) >97.0%(gc) 97.0% 99.5% metals basis 99.8% 99.9% (reo) ar ≥80% 试剂级, 98.0% >98.0%(t) 98.5% 99.99% trace metals basis ar, ≥99% ≥94% ≥96%(hplc) 70% 90%(gc) 99 atom % d ≥99.5%(gc) 超干级, 99.99% >98.0% 1000μg/ml in methanol, 不确定度2% 98% 99%ee 99.7% 99.995% metals basis sp ≥99%(t) ≥99.0% 分析对照品, ≥98% 化学纯(cp), ≥98% 95% mix tbc as stabilizer 99% trace metals basis 99.8% metals basis analytical standard ≥85%(gc) 试剂级, 95% 99.99% (reo) 99.999% trace metals basis m.w. 2000 ≥92% ≥98%(t)(hplc) ≥99.9% metals basis 分析对照品 试剂级, 98.5% >98%(t) 0.5m in thf 97 % 97%, 99%e.e. 98 atom % d,98% 98%,gc 99.5% trace metals basis 99.999% >98% 优级试剂, 99.5% >97%(hplc) 0.5 m in thf 1000μg/ml in acetonitrile, 不确定度2% 95%(t) ≥97%(hplc)(t) >95%(gc) 100μg/ml in acetonitrile, 不确定度3% 91% 99%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.6% ≥80%(gc) ≥90%(t) ≥95%, mixture of isomers ≥97%,≥99%(ee) ≥99.9% trace metals basis ≧95% 化学纯(cp) 工业级 >98.0%(gc)(t) >98.0%(hplc) >99.5% 10mm in water 98%,顺反混合物 98.0%(gc) 99%(hplc) ≥96.0% ≥98%,99%d.e. 优级试剂 分析标准品 超干级, 99.99% metals basis >99%(gc) 1.0 m in thf 10% in h2o 50% 97%, 99%ee 98%(mixture) 98%, 99%e.e. 99 atom % 13c 99%(t) br,97% br m.w. 5000 ≥70% ≥95%(gc)(t) 丰度:99atom%;化学纯度:≥98.5% 100μg/ml in acetonitrile 40% 50% in h2o 50%水溶液 95%, contains tbc as stabilizer 98%,lc&t 98%,t 99.0% 99.5%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.998% metals basis cp,98% ≥90%(hplc) ≥95.0%(gc) ≥98%(lc) ≥98%, mixture of isomers ≥98.0%(hplc) ≥99.9% 无水, 粉末, 99.99% metals basis 试剂级, 96% 适用于合成 >98%(lc) >99% (hplc) 1.0 m solution in thf,mkseal 1000ug/ml in purge and trap methanol 95% (stabilized with tbc) 95%(nmr) 97%(gc)(t) 97%(t) 97%,99%ee 98 % 98 atom % d, 98%(cp) 98%(n) 98%, 异构体混合物 98%,99%ee >95% cp m.w. 4000 ≥95.0%(hplc) ≥95.0%(t)(hplc) 丰度:10atom%;化学纯度:≥98.5% 分析对照品, ≥99% >95%(hplc) >96%(gc) >96% >96.0%(gc) >98.0%(hplc)(t) 100μg/ml in methanol 10mm in h2o 30% in h2o 90%(hplc) 95%(stabilized with tbc) 98%, mixture of isomers 98%,mixture of isomers 99 atom % 13c 99.995% trace metals basis m.w. 1000 standard for gc,≥99.5%(gc) tech. 90% ≥96%(gc)(t) ≥98 atom % d ≥98%,≥99%(ee) 工业级, ≥90% >90.0%(gc) 0.25 m solution in thf, mkseal 2.0 m solution in thf, mkseal 2mm in dmso 5% in h2o 88% 95%(mixture) 97% mix tbc as stabilizer 98 atom % d, 98% (cp) 98% (tlc) 98%(hplc)(n) 98%(lc) 99.5%,water≤50 ppm (by k.f.), mkseal 99.9% (metals basis) 99.997% metals basis acs, ≥99% ar, ≥98% ≥60% ≥70%(gc) ≥95%(n) ≥96%(t) ≥98 atom % d, ≥98%(cp) ≥98%(lc&n) ≥98.5% 环保级 用于合成 电子up级 符合usp测试规范 药典专用 高纯,98% >90% >95.0%(hplc) 1.0 m in methylene chloride 1000μg/ml in methanol 50% in water 60% 95%,gc 96.0%(gc) 97%, contains tbc as stabilizer 98%(mixture of isomers) 98%(stabilized with mehq) 98%,含稳定剂铜屑 98%,异构体混合物 99%,water≤50 ppm (by k.f.),mkseal 99.9% trace rare earth metals basis 99.98% metals basis acs,≥99.5% br,95% cp,99% mw=2000 ≥75% ≥88%(gc) ≥95%(hplc)(t) ≥95%(stabilized with tbc) ≥95.0%(hplc)(qnmr) ≥97 % ≥97%, mixture of isomers ≥97%, 含bht稳定剂,mixture of isomers ≥98%(lc&t) ≥98%,gc ≥99.95% metals basis 分析对照品, 98% 分析对照品, ≥98%(hplc) 试剂级, 90% 试剂级, 97.0% >94.0%(gc) >95%(t) >95.0%(t) >97.0%(hplc) >98.0%(n) >99%(hplc) >99.5%(gc) 0.5 m solution in thf ,mkseal 2.0 m solution in thf,mkseal 30% in water 65% 70% in h2o 70%水溶液 90%(nmr) 95%,99%e.e. 95%,stabilized with tbc 95.0%(gc) 95.0% 96%(hplc) 97% (hplc) 97%(stabilized with tbc) 97%,异构体混合物 98 atom % d, 98% 98%(stabilized with tbc) 98%,gc&t 98%,water≤50 ppm (by k.f.), mkseal 99.95% ar,98.5% d,99% mw=1000 standard for gc, ≥99%(gc) usp级 ≥50% ≥92%(gc) ≥95% (hplc) ≥97%(lc) ≥97%,≥98%(ee) ≥97.0%(t) ≥98%(gc), 含铜稳定剂 ≥98.0%(t)(hplc) ≥99% metals basis ≥99%(hplc)(t) ≥99.0%(gc) ≥99.9% metals basis(reo) ≥99.9%(gc) 分析对照品, 99% 分析对照品,99.5% 无水, 粉末, 99.9% metals basis 无水,99.9% metals basis 电池级, 99.9%, water≤20 ppm 精馏级, ≥99.5% 试剂级, 99.8% 试剂级, ≥99% 试剂级, ≥99.5% 试剂级,98% 超干级, 99.99%(reo) >98%(gc&t) >98%(hplc)(t) >98%(n) >99.0% (gc) >99.0%(t) 1% in h2o 1.0 m solution in hexanes, mkseal 1.0 m solution in thf ,mkseal 1.0m in thf 100μg/ml in hexane, 不确定度3% 10g/l in h2o 1mol/l in thf 20% in h2o 300-400目 35% 40% in water 50g/l in h2o 60%水溶液 95% (hplc) 95%, mixture of isomers 95%, 异构体混合物 97% average mw5000 97%,含有数量不等的酸酐 98% trace metals basis 98%,lc 98%purity,99%e.e. 98.0% (hplc) 98atom % d, 98% 99%,with molecular sieves, water≤50 ppm (by k.f.),mkseal 99%,含稳定剂mehq 99.9% metals basis,10μm 99.9%(reo) 99.95% trace metals basis 99.98% 99.99% metals basis,200目 99.999% (metals basis) 99.9999% metals basis >97% acs, ≥99.5% ar,99.5% meets usp testing specifications mw=4000 mw=5000 natural reagent grade, 98% reagent grade spectrophotometric grade, 99% standard for gc, ≥99.5% technical grade ≥40% ≥60%(gc) ≥75%(gc) ≥80%(hplc) ≥85%(hplc) ≥95 % ≥95%(lc&t) ≥95%(t)(hplc) ≥97%(n)(t) ≥97.0%(gc) ≥98%(gc&t) ≥98%(n)(t) ≥98%,顺反异构体混合物 ≥98.0 % ≥98.0%(gc)(t) ≥99 % ≥99.0% (gc) ≥99.5% (gc) 优级试剂, 98% 优级试剂, 99.8% 优级试剂, 99.9% 分析对照品, 99%(hplc) 分析对照品, ≥99%(hplc) 分析对照品,99% 无水,99.99% metals basis 无水级, ≥98% 无水级, ≥99% 用于分子生物学, ≥99% 粉末,99.9% metals basis 超干级, 99.99% (reo) 过滤除菌 > 98% >85%(gc) >85.0%(gc) >93%(gc) >96%(hplc) >97%(t) >97.0%(t) >98%(gc)(t) >98%(hplc)(n) >98%(lc&t) >99% (gc) >99.0%(lc) >99.0% >99.5% (gc) 0.5m solution in thf, mkseal 0.5mol/l in thf 0 1.0 m in thf, mkseal 10% (v/v) in h2o 100 μg/ml in acetonitrile 100-200目 1000μg/ml in acetonitrile,不确定度2% 100μg/ml in acetonitrile,不确定度3% 100μg/ml in methanol,不确定度3% 100μg/ml in methanol,不确定度:3% 20 wt. % in h2o 200目 25% in water 2g/l in h2o 40% in h2o 400目 45%水溶液 5.0% pd basis 50 wt. % in h2o 50 wt. % in water 50% w/w 水溶液 70% in water 75-150目 80%(gc) 82% 85%(gc) 89% 90%(mixture) 92%(gc) 93%(gc) 94%(gc) 95 % 95%(gc)(t) 95%(hplc)(t) 95%, stabilized with tbc 95%,mixture of isomers 95%,含有数量不等的酸酐 95%,异构体混合物 95%,顺反混合物 95%混合(tbc作为稳定剂) 95.0% (gc) 96%(t&lc) 96%(t) 96.0% 97 atom % d 97% (stabilized with tbc) 97% average mw10000 97% average mw2000 97%(mixture of isomers) 97%(n) 97%(nmr) 97%, mixture of isomers 97%, stabilized with tbc 97%,gc 97.0% (gc) 97.0% (hplc) 97.0%(gc) 98 atom % d, 95% 98% metals basis 98% mix tbc as stabilizer 98%(cis- and trans- mixture) 98%(gc&t) 98%(stabilized with copper chip) 98%, 99% e.e. 98%, 99%ee 98%, contains tbc as stabilizer 98%, mixture of cis and trans isomers 98%, stabilized with copper chip 98%, stabilized with mehq 98%, stabilized with tbc 98%, 用于合成 98%,lc&n 98%,n 98%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 98%,含不同量的酸酐 98%,顺反异构混合物 98.0 % 99 % 99 atom% ¹³c 99 atom% 13c 99% (gc) 99% mix tbc as stabilizer 99%, mixture of isomers 99%,gc 99%,粉末 99.5%, water≤50 ppm (by k.f.), mkseal 99.8%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.9 % metals basis 99.9% metals basis,200nm 99.9% metals basis,50nm 99.9% metals basis,粉末 99.9%,200目 99.9%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.99% metals basis,粉末 acs, ≥85% acs, ≥99.0% acs,≥99.0% ar,96% cp,98.5% d,99.5% d,99.8% for spectrophotometric det. of cu, 99% ind min. 99.5% reagent grade, 99% standard for gc, 99.5%(gc) standard for gc, ≥98%(gc) standard for gc tech. 85% technical grade, 90 % ≥90%, mixture of isomers ≥90.0%(gc) ≥90.0%(qnmr) ≥95%, stabilized with tbc ≥96%(hplc)(t) ≥97 % sum of enantiomers ≥97%(at) ≥97%(lc&n) ≥97%(mixture of isomers) ≥97%, 含铜稳定剂 ≥97.0% (hplc) ≥98% (hplc), powder ≥98%(gc)(n) ≥98%(gc), 用于生化研究 ≥98%(mixture of isomers) ≥98%(t&lc) ≥98%, mixture of cis and trans ≥98%, ≥98 atom % d ≥98.0% (hplc) ≥98.0%(hplc)(n) ≥98.0%(t) ≥99% (gc) ≥99%(tlc) ≥99.0% (hplc) ≥99.5%(4 times purification) ≥99.7% ≥99.99% ≥99.999% metals basis 分析对照品, 99.5% 分析对照品, ≥99.5%(gc) 分析对照品,>95% 分析对照品,≥98% 分析标准品,98% 制备色谱级, 99.9% 化学纯(cp), ≥97% 基质:sio2,表面基团:-cooh,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-cooh,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-cooh,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:3-4μm,单位:10mg/ml 支链异构体混合物 无色液体 电池级, 99.8%, water≤20 ppm 离子对色谱级 粉末 试剂级, >99.0%(gc) 试剂级, 90.0% 试剂级, 94% 适用于离子对色谱, ≥99% >60.0%(gc) >90%(gc) >90%(hplc) >90%(t) >93.0%(gc) >95%(lc&t) >95%(lc) >95.0%(lc&t) >96.0%(t) >97.0%(gc)(t) >97.0%(hplc)(t) >97.0% >98.0%(hplc)(n) >98.5%(gc) >99%(t) >99%, ee >98% (d, 99%) (d,99.5%) (d,99.9%) 0.1m in h2o 0.1mol/l 介质:h2o 0.1mol/l 0.5 m in thf, mkseal 0.5 m solution in thf,mkseal 0.5% in h2o 0.7-1.3 mmol/g 0.85-1.7mm, 元素分析仪专用 1.0 m solution in heptane, mkseal 1.0m in hexanes 10 wt. % in h2o 1000ug/ml, 5% hno3 1000μg/ml in h2o 1000μg/ml in hexane, 不确定度2% 1000μg/ml, in purge and trap methanol 1000μg/ml,in purge and trap methanol 100μg/ml in h2o 100μg/ml in hexane,不确定度3% 100μg/ml in mtbe 100目 10m in h2o 11.5% (w/v) 12% zr in mineral spirits 1250目 13%于四氢呋喃中, 约0.8mol/l 14% in h2o 15.3% pt 1m in h2o 1m 2.0 m in thf, mkseal 2.0 m in thf 2.0 m solution in hexanes, mkseal 20% in water 20%水溶液 200-300目 2000ug/ml in purge and trap methanol 200g/l in h2o 200mm 20g/l in h2o 25 wt. % in hexanes 25% in h2o 25%水溶液 25wt. % in toluene 30 wt. % in h2o 30% 30-35 wt. % in 200#paint solvent 30g/l in h2o 30nm 球形,99.5% 35 wt. % in h2o 35% in h2o 35wt.% in h2o 40 wt. % in h2o (8.8 m) 40 wt. % in h2o 40% (w/w) 40% 水溶液 40%水溶液 40nm 球形,99.5% 40目 45wt.% aqueous solution 5 m in thf 50 wt. % in mineral spirits 50% in chlorocyclohexane 50% solution in h2o 50% w/w in h2o 50% w/w in water 50μm 55% in water 6%-8%fe 60 wt. % in h2o 62% in ethanol 65 wt. % in h2o 65 wt. % in mineral spirits 65wt% in h2o 6m in h2o 70 wt. % in h2o 70%(gc) 75%(gc) 78% in 2-ethylhexanoic acid 80% (hplc) 80% in ethanol 80% in h2o 80% in isopropanol 80% in water 80-85% 80.0%(t) 83% 85%(t) 85%, 异构体混合物 86% 87% 90%(mixture of isomers) 90%(t) 90%,t 90.0%(gc) 92%,含有稳定剂mehq 94%(hplc) 95 atom % d, 95% 95% (gc) 95% (tlc) 95%(17-e/z 混合物) 95%(lc) 95%(mixture of isomers) 95%(stabilized with mehq) 95%(tbc作为稳定剂) 95%, stabilized with mehq 95%,98%ee 95%,99%d.e. 95%,gc&t 95%,stabilizedwithtbc 95%,分子量200 95%,含稳定剂铜屑 96% (hplc) 96%(gc)(t) 96%(mixture of isomers) 96%, contains tbc as stabilizer 96%,gc 96.5% 97% average mw1000 97%(hplc)(t) 97%(mixture) 97%(mixtures) 97%(stabilized with hq) 97%(stabilized with mehq) 97%(异构体混合物) 97%, 50% in methanol 97%, contains mehq as stabilizer 97%, stabilized with mehq 97%, 异构体混合物 97%, 粉末 97%,>99% ee 97%,(hplc) 97%,mixture of isomers 97%,stabilizedwithmehq 97%,含铜稳定剂 97%,顺反混合物 97.0% (t) 97.5% 98 atom % 13c, 98 atom % 15n, 95%(cp) 98 atom % 15n 98 atom % d, 99% (cp) 98 atom % d, 99%(cp) 98 atom % d,96% 98 atom %15n, 99 atom %13c 98 atom% 15n 98 atom% 98% (mixture of isomers) 98% 异构体混合物 98%(cis+trans) 98%(lc&t) 98%(mehq作为稳定剂) 98%(metals basis) 98%(mixture of cis and trans) 98%(n)(t) 98%(nmr) 98%(stabilized with bht) 98%(sum of mixtures) 98%(t)(hplc) 98%(混合物) 98%, 99 atom % 13c 98%, 99 atom % d 98%, contains mehq as stabilizer 98%, water≤50 ppm (by k.f.), mkseal 98%, 白色粉末 98%,100目 98%,300目 98%,mix tbc as stabilizer 98%,stabilized with copper chip 98%,stabilized 98%,含稳定剂hq 98%,异构体的混合物 98%,白色固体 98.0% (nt) 98.0%(hplc) 98.0%(t) 99 atom % 13c, 99%(cp) 99% (cp) 99% (metals basis) 99%(4 times purification) 99%(gc)(t) 99%(lc-ms) 99%(mixtures) 99%(sum of mixtures) 99%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99%, -325目 99%, mixture 99%, stabilized with bht 99%, 用于合成 99%,2-4μm 99%,300目 99%,50nm 99%,t 99%,升华纯化 99%,单杂<0.1% 99%,含稳定剂铜屑 99%,含铜屑稳定剂 99.5 atom % d 99.5% (reo) 99.5% trace metals basis excluding hf 99.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.8%,water≤50 ppm (by k.f.), mkseal 99.8%,water≤50 ppm (by k.f.),mkseal 99.9% metals basis, -200目 99.9% metals basis,100nm 99.9% metals basis,200目 99.9% metals basis,30nm 99.9% metals basis,pd 29% 99.9%(metals basis) 99.9%(metalsbasis) 99.9%,2-5um 99.9%,325目 99.9%,500目 99.9%,50nm 99.9%,粉末 99.90% 99.95 % metals basis 99.98% trace metals basis 99.99% (metals basis) 99.99% metal basis 99.99% metals basis,10μm 99.99% metals basis,50nm 99.99% trace rare earth metals basis 99.99%(reo) 99.9985% (metals basis) 99.999% metals basis,200目 99.999% metals basis,for perovskite precursor 99.9995% metals basis 99.9999% metals basis,块状 >97%(gc) acid value(koh mg/g):286~326 acs reagent,99% acs, ≥98% ar, ≥90% ar, ≥99%(gc) ar,95% ar,97% average mn 2000 br≈58% c16:98% c18:80-90% ca. 50% in water certified reference material, 1000 μg/ml each component in hexane cu:8% d,98% dye content 85 % dye content 90 % fe2o3≤2ppm for microbiology ipc,98% lc-ms m.w. 10000 m.w.10000 m.w.20000 m.w.4000 min. 98.5% moligand™, ≥97% mo≥50 % mw 1000 mw 3400 da pd 18.5% pd ≥20.5% pellets ph值(25°c):6.864 pt,18.02% t-95% technical grade, 80% technical grade, 85% ulc-ms,0.1% in water ~30% in h2o ~40% in h2o ≥52% in water ≥55%(gc) ≥55%(hplc) ≥65%(hplc) ≥80.0% ≥85%(t) ≥85.0% ≥90.0% ≥92%(hplc) ≥93%(hplc) ≥93.0%(gc) ≥94%(hplc) ≥94%(t) ≥95%(lc&n) ≥95%(lc) ≥95%(mixture of isomers) ≥95%(uv) ≥95%(w) ≥95%, contains tbc as stabilizer ≥95%, stabilized with mehq ≥95%, 含稳定剂tbc ≥95%,99%d.e. ≥95%,≥99%(ee) ≥95%,单酯和二酯的混合物 ≥95%,顺反异构体混合物 ≥95%,顺反混合物 ≥95.0% (hplc) ≥95.0%(gc)(t) ≥95.0%(qnmr) ≥97% (hplc) ≥97%(hplc)(n) ≥97%(n) ≥97%(nt) ≥97%(stabilized with tbc) ≥97%, mixture of cis and trans ≥97%, stabilized with copper chip ≥97%, stabilized with mehq ≥97%, 含稳定剂hq ≥97%,hplc ≥97.0 % ≥97.0% (calc. based on dry substance, nt) ≥98 atom % d,≥98% ≥98 atom %, ≥98%(cp) ≥98 atom% d,≥98% ≥98% (tlc) ≥98%(gc), mixture of cis and trans ≥98%(mixture) ≥98%(异构体混合物) ≥98%, cantains 0.1%tbc as inbibitor ≥98%, cis- and trans- mixture ≥98%, stabilized with copper chip ≥98%, 异构体混合物 ≥98%,异构体混合物 ≥98%,顺反混合物 ≥98.5 % sum of enantiomers ≥98.5%(hplc) ≥98.5%, 200-400nm ≥99 atom % d, ≥99%(cp) ≥99%(gc)(t) ≥99%, mixture of isomers ≥99%, 含铜稳定剂 ≥99%, 用于合成 ≥99%,gc ≥99%,hplc ≥99%,≥98%(ee) ≥99.0%(hplc) ≥99.5% metals basis ≥99.5%, 升华提纯 ≥99.7%(gc) ≥99.8%(gc) ≥99.8% ≥99.99% trace metals basis ≥99.9995% metals basis 丰度:99atom %;化学纯度:≥98.5% 优级试剂, 85% 优级试剂, ≥99% 优级试剂,适用于分析,acs,iso,reag.ph eur 分子量 28.0 w 分子量1000 分析对照品, 98%(hplc) 分析对照品, ≥96% 分析对照品,95% 分析对照品,≥99.5% 分析对照品,≥99.7% 分析标准品, 2000 μg/ml in methanol 包含有200 ppm mehq阻聚剂, 99% 化学纯(cp), ≥98%(gc) 单酯和二酯的混合物 含0.2 % 碳酸钾稳定剂, 97% 四氢树脂酸含量≥30% 基质:sio2,表面基团:-cooh,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-cooh,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-epoxy,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-nh2,粒径:3-4μm,单位:10mg/ml 基质:sio2,表面基团:-nh2,粒径:4-5μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:1-2μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:2-3μm,单位:10mg/ml 基质:sio2,表面基团:-sioh,粒径:4-5μm,单位:10mg/ml 天然来源, 98% 工业级, 98% 工业级, ≥80% 工业级, ≥85% 工业级, ≥90%(gc) 异构体混合物 无水、粉末、99.99% 无水级, 99.99% metals basis 无水级, acs, ≥99% 欧洲药典, 适用于分析, acs, 优级品 欧洲药典 沸点130-134℃ 片径:0.2-4μm 特纯,98% 特纯,99% 生物制剂,适用于细胞培养,适用于昆虫细胞培养 生物技术级 用于gc衍生化, ≥99% 用于gc衍生化,99% 用于植物细胞培养, ≥99% 用于电泳, ≥99% 用于细胞培养, ≥99% 用于细胞培养, 用于昆虫细胞培养 用于药物研究 用于酶联免疫,≥99.0% 用于钙钛矿电池 电子el级 电子ups级 电子级, 99.9999% metals basis 电子级 电池级, 99.5%, water≤20 ppm 电池级, 99.99%, water≤20 ppm 粒度 6~10μm,防腐级 约44%于异丙醇,水中 约85%的水溶液 细胞培养级, ≥98% 药用级 试剂级, 50 wt. % in h2o 试剂级, 85% 试剂级, 95.0% 试剂级, 96.0% 试剂级, 99% metals basis 试剂级, 99.00% 试剂级, 99.5%(gc) 试剂级, 99.7% 试剂级, fe:16.5-18.5% 试剂级, ≥98% 试剂级, ≥99.0% 超干, 99.9% (reo) 超干, 99.99% (reo) 超干, 99.99% metals basis 超干, 99.999% metals basis 超干,99.999% metals basis 超干级, 99.9% metals basis 超干级, 99.95% metals basis 超纯级, ≥99.5%(gc) 超纯级,99.0% 适用于分析, 优级品 重蒸馏,99.5% 重蒸馏,≥99.5% 颗粒 基础级试剂,适用于制备 高纯,97% 高纯,99% > 98 % hplc, powder > 99 % hplc, solid >40.0%(gc) >52%(gc) >75%(gc) >80.0%(gc),含200-650ppm mehq稳定剂 >80.0%(gc) >80.0%(lc) >80.0%(t) >85.0%(hplc) >90%(gc),单脂 >90%(gc),含100 ppm 对叔丁基邻苯二酚稳定剂 >90%(lc) >90%, mn~40000 >90.0%(hplc) >90.0%(t) >93%(hplc) >93%(t) >93.0%(lc),顺反混合物 >94% >95% (gc),approximately ~15% wt/vol in ethyl acetate >95% (lc-ms) >95%(lc-ms) >95%, 含稳定剂bht >95.0%(gc&t) >95.0%(gc) ,含0.2 % caco3/mgo (1:1)稳定剂 >95.0%(gc)(t) >95.0%(gc), 含稳定剂bht >95.0%(hplc)(n) >95.0%(lc) >95.0%(n) >95.0%(t),硬型,混合物 >95.0% >95.5%(hplc) >96%(gc&t) >96.0%(gc),stabilized with hq >96.0%(lc&t) >97% (hplc) >97%(gc),包含180-200 ppm mehq 稳定剂 >97%(n) >97%(t&lc) >97%, 含稳定剂tbc >97.0%(gc&t) >97.0%(gc),含稳定剂铜 >97.0%(lc) >97.0%(n) >97.0%,total of isomer >97.5% >98% usp >98%(gc&n) >98%(gc) , 含铜作稳定剂 >98%(hplc), unsublimate >98%(lc&n) >98%(t&lc) >98.0% (gc) >98.0%(gc,顺反异构体混和物) >98.0%(hplc)(w) >98.0%(lc&n) >98.0%(lc) >98.0%(n)(t) >98.0%(t&lc) >98.0%(t)(hplc) >98.0%(w) >99%(gc)(mixture of isomers) >99%(gc),包含180-200 ppm mehq 稳定剂 >99.0% (gc), 无色液体 >99.0% (hplc) >99.0%(gc) ,含100ppm 4-叔丁基邻苯二酚稳定剂 >99.0%(gc)(t) >99.0%(gc),250ppm mehq做稳定剂 >99.0%(gc),含mehq稳定剂 >99.0%(gc),用于hplc荧光标记 >99.0%(hplc) >99.7%(gc) >99.8%(gc) >99.9% (gc) >99.998% <1% diethylene glycol monobutyl ether <100 μm, ≥99.98% trace metals basis <100nm(tem),20 wt. % in h2o <100nm,99.9% metals basis <45 μm (1mg/ml的甲醇溶液)[用于水分析] (99.99%-ce) (reo) (99.99%-er)(reo) (99.99%-pr)(reo) (99.99%-pr)(reo (99.99%-zr)(reo) (d, 99%) dcl 20% in d2o (d, 99%) dcl 36.5% in d2o (d, 99.5%) (<5% d2o) (d, 99.5%) 30% in d2o (d, 99.5%) 40% in d2o (d, 99.5%)+ 0.03% v/v tms (d, 99.96%) (d,99.5%) + 0.05% v/v tms (d,99.5%) +0.03% v/v tms (d,99.8%) +0.03% v/v tms (d,99.8%)(0.03% v/v tms) (d,99.8%)+0.03% v/v tms+silver foil (d,99.8%)+0.03% v/v tms (d,99.8%)+silver foil (d,99.8%) (d,99.9%) + 0.03 % (v/v) tms (d,99.96%)(+0.03% v/v tms) (d2, 98%) (~5% d2o) (d3, 99%) (d4, 98%) (d5, 99%) (d7, 98%) (dhqd)2phal:0.552% (mixture of 3- and 4-isomers) stabilised with 4-tert-butylpyrocatechol for synthesis: ≥ 98.0 % (a/a) (w/w=7/3) (顺式+ 反式), ≥92%(gc) +47 to +49℃ -100 目, 99.9% (metals basis) -100 目, 99.9% metals basis -100 目, 99.999% (metals basis) -200+325目, 99.95% metals basis -200目,97% -200目粒径 -22 目, 99.995% metals basis -22 目,99.998% metals basis -22 目,99.999% (metals basis) -325目, 99.5% metals basis -325目,99.99% (metals basis去除ta), ta <500ppm -40 目, 99.9% (reo) 0.001mol/l 0.001m 0.01 g/ml的硫酸铜水溶液 0.0100m in h2o 0.015mm 直径, 99.95% metals basis 0.015mol/l 介质:h2o 0.016mol/l(0.016m) in h2o 0.01m in h2o 0.01m,ph4.0,无菌无酶 0.01mol/l 介质:h2o 0.01mol/l(0.01m) in h2o 0.01mol/l 0.02% 0.025mm 厚, 99.985% metals basis 0.02m in h2o 0.02mol/l 0.04% 水溶液 0.05 mol/l naoh(0.05摩尔/升 氢氧化钠) 0.05 m聚(二甲基硅氧烷), 乙烯基封端 0.05% (w/v) in h2o 0.05% in ethanol 0.05%((w/v) in h2o 0.05%(w/v)in water 0.05000mol/l(0.05m) 0.05m edta溶液 (ph8.0) 0.05m in h2o 0.05mm 直径,99.995% metals basis 0.05mol/l 介质:h2o 0.05mol/l,介质:h2o 0.05m 0.085 wt. % in h2o 0.085% phosphoric acid in ethanol 0.085% phosphoric acid in ipa 0.085% phosphoric acid in methanol 0.1 g/ml的氢氧化钠水溶液 0.1 m in poly(dimethylsiloxane), vinyl terminated 0.1 m solution in thf , mkseal 0.1% (v/v) hplc 0.1% (v/v) in h2o 0.1% 乙醇溶液 0.1%(w/v) in h2o 0.1%(w/v)in water 0.1% 0.1%乙醇溶液 0.1-0.5mg/ml in water 0.100 m in h2o 0.100 n in h2o 0.1000mol/l(0.1m) 0.1001mol/l 介质:95%乙醇 0.104 m in methylvinylcyclosiloxanes 0.125n, 0.0208m solution 0.127mm (0.005in) 厚, 退火, 99.8% (metals basis) 0.13%(0.044n) in h2o 0.15m in h2o 0.16 m soln. in 1, 2-dimethoxyethane 0.1m in thf 0.1m,ph7.5 0.1mm 厚, 99.9% (reo) 0.1mm 厚, 99.9% metals basis 0.1mm 厚, 99.99% metals basis 0.1mm 厚,≥99.995% metals basis 0.1mm 直径, 99.99% metals basis 0.1mm, 99.999% metals basis 0.1mm,99.9% metals basis 0.1mm,99.99% metals basis 0.1mol/l(0.1m) in h2o 0.1mol/l, 介质: h2o 0.2 mm,99.9% metals basis 0.2 mm,99.99% metals basis 0.2 n in h2o 0.2% in h2o 0.22g/l 0.25 m solution in 2-methyltetrahydrofuran 0.25 m solution slurry in thf, mkseal 0.25m in h2o 0.25m solution in thf, mkseal 0.25mm 厚, 99.994% metals basis 0.25mm 直径, 99.99% (metals basis 去除 ta) 0.2g/l 0.2m in h2o 0.2m,ph7.2 0.2m,ph7.5 0.2m,ph7.6 0.2mg/ml in dichloromethane 0.2mg/ml, 混合溶剂 0.2mm直径,99.999% metals basis 0.2mol/l 介质:h2o 0.2μg/ml, 5% hno3 0.3 m solution in thf, mkseal 0.3% 0.3-0.8mm, 水封 0.3-0.8mmol/g 0.300mol/l in h2o 0.35m in h2o 0.35mol/l in water 0.3m in h2o 0.3mm 厚, 99.9% (reo) 0.4 m solution in 1,4-dioxane, mkseal 0.4 m solution in thf, mkseal 0.4±0.008mol/l in h2o,trace metal grade 0.4m in ethylene glycol 0.4m solution in hexane 0.4m solution in toluene 0.5 m in h2o 0.5 m in tetrahydrofuran 0.5 m slurry in thf ,mkseal 0.5 m 0.5% (w/v) in h2o 0.5% solution in water,stabilized with sodium hypochlorite 0.5%(w/v) in h2o 0.5% 0.5 m in h2o 0.5 m in thf 0.5-2μm, c: 65-75wt%, n: 10-20wt%, co: 2-4wt%, fe: 2-4wt% 0.5-2μm, c: 65-75wt%, n: 10-20wt%, co: 4-6wt% 0.5-2μm, c: 65-75wt%, n: 10-20wt%, fe: 4-6wt% 0.5-3μm, 92% (eds) 0.50 m in 2-methf 0.50 m solution in 2-methyltetrahydrofuran, mkseal 0.50 m solution in 2-methyltetrahydrofuran 0.53% 0.56 m in hexanes, mkseal 0.56 m in hexanes 0.5m edta溶液 (ph8.0) 0.5m in ether 0.5m in h2o 0.5m in thf,mkseal 0.5m solution in thf 0.5m,ph10 0.5m,ph7.2 0.5m,ph7.5 0.5m,ph8.0 0.5minthf 0.5mm 厚, 99.998% metals basis 0.5mm 厚,99.9975% metals basis 0.5mm 直径, 99.998% metals basis 0.5mol/l in water 0.5mol/l 介质:h2o 0.5msolutioninthf,mkseal 0.5wt%la, 300目 0.6%(w/v)in water 0.600 m in h2o 0.600mol/l in h2o 0.6m in thf, mkseal 0.7 m solution in thf,water≤1000ppm, mkseal 0.75m solution in thf, mkseal 0.7g/l, 介质: h2o 0.7m solution in hexanes, mkseal 0.8-12mm (0.03-0.47in), 99.98% (metals basis) 0.8mg/ml solution (ph 10) 0.9 m in heptane , mkseal 0.9% (w/w) in h2o 0.9m solution in thf, mkseal 1 m in tetrahydrofuran 1 m in thf, mkseal 1 mol/l 1 μm,98.5% 1% (v/v) in h2o 1% (w/v) in h2o 1% in ethanol 1% on titania(anatase)(surfactant and reactant-free),≤100nm 1% w/v 1%(w/v)in water 1%(w/w) in h2o 1%pd 1% 1%乙醇溶液 1 m in dichloromethane 1 mg/ml in methanol (:aqueous 10 mm nh4oh (7:3)), 90% (tlc) 1,000 mesh 1-1.5mm 厚, 保存在石蜡油里, 99.9% (reo) 1-10 μm,98% 1-3mm (0.04-0.1in),99.9997% (metals basis) 1-3mm,99.999% metals basis 1-3μm, ≥99% metals basis 1.0 m in h2o(cosolvent:~10% methanol) 1.0 m in h2o 1.0 m in heptane, mkseal 1.0 m in hexanes 1.0 m in tert-butanol 1.0 m in thf/hexanes, mkseal 1.0 m in toluene 1.0 m solution in 2-methyl-thf, mkseal 1.0 m solution in 2-methyltetrahydrofuran, mkseal 1.0 m solution in ethanol, mkseal 1.0 m solution in h2o 1.0 m solution in hexanes ,mkseal 1.0 m solution in tert-butyl methyl ether, mkseal 1.0 m solution in thf , mkseal 1.0 mg/ml in acetonitrile 1.0 mol/l in h2o 1.0 mol/l in thf 1.0 m in ethyl acetate 1.0 m in heptane 1.0 m in methanol 1.0 m in thf, mkseal 1.0 m solution in thf, mkseal 1.0 mg/ml in methanol 1.00 m in h2o 1.00 n in h2o 1.00mg/ml,介质:甲醇 1.00mg/ml,基体:甲醇 1.0m in 2-methf 1.0m in cyclohexane 1.0m in diethyl ether 1.0m in methf 1.0m in toluene 1.0m solution in toluene 1.0mm 厚, 99.99% metals basis 1.0mm 直径, 99.8% metals basis 1.0mm 直径, 退火,99.995% metals basis 1.0mm 直径,99.999% metals basis 1.0mm直径, 99.9% metals basis 1.0mol/l in thf, mkseal 1.0mol/l in thf 1.0mol/l in toluene 1.0mol/l inthf,mkseal 1.1% in h2o, surfactant-free, high-conductivity grade 1.137ppm(±0.357ppm) 1.2-1.4mmol/g,100~200mesh,1%dvb 1.3 m in thf, mkseal 1.3 m solution in hexane, mkseal 1.3 m solution in pentane, mkseal 1.3 m solution in thf, mkseal 1.3 wt % dispersion in h2o, conductive grade 1.3%-1.5% in isopropanol 1.3m in n-hexane 1.3m in pentane 1.3m lifsi in ec:pc=1: 1 wt% 1.4 m solution in butyl diglyme, mkseal 1.4 m solution in thf,mkseal 1.45% (v/v) in h2o 1.45 m solution in butyl diglyme, mkseal 1.5 m in h2o 1.5 m in thf 1.5 m solution in dibutyl ether, mkseal 1.5% (v/v) in h2o 1.5% in h2o, neutral ph, high-conductivity grade 1.50 n in h2o 1.5mm 直径, 退火,99.995% metals basis 1.6 m in diethyl ether 1.6 m in thf, mkseal 1.6 m solution in hexanes, mkseal 1.6% 1.6m in hexane ,mkseal 1.6m in hexane(15% solution) 1.6μg/ml in methanol 1.7 m solution in thf,mkseal 1.8 m in thf 1.8 m solution in thf, mkseal 1.9-2.1%, for determination of hydrogen peroxyde (h 15), according to din 38 409, part 15, dev-18 1.90% (v/v) in h2o 1.9m solution in thf, mkseal 10 % 溶液 10 atom % 18o 10 mg/ml in 20 mm hepes 10 nm diameter, λmax, 780 nm, dispersion in h2o 10 wt% in hexanes 10 wt.% in 10 wt.% nitric acid, 99.999% trace metals basis 10 wt.% in hexanes 10 wt.% in propylene glycol 10% (v/v) 10% (w/v) 10% (w/w) 10% fe 10% in acetonitrile 10% in propanediol 10% pd basis 10% pd(oh)2 10% pd,contains 40-60% h2o 10% solution in h2o 10% w/w soln. in thf 10% 水溶液 10%(w/v) 10%lipf6+2.5%lifsi in ec:emc:dec=3:5:2 10%pd 10%w/w in propylene glycol 10%于水中 10%水溶液 10%溶液, 丙二醇 10%的水溶液,约2.4mol/l 10%的水溶液,约2.4mol l 10-30 nm, 25% in h2o 10.0mg/ml,基体:纯水 100 mesh,99.9% 100 nm 粒径, 20 wt. % 异丙醇溶液 100 nm 粒径, 20 wt. % 水溶液 100-19-6 100-200 mesh, 1% dvb,0.5-2.5mmol/g 100-200 mesh,1% dvb,0.4-3.0mmol/g 100-300nm, 99.5% metals basis 1000 kda 1000.0 mg/l in water 1000mg/l于叔丁基甲醚 1000ug/ml in acetone 1000ug/ml in high purity hexane 1000ug/ml, 1%hno3 1000μg/ml ±1% (20℃) 1000μg/ml in acetonitrile, uncertainty 2% 1000μg/ml in acetonitrile,uncertainty 2% 1000μg/ml in acetonitrile,不确定2% 1000μg/ml in acetonitrile,不确定度:2% 1000μg/ml in dichloromethane 1000μg/ml in ethanol, 不确定度2% 1000μg/ml in ethanol 1000μg/ml in methanol,uncertainty 2% 1000μg/ml in methanol,不确定度2% 1000μg/ml in mtbe 1000μg/ml, 溶剂:甲醇 1000分子量 100g/l in h2o 100g/l, 介质: h2o 100g/l,介质:h2o 100mg/l in methanol 100mg/l,溶剂:水 100mg/l于甲醇 100mg/ml in ethanol 100nm,99.5% metals basis 100ug/ml in n-hexane 100ug/ml, 溶剂: 正己烷 100ug/ml,1% hno3 100μ g/ml in ethyl acetate 100μ g/ml in methanol 100μg/ml ±2% (20℃) 100μg/ml in acetonitrile, uncertainty 3% 100μg/ml in cyclohexane 100μg/ml in ethanol, 98% (cp) 100μg/ml in ethanol 100μg/ml in h2o(以三氯乙醛计) 100μg/ml in hexane,不确定度:3% 100μg/ml in hexane 100μg/ml in isooctane 100μg/ml in methanol,uncertainty 3% 100μg/ml, 溶剂: 甲醇 100μg/ml,in acetonitrile 100μg/ml,溶剂:甲醇 10:1 10g/l in h2o,适用于gb/t 5750.5 酚盐分光光度法 10g/l, 介质: h2o 10g/l,用于氧化还原反应 10mg/ml in ethanol 10mm in ethanol 10mm in h2o, suitable for hplc 10mm in methanol 10wt. % in h2o 10wt.% in hexane,mkseal 10x 10μg/ml in acetonitrile 10μg/ml in ethanol 10μg/ml,u=3% 12% (v/v) in h2o 12% (w/v) in water 12-14% fe 12-16目 12.0-14.5% fe basis 12.1±1.1μg/l 125 cst 12醇:14醇=70:30,moa-3 12醇:14醇=70:30,moa-5 12醇:14醇=70:30,moa-9 13 wt. % in h2o 13-14% active oxygen 14% in water 14% solution in h2o 14.5 - 16% wt.% 磷 140g/l in h2o 15 wt. % in h2o 15% (v/v) in h2o 15% mo 15%(w/v) 15%-20%in sulfuric acid 15%mo 15%水溶液 15%水胶体分散液 15 wt. % in toluene 15-20 wt. % in h2o, ≥99.99% trace metals basis 150-250 cst 150g/l, 介质: h2o 150nm, 99.9%, α型 150μm 15cm或更小, 99.999% metals basis 15g/l in h2o 15wt.% in h2o 16.5%(w/v), stabilized 165000 cst 17% (v/v) in h2o 17-23%钒 18 wt. % in h2o,含5-8% 甲醇稳定剂 182.3μg/ml in h2o 188ppb(±78ppb) 19-23% ce basis 19mm 或更小, 99% metals basis 1:1比例 1:1水溶液 1:2水溶液 1:3水溶液 1:4水溶液 1g/l in h2o 1g/l in water 1g/l 1m in methf 1m in methylene chloride 1m in tetrahydrofuran 1m in water 1m kpf6 in dmc:ec:emc=1:1:1 vol% with 2%fec 1m kpf6 in dme 1m lipf6 in ec:dec=1:1 vol% with 10% fec 1m lipf6 in ec:emc=3:7 vol% 1m lipf6 in fec:femc:hfe=1:1:1 wt% 1m litfsi in dmc:ec:emc=1:1:1 vol% 1m solution in thf, mkseal 1m thf 1m lipf6 in dec:dmc:ec=1:1:1 vol% 1m lipf6 in dmc:ec:emc=1:1:1 vol% with 1%vc 1m lipf6 in dmc:ec:emc=1:1:1 vol% with 5%fec,1%vc 1m litfsi in tetraethylene glycol dimethyl ether 1mg/ml in dichloromethane 1mg/ml in pbs 1mg/ml in water 1mg/ml, 基体:冰乙酸 1mg/ml,基体:水 1mm 直径, 99.998% metals basis 1mol/l in etoh 1mol/l thf溶液 1mol/l 介质:h2o 1mol/l, 介质: h2o 1wt. % loading(dry basis), 4-8mesh, (wetted with ca. 30-40% water) 1μg/ml, 5% hno3 2 % cross-linked with divinylbenzene 2 m in thf, mkseal 2% (w/v) in ethanol 2% (w/v) in h2o 2% (w/v) 2% (w/w) in h2o 2%pd 2%水溶液 2-5mm (0.08-0.20in) 直径, 99.9999% (metals basis) 2-5um/99.5% 2.0 m in methylene chloride, mkseal 2.0 m in tetrahydrofuran 2.0 m in thf/n-heptane ethylbenzene, mkseal 2.0 m solution in hexane, mkseal 2.0 m solution in hexanes 2.0 m solution in methanol,mkseal 2.0 m solution in thf ,mkseal 2.0 m solution in thf 2.0 m in cyclohexane 2.00 m in h2o 2.0m in thf,mkseal 2.0m in thf 2.0mm 厚,99.9985% metals basis 2.0mm 直径, 99.999% metals basis 2.0mm直径, 99.999% metals basis 2.24ppm(±0.1ppm) 2.2m in hexane(20% solution) 2.5 m solution in hexanes, mkseal 2.5 m solution in thf, mkseal 2.5% in h2o 2.5-3.3 m in thf 2.7m in hexane(25% solution) 2.8 m in 2-methyltetrahydrofuran, mkseal 2.8 m solution in 2-methyl-thf, mkseal 2.93ppm(±0.2ppm) 2.9m in 2-methyltetrahydrofuran 20 kda 20 wt. % in ethanol 20 wt. % 正丙醇溶液 20% (v/v) in h2o 20% in c6h5cl 20% in h2o,cod≥17万mg/l 20% in tetrahydrofuran, mkseal 20% pd(oh)2 20% w/w in ethanol 20% w/w in h2o 20%(v/v) in h2o 20%(w/v) solution in thf, stabilized with 100ppm bht 20%-26% in h2o 20% 20%甲醇溶液,~20% in methanol (t) 20-25% 乙醇溶液 20-30nm,99.99% metals basis 20-40目, gc 20-40目 200-300 目 2000 u/ml 2000 μg/ml in dichloromethane 2000 μg/ml in methanol 2000μg/ml in h2o 2000目 200nm,99% 200nm,99.5% metals basis 200ug/ml in high purity hexane 20mg/ml 20nm 球形,99.5%,γ型 20nm-100nm,99.9% metals basis 20nm-50nm 球形,99.5% 20nm~160nm,100od(±5od) in h2o 20~30 nm 粒径, 30 wt. % 异丙醇溶液 20~30 nm 粒径, 30 wt. % 水溶液 20目 219g/l in h2o 22%-25% w/v in isopropanol 22-25% aqueous solution 22.5%水溶液 22mm (0.9in) 直径, 99% (metals basis), sr ≤0.8% 24% in tetrahydrofuran, mkseal 24% in water solution 2400分子量 25 ug/ml in acetonitrile 25 wt. % in h2o,含9-11% 甲醇稳定剂 25 wt. % in n-hexane 25 wt. % in toluene 25 wt.% 水溶液 25 μg/ml in acetonitrile 25% (v/v) in h2o 25% (v/v) in h2o 25% (v/v) 25% in h2o,stabilizer: 0.1% (typically)formic acid 25% w/w in 1-methoxy-2-propanol 25% w/w in hexane 25% in isopropanol 25 wt. % in toluene 25-28%, 蒸发残渣≤0.002% 25-28%, 蒸发残渣≤0.004% 25-30 mpa·s 25-30 wt. % in h2o 25-30 wt. % 水溶液 250g/l, 介质: h2o 25g/l in h2o 25mg/5ml in pbs,非磁性,1um 25wt. % in methanol 25wt.% in d2o, 99 atom % d 25μg/ml in acetonitrile 27% 乙酸乙酯溶液 27.5g/l in h2o 28 wt. % in h2o, 含10-12% 甲醇稳定剂 28% in water 28% k2o,粉末 28%-bi 2m in h2o 2m in thf 2mg/ml in dichloromethane 2mg/ml, 基体:无水乙醇 2mm in h2o 2mm in water 2mol/l in etoh 2m 2na salt, 95% 2um 2μm,医用研究级 3 wt.% in propylene glycol 3% nh3 in h2o 3%pd 3%溶液 3-5mm,吸附剂,催化剂及载体 3.0 m in methylene chloride 3.0 m in thf, mkseal 3.0 m solution in 2-methyl-thf, mkseal 3.0 m solution in thf, mkseal 3.1 m in diethoxymethane 3.175mm 直径 x 3.175mm 长, 99.9999% (metals basis) 3.175mm 直径 x 3.175mm 长,99.9999% metals basis 3.175mm 直径 x 6.35mm 长, 99.95% (metals basis去除ta) 3.4 m solution in 2-methyltetrahydrofuran, mkseal 3.4um 3.5%溶液 3.6g/l in h2o 3.8% in h2o 30 nm 粒径, 20 wt. % 异丙醇溶液 30 nm 粒径, 20 wt. % 水溶液 30 wt% in methanol(ca. 5mol/l in methanol) 30% (v/v) in h2o 30% (w/w) in h2o 30% (w/w) 30% solution in h2o 30% w/w 水溶液 30% w/w 30%,cod≥25万mg/l 30%乙二醇溶液 30%水溶液(含磷酸稳定剂) 30%水溶液 30%甲醇溶液 30±2% in h2o 30-35 wt. % in ethanol, mkseal 30-35% in h2o 30-35% in  water 30-40 wt. % in d2o, 98 atom % d 30.6-39.0%cu 3000ppm 300目,99% 300目 30nm 球形 纯度:99% trace metals basis 30nm 球形 纯度≥97% trace metals basis 30nm 球形,99.5%,α型 30nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 30nm,98%,α型 30nm,99.5% 30目,98% 31% in h2o 31wt.% phthalyl 32%溶液 32-36% 325目, 99.5% metals basis 33 wt.% in acetic acid 33 wt.% solution in acetic acid, mkseal 33% in h2o, 99% (dry basis) 33-35% tio2 33.1-33.5% in dipropyleneglycol 33.1-33.5% in monoethyleneglycol 34-40%ca 35 μg/ml in isooctane 35% in water 35%水溶液 35 wt. % in h2o 36%,固体 36% 36.0-40.0% ru basis 37 wt. % in h2o,含10-15% 甲醇稳定剂 37% 38-42% aqueous solution(含稳定剂铁粉) 39-44% b2o3 basis, 31-37% cao basis, powder 399.6 mosmol·kg-1 3m,ph4.5,溶剂:h2o 3m,ph5.2 3m,ph5.5,溶剂:h2o 3mm in dmso 3mol/l in etoh 3mol/l,ph5.5 3m 4 wt. % in h2o 4% ca 4-6mm,99.999% metals basis 4.00% (w/w) in h2o 4.00mg/l in water 4.5 m in acetonitrile 4.5-6.5% (al) 4.76% (v/v) in h2o 40 cst 40 kda 40 mpa·s 40 wt. % in h2o, 含0.01%的乙酸铵阻聚剂 40 wt. % in methanol, contains (3-chloropropyl)trimethoxysilane 40% (w/w) in h2o 40% 2-乙基己酸溶液(8-12% sr) 40% aqueous solution 40% solution in mineral spirits (6% mn) 40% w/w in hexanes 40% w/w in water 40% w/w 水溶液 40%inwater 40%溶液,电子级 40%溶液 40 wt. % in isopropanol 40-47%mgo 40-47% 40-50nm, ≥99.95% metals basis 40-60%,工业级 40-60目 gc 40.0 - 50.0 %甲醇溶液 40.5%-42.5% pb 40g/l in h2o 40g/l, 介质: h2o 40nm,99.5% metals basis 40nm,99.5% 42% 43.6%(wt) in dichloromethane 430g/l 45% in h2o 45%的水溶液 45-50%, soluble in isobutanol 45-55 %(w/w) in h2o, ≥98 atom % 13c, ≥98%(cp) 45-55% in water 45-60%, mixture of isomers 45-85 cst 45.0 - 50.0% 45mg/ml in h2o 45um,-325 目, 99.9% metals basis 46% 460μg/mg 47% 47-49°c 48-50% ni basis,150μm 48-50% ni basis,40μm 48-50% ni basis,425-850um 48-50% ni basis,50μm 48-50% ni basis,60μm 48-50%溶液 48~50% au basis 49 wt. % in 2-ethylhexanoic acid 49 wt. % in hexane, ce: 12% 49% in 2-ethylhexanoic acid, ce 12% 4mol/l in h2o 4n,靶材专用 5 % 溶液 5 m in ethanol 5 wt. % in h2o 5% (v/v) in h2o 5% (v/v) 5% on carbon black (surfactant and reactant-free) 5% pd, 50-70% wetted powder 5% pt, 99.95% metals basis 5% w/v in methanol 5%(v/v) in h2o 5%(w/v) in h2o 5%pd 5% 5%载量,粉末 5-10 nm 粒径, 20 wt. % 异丙醇溶液 5-10 nm 粒径, 20 wt. % 水溶液 5-10nm,自分散 5.00 n in h2o 5.00mol/l in h2o 5.4mg/l,1-5层 50 kda 50 wt%己烷溶液 50 wt. % in h2o, 99.9% trace metals basis 50 wt. % 水溶液 50 wt. %水溶液 50 wt.% in h2o 50 wt.% solution in water 50% (v/v) 50% in 2-ethylhexanoic acid 50% in dichloromethane 50% in diethyl phthalate 50% in ethanol(copolymer,3:7) 50% in ethanol 50% in h2o,stabilizer: 0.1% (typically)formic acid 50% in methanol 50% in methylene chloride 50% in toluene 50% in triacetin, α-tocopherol as stabilizer 50% pt basis 50% w/w in hexanes 50% w/w solution in methanol, mkseal 50% w/w 水溶液, 试剂级 50% w/w水溶液 50% 水溶液 50% in ethanol 50% in volatile silicone 50% in xylene 50%(gc), 异构体混合物 50%(w/v) 50%aqueoussolution(99.9%-eu)(reo) 50%水溶液,含磷酸稳定剂≤2% 50%溶液 50%甲醇溶液 50%邻苯二甲酸二辛酯溶液 50 wt. % in ethanol 50 μg/ml in isooctane, analytical standard 50-100 mesh, extent of labeling: 3-4 mmol/g loading, 1 % cross-linked 50-150 ppm mehq稳定剂 50-55% w/w hbf4 50-60% tio2, 35-40% k2o 50-60%的水溶液 50.00%水溶液 5000-70000 cps(25°c), stabilized with mehq 500g/l in h2o 500g/l, 介质: h2o 500nm 500μg/ml ±1% (20℃) 500μg/ml in water 50g/l, 介质: h2o 50nm 近球形,99.5% 50nm,20-30% in water 50nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 50nm,40 wt. % in h2o 50nm,40 wt. % 异丙醇 50nm,50 wt. % in h2o 50nm,99% 50nm,球形, 99.9% metals basis 50wt%水溶液 50wt.% in h20 50μg/ml, 5% hno3 55 wt. % in h2o 55%, soluble in isobutanol 55%,外消旋和内消旋的混和物 55% 55.0 - 58.0 %, 不含稳定剂, acs试剂 55.0 - 58.0 % 55.0-93.0% (as cinnamic aldehyde,c9h8o) 59% 595ug/mg 5g/l in h2o 5m in h2o 5m,ph4.8,溶剂:h2o 5mg/l in methanol 5mm (0.2in) 直径,99.995% (metals basis) 5mm 或更小, 99.9999% metals basis 5mm 直径,99.995% metals basis 5mm 直径,99.999% metals basis 5mm 直径,99.9999% metals basis 5mol/l,ph4.8 5um/99.5% 5wt. %(dry basis), matrix activated alumina 5x 6 wt. % (on silica gel) 6.35mm 厚, 99.9% metals basis 6.5% 60 wt. % in methanol, contains (3-chloropropyl)trimethoxysilane 60 wt. % 水溶液 60 wt. %水溶液 60 wt.% in h2o 60% (hplc) 60% (w/v) in h2o 60% as menthol 60% in h2o 60% in heptane, ca. 1.7 mol/l, mkseal 60% in heptane,ca. 1.7mol/l 60% in n-butoxide, hf: 22.6 wt% 60% in water,300-500ppm mehq 60% in water 60% w/v 60% w/w 60% 水溶液 60%,gc 60%正己烷溶液, ca. 1.7mol/l 60%溶液 60-200目 60-64%, fe≤10ppm 60-70% 水溶液 60-80目 gc 60.0% 60.8 - 74.3 % tin 600目 60nm 球形,98.0% 60nm,99.9% metals basis 61%min in mineral spirits ,pb 24% 62 wt. % in h2o 62% in methanol 62-66%的水溶液 625目 64-66%的水溶液 65 % water 65% (w/w) 65% in etoh 65% in h2o 65%(lc) 65%水溶液 65-72% in water 68-70%, mixtures 68.0-72.0% in h2o 6mm 直径, 99.99999% metals basis 6mm 直径,99.9% metals basis 7-9% 7.5% (v/v) in h2o 7.5% (w/v) 7.50 m in h2o 7.5g/l in h2o 70 wt. % 正丙醇溶液 70 wt.% in 1-methoxy-2-propyl acetate 70% (hplc) 70% hf 70% in 1-methoxy-2-propyl acetate 70% in etoh 70% in toluene 70%(hplc) 70%(含30%甲醇和水) 70%,含异构体和邻苯二甲酸 70%,含稳定剂铜屑 70%,块状 70%溶液 70%甲醇溶液 70%的水溶液,约7.3mol 70%的水溶液 70 wt. % in h2o 70 wt. % in isopropanol 7000-10000 cps(25°c), stabilized with mehq 72-82%, 粒径≤40mm 73%,含约20%的2-溴-1-丁醇 73% 73%水溶液 74%,光球状,3-5mm 74%,片状 74-76% in water 75 wt. % in h2o 75% (contains ca. 23% isomer) 75% (in water) 75% (v/v) in h2o 75% (v/v) 75% in 2-ethylhexanoic acid 75% in h2o 75% w/w 75%(hplc) 75%(v/v),消毒用 75%,含稳定剂mgo 75%异丙醇溶液 75%水溶液 75-150 cst 75-80 wt. % in water 75.00% 78%(t) 78% 8 wt. % in h2o 8% (v/v) in h2o 8-12 cst 8-15nm, ≥99.95% metals basis 80 % in water 80 g/l aqueous 80 wt%甲苯溶液,含0.3 % mgo 稳定剂 80 wt. % in h2o, contains 600 ppm monomethyl ether hydroquinone as inhibitor 80% (contains 5% phenol at maximum) 80% (gc); 80% 80% (gc,stabilized with 1%na2co3) 80% ethanol solution 80% in water,稳定剂:聚乙二醇5-10% 80% metals basis 80% 水溶胶 80%(mixture of monoester, diester, triester) 80%(mixture) 80%(mixtures of isomers) 80%(t) 80%, mixture of isomers 80%, 粉末 80%,gc 80%,含2,6-异构体 80%,天然 80%-85% 80-100目 gc 80.0% in thf 80.0%(gc), 含约20%反-异构体 80.0% 800nm 球形 纯度>99.5% 800目 80g/l, 介质: h2o 80nm, 99.5% metals basis 83%,gc 83.5-86.5% tio2, 13.5-16.5% k2o 84% 85% (page),不含钙 85% in h2o 85% in hexamethyldisiloxane 85%(mixtures) 85%, cont. ca 10% 2-cyclohexylidenecyclohexanone 85%, 医药级ph eur,bp,jpe,nf,e338 85%,c12-c16的混合物 85%,gc 85%,stabilized with tbc 85%,其余物为2-氯代萘 85%,分子量627-691 85%,含100ppm mehq稳定剂 85%,含水约30% 85%,外消旋和内消旋混和物 85%hplc 85-90%,工业级 85.0%(gc) 85.0%(hplc) 85.0%,gc 85.0% 87%,顺反异构体混和物 88% (m- and p- mixture)(stabilized with tbc + onp + o-nitrocresol) 88% (uv-vis) 88%(stabilized with tbc) 88%, contains 1000 ppm hydroquinone as stabilizer 88.5% 8m in h2o 8m 9 wt. % in h2o 9% (w/w) 9.5mm 直径,99.97% metals basis 9.5mm 直径,99.999% metals basis 90% (gc), mixture of isomers 90% (hplc),用于荧光分析 90% (hplc) 90% (stabilized with tbc) 90% in h2o 90% stabilized with 60-100 ppm mehq 90% technical grade 90%(gc )(mixture of isomers) 90%(hplc)(混旋) 90%(lc) 90%(mixture of c-16 and c-18 isomers), 工业级 90%(stabilized with tbc) 90%(tbc作为稳定剂) 90%(total of isomer) 90%(以干基计) 90%, contains mehq as inhibitor 90%, mixture, stabilized with tbc 90%, stabilized with mehq 90%, γ型 90%, 包含对苯二酚稳定剂 90%, 含200ppm mehq稳定剂 90%, 含有dkss, 混合物 90%, 含有~6%氯化铵 90%, 含稳定剂α-生育酚 90%, 异构体混合物 90%, 来源于鲨鱼 90%, 片状 90%,5-和6-异构体混合物 90%,gc 90%,lc&n 90%,lc 90%,nmr 90%,stab. with 0.5% 4-methoxyphenol 90%,stabilized with 250-450ppm hq 90%,stabilized with tbc 90%,其余为反,顺-异构体 90%,异构体混合物 90%,异构体的混合物 90%,溶于水 90%,顺反异构体混和物 90%,顺反混合物 90%-98% 90.0% 90g/l in h2o(cp) 90nm,0.03mg/ml,溶剂:超纯水 90nm,30 wt. % 1,2-丙二醇单甲醚乙酸酯溶液 90nm,40 wt. % 乙醇 91%, 浊点61°c 91%,浊点90℃ 92%(hplc) 92%, stabilized with mehq 92%,97%(mixture of isomers) 92-94 % 92-94% 92.5%(hplc) 93% (gc) 93% (hplc) 93%(hplc) 93%(t) 93%,lc 93%,t 93%,含200 ppm tbc 阻聚剂 93%,含稳定剂吩噻嗪 93%,外消旋和内消旋混合物 93%,异构体混合物 93%,黄相 93.0% (qnmr) 94% (hplc) 94% (oligomer purity) 94%(mixture of isomers) 94%,刺球状,1-3mm 94%,刺球状,3-5mm 94%,含0.2% topanol 稳定剂 94%,含mehq稳定剂 94%,用于植物细胞培养 94.0% 95 atom % 6li 95 atom % d, 96% 95% (dry basis) 95% (e) 95% (lc/ms-elsd) 95% (mixture of 2-ethylbenzenethiol and 4-ethylbenzenethiol) 95% (mixture of isomers) 95% (nmr) 95% (stabilized with 1%bht) 95% (stabilized with copper chip) 95% ,stabilized with mehq 95% 99%ee 95% anhydrous basis 95% containing less than 10% ea 95% contains ≤10%h2o 95% h4p2o7 basis 95% mixture, stabilized with mehq 95% stabilized with tbc 95% v basis 95%(contains=<11%h2o) 95%(gc)(mixture) 95%(gc), stabilized with mehq 95%(hplc)(n) 95%(lc&t) 95%(min 90%) 95%(mixture of isomer) 95%(mixture of stereoisomers) 95%(mixture of t8,t10,t2) 95%(mixtures) 95%(n) 95%(stabilized with bht) 95%(stabilized with copper chip) 95%(stabilized with dcm) 95%(stabilized with k2co3) 95%(sum of mixtures) 95%(t), 65%(hplc) 95%(tlc) 95%(with total nitrogen) 95%(含有<3%h2o) 95%(含碳酸钾稳定剂) 95%(含稳定剂) 95%(含约40%的十八烷基醚硫酸钠) 95%, 0.1% 4-甲氧基苯酚稳定剂 95%, 10 mg/ml in ethanol 95%, 200ppm 4-甲氧基苯酚稳定剂 95%, 98 atom % d 95%, 98% e.e. 95%, contains 0.1% bht as stabilizer 95%, contains 0.1% hq as stabilizer 95%, contains h2o 95%, mw10000 95%, mw20000 95%, mw40000 95%, mw≥700kda 95%, stabilized with 0.2% tbc 95%, stabilized with 0.25% tbc 95%, stabilized with copper chip 95%, stabilized with hq 95%, total of isomers 95%, wetted with ca. 20% water 95%, ~1 m in h2o 95%, ~400mesh 95%, 分子量600 95%, 分子量:2000 95%, 含0.1%tbc稳定剂 95%, 含k2co3稳定剂 95%, 含有mehq作为抑制剂 95%, 含有稳定剂mehq 95%, 邻位~40%, 对位~60% 95%,(e)+(z) 95%,(双酯≥75%,单酯≥20%) 95%,-100目 95%,1m solution in water 95%,200 ppm monomethyl ether hydroquinone as inhibitor 95%,200-300目 95%,2000目 95%,40-60目 95%,5-10% branched isomers 95%,contains ≤200 ppm bht as inhibitor 95%,contains30-35%pinacone 95%,ee 98% 95%,ee98% 95%,ee99% 95%,fe 21% min 95%,lc&t 95%,lc 95%,mixture of cis and trans isomers,with 200ppm 4-methoxyphenol 95%,mixture of trimers and monomer of piperideine 95%,mw 10000 95%,nmr 95%,stabilized with 50-350ppm mehq 95%,stabilized with 60-100 ppm mehq 95%,stabilized with mehq 95%,stabilizedwithbht 95%,trans-isomer >92% 95%,t 95%,water≤50 ppm (by k.f.), mkseal 95%,≤1.0% water 95%,分子量2000 95%,分子量400 95%,含0.01 % 柠檬酸稳定剂 95%,含100-500 ppm tbc稳定剂 95%,含100ppm mehq稳定剂 95%,含200ppm mehq稳定剂 95%,含250ppm bht 稳定剂 95%,含稳定剂mehq 95%,含稳定剂tbc 95%,固体 95%,异构体的混合物 95%,异构体的混和物 95%,混合物 95%,蓝相 95%,顺反异构体混和物 95%,颗粒状 95%;mw~4.5w 95%mixtbcasstabilizer bioreagent, 无dna酶和rna酶, pcr试剂, 分子生物学级, 无菌, for dna and rna applications, ≥99%, 100mm 95.0% (hplc) 95.0% (qnmr) 95.0%(total of isomers) 96 atom % d, 98% (cp) 96% (predominantly (s-)) 96% ,含80- 120 ppm hydroquinone 稳定剂 96% dry weight,5-10% 甲醇做稳定剂 96%(gc&t) 96%(gc), contanins ≤200ppm mehq as inhibitor 96%(isomers mixture) 96%(mixture of tautomers) 96%(mixture) 96%(stabilized with tbc) 96%(stabilizedwithtocopherol) 96%(酯含量) 96%, 2500-3500 da 96%, contains nahco3 as stabilizer 96%, mixture of isomers 96%, mixture 96%, mkseal 96%, stabilized with 100ppm 4-methoxyphenol 96%, 含有200 ppm mehq阻聚剂 96%, 大约200ppm bht 稳定剂 96%, 粒径: 10 μm 96%,(99% ee) 96%,5-和6-异构体混合物 96%,sum of branched isomer,0.01% mehq 96%,上层覆保护剂 96%,含200 ppm mehq 稳定剂 96%,含250ppmmehq稳定剂 96%,含30 - 70 ppm mehq 稳定剂 96%,含30%水作为稳定剂 96%,含稳定剂hq 96%,含稳定剂铜屑 96%,混合构型 96%,溶于油 96%,片状 96%,顺反混合物 96(含3%diea) 96.0% (gc) 96.0% (tlc) 96.0%(t) 97 %,200 ppm mehq 97 atom % 18o 97 atom % d, 95%(cp) 97% (hplc), white powder 97% (tlc) 97% (含 0.1% 0.02% 4-methoxyphenol稳定剂) 97% 25-27% solution in ethyl acetate 97% 99%ee(contains ~10%solvents) 97% average mw20000 97% average mw4000 97% contains ≤10%h2o 97% including isomers,85% min n-c18 97% including isomers,93% min n-c18 97% metals basis 97% rel-(1r-2e-ps)-axial 97% trace metals basis, 300-500nm 97% trace metals basis, 50-300nm 97%(cis- and trans- mixture) 97%(contains of anhydride) 97%(d4<0.1%, d5<0.1%, d6<0.1%) 97%(gc&t) 97%(hplc)(t)(contains <10%h2o) 97%(hplc), 99%e.e. 97%(lc&t) 97%(mix) 97%(n)(t) 97%(nmr)(mixtures) 97%(stab. with hydroquinone) 97%(stabilized with bht) 97%(stabilized with copper chip) 97%(stabilized with cu+mgo) 97%(stabilized with phenothiazine) 97%(stabilizedwithmehq) 97%(sum of mixtures) 97%(t)(hplc) 97%(tbc作为稳定剂) 97%(ti) 97%(w) 97%(含200-300ppmmehq稳定剂) 97%(基于干物质)in 25% h2o 97%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 97%, (d, 98%) 97%, (e)+(z) 97%, 20 wt. % in h2o 97%, 20% in methoxyethanol, mkseal 97%, 25% in h2o 97%, 30-45kda 97%, 4-叔-丁基邻苯二酚 稳定剂 97%, 60% in heptane 97%, 95 atom % d 97%, average mw 10000 97%, average mw 1000 97%, average mw2000 97%, average mw5000 97%, mixture of 2- and 4-isomers 97%, mixture of cis and trans 97%, mixture of isomers,stabilizer:100-300ppm mehq 97%, mixture of tetramer 97%, mixtures of c16&c18 97%, mixtures 97%, moistened with ca 20% water 97%, pd 5%, 铅毒化 97%, stabilized 250 ppm bht 97%, stabilized with 0.5% calcium carbonate 97%, stabilized with 500-1000 ppm tbc 97%, stabilized with cao 97%, sum of c16 c18 c20 97%, water ca 10% 97%, water ≤ 3.0% 97%, 含0.01% bht稳定剂 97%, 含0.1% koh稳定剂 97%, 含有稳定剂mehq 97%, 含稳定剂mehq 97%, 含稳定剂tbc 97%, 含稳定剂铜屑 97%, 含铜稳定剂 97%, 来源于山苍子油 97%, 白色到淡黄色粉末 97%, 白色固体 97%, 精制级 97%, 约含150ppm 4-甲氧基苯酚稳定剂 97%,0.01% 氢醌稳定剂 97%,0.1% 对叔丁基邻苯二酚作稳定剂 97%,0.1m in def 97%,10%h2o 97%,10mg/ml solution in water 97%,1μm 97%,300目 97%,40-100kda 97%,99% ee 97%,bet surface area 8~16 m2/g 97%,contain≤10%ea 97%,ee97% 97%,ee值98% 97%,gc&t 97%,hq as inhibitor 97%,lc&t 97%,mixture of isomers,mehq:200ppm 97%,n 97%,pd 10% 97%,stab. with <1% magnesium oxide 97%,stabilized with bht 97%,stabilized with tbc 97%,stabilizedwithtbc 97%,water≤50 ppm (by k.f.), mkseal 97%,含0.02% 4-methoxyphenol 稳定剂 97%,含0.05% bht 稳定剂 97%,含0.05% 四溴双酚a 稳定剂 97%,含0.1 % 对苯二酚 稳定剂 97%,含0.1% tbc稳定剂 97%,含0.1%对叔丁基邻苯二酚(tbc)稳定剂 97%,含100-200ppm bht稳定剂 97%,含100ppm bht稳定剂 97%,含100ppmmehq稳定剂 97%,含60-100ppm bht稳定剂 97%,含tbc稳定剂 97%,含不同量的酸酐 97%,含低聚物 97%,含含稳定剂氢醌 97%,含稳定剂mehq 97%,含稳定剂mgo 97%,含稳定剂tbc 97%,含稳定剂水滑石 97%,含稳定剂铜屑 97%,含铜作稳定剂 97%,含铜粉稳定剂 97%,混和物 97%,片状 97%,用于gc衍生化,含1% tbdmscl 97%,顺反异构体混合物 97%,顺式 + 反式 97%,香料级 97.0 % gc 97.0 % 97.0% (nt) 97.0% (sum of isomers, gc) 97.0% (tlc) 97.0%(hplc) 97.00%盐酸盐 97.5%(hplc) 98 % hplc, solid 98 atom % 13c, 95%(cp) 98 atom % 13c, 95% 98 atom % 13c, 97%(cp) 98 atom % 13c, 98 atom % 15n, ≥98% 98 atom % 13c 98 atom % 15n, 98 atom % 13c, 95% (cp) 98 atom % 15n, 98%(cp) 98 atom % 15n, 99 atom % 13c 98 atom % d(deuterated from d0-d8), 95% 98 atom % d, 97%(cp) 98 atom % d, ≥99%(cp) 98 atom % d,95% 98 atom % d,99% 98 atom % 13c, 98 atom % 15n, 95%(cp) 98 atom % 13c, 99% (cp) 98 atom % 15n, 98 atom % 13c, 95%(cp), 97%(chiral purity) 98 atom % 15n 98 atom %, 98%(cp) 98 atom %, 98% 98 atom %d 98 atom% 13c 98 atom% 15n, 98 atom% d 98 atom% d,99%(cp) 98 atom%d 98% (as sncl4) 98% (contains <0.5%h2o) 98% (enzymatic) 98% (gc) 98% (mixtures) 98% (only trans) 98% (reo) 98% (stabilized with copper chip) 98% (stabilized with mehq) 98% ,含5-10 ppm tert-butylcatechol 稳定剂 98% contains ca. 11% dioxane 98% dry weight 98% gc 98% ir 53% 98% metal basis, ir 25.5%最低 98% metal basis, rh 19.32%最低 98% mix tbc as stabilize 98% mixture of isomers 98% trace metals basis excluding zr 98%(contains <9-12%h2o) 98%(contains of anhydride) 98%(gc&n) 98%(gc), 顺反异构体混和物 98%(gc), 顺反混合物, stabilized with mehq 98%(gc),含稳定剂bht 98%(gc),含稳定剂mehq 98%(gc),含稳定剂tbc 98%(hplc), solid 98%(hplc), 用于气相色谱/质谱的环状硼化剂 98%(hplc),solid 98%(lc&n) 98%(lc&w) 98%(m- and p- mixture)(stabilized with tbc) 98%(mixture of isomers) 98%(mixture of isomer) 98%(mixture of isomeric branched chain hexanes) 98%(mixtures of isomers) 98%(mixtures) 98%(stabilized with koh) 98%(stabilized with methylhydroquinone) 98%(stabilized with tbc)(contains3-10%cis- anhydride) 98%(t&lc) 98%(t)(hplc), 用于生化研究 98%(t)(mixture) 98%(tlc) 98%(total of isomer) 98%(total) 98%(w) 98%(以干基计), water≤16.5% 98%(含异构体) 98%(异构体混合物) 98%(混合异构体) 98%(顺反异构体混合物) 98%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 98%, 10 mg/ml in methyl acetate 98%, 1800-2000目 98%, 325目 98%, 400nm-1μm 98%, 50 mg/ml in ethanol 98%, 80%ee 98%, 95 atom % d 98%, 98 atom % 13c 98%, 98 atom % 15n 98%, 98 atom%d 98%, 98%atom%d 98%, carbon≤1.5%, d50=1.2±0.5μm 98%, carbon≤1.5% 98%, chloride≤0.002% 98%, contains <7%h2o 98%, contains 10-15%acoh 98%, contains 15 wt.% water as stabilizer 98%, contains caco3 as stabilizer 98%, contains potassium carbonate as stabilizer 98%, d50≤80nm 98%, ee80% 98%, ee99% 98%, ee≥98% 98%, for analysis, acs,iso,reag. ph eur 98%, isomer mixture 98%, mixture 98%, ni:22.5% 98%, ph<7 (33.3% in water) 98%, ru≥25.8% 98%, stab. with 1-5% hexane 98%, stabilized with bht 98%, stabilized with ~1.5% phenothiazine 98%, unsublimated 98%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 98%, ~20nm 98%, 含<1%正丁硫醇稳定剂 98%, 含0.1%tbc稳定剂 98%, 含200 ppm tbc稳定剂 98%, 含250ppmmehq稳定剂 98%, 含k2co3稳定剂 98%, 含有2%硫酸钠作为干燥剂 98%, 含稳定剂mehq 98%, 含稳定剂吩噻嗪 98%, 含铜屑稳定剂 98%, 无水 98%, 有效氧含量: ≥7.18 % 98%, 游离态 98%, 用于蛋白质研究 98%, 白色粉末, 用于生化研究 98%, 立体异构体混合物 98%, 粉末 98%, 粒径: 0-2μm 98%, 粒径: 1-2μm 98%, 粒径: 100-300nm 98%, 粒径: 600-800nm 98%, 粒径; 100-500nm 98%, 粒径; 400-700nm 98%, 粒径; 800-1000nm 98%, 粘度:2~8 mpa.s(25℃), 总氯: ≤3000 mg/kg 98%, 顺反混合异构 98%, 顺反混合物 98%, 颗粒 98%, stabilized with bht 98%,(stabilized with mehq) 98%,(t) 98%,-325目 98%,-40目 98%,10-20目 98%,100-200 ppm bht as inhibitor 98%,1250目 98%,200 ppm monomethyl ether hydroquinone as inhibitor 98%,200目 98%,4 ~ 8μm 98%,400目 98%,42-50(mpa25°c) 98%,98atom%d 98%,contains 0.1-0.2%mehq 98%,contains<10-20%h2o 98%,contains≤6%h2o 98%,contains≤7%h2o 98%,ee 99% 98%,ee92% 98%,ee95% 98%,gc&n 98%,hplc 98%,isomersmixture 98%,mixture of cis and trans 98%,pd 15% 98%,pd>13.3% 98%,pd>15.5% 98%,pd>19.0% 98%,pd>22.5% 98%,pd>29.0% 98%,pd>36.2% 98%,pt:55.0 ± 1.3% 98%,rh>42% 98%,stabilized with 0.1% 3,5-di-tert-butylcatechol 98%,stabilized with 0.2% α-tocopherol 98%,stabilized with 200ppm mehq 98%,stabilized with 5-20 ppm hydroquinone 98%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 98%,stabilized with hq 98%,stabilized with mehq 98%,stabilized with tbc 98%,stabilizedwithcopperchip 98%,stabilizedwithmehq 98%,water<8% 98%,water≤50 ppm (by k.f.),mkseal 98%,with molecular sieves, water≤50 ppm (by k.f.),mkseal 98%, 98%,光学纯 70% 98%,光学纯 98%,含0.01% koh稳定剂 98%,含0.1% 对苯二酚稳定剂 98%,含0.1%碳酸钾稳定剂 98%,含0.10% alpha-tocopherol 抗氧化剂 98%,含0.3 % mgo稳定剂 98%,含100ppmmehq稳定剂 98%,含50 - 100 ppm bht 稳定剂 98%,含500 ppm bht稳定剂 98%,含90 - 110 ppm mehq 稳定剂 98%,含有数量不等的酸酐 98%,含水约20% ,单位重量以干重计 98%,含稳定剂0.1% dea 98%,含稳定剂0.1%koh 98%,含稳定剂koh 98%,含稳定剂mehq 98%,含稳定剂tbc 98%,含稳定剂吩噻嗪 98%,含铜屑稳定剂 98%,外消旋和内消旋混合物 98%,支链异构体类的混和物 98%,无水 98%,无水级 98%,无色液体 98%,晶体 98%,棕色结晶粉末 98%,正丁酰氯≤0.10% 98%,深蓝紫色结晶粉末 98%,片状 98%,球状 98%,生物技术级 98%,用于过氧化物酶试验 98%,磺酸掺杂 98%,粒径:100-300nm 98%,约含0.5% mehq 稳定剂 98%,细胞培养级 98%,蓝相 98%,非对映异构体混合物 98%,顺反异构体混合物 98%,黄相 98%atom%d 98%含稳定剂mehq 98%棕榈酸基(gc) 98%混合物(tbc作为稳定剂) 98-101% 98-102%(t)(含有30-40%h2o) 98.0% (at) 98.0% (sum of enantiomers, gc) 98.0% (sum of isomers, hplc), ~2500 u/mg, stabilized with bht 98.0%(hplc)(t), 用于高效液相色谱标记 98.0%(tlc) 98.0-102.0% anhydrous basis (hplc) 98.00%lc&n 98.00%lc 98.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 98.5%, mixture of isomers 98.5%,water≤50 ppm (by k.f.), mkseal 98.50% 98.9-101.2% b2o3 basis 99 %,stab. with 0.1% tbc 99 atom % 13c, 95% 99 atom % 13c, 97%(cp) 99 atom % 13c, 98% (cp) 99 atom % 13c, 98%(cp) 99 atom % 13c, 99 atom % 15n, 95% (cp) 99 atom % 13c, 99 atom % 15n, 98%(cp) 99 atom % 13c, 99 atom % d 99 atom % 13c, 99% 99 atom % d, 80%(hplc) 99 atom % d,99% 99 atom % 13c, 98%(cp) 99 atom % 13c, 99%(cp) 99 atom %, 98% 99 atom %, ≥98% 99 atom %13c, 99%(cp) 99% (dry wt.), water <2% 99% (hplc), 98% 99% (hplc) 99% (metals basis excluding ba) 99% (purity excludes ~1% zr) 99% (reo) 99% (异构体混合物,环氧当量150.0-180.0g/mol) 99% ,粒径≤1μm 99% 10-50微米 99% au assay:39.91 ± 0.8% 99% isotopic 99% metals basis, 25μm 99% metals basis, ≥325 mesh 99% metals basis, 含有约10%的nicro3 99% metals basis,2-10 μm 99% metals basis,20-40nm,锐钛, 亲水 99% metals basis,pd 9.0% 99% purity,>99% ee 99% trace metals basis, 150-200nm 99% trace metals basis, 20nm, 球形 99% trace metals basis, 350nm 99% trace metals basis,sba-15 99%(99.99%-w) 99%(dry basis) 99%(gc), contanins ≤200ppm mehq as inhibitor 99%(gc), 工业级, 浅黄色晶体 99%(isomers mixture) 99%(mixture of isomers),来源枯草菌脂肽钠 99%(mixture of isomers) 99%(mixture) 99%(mixtures), 包含~0.006%对苯二酚稳定剂 99%(n) 99%(nmr) 99%(stabilized with tbc), mkseal 99%(sum of isomers) 99%(titration) 99%(二甲苯异构体+乙基苯) 99%(升华级) 99%(含200-300ppmmehq稳定剂) 99%(天然) 99%(支链异构体类的混合物总和) 99%, water≤50 ppm (by k.f.),mkseal 99%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99%, -100目 99%, 0.1-1mm 99%, 0.2-0.5μm 99%, 0.5-1μm 99%, 1-3mm 99%, 10% w/v in isopropanol/hexane(50:50) 99%, 10-20目 99%, 100±5nm 99%, 100-300nm 99%, 10μm 99%, 2-4mm 99%, 20-60目 99%, 200目 99%, 3-5μm 99%, 300-500nm 99%, 4-16mesh 99%, 4-7mm 99%, 400目 99%, 7% s, dissolved in tbp 99%, 99.999%-si 99%, acid<200 ppm, h2o<100 ppm 99%, crystalline 99%, d50: 3-4μm 99%, d50≤1μm, d90≤2μm 99%, from myxococcus fulvus mx f85 99%, in 100mg/ml ethanol 99%, powder 99%, stabilized with 0.25% tbc 99%, stabilized with mehq 99%, suitable for determination of sulfhydryl groups 99%, water≤50 ppm (by k.f.), mkseal 99%, with molecular sieves, stabilized with 400 ppm triethylamine, water≤50 ppm (by k.f.), mkseal 99%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99%, with molecular sieves,water≤50 ppm (by k.f.), mkseal 99%, β型 99%, ≥99.99% trace metals basis 99%, 发酵工艺 99%, 含0.01%的乙酸铵阻聚剂 99%, 含50-150 ppm tbc 稳定剂 99%, 平均粒径: 2μm 99%, 异构体混合物 99%, 无色液体 99%, 用于电化学分析 99%, 用于药物研究 99%, 粉末 99%, 粒径: 5-10μm 99%, 粒径<10μm 99%, 顺式含量: ~20%, 反式含量: ~80% 99%, 顺式含量: ~40%, 反式含量: ~60% 99%,(99% ee) 99%,(mixture of isomers) 99%,-100目 99%,0.1%单杂 99%,0.5~0.7um 99%,1-4mm 99%,1-5μm 99%,15nm,疏水性 99%,1~2μm 99%,1μm 99%,200目 99%,30-60nm 99%,30-80nm 99%,40-60目 99%,500目 99%,50目 99%,6-10μm 99%,6μm 99%,7-9μm,高白度 99%,<500nm 99%,anhydride group content≥41.0% 99%,bp 99%,ee 98% 99%,ee99% 99%,for spectrophotometric det. of ta 99%,hplc 99%,hq as inhibitor 99%,metals basis 99%,mixture of isomers 99%,p≥27% 99%,stabilized with 100ppm mehq,water≤50 ppm (by k.f.),mkseal 99%,stabilized with bht, water:300-500ppm (by k.f.), mkseal 99%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 99%,water≤50 ppm (by k.f.), mkseal 99%,with molecular sieves, water≤30 ppm (by k.f.), mkseal 99%,≤100nm 99%,≤325 目,粉末 99%,主要是顺式 99%,凝固点: ≥76°c 99%,单杂<0.2%,ee99.5% 99%,含0.01 % bht 稳定剂 99%,含0.01% copper 稳定剂 99%,含0.01% 铜片 稳定剂 99%,含0.1 % koh 稳定剂 99%,含1-3%乙醇稳定剂 99%,含10 - 20 ppm mehq 稳定剂 99%,含10-100ppm 4-methoxyphenol 稳定剂 99%,含10-15ppm 4-叔-丁基邻苯二酚稳定剂 99%,含10-20 ppm mehq 作为稳定剂 99%,含15 - 20 ppm mehq稳定剂 99%,含150-400 ppm bht 稳定剂 99%,含20ppm mehq稳定剂 99%,含50-150 ppm tbc 稳定剂 99%,含50ppm bht 稳定剂 99%,含水20% 99%,含阻聚剂mehq 99%,异构体混合物 99%,总杂<0.1% 99%,无色 99%,水分≤1.0% 99%,混合物 99%,混旋构型 99%,用于生化研究 99%,粉红色到淡紫色 99%,粒径<1.2um 99%,粒状 99%,适用于分析 99%,锐钛,100nm 99%,锐钛,d50: 0.4-1um 99%,锐钛 99%,闪烁级 99%,顺反混合物 99%,颗粒 99%,高纯级 99%,黄色结晶针状固体 99.0% (at) 99.0% (hplc) 99.0% (t) 99.0% metals basis 99.0%(gc) 99.0%(hplc) 99.0%,stabilized with 5-20 ppm hydroquinone 99.0-100.5% (in dried substance), meets analytical specification of e 282 99.00%,ee99% 99.3wt%,粒径:5-10nm 99.4% 99.5 atom % d+0.03%tms,用于 nmr 99.5 atom % d,≥99% 99.5% metals basis 99.5% (metals basis excluding sr), sr <500ppm 99.5% (metals basis 去除ni), ni < 0.2% 99.5% (metals basis 去除铪) ,325目 99.5% (metals basis,锆除外), zr<1% 99.5% ,粒径:1-2um 99.5% metals basis (去除铪),1-3μm 99.5% metals basis(镁、铝除外), d50≈3μm 99.5% metals basis, 100-200nm 99.5% metals basis, 40nm, 近球形 99.5% metals basis, 50-100nm 99.5% metals basis, d50: 1-1.5um 99.5% metals basis, d50: 1-3μm 99.5% metals basis, d50: 2-3μm 99.5% metals basis, ≤6um 99.5% metals basis,<100 nm 99.5% metals basis,<100nm 99.5% metals basis,-300目 99.5% metals basis,10μm 99.5% metals basis,150nm,锐钛,亲水 99.5% metals basis,2.0μm 99.5% metals basis,25μm 99.5% metals basis,2μm 99.5% metals basis,5 μm 99.5% metals basis,5μm 99.5% metals basis,<15μm 99.5% metals basis,≤45um 99.5% metals basis,≥200目 99.5% metals basis,粉末, 2 μm 99.5% metals basis,粉末,<3 μm 99.5%( based on diamine), mixture of isomers 99.5%(4 times purification) 99.5%(gc) 99.5%(metals basis), -200目 99.5%, water≤50 ppm (by k.f.),mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99.5%, 10-80目 99.5%, 500nm 99.5%, acid <200 ppm, h2o <100 ppm 99.5%, hafnium chloride<50ppm 99.5%, mixture of isomers 99.5%, water≤50 ppm(by k.f.), mkseal 99.5%, with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.5%, 含<1%正丁硫醇稳定剂 99.5%, 含0.01%的乙酸铵阻聚剂 99.5%, 含有稳定剂mehq 99.5%, 水分≤0.5% 99.5%, 适用于分析 99.5%, 颗粒 99.5%,-100目 99.5%,-325mesh 99.5%,1-3μm 99.5%,100-200nm,球形 99.5%,100nm 99.5%,100目 99.5%,10um 99.5%,15±5nm 99.5%,150-200目 99.5%,2-3μm 99.5%,20±5nm 99.5%,20-80nm 99.5%,200目 99.5%,30±5nm 99.5%,300目 99.5%,40-100nm 99.5%,50±5nm 99.5%,500nm 99.5%,50nm 99.5%,60-120nm 99.5%,ee99.5% 99.5%,gc 99.5%,metals basis 99.5%,stabilized with 5-20 ppm hydroquinone 99.5%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.5%,trace metals basis 99.5%,water< 0.005% (by k.f.), mkseal 99.5%,water≤50 ppm (by k.f.),mkseal 99.5%,with molecular sieves, stabilized with bht, water≤30 ppm (by k.f.), mkseal 99.5%,with molecular sieves, stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.5%,with molecular sieves, water≤30 ppm (by k.f.), mkseal 99.5%,with molecular sieves, water≤50 ppm (by k.f.),mkseal 99.5%,≤3 μm 99.5%,≤30μm 99.5%,≥100目 99.5%,升华纯化 99.5%,单杂<0.1% 99.5%,含0.1 % koh 稳定剂 99.5%,含稳定剂铜屑 99.5%,异构体混合物 99.5%,片状 99.5%,生物技术级 99.5%,粉末 99.5%,重蒸馏 99.5%metals basis 99.5%分析标准品 99.6%,25μm 99.6%,无水级 99.7% metal basis 99.7% metals basis 99.7%,stabilized with bht, water≤50 ppm (by k.f.),mkseal 99.7%,water≤50 ppm (by k.f.), mkseal 99.7%,with molecular sieves, stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.7%,with molecular sieves, water≤50 ppm (by k.f.), mkseal 99.7%,含100ppmmehq稳定剂 99.75% metals basis 99.8 atom % d, cp:98% 99.8% trace metals basis 99.8% metal basis, 1μm, 近球形 99.8% metals basis, 10nm-25nm, 锐钛, 亲水 99.8% metals basis, 20nm, 金红, 亲油(kh-570处理) 99.8% metals basis, 300±50nm 99.8% metals basis, 30nm, 锐钛, 亲水 99.8% metals basis, 40nm, 金红, 亲油(kh-570处理) 99.8% metals basis, 60nm, 金红, 亲油(kh-570处理) 99.8% metals basis, ≤150nm 99.8% metals basis, ≥100目 99.8% metals basis,100-300nm,金红,亲水 99.8% metals basis,100nm,金红,亲水 99.8% metals basis,100nm,金红,亲油 99.8% metals basis,100nm,锐钛,亲水 99.8% metals basis,100nm,锐钛,亲油 99.8% metals basis,25nm,金红,亲水 99.8% metals basis,25nm,锐钛,亲水 99.8% metals basis,300目 99.8% metals basis,40nm,金红,亲水 99.8% metals basis,40nm,锐钛,亲水 99.8% metals basis,5-10nm,锐钛,亲水亲油型 99.8% metals basis,5-10nm,锐钛,亲水型 99.8% metals basis,50±10nm 99.8% metals basis,60nm,金红,亲水 99.8% metals basis,60nm,锐钛,亲水 99.8% metals basis,60nm,锐钛,亲油(硬脂酸处理) 99.8% metals basis,60nm 99.8% metals basis,90±10nm 99.8% metals basis,rh 81% 99.8% trace metals basis,粒径: 2 μm, 粉末 99.8% trace metals basis 99.8%, with molecular sieves, water≤50 ppm (by k.f.),mkseal 99.8%, fe≤0.2%, d50:3-10μm 99.8%,10μm 99.8%,1μm,,高白度 99.8%,200目 99.8%,6.35mm (0.25in) dia x 6.35mm (0.25in) length 99.8%,d50 0.5-1.5μm 99.8%,pb:0.0005% 99.8%,pb:0.001% 99.8%,stabilized with bht, water≤50 ppm (by k.f.), mkseal 99.8%,water≤30 ppm (by k.f.), mkseal 99.8%,with molecular sieves, water≤30 ppm (by k.f.), dma≤10mg/kg, mkseal 99.8%,with molecular sieves, water≤30 ppm (by k.f.), mkseal 99.8%,升华纯化 99.8%,比表面积(bet): 260m2/g;粒径:7-40nm 99.8%,比表面积(bet):100m2/g;粒径:7-40nm 99.8%,比表面积(bet):115m2/g;粒径:7-40nm 99.8%,比表面积(bet):120m2/g;粒径:7-40nm 99.8%,比表面积(bet):150m2/g;粒径:7-40nm 99.8%,比表面积(bet):170m2/g;粒径:7-40nm 99.8%,比表面积(bet):200m2/g;氯化物:0.0125 99.8%,比表面积(bet):200m2/g;粒径:7-40nm 99.8%,比表面积(bet):230m2/g;粒径:7-40nm 99.8%,比表面积(bet):300m2/g;粒径:7-40nm 99.8%,比表面积(bet):380m2/g;粒径:7-40nm 99.85% (metals basis) 99.9 %,~60% in neodecanoic acid (15-20% bi) 99.9 atom % d 99.9% metals basis, ≤1μm 99.9% (metals basis), pt 44.9% min 99.9% metal basis, d50≤10μm 99.9% metal basis 99.9% metals basis ,无水 99.9% metals basis(镁、铝除外) 99.9% metals basis, -300目 99.9% metals basis, 1-3cm 99.9% metals basis, 1000目 99.9% metals basis, 150-250目 99.9% metals basis, 1μm 99.9% metals basis, 20-60nm 99.9% metals basis, 200-300nm 99.9% metals basis, 2~5μm 99.9% metals basis, 50-300nm 99.9% metals basis, 600-800nm 99.9% metals basis, 600目 99.9% metals basis, 800目 99.9% metals basis, 900目 99.9% metals basis, <100nm particle size 99.9% metals basis, d50=200nm 99.9% metals basis, d50=40nm, 近球形 99.9% metals basis, d50≈1-1.5μm, 不规则片状(sem) 99.9% metals basis, d50≈30μm 99.9% metals basis, d50≤40nm 99.9% metals basis, α相, 100nm, 亲油型 99.9% metals basis, ≤0.8μm 99.9% metals basis, ≤10um(fsss) 99.9% metals basis, ≤150nm 99.9% metals basis, ≤500目 99.9% metals basis, ≥200目 99.9% metals basis, 平均粒径:10 μm, 近球形 99.9% metals basis, 斜方晶 99.9% metals basis, 棕色固体 99.9% metals basis, 粒径: ~20nm, 比表面积:~100 m2/g 99.9% metals basis, 粒径: ~20nm, 比表面积:~240 m2/g 99.9% metals basis, 粒径<500nm 99.9% metals basis,<50 nm 99.9% metals basis,-250目 99.9% metals basis,-300目,近球形 99.9% metals basis,0.5μm 99.9% metals basis,1-2μm 99.9% metals basis,1-5μm 99.9% metals basis,10-20μm 99.9% metals basis,10-30nm 99.9% metals basis,100-200 mesh 99.9% metals basis,100目 99.9% metals basis,1~2μm 99.9% metals basis,1μm 99.9% metals basis,2 μm 99.9% metals basis,2-3μm 99.9% metals basis,200目,粉末 99.9% metals basis,20nm 99.9% metals basis,2μm 99.9% metals basis,30±10nm 99.9% metals basis,400nm 99.9% metals basis,40nm 99.9% metals basis,4mm,颗粒 99.9% metals basis,50-70nm 99.9% metals basis,500nm 99.9% metals basis,5~10μm 99.9% metals basis,60-100nm,黑色粉末 99.9% metals basis,60-100nm 99.9% metals basis,60-80nm 99.9% metals basis,<200nm 99.9% metals basis,ir ≥84.5% 99.9% metals basis,α相,100nm,亲水型 99.9% metals basis,α相,30nm,亲水型 99.9% metals basis,α相,30nm,亲油型 99.9% metals basis,α相,<20nm 99.9% metals basis,≤1μm 99.9% metals basis,≤40μm 99.9% metals basis,不规则片状 99.9% metals basis,宽:13 mm, 厚:0.3 mm 99.9% metals basis,无水 99.9% metals basis,粉末,100-200 mesh 99.9% metals basis,粉末,≥200目 99.9% metals basis,粒径<5mm 99.9% metals basis,粒径(d50)10-20μm 99.9% metals basis,粒径10μm 99.9% metals basis,粒径≤1μm 99.9% metals basis,颗粒 99.9% metals basis,黄色 99.9% rare earth metals basis,200目 99.9% trace metals basis (purity excludes ~2% hfo2) 99.9% trace metals basis, 100目 99.9% trace metals basis, 50-100 nm 99.9% trace metals basis, 50-80nm 99.9% trace metals basis,-325mesh 99.9% trace metals basis,−325目 99.9%(200ppm mehq as inhibitor) 99.9%(gc),含40ppm二异丙胺 稳定剂 99.9%(metals basis), 白色 99.9%, 0.5-2μm 99.9%, 100±5nm 99.9%, 100nm, 单斜相 99.9%, 100nm, 沉淀法 99.9%, 100nm, 立方相 99.9%, 1600-2000目 99.9%, 1um 99.9%, 1μm, 单斜相 99.9%, 200-300nm, 四方相 99.9%, 200nm, 单斜相 99.9%, 200nm 99.9%, 200目, 四方相 99.9%, 200目 99.9%, 20nm, 单斜相 99.9%, 20nm 99.9%, 300±5nm 99.9%, 5-10nm, 沉淀法 99.9%, 500nm, 单斜相 99.9%, 50nm, 单斜相 99.9%, 50nm 99.9%, 60-100目 99.9%, d50≈8μm, 球形 99.9%, water≤0.2% 99.9%, with molecular sieves, water≤30 ppm (by k.f.), residue after evaporation≤5ppm, mkseal 99.9%, ≤30μm 99.9%, ≤50nm 99.9%, 不含甲醇 99.9%, 无甲醇、无甲醛、无酯、无杂醇油 99.9%, 深蓝色, 用作透明隔热薄膜 99.9%, 球型, d50=0.6-1um, 四方晶体-铁电体 99.9%, 球型, d50=0.6-1um 99.9%, 粒径: 500nm 99.9%, 锐钛, 500nm, 近球形 99.9%,1-2um 99.9%,1-3um 99.9%,100nm 99.9%,100目 99.9%,105-250um 99.9%,1250目 99.9%,12~16um 99.9%,15-45um 99.9%,15-53um 99.9%,17um 99.9%,1~5mm 99.9%,23um 99.9%,27um 99.9%,300目 99.9%,30nm 99.9%,3~4um 99.9%,40nm 99.9%,53-105um 99.9%,53-120um 99.9%,53-150um 99.9%,80-100nm 99.9%,800目 99.9%,8~10um 99.9%,d50(0.2~0.55μm) 99.9%,metals basis 99.9%,stabilized with amylene, water≤50 ppm (by k.f.), mkseal 99.9%,total metallic impuriyies≤1000 ppm 99.9%,water≤50 ppm (by k.f.), mkseal 99.9%,with molecular sieves, water≤30 ppm (by k.f.), mkseal 99.9%,平均粒径:0.3-0.6 μm 99.9%,平均粒径≤100 nm,粉末 99.9%,比表面积≥120m2/g;粒径:30nm 99.9%,生物技术级 99.9%,颗粒,锆≤0.15% 99.9%-ni 99.9%-pd 99.9%metal basis,d1=1μm 99.9%metals basis 99.95% (metals basis), pt 51.5% min 99.95% metal basis, ru 25.3%最低 99.95% metal basis 99.95% metals basis ,白色 99.95% metals basis, -150目 99.95% metals basis, -80目 99.95% metals basis, os 37%最低 99.95% metals basis, 钌 10.2% 最低 99.95% metals basis,1-5mm 99.95% metals basis, 99.95% metals basis,α相,d90≤30μm,亲水型 99.95% metals basis,无水级,粉末 99.95% trace metal basis 99.95%(trace metal basis) 99.95%, 蒸馏, 57wt. % in h2o, 含<1.5 % h3po2 稳定剂 99.95%,1um 99.97% metals basis 99.99 % metals basis 99.99% (metals basis 去除ni), ni < 0.2% 99.99% (metals basis), au 84.2% 最低 99.99% metal basis, ru 23%最低 99.99% metal basis, 无气味的粉末 99.99% metals basis ,50nm 99.99% metals basis 0.5-2mm 99.99% metals basis, -2000目 99.99% metals basis, 120mm×100mm×0.3mm 99.99% metals basis, 3.3-5μm 99.99% metals basis, 300目, o≤0.5% 99.99% metals basis, 40目 99.99% metals basis, 800目 99.99% metals basis, au≥39.3%最低 99.99% metals basis, d50: 15-25μm 99.99% metals basis, d50≈2μm 99.99% metals basis, os 52-56% 99.99% metals basis, rh 46.2% 最低 99.99% metals basis, water<10 ppm (by k.f.) 99.99% metals basis, water≤0.2% 99.99% metals basis, α相, d50: 5-6μm 99.99% metals basis, γ相, 40nm 99.99% metals basis, φ3mm, 长:3mm 99.99% metals basis, φ6mm, 长:6mm 99.99% metals basis, 平均粒径: 100nm 99.99% metals basis, 无水 99.99% metals basis, 用于镀膜 99.99% metals basis, 直径0.1-2mm 99.99% metals basis, 锐钛矿 99.99% metals basis,-120目 99.99% metals basis,-200目 99.99% metals basis,-400目 99.99% metals basis,0.1mm 直径 99.99% metals basis,0.25mm 直径 99.99% metals basis,0.5mm 直径 99.99% metals basis,0.5um 99.99% metals basis,1-3mm,powder 99.99% metals basis,1-3mm 99.99% metals basis,100nm 99.99% metals basis,150-250目 99.99% metals basis,150目 99.99% metals basis,1mm 直径 99.99% metals basis,1um 99.99% metals basis,200nm 99.99% metals basis,2~10μm 99.99% metals basis,2μm 99.99% metals basis,300目 99.99% metals basis,30nm-50nm 99.99% metals basis,40-200目 99.99% metals basis,4mm颗粒 99.99% metals basis,50-70nm 99.99% metals basis,5μm 99.99% metals basis,80%α相,30nm-50nm 99.99% metals basis,d50=10μm, 不规则球形 99.99% metals basis,α晶型,60nm 99.99% metals basis,α晶型约90%,晶型γ约10%,50nm 99.99% metals basis,α相,300nm,亲水型 99.99% metals basis,α相,30nm,亲水型 99.99% metals basis,α相,30nm 99.99% metals basis,α相,50nm,亲水型 99.99% metals basis,α相,d90≤30μm,亲水型 99.99% metals basis,γ晶型,60nm 99.99% metals basis,γ相,10nm 99.99% metals basis,γ相,20nm 99.99% metals basis,≤0.1μm 99.99% metals basis,不规则块状 99.99% metals basis,无水级 99.99% metals basis,晶体颗粒 99.99% metals basis,晶型α,0.20μm 99.99% metals basis,晶型γ,20nm 99.99% metals basis,晶粒 99.99% metals basis,用于光学玻璃或单晶 99.99% metals basis,粒径<5mm 99.99% metals basis,粒径:10μm 99.99% metals basis,粒径:2μm 99.99% metals basis,粒径:5μm 99.99% metals basis,粒状,1-3mm 99.99% trace metals basis, <100 nm 99.99% trace metals basis, d50=2~3μm 99.99% trace metals basis, ≤10 μm 99.99% trace metals basis, 无水级 99.99% trace metals basis, 蒸馏, 57wt. % in h2o, 不含稳定剂 99.99% trace metals basis, 超干 99.99% trace metals basis,<20 μm, 99.99% trace metals basis,颗粒 99.99%(metals basis) 99.99%, 1μm 99.99%, 2um 99.99%, 30μm, 球形 99.99%, 400mesh 99.99%, d50=1μm 99.99%, d50≈10um 99.99%, 黑色颗粒, 1-3mm 99.99%,1-3mm 99.99%,1-3μm 99.99%,1~5mm 99.99%,1μm 99.99%,3-5um 99.99%,4n 99.99%,metals basis 99.99%,water:0.5-0.8% 99.99%,白色粉末,锆≤0.15% 99.99%-sn 99.99%-zr (reo) 99.99%metalsbasis 99.995 % metals basis 99.995% metals basis, φ3mm, 长:3mm 99.995% metals basis, φ6mm, 长:6mm 99.995% metals basis,α相,d90≤30μm,亲水型 99.995% metals basis,≤60目 99.995% metals basis,≤80目 99.995%,直径:6mm,长度:6mm 99.998% (metals basis 去除 w), w 300ppm 最高 99.998% metals basis,-100目 99.998% metals basis,≤60目 99.998% trace metals basis,结晶,粉末 99.998% trace metals basis 99.998% 99.9985% (metals basis), (去除最高25ppm的碱土金属) 99.9985% metals basis 99.999% metals basis 99.999% metals basis, -800目 99.999% metals basis, 1-6mm 99.999% metals basis, 200目 99.999% metals basis, 60目 99.999% metals basis, si 10ppm 最高 99.999% metals basis,-300目 99.999% metals basis,1-5mm 99.999% metals basis,1-6 mm,beads 99.999% metals basis,1-6mm,颗粒 99.999% metals basis,beads,1-6 mm 99.999% metals basis,powder 99.999% metals basis,≥100mesh 99.999% metals basis,无水级 99.999% metals basis,粒状,1-3mm 99.999%(metalsbasis去除ni),ni<0.2% 99.999%,5n 99.999%,≤45μm,粉末 99.9995% trace metals basis 99.9999% metals basis,1-5mm 99.9999% metals basis,单晶棒状 99.9999% trace metals basis 99.9999% 99.99999% metals basis,块状 99.99999% metals basis,棒状或块状 <100nm,99% >200目 >40% in h2o >65% >70% >80% >90% >97%(hplc) >98%(gc) >99%metals basis,粒径:15nm,比表面积(bet):300±50m2/g >99.0% metals basis,2μm acid terminated,lactide:glycolide 50:50,mw 24000-38000 acid terminated,lactide:glycolide 50:50,mw 38000-54000 acid terminated,lactide:glycolide 75:25,mw 4000-15000 acid terminated,mw 38000-54000 acid terminated,mw 7000-17000 acid value (koh mg/g): 200~235 acs ,≥99.5% acs reagent, chips, 33.5-36.5% acs reagent, for spectrophotometric det. of cd,cu,hg,pb,zn, ≥98%(tlc) acs reagent, mixture of cuo and cu2o acs spectrophotometric grade, ≥99.9% acs, 98% acs, 99% acs, 99.0% (gc) acs, pt 37.5% min acs, ≥90% acs, ≥98.0% (rt) acs, ≥98.5% acs, ≥99%(gc) acs, ≥99%(nt) acs, ≥99.4% acs, ≥99.5%(t) acs, ≥99.8% acs,>98% acs,48%,无色液体 acs,48% acs,97%,片状 acs,97.0% acs,98% acs,98.0-102.0% acs,98.0-103.0% acs,99% acs,99.0% acs,99.0-100.5% acs,99.0-101% acs,99.0-101.0% acs,99.5-101.0% acs,≥98% acs,≥99.0%(gc) acs,≥99.5%(gc) acs,≥99.5%(t) acs,≥99.7% acs,≥99.8% ag≥24% al2o3 30-40%, -600目 al2o3:46% al2o3≈32% al2o3≥30% al2o3≥50% al: 16-20%, stabilized with boric acid al:16-20% alkylating agent, 90% al≥8.4% al≥9.8% analytical standard 99.0% (gc) analytical standard ≥ 99.0 % analytical standard 97.0% (hplc) analytical standard, 99.5% analytical standard,98% analytical standard,≥99.5%(gc) anhydrous, 99.9% metals basis anhydrous, 98% anhydrous, 99.5% anhydrous, 99.999% trace metals basis anhydrous, powder, 99.9% metals basis anhydrous,98% anhydrous,99.0% anhydrous,99.9% trace rare earth metals basis anhydrous,99.995% trace metals basis anhydrous,99.998% trace metals basis anhydrous,≥99% anhydrous anion active matter,65% anion active matter,85% aps≈2微米, 99.9% metals basis ar, 30 wt. % in h2o ar, 50% in h2o ar, mo≥61.1 % ar, ≥96% ar, ≥98.5% ar, ≥99%(t) ar, ≥99%, 含30 ppm dmbp稳定剂 ar, ≥99.5% ar, 含10-15%甲醇稳定剂 ar,60% ar,80% ar,98%(hplc) ar,98%,mixture of stereoisomers ar,≥98%((hplc)) ar,≥99% au 23.5~23.8% in h2o au 48-50% au ≥35% au ≥48% au≥51% au≥55% available chlorine 4.0 % average m.w. 2000 average m.w. 5000 average mn 1,700-3,200 average mn 2,000, tosylate, methoxy average mn 2,000 average mn 20,000, contains mehq as inhibitor average mn 200, contains mehq as inhibitor average mn 2500 average mn 2700 average mn 3000 average mn 40,000 average mn 400, contains mehq as inhibitor average mn 45,000 average mn 500 average mn 550, contains 270-330 ppm bht as inhibitor, 80-120 ppm mehq as inhibitor average mn 5500 average mn 6,000, contains 1000 ppm 4-methoxyphenol as inhibitor average mn 600, contains mehq as inhibitor average mn 600 average mn 750, contains 900-1100 ppm mehq as inhibitor average mn 80,000 average mn ~1,000 average mn ~2,500 average mn ~2,600 average mn ~27,000 average mn ~330 average mn ~357 average mn ~468, eo/phenol 1.5, contains mehq as inhibitor average mn ~50000 by gpc average mn ~512 average mn ~683 average mn ~1,000 average mn ~314, contains 300 ppm mehq as inhibitor average mn ~50,000 average mn ~650 average mn ~7,200 average mn-345 average mn~1124 average mn~380 average mn~428, 含100-350ppm mehq稳定剂 average mn~432,84wt.% in 1-butanol average mn~500 average mn~640 average mn~692,含100ppm mehq稳定剂 average mn~912 average mw 1000-1500 average mw 1200-1600 average mw 1400-1600 average mw 1500-1800 average mw 2000 average mw 250-500 average mw 3000-5000 average mw 4000-7000 average mw 5000 average mw 550-650 average mw 570-620 average mw 600-1000 average mw 600-800 average mw 650-1000 average mw 700-1000 average mw 800-1400 average mw ~1,080,000, average mn ~311,000 average mw ~1000000, powder average mw ~14,000, average mn ~10,000 average mw ~160,000 average mw ~165,000 by gpc, acrylonitrile 25 wt. %, pellets average mw ~185,000 by gpc, acrylonitrile 30 wt. %, powder average mw ~2,000 by gpc, 61-65 wt. % in h2o average mw ~216000, average mn ~80,000 average mw ~35,000, pellets average mw ~50,000 average mw ~60,000 average mw ~70000, powder average mw ~2,200, average mn ~1,200, allyl alcohol 40 mol % average mw:3600~5000 average mw~693 ba ≥30.0 % basichydrate battery grade 99.99% trace metals basis bi: 210g/l, 溶剂: 水 biochemika, ≥96.0%(tlc) biochemika, ≥99% biological stain bioreagent plus, ≥98% bioreagent, ≥99% bioreagent, 用于分子生物学, lyophilized powder bioreagent, 用于细胞培养, powder bioreagent, 适用于荧光分析, ≥99%(hplc) bioreagent bioxtra, 98.0% (tlc) black granular br,10-20u/mg br,28% br,70% br,75% br,95%(mixture of cis and trans) br,98.5% br,用于亚铁离子的测定 bs c(cdta-2na)=0.05mol/l c10-hsl,ahl信号分子 c14-c17混标, 42% cl, 100 μg/ml in cyclohexane c14:98% c16: 54%-62%; c18: 38%-44% c16:65-75%, c18:16-26% c18≥90% c22 ≥ 75% c=0.100mg/ml u=3%, 溶剂: 甲醇 ca 6.6-7.4% ca. 10% in isopropyl ether,mkseal ca. 10% weight in thf ca. 15% in tetrahydrofuran,mkseal ca. 15% in water ca. 45% in water ca. 8% in dichloromethane,mkseal ca. 9% in hexane,mkseal cabot vulcan xc-72 caco3≥90% carbon 44%-45% carbon 58.6%-74.6% cd ≥75% cis and trans,94% cis and trans,98% cis and trans,99% co 43.0 - 47.0 % co 7.8 - 8.2%,溶剂:40%-80%的石脑油 co 9%-10% co 9-10% co ≥20% co ≥22% co ≥31% co:43-47% contains >100 ppm mehq as inhibitor, 97% contains 700 ppm monomethyl ether hydroquinone as inhibitor contains 75-125 ppm monomethyl ether hydroquinone as inhibitor, >90% contains ≤2% bht as stabilizer, 98% contains ≤6000 ppm hydroquinone as stabilizer content(1-mcp): ≥4.0%,carrier cyclodextrin co≥12% co≥25% cp(中国药典) cp,4.5% cp,50-60% cp,85% cp,88% cp,98.0% ,含20ppm mehq稳定剂 cp,99.5% crude source of omega-3 fatty acids crystalline cu>36% cu: 33.0-42.8% cu:9.5%-10.9%,200目 cu≥8% cu含量:55-56% d,98% + bht d,99%,85 wt.% in d2o d,99%,98% in d2o d,99%,无水级 d,99.5%+ dcl 35% w/w solution in d2o d,99.5%+0.05% v/v tms d,99.5%,90% in d2o d,99.5%,98% in d2o d,99.50% d,99.6% d,99.8% (0.05% v/v tms) d,99.8%+0.03% v/v tms d,99.9% d,≥98% d.98% d.99.7% +0.03%tms d.99.9% +0.03%tms d.99.9% +1%tms d.99.9% d50: 3~5μm d50~300nm diam. 3 mm, ≥99.95% metals basis diameter 2.0 - 2.9μm,2.5% w/v,正电位 doped, conductivity 0.5-1.5 s/cm (pressed pellet, typical), extent of labeling: ~5 wt. % loading, coated on titanium dioxide dye content 30 % dye content 30% dye content 85% dye content 95 % dye content 97 % dye content, 80% dye content,~90% dye content~95 % electronic grade, 99.999% trace metals basis electronic grade enzymopure™, 0.8 au-n/g ep,bp,jp,usp级 epoxy value:0.28-0.35 eq/100g epoxy value:0.43 epoxy value:0.54-0.59 eq/100g epoxy value:0.5 epoxy value:0.65~0.70 epoxy value~4 ep级,平均粒径:0.1-0.3μm ester terminated, 0.55-0.75 dl/g ester terminated, lactide: caprolactone 70:30 ester terminated, lactide:glycolide 82:18, viscosity:1.7-2.6 dl/g ester terminated, lactide:glycolide 85:15, viscosity:2.5-3.5 dl/g ester terminated,lactide:glycolide 50:50,mw 24000-38000 ester terminated,lactide:glycolide 50:50,mw 38000-54000 ester terminated,lactide:glycolide 50:50,mw 50000-75000 ester terminated,lactide:glycolide 50:50,mw 7000-17000 ester terminated,lactide:glycolide 75:25,mw 76000-115000 ester terminated,lactide:glycolide 85:15,mw 190000-240000 ester terminated,mw 50000-75000 ester terminated,mw 54000-69000 esterterminated,l-lactide:d,l-lactide70:30 extent of labeling: 12-15 mol per mol β-cd extent of labeling: 30 wt. % loading, matrix activated carbon support fcc fe ~20 % fe>26%, powder fe>30.5% fe, 24% fe,60.0 - 72.0 % fe2+(dry basis): 32%~36% fe2o3≥85% fe: 19%-24% fe: 20% fe: 24%-30% feso4 ~87% fe≈70%, mixture fe≥21% fe≥50% fg fmp(显微镜用) for analysis acs,iso,reag. ph eur for analysis for benchmarking research, 99.5% for chiral derivatization,≥98.5% for enzymic, spectrophotometric determination of h2o2, ≥98% for enzymic, spectrophotometric determination for esr-spectroscopy, 99% for fluorescence,≥98.0% for fluorescence for gc, 95% for gc, liquid phase for gc-hs, ≥99.99% for gc-hs,≥99.9%(gc) for gc-hs,≥99.9% for hplc, 99.0% for hplc,0.1% (v/v) in h2o for hplc,0.25 m in h2o for hplc,99.0%(t) for hplc,99.8% (gc) for hplc,≥95% for hplc,≥99.5% for hplc,≥99.9%,甲醛≤1.5μg/l for hplc,≥99.9% for hplc,≥99.99% for hplc for ir-spectroscopy for lc-ms, ≥99% for lc-ms, ≥99.8% for lc-ms,≥25% in h2o for lc-ms,≥99.0% for lc-ms for microscopy(bact., bot., hist.), ~1 mol/mol water for molecular biology,99% for nmr spectroscopy,≥99.9%(gc) for plant cell culture,98%(hplc) for plant cell culture,≥96% for plant cell culture,≥99% for spectrophotometric det. (of b, pb) for spectrophotometric det. of ag, fe, ru, ≥98.5% for spectrophotometric det. of amino sugars, 99% for spectrophotometric det. of au, no2-, ce(iv), for the detection of au, co, cu, scn-, v, 97% for spectrophotometric det. of au,tl(iii),w, 99% for spectrophotometric det. of cu, fe for spectrophotometric det. of cu, zn for spectrophotometric det. of fe in serum, 99% for spectrophotometric det. of fe(iii), ≥98.5% for spectrophotometric det. of fe, 97% for spectrophotometric det. of metal ions, ≥99% for spectrophotometric det. of nitrate and nitrite, 99% for spectrophotometric det. of s2-,cl2, 99% for spectrophotometric det. of si, 95% for spectrophotometric det. of so42-, s2-, ≥97% for spectrophotometric det. of transition metals, 95% for spectrophotometric det. of urea, ≥99.0% for spectrophotometric det. of zn(ii), cu(ii), fe(ii), co(ii), h2o2, 95% for spectrophotometric det., 99% for spectrophotometric det., bi,71-74% bi basis (kt) for spectrophotometric detection, 99.5%(hplc) for spectrophotometric for supporting electrolyte for synthesis, mixture of isomers for the spectrophotometric determination of fe, pd, v, 99% for use in transformations, x-ray crystallography and nmr formicroscopy free macrogoly, 25-40% free, 90% glu:tyr (4:1), mol wt 20,000-50,000 gr, ≥99% gr,99% grade 135 granular h%:1.5-1.6% hcl salt, 97% hcl salt,98% hf 65% w/w hlb值:13-14,ph值:5.0-7.0 hlb值:16~17 hp-55s,邻苯二甲酰含量24% hplc≥98% hpo3≥38% hpo3≥43% hydroxyl value 75-95mgkoh/g i>69%,bi>16% igg(h&l),≥95%(sds-page),≥ 5mg/ml in 0.01m pbs, ph7.4±0.2 in 2mm dmso in mixed tetratoluene (8-10% cr) inherent viscosity: 10-12.5ml/g ir 48.0 - 55.0 % ir 50-54% ir:73% lactide:glycolide(50:50),mol wt 30000-60000 lactide:glycolide(65:35),mw 40000-75000 lactide:glycolide(75:25),mol wt 66000-107000, 羧基封端 large,粒径: 900-1000 nm,表面积:550m2/g lc-ms,≥99.99% m.w 1000 m.w 11000-12000 m.w 2000 m.w 3000 m.w 7000-7500 m.w :30000-100000 m.w ~80000 m.w. 2000,不含酯基 m.w. 28000 m.w. 8000 m.w.1000 m.w.1500 m.w.2000 m.w.5000 maldi-ms基质 mass spec std massspecstd medium,粒径: 400-450 nm, 表面积: 400m2/g mgo:45% min. 85.0% min. 94.0% min. 98.0% min. 99.0% (m/m) min. 99.0% min. 99.00% min. 99.3%(w/w) min. 99.7% min. 99.8% min. 99.9 wt% mix.80% mixed,50% in propylene carbonat mixture of cis and trans, 99% mixture of cmi and mi,1.50-1.75% in water,ph:2.0-4.0 mixture of cmi and mi,2.5-3.5% in water,ph:2.5-5.0 mixture of heptylnonyl adipate, diheptyl adipate, dinonyl adipate mixture of isomers, stabilized with mehq mixture of isomers,90% mixture of isomers,97% mixture of isomers,≥80% mixture of isomers,≥90% mixture of oligomers,98% mixture of perfluoroadamantane adn perfluoro(1-methyladamantane) mixture, 粘度:1500-1800cps mixtures of cob&co2b mn >44% mn 27,000 mn 30% mn 40,000 mn 4000,50%溶液 mn 6,000 mn 90k-250k mn ca. 6% mn ~300,000 mn ~492 (n≈6) mn ≥71.0%,bet surface area 5~7 m2/g mn: 2500-3000, viscosity: 32-42cps, contains <100 ppm mehq as inhibitor mn~25000 mn~266 mn~3000 mn≥15.1% mn≥4.0%水溶液 mo 56.5% moistened with water, 10% pd basis (based on dry substance) moistenedwithwater,5%pd,unreduced mol wt >30,000 mol wt 15,000-20,000 da mol wt 15000-30000 mol wt 2,000-11,000 mol wt 5000 moligand™, ≥90%(mixture of isomers), stabilized with tbc moligand™, ≥96% mo≥45 % mo≥46.3% mo≥61.1 % mw 10,000-50,000 by gpc mw 1000, 含0.5-1 wt% bht稳定剂 mw 10000 mw 130000-200000 mw 2000 da mw 20000 mw 2000 mw 3000 mw 3400 mw 5000 mw 520,000, mn 150,000 (typical), acrylamide ~80 wt. % mw 9500-10500 mw ~120,000, mn ~50,000 mw ~25,000 20.0 wt% in thf 溶液 mw ~280,000 mw ~315 mw ~35,000 10 wt% in thf溶液 mw ~45,000 20.0 wt% in thf 溶液 mw ~480 mw ~590 mw ~65,000 15.0 wt% in thf溶液 mw ~80,000 15.0 wt% in thf溶液 mw, typical 275 mw-25000 mw:1000 mw:2000 mw:273,油溶性 mw:317,油溶性 mw:4000 mw:405,溶于水和有机溶剂 mw:5000 mw:625,水溶性 mw:845,水溶性 mw<100kda mw<5000 mw=10000 mw=2500~2700 mw~1.0 w: n(mma):n(gma) = 9:1 mw~1000 mw~22.0 w: n(mma):n(gma) = 1.11:1 mw~37.0 w: n(mma):n(gma) =1:4 mw~38,000;甲基丙烯酸羟乙酯 10mol% mw~48,000, mn~15,000 mw~55,000, mn~20,000 n 8% n>32.5 %, d50=5.0μm na 11-13(%) na2o:18.7-23.4% nacl含量: ≥99%, 近球形 nanoparticles, dispersion, in h2o nanopowder, <100 nm particle size (laser psa), 99.8% trace metals basis nanopowder, <100 nm particle size (bet), >97% trace metals basis nanopowder, <200 nm particle size (bet), >99% nanopowder, 21 nm primary particle size (tem) , ≥99.5% trace metals basis nco content ~30%, 粘度~200mpa·s(25℃) nd2o3/treo≥99.5%,treo≥44% nd: 28-34% ni 61% ni: 34-41% ni:47% ni:8% ni≥180g/l nominally 75% in ethanol novec 7500 n≈100 n≈15 n≈40 os 38.7% os 38.7%最低 os 42.5% os 83% oxirane oxygen:7.8-8.5 (mixture of isomers) p2o5: 30-42% p2o5:60-70% p2o5≥30% p2o5≥60% pa,95% palladium(pd)≥19.6% pb ≥82% pb:59.35~61.36% pb≥26.7% pc50 pc60 pc70 pc80 pc90 pd 13.0-15.0% pd 14.2% pd 14.5% pd 15.2% pd 17.1% pd 18% pd 18.09 wt. % in nitric acid pd 20.8% pd 21.5% pd 23.9% pd 26.2% pd 27.7% pd 34.9% pd 37.3% pd 4-5% w/w (cont. pd) pd 40 % pd 41.0% pd 44.8% pd 51.2%-53.9% pd 58.2% pd 59-60% pd ~40.0% pd ≥27.5% pd ≥32.6% pd ≥36.5% pd ≥39.0% pd ≥44% pd ≥50% pd ≥85% pd,27.4% peg 1700 peg400ml peg400mo peg600mo peh-15 peh-3 peh-6 ph eur ph. eur.,bp,usp,99-100.5% ph. eur. ph6.0 ph值:5.0~7.0, 浊点:70~85℃ pieces, 3-6 mm, 99.9% trace metals basis (excluding na) powder, <5 μm powder, 60 mesh, 99% powder, 99.5% metals basis powder,1-2 μm,99% powder ppg-2000do primortrace™, ≥99.99% metals basis proclin 8020 防腐剂 protease substrate pt >99.9% metals basis, ≤20 μm pt 10% pt 15%, 水含量≤60% pt 15.2% pt 20%, 水含量≤60% pt 34.0% pt 5%, 水含量≤60% pt 50.5% pt 51.6-52.6% pt 59.0% pt 65% pt basis ≥73% pt ≥24.2% pt ≥57% pt ≥64.5% pt, 80-85% pt, ~2% 二甲苯溶液 pt≥18% pt≥43.4% purespectra™, uv/vis spectroscopy grade, 50% in h2o,a235:a280 ratio<1.05 purified by redistillation,≥99.5% puriss. p.a., acs reagent, reag. iso, reag. ph. eur., ≥99.5% puriss. p.a., 无水级, ≥99.5%(gc) puriss., ≥99% puriss., ≥99.0%(gc) purity: 95%,isotopic purity:95% purum, 98.0%(hplc),粉末,红棕色 purum, ≥98.0% (tlc) purum, ≥99% ratiocarbondioxide/dimethylamine<2:1 re: 80g/l reagent for ion-pair chromatography reagent grade, 97% reagent grade, co 43.0 - 47.0 % reagent grade,98.0% red(hematite)(99.8%-fe) regioregular(80-90%), mw=54000 (typical) research grade, 99 atom % 13c rh 11.2% rh 17.1% rh 18.5 - 21.3% rh 21% rh 21.3% rh 25.3% rh 27.5% rh 30% min rh 38.5-42.5% rh ≥23.3% rh ≥8.7% rh: 43.0%-46.6% rh≥25.0% ru 1.5% w/v ru 10% ru 23.0% min ru 29% min ru 31.3% ru 35.8-36.1% ru 40-45% ru 5% ru content 45-55% ru: 5%,avg=200 nm ru>44% s: 13.5-15.5% sio2,44-47% sn 56%±0.5% sn 56.5%±0.5% sn>18.8% sn:19% sn≥17% sn≥42% sn≥46% sn≥57% solid content 99% solid, 98%(hplc) solid, ≥98%(hplc) solution complete solution incomplete spectrophotometric grade, ≥99% spectrophotometric grade spray reagent, 10% in ethanol stabilized with bht 1 % w/w stabilized standard for gc, >99.5% standard for gc, 99.9% (gc) standard for gc, 99.9% standard for gc, ≥99.5% (gc),mixture of isomers standard for gc, ≥99.5% (gc) standard for gc, ≥99.7% (gc) standard for gc, ≥99.8% standard for gc, ≥99.9% (gc) standard for gc, ≥99.9% standard for gc,99.7% standard for gc,≥99%(gc) standard for gc,≥99.5%(gc,stabilized with 1000ppm mehq) standard for gc,≥99.5% statsafe 6000 strength 200% strength ≥290% sublimed,>99% suitable for fluorescence, ≥75% (hplc) suitable for plant cell culture, bioreagent, liquid surface area 800-1075, pore volume 0.31-0.41 t-98% tech-95% functional actives (contains analogous compounds) tech. 80% tech. 90%(异构体的混合物) technical grade, 70% technical grade, 75% technical grade, 80 % technical grade, 85 % technical grade, 90% technical grade, 92% technical grade, mixture of isomers technical grade,90% technical, 0.5-1.5 m in diethylene glycol diethyl ether technical, 90 % technical, mixture of isomers(mainly the α-isomer), 90%(gc) technical, ≥80% technical, ≥85% (gc) ,含铜屑稳定剂 technical, ≥90% (gc,mixture of isomers) technical, ≥90%(gc) technical,75% technical,85 % technical,90 % sum of enantiomers technical,90 % technical,90%,ee 99% technical,≥85% technical,≥90 % technical,≥90% tested according to ph. eur. tetraacrylate≥80%, 含有稳定剂mehq tfa salt, 98% tfa salt, ≥94% ticl3:76.0-78.5% tio2 ≥78%,na2o≥14% total omega3 ≥50% type 400-dl,lyophilized powder type 400 ulc-ms,0.04% in water ulc-ms,0.1% in acetonitrile ulc-ms,0.3% in water ulc-ms ultra dry ultra pure,99.0% ultra, 超纯级, ≥99.9999% metals basis usp, bp, 欧洲药典, ≥99% usp, 欧洲药典 usp, 用于细胞培养 usp,95% usp,ep usp,ph eur usp usp级,cross-linked,粉末 v/v viscosity 1.4dl/g viscosity 100.0-160.0 mpa•s viscosity 12000-17000 mpa.s viscosity 150-300 cst(25 °c) viscosity 400-600 cst(25 °c) viscosity 45000-55000 mpa.s viscosity 5-8 cst(25 °c) viscosity 600-1000 cst(25 °c) viscosity 70-75 cst (25 °c) viscosity 70000-80000 mpa.s viscosity 80-150 cst (25 °c) viscosity 800-1200 cst (25 °c) viscosity 800-1400 cst(25 °c) viscosity ~150 mpa.s, neat(25 °c) viscosity:800-5000 mpa.s v≥50% (mixture of ⅲ&ⅴ) w(k2cro4)=20g/l w(k2cro4)=40g/l white granular, viscosity:0.8-0.83 dl/g with indicator, 10-20 mesh wo3≥85% zero2, 98.0% zn 10-12%,200目 zn 10-12%,325目 zn 10-12% zn: 15% zn: 18% zn: 19%-22% zno≥61%, cro3≥19% zn≥ 35.5% zn≥18% zr 6% zr, 40.4-43.3% gravimetric zro2+hfo2 ≥33.0% zro2≥20% ~0.5 m in tert-butyl methyl ether, 95% (hplc) ~0.5 m in 2-methyltetrahydrofuran, 95.0% ~0.5m in tert-butyl methyl ether ~100 μg/ml in ethanol, ≥95% ~100 μg/ml in ethanol, 97% ~100mm in ipa ~13% in water ~17% aromatics basis ~18% zn,~1% diethylene glycol monomethyl ether ~2 m in 1-methyl-2-pyrrolidinone ~20% in h2o ~20 wt. % in d2o, 98 atom % d ~200 mesh, 99% ~200目 ~40% active ingredients in h2o ~40% in 2-ethylhexanoic acid,8-12% sr ~5% in h2o ~50% in h2o ~70% in h2o ~75%(al) ~80% in h2o, for spectrophotometric det. of palladium, iron, uranium(vi), molybdates and nitrites ~85% (kt) ~average mn 50kda;25 wt% in ethanol α-phase≥90%,-325 mesh α型, 99.9% metals basis, d50: 1.5-3.5μm α相, 99.9% metals basis, 40nm α相,99.9% metals basis,100nm α相,99.9% metals basis,200nm α相,99.9% metals basis β-form,98% β-phase,95%,1-3μm β型, 99.9% metals basis β相, 99.9% metals basis, d50=500nm β相,99.9% metals basis,200nm β相,99.9% metals basis φ4mm-6mm, 干燥剂用 φ5mm 高2.5mm 圆柱体,ge≥99.999% −60 mesh ≤10% water ≤100nm, 99% metals basis ≤20mm, 99.9% (reo) ≤3% water ≤500 nm, 99.9% metals basis ≤65μm,分散在水中 ≥ 98% ≥100u/mg ≥18% na (as na2o) basis, ≥60% si (as sio2) basis, powder ≥20.0% in thf ≥200 mesh particle size ≥28% nh3 in h2o,电子级 ≥29% ti (as tio2) basis, technical ≥300g/l in water ≥35% ≥37% ru basis ≥39% ≥40% w/w in water ≥40% zro2 basis ≥40%(gc) ≥40%,含菜油甾醇乙酸酯 ≥40.0% ≥400 mesh particle size, ≥97.5% ≥400 u/mg ≥400u/mg ≥400目 ≥45%(e) ≥50% h4p207 basis ≥50.0% pt basis ≥50.0%(gc) ≥52% ≥57% ≥62%(gc), 顺反混合物, 含≤38%的3-氯-1-丁烯 ≥62%(gc) ≥64% ≥65%(gc), mixture of isomers ≥65%(gc) ≥65%,含有异构体 ≥69% ≥70%(hplc) ≥70%(t) ≥70%,α-和β-位的混和物 ≥70%,含苯酚 ≥72% ≥75%(gc), stabilized with mgo ≥75%(hplc) ≥75%,顺反异构体混合物 ≥78% ≥80%(gc), contains 1% hq as stabilizer ≥80%(gc), contains ca. 20% trans- isomer ≥80%(gc), 含250ppm mehq稳定剂 ≥80%(qnmr) ≥80%, for microscopy ≥80%,最多含10%的乙醇 ≥83%(gc) ≥85% (gc) ≥85% (hplc) ≥85% phosphate(as p2o5) basis ≥85%(gc)(n) ≥85%(hplc)(t) ≥85%(l-香茅醇和香叶醇的混合物) ≥85%(nt) ≥85%(t)(hplc) ≥85%, cis- and trans- mixture ≥85%, contains mehq as stabilizer ≥85%, mixture of cis and trans isomers ≥85%, mixture of isomers ≥85%, mixture of l-citronellol and geraniol ≥85%, remainder 2-chloronaphthalene ≥85%, 含600ppm mehq稳定剂 ≥85%, 粉末 ≥85%,contains stabilizer ≥85%,nmr ≥85.0%(gc) ≥87% ≥88%(hplc) ≥88%,contain inhibitor ≥88%,顺反异构体混和物 ≥88% ≥89%(gc) ≥90% (gc) ≥90% (hplc),用于荧光分析 ≥90% (hplc) ≥90%(c) ≥90%(gc)(t) ≥90%(gc,stabilized with 1%na2co3) ≥90%(lc) ≥90%(mixture of isomers) ≥90%, cis and trans mixtures ≥90%, contains 1500 ppm hydroquinone as stabilizer ≥90%, contains 900-1100 ppm mehq as inhibitor ≥90%, contains stabilizer ≥90%, d-trans isomer mixture ≥90%, stabilized with 5-10% methanol ≥90%, stabilized with calcium carbonate ≥90%, stabilized with mehq ≥90%, stabilized with α-tocopherol ≥90%, total of isomer,stabilized with mehq ≥90%, 含稳定剂铜屑 ≥90%,gc ≥90%,n=9 ≥90%,totalofisomer ≥90%,块状 ≥90%,苏-和赤-的混和物 ≥90%,顺反异构体混合物 ≥90.0%(hplc)(qnmr) ≥90.0%(t) ≥90.0%,顺反异构体混和物 ≥900ug/mg,dry basis,de-nacl and residual solvents ≥91%, 10% dichloromethane ≥92%(t) ≥92%(total of isomer) ≥92%, soluble in 2-diethylhexanoic acid ≥92%,80-150目,中性 ≥92%,80-150目,碱性 ≥92%,80-150目,酸性 ≥92%,mw<10kda ≥92.0% ≥93%(gc)(t),stabilized with mehq ≥93%(t) ≥93%, with 100ppm mehq stabilizer ≥93%,异构体的混和物 ≥93.0%(qnmr) ≥93.0% ≥94% (hplc) ≥94%, contains 0.2% topanol as stabilizer ≥94%, contains 0.5% bht as stabilizer ≥94%, mixture of isomers,contains bht as stabilizer ≥94%, straight chain isomer mixture ≥94%, 含300 ppm bht稳定剂 ≥94%,顺反异构体混合物 ≥94.0 % ≥94.0%(gc) ≥95 atom % d ≥95% (gc) ≥95% (oligomer purity) ≥95% (stabilized with copper chip) ≥95% ,异构体混合物 ≥95%(c22:80%-84%,c20:12%-16%,c18<2%) ≥95%(ce) ≥95%(gc&t) ≥95%(gc), cis- and trans- mixture ≥95%(gc), containing enol tautomers ≥95%(gc), contains 0.2 % caco3/mgo (1:2) as stabilizer ≥95%(gc), contains 1% hq as stabilizer ≥95%(gc), stabilized with 30% naoh solution ≥95%(gc), stabilized with koh ≥95%(gc), sum of monoester and diester ≥95%(gc), 含稳定剂bht ≥95%(hg) ≥95%(hpce) ≥95%(hplc)(n) ≥95%(hplc), ~0.5m in 2-methyltetrahydrofuran ≥95%(nt) ≥95%(predominantly trans) ≥95%(stabilized with mehq) ≥95%(t)(n) ≥95%(t),非对映异构体混合物 ≥95%(titration) ≥95%(tlc) ≥95%(含有部分二盐酸盐) ≥95%(对映体总量, gc) ≥95%, 1250-2500目 ≥95%, 3500-5000目 ≥95%, 400-800目 ≥95%, containing k2co3 stabilizer ≥95%, contains 0.01 % citric acid as stabilizer ≥95%, contains 0.1% bht as stabilizer ≥95%, contains 0.2% sodium carbonate as stabilizer ≥95%, contains 100ppmmehq as stabilizer ≥95%, contains 80-150ppm bht as inhibitor ≥95%, contains hq as stabilizer ≥95%, contains sodium carbonate as stabilizer ≥95%, contains stabilizer ≥95%, contains ~100 ppm bht as stabilizer ≥95%, contains~2% 2,6-di-tert-butyl-p-cresol as stabilizer ≥95%, contians 200 ppm mehq as stabilizator ≥95%, ee99% ≥95%, mixture of cis and trans isomers ≥95%, mixture of cis and trans ≥95%, mixture of endo and exo ≥95%, mixture of isomer ≥95%, stabilized with 25ppm mehq ≥95%, stabilized with bht ≥95%, stabilized with copper chip + nahco3 ≥95%, stabilized, fg ≥95%, stabilized ≥95%, 含0.3%氧化镁稳定剂 ≥95%, 含500ppmmehq稳定剂 ≥95%, 含有≤200 ppm bht作为抑制剂 ≥95%, 异构体混合物(主要以反式形式存在) ≥95%,[(5e,9e,13e)-和(5z,9e,13e)异构体混合物] ≥95%,mixture with dkss ≥95%,≥250g/l in water ≥95%,≥98%(ee) ≥95%,≥99% e.e. ≥95%,立体异构体混合物 ≥95%; mw:2000 ≥95.0% (h-nmr) ≥95.0% ,异构体混合物 ≥95.0%(gc), 含3-5%水作稳定剂 ≥95.0%(gc),含稳定剂氢氧化钾 ≥95.0%(nmr) ≥95.0%(t)(hplc),mixture endo- and exo- ≥95.0%,mixture of isomers ≥96%(gc), mixture of cis and trans isomers ≥96%(gc), mixture of cis- and trans- ≥96%(gc), sum of cis and trans ≥96%(gc), 含20 ppm tbc 稳定剂 ≥96%(gc), 含tbc稳定剂 ≥96%(lc) ≥96%(n) ≥96%, cis + trans ≥96%, contains 200-600 ppm mehq as inhibitor ≥96%, contains 50-100ppm bht as stabilizer ≥96%, isotopic purity: ≥95% ≥96%, mixture of isomers ≥96%, mixture ≥96%, mw11.0 w,st:bma=4:1 ≥96%, mw~10.0w,st:bma=1:1 ≥96%, mw~20.0w,n(st) : n(bma) = 4:1 ≥96%, mw~8.5w,n(st) : n(bma) = 1:1 ≥96%, mw~8.5w,n(st) : n(bma) = 4:1 ≥96%, n≤0.0005% ≥96%, rel-(1r-2e-pr)-equatorial ≥96%, stabilized with tbc ≥96%, 上层覆保护剂 ≥96%, 含200 ppm mehq 稳定剂 ≥96%, 含稳定剂 bht ≥96%, 异构体混合物 ≥96%,sum of enantiomers ≥96%,立体异构体混合物 ≥96.0% (hplc) ≥96.0%(t) ≥96.5% (hplc); 97% ≥97% (enzymatic) ≥97% ,≥99% ee ≥97%(enaymatic) ≥97%(enzymatic) ≥97%(gc&n) ≥97%(gc&t) ≥97%(gc), mixture of isomers ≥97%(gc), stabilized with 2.5% k2co3 ≥97%(gc), stabilized with tbc ≥97%(gc), 含20 ppm tbc 稳定剂 ≥97%(gc), 含稳定剂koh ≥97%(gc), 异构体混合物 ≥97%(gc/ch) ≥97%(hpce) ≥97%(hplc), mixture of cis and trans ≥97%(hplc), mixture of isomers ≥97%(lc&t) ≥97%(pure) ≥97%(qnmr), 含稳定剂mehq ≥97%(t)(n) ≥97%(t), hplc标记用 ≥97%, 100 μg/ml in hexane containing 1% triethylamine ≥97%, 100mm in water ≥97%, 20nm ≥97%, contains stabilizers ≥97%, iii类, 冻干粉, 来源于鸡蛋黄 ≥97%, mixture of endo and exo ≥97%, stab. with hydroquinone ≥97%, stabilized with bht,mixture of isomers ≥97%, stabilized with copper ≥97%, stabilized with cu ≥97%, sum of two isomers ≥97%, 含 0.1% α-生育酚作稳定剂 ≥97%, 含0.05% bht 稳定剂 ≥97%, 含0.1 % 对苯二酚稳定剂 ≥97%, 含100ppm对叔丁基邻苯二酚稳定剂 ≥97%, 含50ppm bht稳定剂 ≥97%, 含60-100ppm bht稳定剂 ≥97%, 含koh抑制剂 ≥97%, 含稳定剂氢醌 ≥97%, 异构体混合物 ≥97%, 用于昆虫细胞培养 ≥97%,<50nm(bet),粉末 ≥97%,mixture of cis and trans ≥97%,mixture of isomers ≥97%,n ≥97%,≥97%(ee) ≥97%,含有稳定剂吩噻嗪 ≥97%,异构体混合物 ≥97%,约含≤2%2-丁醇 ≥97%,非对映异构体混合物 ≥97%,顺反异构体混合物 ≥97%,顺反混合物 ≥97.0% (tlc) ≥97.0%(gc)(qnmr) ≥97.0%(hplc) ≥97.0%(rt) ≥97.5% (hplc) ≥98 atom % d, 96%(cp) ≥98 atom % d, ≥96%(cp) ≥98 atom % d, ≥97%(cp) ≥98 atom % d, ≥98% (cp) ≥98 atom % d, ≥98%(cp), 10mg/ml solution in methyl acetate ≥98 atom % d, ≥99% (cp) ≥98 atom % d,98% ≥98 atom % 15n, ≥95%(cp) ≥98 atom %, ≥95%(cp) ≥98 atom %, ≥97%(cp) ≥98 atom% d ≥98% (contains <8%h2o) ≥98% (gc), ~10 mg/ml in methanol ≥98% (mixture of regioisomers) ≥98% hplc, solid ≥98% hplc ≥98% metals basis ≥98% sum of enantiomers ≥98%(0.1%生育酚作为稳定剂) ≥98%(4 times purification) ≥98%(ch) ≥98%(gc), contains <1% butyl mercaptan as stabilizer ≥98%(gc), contains as stabilizer hq ≥98%(gc), mixture of isomers ≥98%(gc), 含稳定剂bht ≥98%(gc), 异构体混合物 ≥98%(gc), 顺反异构体混合物 ≥98%(hplc)(qnmr) ≥98%(hplc)(t ≥98%(hplc), oil ≥98%(hplc), 用于生化研究 ≥98%(hplc),10mg/ml in acetonitrile ≥98%(hplc),solid ≥98%(hplc),≥98%(at) ≥98%(nmr) ≥98%(stabilized with tbc) ≥98%(sum of c9-c11) ≥98%(sum of enantiomers) ≥98%(t)(gc) ≥98%(t), 用于生化研究 ≥98%(w) ≥98%(with less than 4% ethanol) ≥98%, 100ug/ml in ethanol ≥98%, 1mg/ml in dcm solution ≥98%, 20% water ≥98%, 4 ~ 8um ≥98%, 99%e.e. ≥98%, containing stabilizer mehq ≥98%, containing ≤ 250ppm mehq stabilizer ≥98%, contains 0.01% hydroquinone as stabilizer ≥98%, contains 0.1% hydroquinone as stabilizer ≥98%, contains 0.10% alpha-tocopherol as antioxidant ≥98%, contains 0.3 % mgo as stabilizer ≥98%, contains 50 - 100 ppm bht as stabilizerr ≥98%, contains 60 - 100 ppm monomethyl ether hydroquinone as inhibitor, ≥98%, contains copper chip as stabilizer ≥98%, contains k2co3 as stabilizer ≥98%, contains mehq as inhibitor ≥98%, contains stabilizer ≥98%, contains~1% k2co3 as stabilizer ≥98%, for esterfication ≥98%, for peroxidase test ≥98%, hplc ≥98%, hplc标记用 ≥98%, hplc用 ≥98%, lc-ms用离子对试剂 ≥98%, mixture of 47-67% 5-hydroxy-1,3-dioxane basis and 33-53% 4-hydroxymethyl-1,3-dioxolane ≥98%, mixture of cis and trans isomers ≥98%, mixtures ≥98%, powder, ~180 mesh ≥98%, powder, ~325 mesh ≥98%, powder, ~80 mesh ≥98%, stabilized with 100ppm mehq ≥98%, stabilized with copper ≥98%, trans-isomer ≥95% ≥98%, with stabilizers ≥98%, ~25%water ≥98%, 包含 <2% bht稳定剂 ≥98%, 含0.01%柠檬酸稳定剂 ≥98%, 含0.1%碳酸钙稳定剂 ≥98%, 含250ppm mehq稳定剂 ≥98%, 含50-185 ppm mehq稳定剂 ≥98%, 含500ppmmehq稳定剂 ≥98%, 含≤1000 ppm 氧化丙烯稳定剂 ≥98%, 含硫酸溶液稳定剂 ≥98%, 含约3%碳酸钾/碳酸钠稳定剂 ≥98%, 四种异构体混合 ≥98%, 用于生化研究 ≥98%,hplc ≥98%,kosher ≥98%,pellets(anhydrous) ≥98%,ru>15.75% ≥98%,≥98%(ee) ≥98%,含pth-别异亮氨酸 ≥98%,含稳定剂丁基硫醇 ≥98%,含稳定剂铜屑 ≥98%,白色 ≥98.0% (at) ≥98.0% (gc) ≥98.0%(gc)(qnmr) ≥98.0%(gc),inhibited with 100 ppm mehq ≥98.0%(gc),mixture of isomers ≥98.0%(hplc)(qnmr) ≥98.5% (hplc) ≥98.5% (nmr); 99% ≥98.5%(gc), matrix for fab-ms and liquid sims ≥99 % hplc, powder ≥99 atom % d, ≥99% (cp) ≥99 atom % 13c, ≥99% (cp) ≥99 atom% 13c, ≥99%(cp) ≥99 atom% d, ≥99% ≥99 atom% d,≥95% ≥99% (sum of isomers) ≥99% metals basis, 350nm ≥99% metals basis, powder, ≤3μm ≥99%(75% in ethyl acetate solution) ≥99%(gc), 用于测定醛 ≥99%(gc), 用于生化研究 ≥99%(hplc),≥98%(t) ≥99%(metals basis for removing hafnium) ≥99%(t), 用于生化研究 ≥99%(t), 电解质用 ≥99%, -325 mesh ≥99%, 1-5μm ≥99%, 100nm ≥99%, 1um ≥99%, 2.0m in tert-butyl methyl ether ≥99%, 200-300目 ≥99%, acs reagent ≥99%, containing 20 ppm mehq as stabilizer ≥99%, contains 1% k2co3 as stabilizer ≥99%, contains 10-50ppm 4-methoxyphenol as stabilizer ≥99%, contains 15-20 ppm mehq as stabilizer ≥99%, contains 150-400 ppm bht as stabilizer ≥99%, contains 20 ppm mehq as stabilizer ≥99%, contains 200 ppm mehq as inhibitor ≥99%, contains 50-150 ppm tbc as stabilizer ≥99%, contains 50ppm bht as stabilizer ≥99%, contains 90-110 ppm mehq as stabilizer ≥99%, contains copper chip as stabilizer ≥99%, d50≤10μm ≥99%, for photovoltaic ≥99%, inhibitor-free ≥99%, mix of sodium stearate and sodium palmitate ≥99%, ni:≥47% ≥99%, pd≥34.7% ≥99%, ph(50g/l, h2o, 20°c): 4-5 ≥99%, ≤1μm(fsss) ≥99%, ≤500 ppm h2o ≥99%, ≥96%e.e. ≥99%, 升华提纯 ≥99%, 同分异构体混合物 ≥99%, 含100ppm naoh 稳定剂 ≥99%, 无水级, 同分异构体混合物 ≥99%, 无色 ≥99%, 用于gc衍生化 ≥99%, 用于化肥分析 ≥99%, 蓖麻油裂解制取 ≥99%,300目 ≥99%,含200ppm mehq稳定剂 ≥99%,含50 - 100 ppm bht 稳定剂 ≥99%,无氯 ≥99%,水分≤0.3%,d50≤3μm ≥99%,用于合成 ≥99%,粒度:>10um,白色粉末 ≥99.0% (sum of enantiomers, gc) ≥99.0%(t)(hplc) ≥99.0%,mixture of isomers ≥99.2% ≥99.3% ≥99.5 % ≥99.5 atom % d, contains 0.03 % (v/v) tms ≥99.5 atom % d, ≥99% (cp) ≥99.5% (4 times purification) ≥99.5% (metals basis) ≥99.5% metals basis, <15μm ≥99.5% metals basis, sphere,5-25nm ≥99.5% trace metals basis,20-80nm ≥99.5% trace metals basis,平均粒径25 nm ≥99.5%(gc), stabilized with 30ppmdmbp ≥99.5%(gc), 用于滴定法测定异氰酸酯 ≥99.5%(hplc), 用于光谱测定胺 ≥99.5%(hplc) ≥99.5%(t), matrix substance for maldi-ms ≥99.5%(电子级) ≥99.5%, 1250目 ≥99.5%, 2500目 ≥99.5%, 5000目 ≥99.5%, 98 atom % d ≥99.5%, acid <200 ppm,h2o <100 ppm ≥99.5%, d50≈6μm ≥99.5%, ≤50nm ≥99.5%, 已加稳定剂 ≥99.5%, 无色 ≥99.5%, 用于有机电子 ≥99.5%, 用于邻甲酚的测定 ≥99.5%, 直径: 0.38mm ≥99.5%, 直径: 0.6mm ≥99.5%, 直径: 1mm ≥99.5%, 直径: 2mm ≥99.5%,100nm ≥99.5%,99.999% metals basis ≥99.5%,gc ≥99.5%,适用于植物细胞培养 ≥99.5(gc),含0.01% koh稳定剂 ≥99.6% trace metals basis,-10目 ≥99.7 wt.% ≥99.7% metals basis, spherical,20μm ≥99.7% metals basis, spherical,28.5μm ≥99.7% metals basis, α相, d50≈45μm ≥99.9 atom % d,99% ≥99.9% (gc) ≥99.9% metals basis, 200 mesh ≥99.9% metals basis, pt 44.9% ≥99.9% metals basis,excludes ~1% zirconium ≥99.9% metals basis,pt ≥46.0% ≥99.9% trace metals basis, water≤1% ≥99.9% trace metals basis,<250 nm particle size (tem), 粉末 ≥99.9%(t), 标准缓冲物质, ph(121.14mg/ml h2o,25℃):10.73-11.17 ≥99.9%(t), 标准缓冲物质 ≥99.9%, nmr grade ≥99.9%, 直径: 5mm ≥99.9%,100-150 kda ≥99.9%,粒径:≥1 μm,孔径:6-10 nm,总孔容:≥0.6 cm³/g,比表面积(bet):≥500 m²/g ≥99.9%,粒径≤0.2 μm,孔径:≥4.0 nm,总孔容≥0.7 cm³/g,比表面积(bet):≥500 m²/g ≥99.95% metals basis, 5% pt ≥99.95% trace metals basis, loss on drying≤0.5% ≥99.97% metals basis ≥99.98% metals basis ≥99.98% ≥99.99 % ≥99.99% metals basis(reo) ≥99.99% metals basis, fe,cu,pb,zn,ni,mg,mn,cd,al各≤1ppm, ca≤5ppm, 硫酸根≤20ppm ≥99.99% metals basis, powder ≥99.99% metals basis, 核磁定量标准品 ≥99.99% metals basis,200目 ≥99.99% metals basis,99.7-100.5% dry basis ≥99.995% trace metals basis ≥99.996% metals basis ≥99.997% metals basis ≥99.998% metals basis, 3-20目 ≥99.999% metals basis, 200 mesh ≥99.999% metals basis, chunks,1-10mm ≥99.999% metals basis,28% in h2o ≥99.999% metals basis,粒径:1-6mm ≥99.999%(metals basis) 丙酮离子≥60% 丙酮酸根pyruvic ion ≥ 60.0% 丰度:10atom %;化学纯度:≥98.5% 丰度:5atom%;化学纯度:≥98.5% 丰度:60atom%;化学纯度:≥98.5% 丰度:98atom%;化学纯度:≥98.5% 丰度:98atom%;化学纯度:≥99% 丰度:99atom%;化学纯度:≥99% 乙烯含量: 50% 乙烯含量:53%;enb:4.0% 乙烯含量:55%;enb:9.5% 乙烯含量:60%;enb:7.8% 乙烯含量:68%;enb:5.7% 乙烯含量:69%;enb:4.5% 乙烯含量:72%;enb:4% 乙酰基含量13.5%, 丁酰基含量38% 乙酰基含量15.5%, 丁酰基含量35.5% 乙酰基含量2%, 丁酰基含量46% 乙酰基含量2%, 丁酰基含量52% 乙酰基含量2%,丁酰基含量53%,粘度0.01-0.03 乙酰基含量2.5%,混合乙酸含量45% 乳化型, 99%(mixtures) 二氧化硅:38.0%~42.0% 二氧化硅含量:29%~31% 二氧化钛:17wt% 溶剂:水 二聚,三聚和四聚甘油 ≥75 w/%,七聚甘油以上 ≤10w/% 亚胺当量(克当量): 130 ~ 150 亲水,比表面积:150 m2/g 亲油性 介孔,粒径:0.5μm, 孔径:2nm 介孔,粒径:1μm, 孔径:4nm 介质: h3po4(cp) 从紫胶所得 优级试剂 , 适用于分析, acs, iso, reag. ph eur 优级试剂 , 适用于分析, acs,reag. ph eur 优级试剂, 70% 优级试剂, 97% 优级试剂, 99.7% 优级试剂, ≥60% 优级试剂, ≥85 wt. % in h2o 优级试剂, ≥90% 优级试剂, ≥99.0%(gc),用于测定醛 优级试剂, ≥99.0%(t) 优级试剂, ≥99.5%(gc) 优级试剂, ≥99.5%(rt) 优级试剂, ≥99.8% 优级试剂,99.8% 低硫 元素分析仪专用 光玻级,99.99% metals basis 光致抗蚀剂级,99% 光谱级, ≥99.5% 光谱级,≥99.8% 光谱纯, 99.9% 光谱纯,99%(gc) 冶金级,99.95% metals basis 分子生物学级,≥99 % 分子生物级, 99.0% (at) 分子量 <10kda 分子量1.0mda~1.8mda 分子量2000 分子量3000 分子量500 分子量800kda~1.0mda 分子量:10-20万 分子量:1200 分子量:150-250万 分子量:20-40万 分子量:2000 分子量:3000 分子量:3500-4500 分子量:40-80万 分子量:4000-5000 分子量:80-150万 分子量:900 分子量~1200 分子量~3000 分子量~4000 分子量≥1.8mda 分析对照品, 98%(hplc) 分析对照品, >98% 分析对照品, 95% 分析对照品, 96% 分析对照品, 97%(含水约40%) (单位重量以湿重计) 分析对照品, hplc≥98% 分析对照品, standard for gc, 99.5% 分析对照品, ≥99%(gc) 分析对照品, ≥99.5% 分析对照品, ≥99.6%(hplc) 分析对照品,>99.7% 分析对照品,98%(hplc) 分析对照品,99.95% 分析对照品,>96% 分析对照品,>97% 分析对照品,≥97% 分析对照品,≥98%(hplc) 分析对照品,≥98.5% 分析对照品,≥99.5%(gc) 分析对照品,≥99.8%(gc) 分析对照品,混合物 分析标准品, 10 mm amino acid in 0.1 m hcl 分析标准品, 1000 μg/ml in hexane 分析标准品, 100ug/ml in acetone 分析标准品, 10ug/ml in acetone 分析标准品, in isooctane 分析标准品, ≥99.5%(gc) 分析标准品, 用于环境分析 分析标准品,1000μg/ml甲醇溶液 分析标准品,98.6% 分析标准品,99.93% 分析标准品,99.95% 分析滴定液, 0.02 m 分析滴定液, 0.1mol/l (0.1n) 分析滴定液,2.0m 分析滴定液,4.0m 分析滴定液,8.0m 制备色谱级, 99.5% 制备色谱级,99.8% 助滤剂 包含 200 ppm naoh 稳定剂, 97% 包含 200 ppm naoh 稳定剂, 99% 包含 200 ppm naoh 稳定剂, 99.9% 包含1500 ppm 对苯二酚稳定剂, 90% 包含50-185 ppm mehq稳定剂, 98% 包含≤1000 ppm 氧化丙烯稳定剂, 98% 化学纯(cp), ≥65%(gc) 化学纯(cp), ≥95% 化学纯(cp), ≥96% 化学纯(cp), ≥98%, stabilized with 0.025% bht 医用研究级,白色 医用研究级,红色 医药级(usp/ep/bp/jp/cp) 医药级, ph. eur..bp, chp, jp, usp 医药级, pharmpure™ 医药级, pharmpure 医药级 十二水合物, 99%(sum of mixtures) 升华, 99.9% (reo) 升华品99% 升华提纯, 98.0%(t) 升华提纯, 99.8% metals basis 升华树枝状, 99.9% (reo) 升华级, ≥98%(gc) 升华级, ≥99.5% 单酯含量: 90%, 异构体混合物 即用型喷雾试剂, 用于色谱法, 5 wt.% in ethanol 原子级 发光聚合物 取代度 92% 取代度 95% 取代度 98% 合成法, 99.9% 合成洗涤剂助洗剂用 含10%淫羊藿苷 含200-650ppm mehq稳定剂 含固量:40±2% 含有mehq作为抑制剂 含有部分滑石粉 含氮量26~28% 含百秋里醇(约26%~33%) 含膏量80% 含量(h3po4):105% 含量(h3po4):115% 含量(p2o5)% ≥85% 含量52.5~56.5 含量≥60% 含量测定 含铂量:27% 四方相, 100-350nm, 99wt% 四氢树脂酸含量18%-30% 固体 固含量(以氧化铝计)10% 固含量(以氧化铝计)15% 固含量(以氧化铝计)20% 固含量(以氧化铝计)25% 固含量: 98% 固含量:95% 固含量:99% 固含量:≥99% 固含量~70% 固含量≥55% 固含量≥60% 固含量≥99% 块状,99.9% metals basis 型号: p-df-03-ls 型号:6501(1:1) 基质:sio2,表面基团:-epoxy,粒径:0.1-1μm,单位:5mg/ml 基质:sio2,表面基团:-nh2,粒径:3-4μm,单位10mg/ml 基质:sio2,表面基团:-nh2,粒径:4-5μm,单位10mg/ml 基质:sio2,表面基团:-sioh,粒径:0.1-1μm,单位:5mg/1ml 基质:sio2,表面基团:-sioh,粒径:0.1-1μm,单位:5mg/ml 基质:uf,表面基团:-cooh,粒径:1-2μm,单位:10mg/ml 基质:uf,表面基团:-epoxy,粒径:1-2μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:1-2μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:2-3μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:3-4μm,单位:10mg/ml 基质:uf,表面基团:-nh2,粒径:5-7μm,单位:10mg/ml 天然来源, 98%, 异构体混合物 天然来源, 99% 天然来源, d-柠檬烯含量≥94% 天然来源, ≥97% 天然来源, ≥98% 天然来源, ≥99% 天然来源,≥98% 天然矿物,晶粒,大约 0.06-19in 孔间距:65±10nm直径13mm 季铵盐含量:≥45% 容量法,0.1000mol/l(0.1n) 对照品,99.8% 尺寸:2-3nm,浓度:0.2mg/ml 工业用 工业级, 40-60% 工业级, ≥65% 工业级, ≥70% 工业级, ≥80%(gc) 工业级, ≥93% 工业级, ≥98%, total alkalinity 工业级, 以cu计54-56% 工艺级,98% 平均mn~70000 平均分子量 ~400 平均分子量2000, 含~300 ppm mehq 平均分子量4000, 含~300 ppm mehq 平均分子量: 1000, 无色粘稠液体 平均分子量: 1000, 白色固体 平均分子量: 2000, 无色粘稠液体 平均分子量: 2000, 白色固体 平均分子量: 3000, 无色粘稠液体 平均分子量: 3000, 白色固体 平均分子量: 500, 无色粘稠液体 平均分子量: 500, 白色固体 平均分子量~500, 含900 ppm mehq作稳定剂 平均粒径:300-600nm 异构体混合物, 40 wt. % in h2o 异构体混合物, 98% 异构体混合物,80% 异构体混合物,85% 异构体混合物,97% 异构体混合物,99% 异构体混合物,含稳定剂mehq 异构体的混合物, 40wt. % in h2o 异构体的混和物 强度:250% 总胺值(mg koh/g): 115±4 总胺值(mg koh/g): 40±2 总胺值(mg koh/g): 49±2 总胺值(mg koh/g): 60±3 总胺值(mg koh/g): 79±3 总胺值(mg koh/g):173~183 总胺值:178-188mgkoh/g, 酸值<10mgkoh/g 总胺值:82-92mgkoh/g 总胺值mgkoh/g 18~22,叔胺值mgkoh/g 18~22 总胺值mgkoh/g 28~32,叔胺值mgkoh/g 28~32 总胺值mgkoh/g 44~50,叔胺值mgkoh/g 44~50 总胺值mgkoh/g 50~60,叔胺值mgkoh/g 50-60 总胺值mgkoh/g 75~85,叔胺值mgkoh/g 75~85 总酰胺:375-450 mg/g 手性纯99% 技术级90% 折射率: 1.630-1.635 指示剂 摩擦片专用,97%,1250目 支链异构体混合物,含稳定剂mehq 支链异构体类的混和物 无动物源 低内毒素 用于细胞培养 ≥99% 无动物源, low endotoxin, 用于细胞培养, ≥99% 无孔,粒径:1μm 无孔,粒径:500nm 无孔,粒径:50μm 无定型, 2-6mm (0.08-0.2in),99.999% (metals basis) 无定形, 0.5-2μm, 99.9% 无定形,<5μm,98% 无定形,99%,粒径(d50) 10-20um 无水 99.9%(reo) 无水, 99.95% 无水, 99.99% metal basis 无水, 99.995% metals basis 无水, 99.995% 无水, ≥98% 无水, 粉末, 99.5% metals basis 无水, 粉末, 99.9% 无水, 粉末, 99.95% metals basis 无水, 粉末, 99.999% metals basis 无水, 粉末, ≥99.9% 无水, 粉末, ≥99.99% metals basis 无水,-10目,99.99% trace metals basis 无水,99.5% metals basis 无水,99.999% metals basis 无水,99.999% 无水,acs,≥98% 无水,≥98% 无水,≥99% 无水,片状,99.9% metals basis 无水,粉末,99.9% trace metals basis 无水,粉末,99.99% metals basis 无水,鳞片, 99.99% metals basis 无水级, 99.99% trace metals basis 无水级, usp,fcc,e 331 无水级, ≥99%, 含250 ppm bht稳定剂 无水级, ≥99%, 无稳定剂 无水级, ≥99.5%(gc), h2o ≤0.04% 无水级, ≥99.5%, water≤50 ppm 无水级, ≥99.9% metals basis, powder 无水级, ≥99.99% metals basis 无水级, ≥99.995% metals basis 无水级, ≥99.999% metals basis 无水级, 优级试剂, 适用于分析, acs, 欧洲药典 无水级,acs试剂, ≥99% 无水级,reagent plus, ≥99% 无水级,≥99.9%,含50ppm bht 抑制剂 无水草酸钙,99% 无菌 昆虫细胞培养级, ≥99% 显微镜用 晶体, aps ≈100nm, 99%, 等离子合成 晶状, -4+40 目,99.9999% (metals basis) 有效氧: 9-11% 来源于细菌 来源天然 染料含量: 80% 染料含量~80% 染色强度100% 柠檬烯>90% 柠檬烯≥90% 树脂专用 桂皮醛含量≥80% 植物细胞培养级, ≥98% 植物细胞培养级,≥99.5% 模数:2.3-2.5 橙色结晶 欧洲药典, bp, 100-110%,51.0-59.0% al2(so4)3 basis 母液, 4.00mg/ml 比表面积10-15m2/g,粒度20nm-100nm,99.9% 比表面积1700m2/g,粒径5-15um 比表面积3-8m2/g,粒度80nm,99.9% 氮≥19.5 % 沉淀碳酸钙, 欧洲药典 沸点184-188℃ 沸程80-120°c, 水分<50ppm 油状50% 活性值≥90.0% 活性氧15% 活性氧: 4.0%-5.3% 活性氧~2.8%,邻苯二甲酸二异丁酯溶液 活性物: 50%, 主要溶剂: 烷烃 活性物: 70%, 主要溶剂: 异丁醇 活性物: 70%, 主要溶剂: 甲醇 活性组分(以pbtca计): ≥30% 浊点:17~21°c, ph值:5.0~7.0 浊点:21~26°c, ph值:5.0~7.0 浊点:45~55°c, ph值:5.0~7.0 浊点:57~61°c, ph值:5.0~7.0 浊点:≥95°c, ph值:5.0~7.0 浓度:1mg/ml溶剂:水稳定剂:lioh 浓度范围:0.124±0.008mg/l 涂料专用型,98.5%,6000目 混合异构体, 60%间位, 40%对位, mw 160,000-220,000 混合物,含有部分ni单质 混合物,黄腐酸fa ≥60% 混合物 游离的液体98% 溴甲酚绿 0.1% w/ v in etoh 95% -甲基红0.2% w/ v in etoh 95% 3:1 溶剂:水 滴熔点142,中粒径25μm 澄清过滤 照相一级 照相级, 50% in h2o 照相级, ≥98.5% 熔融指数: ≥1.0g/10min 片状,99.998% metals basis 特级 特纯,95% 环保试剂,96% 环氧值: 0.63~0.68eq/100g 环氧值: 0.64-0.69eq/100g 环氧值: 0.65~0.70eq/100g 环氧值: 0.74-0.78 eq/100g, 粘度:10-25 mpa.s 环氧值:0.20~0.28 eq/100g 环氧值:0.35~0.40eq/100g,粘度(25℃):40~80mpa.s 环氧值:0.70~0.80mol/100g,粘度(25℃):5~25mpa.s 环氧值eq/100g:0.70 环氧当量117-120gm/eq 环氧当量: 125-145 环氧当量: 425 g/mol~575 g/mol 环氧当量:143-154克/当量,粘度:100-300mpa·s 环氧当量:160-180 g/eq 环氧当量:540-580 玻璃钢专用 珠子, 98% 生化试剂, ≥99% 生物制剂,适用于凝血分析,4%(w/v) in h2o 生物医用级, ≥98%, α-phase basis,< 30μm 生物医用级, ≥98%, α-phase basis,< 5um 生物医用级, ≥98%, α-phase basis,< 70μm 生物医用级, ≥98%, α-phase basis,<10μm 生物医用级, ≥98%, β-phase basis,< 0.1μm 生物医用级, ≥98%, β-phase basis,< 0.2μm 生物医用级, ≥98%, β-phase basis,< 30μm 生物医用级, ≥98%, β-phase basis,< 70μm 生物基含量33%-100% 生物技术级,≥99% 生物技术级,≥99.9% 生物试剂级,99.0%,荧光分析专用 用于gc衍生化, 98.0% 用于gc衍生化, ≥97% 用于gc衍生化, ≥99.0% (gc) 用于gc衍生化, ≥99.8% 用于hplc,2.0 mol/l in h2o 用于hplc标记, ≥99% 用于hplc衍生化, ≥99%(gc) 用于hplc衍生化, ≥99%(hplc) 用于hplc衍生化, ≥99%(t) 用于hplc衍生化, ≥99% 用于hplc衍生化, ≥99.0%(t) 用于nmr,99原子%氘 用于分子生物学, 40% in h2o(8.8 m) 用于分子生物学, 5 m in h2o 用于分子生物学, 7.5 m 用于分子生物学, ≥98% 用于分子生物学, ≥99%(gc) 用于分子生物学, ≥99.5%(t) 用于分子生物学, ≥99.5% 用于分子生物学, ≥99.9%(t) 用于分子生物学,95%,100mm in h2o 用于分子生物学,99.0%(t) 用于分子生物学,≥99.5%(gc) 用于分子生物学,≥99.5% 用于分子生物学 用于基准化研究, 99.8% 用于基准化研究, 99.9% 用于基准化研究, 99.9-100.1% 用于基准化研究, 99.99% 用于昆虫细胞培养,≥99.0% 用于昆虫细胞培养,用于植物细胞培养, 96.0% 用于检测类固醇,≥99.0%(hplc) 用于植物细胞培养, ≥98%(hplc) 用于植物细胞培养, ≥99%(hplc) 用于植物细胞培养,99.5% 用于氨基酸分析, ≥99.5%(gc) 用于激光染料 用于环保分析 用于电池,粒度:7-10um,99.9% metals basis 用于电泳, ≥99.5%(t) 用于电泳, 用于分子生物学, 用于细胞培养, ≥99% 用于离子对色谱,≥98.0 % 用于纸层析, ≥98.5% 用于组氨酸甲基化 用于细胞与昆虫细胞培养,≥99.0%(t) 用于细胞和昆虫细胞培养, 81-83% as moo3 用于细胞和昆虫细胞培养,≥99%(t) 用于细胞培养, ≥96.5%(hplc),≥96.5%(spectrophotometric assay), from yeast 用于细胞培养, ≥97% 用于细胞培养, ≥99.5% 用于细胞培养, ≥99.9%(t) 用于细胞培养, 用于昆虫细胞培养, ≥99%(t) 用于细胞培养,≥99%(hplc) 用于荧光分析,99.7% 用于药物研究, ≥98%(gc) 用于萃取分析, 优级试剂, acs,reag. ph eur 用于蛋白测序, ≥99% 用于蛋白测序, ≥99.5%(gc) 用于蛋白测序, ≥99.8%(gc) 用于蛋白质分离,层析 用于钴(iii),铁(ii)的测定 电子mos级 电子级, 99.9% metals basis 电子级, 99.99999% metals basis 电子级,0.5~1um,99.5% 电子级,99.9% 电子级,99.98% metals basis 电子级,99.999% metals basis,钠除外 电子陶瓷专用 电池级, 99.4%, water≤200 ppm 电池级, 99.8%, water≤50 ppm 电池级, 99.95%, water≤10 ppm 电池级, 99.99%, water≤50 ppm 电池级,99.9% 电泳专用级 电泳级,≥99% 电镀级,99% 白色,al2o3≥30% 皂化值:125-145 mgkoh/g 皂化值:150-185mgkoh/g 皂化值:160-170 mgkoh/g 皂化值:185-196mg koh/g 皂化值:84-94mgkoh/g, hlb值:13-14 皂化值mgkoh/g:235~245 盐水溶液 直径:0.1-0.3μm, 长度:3-5μm 直径:0.1-0.5μm, 长度:10-50μm 直径:0.2-0.5μm, 长度:5-15μm 直径:0.2-0.7μm,长度:10-35μm 直径:1.0mm, 退火, 99.9995% metals basis 直径:20-100nm, 长度:≈1μm 直径:3-5μm, 长度:10-30μm 直径:80-150nm, 长度:0.5-8μm 着色强度:100% 石化用芳烃油脱烯烃吸附剂, 圆柱体 石化用芳烃油脱烯烃吸附剂, 圆球形 石油催化剂专用 硬脂酸和棕榈酸:≥ 90.0% 硬脂酸和甲基丙烯酸十六酯的混合物,含有mehq作为抑制剂 硬脂酸钙和软脂酸钙混合物 ca 6.6-7.4% 碱性, 二氧化硅含量 : 30%, 平均粒径: 100nm, 氧化钠含量<0.1wt% 碱性, 二氧化硅含量 : 30%, 平均粒径: 100nm, 氧化钠含量<0.5wt% 碲粒 2-3mm 99.999% 碳含量:43-48% 碳含量:61-67% 磷含量: 23%-24% 离子对色谱专用,≥99.0% 离子对色谱级, 99.0% (at) 离子对色谱级,>98.0%(t) 稀释成1升使用,稀释后的浓度为0.01m 稀释成1升使用,稀释后的浓度为0.1m 稀释成1升使用,稀释后的浓度即0.05m 筹码专用,98%,3000目 粉末, <5μm, ≥99.5% metals basis 粉末, 98% 粉末, 99.99% metals basis 粉末, ≤45μm, ≥99.5% metals basis 粉末, ≥99.9% metals basis 粉末,99.5% 粉末,99.99% metals basis,-200目 粉末,99.99% metals basis,-325目 粉末,99.99% metals basis,100目 粉末,99.99% metals basis 粉末磷脂 粉煤灰活化剂用 粒度:2-20μm 粒度:≥100目 粒径<10.0um 粒径1.5-5μm 粒径: 8-12μm 粒径:0.3μm,2.5% w/v 粒径:0.5μm,2.5% w/v 粒径:0.7±0.15μm 粒径:100nm~3.5μm,机械化学法 粒径:3.0μm,2.5% w/v 粒径:4.0μm,2.5% w/v 粒径:5.0μm,2.5% w/v 粒径:50nm 粒径:7.0μm,2.5% w/v 粒径≤50μm 粒状,1-4mm,99.999% metals basis 粘度(5%水溶液,20℃):500-20000mpa.s 粘度(50°c):16-24 mpas 粘度8,000-10,000 cst 粘度900-1300cps 粘度: 1.75 dl/g 粘度: 30000, 分子量: 2000-3000 粘度: 4-7 cst(25°c) 粘度: 40-80 cps 粘度:130-180 mpa.s 粘度:20~25mpa.s 粘度:300-800 mpa.s(25℃), 环氧当量:125-173 gm/eq 粘度:600-1200mpa.s(25℃),环氧当量:150-180 g/mol 粘度:~300 cps,环氧当量:95-115 gm/eq 精制级, ≥97% 精制级, ≥99.999% metals basis 精馏级, ≥99.5%(gc) 红外分析用,99% 约12.5%于四氢呋喃中, 约1.5mol/l 约13%于四氢呋喃中, 约2mol/l 约15%于四氢呋喃中, 约2.0mol/l 约15%于己烷中 约16%于四氢呋喃中, 约1mol/l 约16.5%于n,n-二甲基甲酰胺中, 约2mol/l 约20%于水中 约40%水润湿品 约63%于异丙醇中 约70%的水溶液 约75%于水中 约80%溶剂油溶液 (zn 17-19%) 纯度标准物质100.00%±0.02% 纯度标准物质99.96%±0.02% 纳米粉末<50纳米粒径(tem) 纳米粉末, <50nm 粒径 (bet), 99% trace metals basis 纳米粉末, 粒径<150nm(bet) 纳米粉末,≤100nm粒径(bet),≥99% trace metals basis 纳米纤维,d<2.5μm,l/d≥20,98% trace metals basis 细胞培养级, 99% 细胞培养级,98-101% 结晶, aps ≤50nm, 98%, 气相激光合成 结晶, 医药级, ph.eur.,bp,usp 羟值(mg koh/g):133~148 羟值(mg koh/g):23.0-25.0 羟值: 35-50 mgkoh/g 羟值mgkoh/g:28±3 羟值mgkoh/g:40±4 羟值mgkoh/g:52±6 羟值mgkoh/g:67±5 羟值mgkoh/g:≤15,皂化值mgkoh/g:180~190 羟值≤4 mgkoh/g 羟基值54-62 mg koh/g 耐火材料粘结剂用 聚乙二醇分子量:2000 聚乙二醇分子量:3400 胺值 312-350mg/g 胺值: 750-770mg koh/g 脱乙酰度 80.0%-90.0% 脱色率≥90 %, 活性度≥180 h+mmol/kg, 水分≤10 % 脱色率≥90%, 比表面积≥180 m2/g, 水分≤3.0 %, 颗粒平均抗压力≥1 n, 抗水型 脱色率≥90%, 比表面积≥180 m2/g, 水分≤5.0 %, 颗粒平均抗压力≥1 n, 脱氮型 脱色率≥90%, 比表面积≥180 m2/g, 水分≤5.0%, 颗粒平均抗压力≥0.7 n 脱色率≥90%, 比表面积≥300 m2/g, 水分≤8.0%, 颗粒平均抗压力≥1 n 脱色率≥92 %, 活性度≥100 h+mmol/kg, 水分≤12 % 脱色率≥98% 色标,99% 色谱级, 99.9%, carbonyl≤0.005% 色谱级, ≥99% 色谱级, ≥99.5%(gc) 色谱级, ≥99.9%, 含有0.10 % (v/v) 甲酸 色谱级, ≥99.9% 色谱级 苛性比≥1.3, fe≤15ppm 苛性比≥1.35 苯酚含量:40-60% 荧光粉专用 荧光级,>97%(hplc) 荧光级 药用级,99.5% 药用级,ph eur 药用级,≥99.5%(gc) 药用试剂级 葡萄糖当量13.0-17.0 葡萄糖当量:16.5-19.5 蒸馏枝形片状 99.95% metals basis 蒸馏树枝状, 99.9% (reo) 蒸馏纯化,≥99.5% 蛋白组学级 表观粘度: ≥110 mpa.s 试剂级, >98.0%(gc) 试剂级, >98.5%(gc) 试剂级, >99.0%(t) 试剂级, 1.0 m in solution 试剂级, 10-15ppm tbc as stabilizer 试剂级, 100nm 试剂级, 2000目 试剂级, 3% in h2o 试剂级, 325目, 白色 试剂级, 36% 试剂级, 40% 试剂级, 40-45% mgo basis 试剂级, 49% 试剂级, 5% in h2o 试剂级, 54-57% cu basis 试剂级, 55.3% sno2 试剂级, 57.5% 试剂级, 60% 试剂级, 65% 试剂级, 75 wt. % in h2o 试剂级, 77% 试剂级, 80% 试剂级, 85 wt. % in h2o 试剂级, 85-90% 试剂级, 85.0% 试剂级, 90%(contains acetic acid) 试剂级, 92% 试剂级, 93% 试剂级, 96.5% 试剂级, 97.0%(gc) 试剂级, 98%,含3%乙醇稳定剂 试剂级, 98.0%(mixtures) 试剂级, 98.5%(mixture of isomers) 试剂级, 99 % 试剂级, 99% (titration) 试剂级, 99%,含10ppm bht稳定剂 试剂级, 99.0%,含40ppm二异丙胺 稳定剂 试剂级, 99.5% metals basis 试剂级, 99.5%,低温煅烧 试剂级, 99.5%,粉末 试剂级, 99.9% 试剂级, co 13.5~14.5% 试剂级, cr≈32% 试剂级, fe 21-23 % 试剂级, fe 21-23% 试剂级, mg 4.0-5.0% 试剂级, mg≈14% 试剂级, mn >47% 试剂级, pd 46.0 - 48.0 % 试剂级, pt ≥37.5% 试剂级, ratio(mgo/al2o3)=3-1,含水率:≤8.5% (100℃,1h) 试剂级, so2≥6% 试剂级, ≥ 44.0% 试剂级, ≥47.0%,含≤1.5 % h3po2 稳定剂 试剂级, ≥60% 试剂级, ≥80%,gc 试剂级, ≥85.0% moo3 basis 试剂级, ≥98.0%((hplc)) 试剂级, ≥98.0% 试剂级, ≥98.5 %(gc) 试剂级, ≥99.0%(rt) 试剂级, ≥99.5%(gc) 试剂级, ≥99.5%,200目 试剂级, 含0.025% bht 稳定剂 试剂级, 含~75 ppm bht稳定剂 试剂级, 块状 试剂级, 异构体混合物 试剂级, 模数:2.00-2.20 试剂级, 模数:2.30-2.50 试剂级, 模数:2.80-3.00 试剂级, 模数:3.10-3.40 试剂级, 白色粉末 试剂级, 硅改性 试剂级, 硝酸法 试剂级, 硫酸铝法 试剂级, 碳化法 试剂级, 磷改性 试剂级, 镧改性 试剂级,1μm 试剂级,70%溶液 试剂级,ir>52% 试剂级,混合物 负载于二氧化硅-氧化铝, ni: 61-71% 超干, 99.9% metals basis 超干, 99.998% metals basis 超干,99.995% metals basis 超干级, 99%metals basis 超干级, 99.9% (reo) 超干级, 99.99%metals basis 超干级, 99.999% metals basis 超干级, ≥99.99% metals basis(reo) 超干级,99.99% metals basis 超灵敏,用于 elisa 超纯,98% 超纯,99% 超纯生物试剂级,2m in h2o 超纯生物试剂级,8m in h2o 超纯生物试剂级,适用于分子生物学,1m in h2o 超纯级, ≥99.0%(kt) 超纯级, ≥99.5% 超纯级,99% 超纯级,99.5%(gc) 超纯级,99.9% 超纯级,≥99%(nmr) 超纯级,≥99% 软型,直链异构体的混和物 轻质,99% 适用于hplc,99.0-101.0% 适用于maldi-ms,50%acn+47.5%h2o+2.5%tfa 适用于分析, acs, 优级品 适用于发光,超纯生物试剂级,≥99.5%(gc) 适用于电化学分析,≥99.0% 适用于离子对色谱, ≥99%(gc) 适用于荧光, ≥90%(hplc) 适用于荧光分析, ex:387nm, em:470nm, ≥90%(hplc) 适用于荧光分析, ≥98%(hplc) 通常38% 溶剂油溶液(6%fe) 通常92%, 溶于2-二乙基己酸 造影级 酐:90%酸:10% 酰胺含量:≥95% 酸值(mg koh/g) ≤0.5, 皂化值(mg koh/g): 325~360 酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 100~130 酸值(mg koh/g) ≤10, 皂化值(mg koh/g): 85~105 酸值: ≤0.1 mg koh/g, 皂化值: 185-210 mg koh/g 酸值: ≤0.1 mg koh/g 酸值mgkoh/g ≤10,皂化值mgkoh/g 120~140 酸值mgkoh/g ≤10,皂化值mgkoh/g 212~222 酸值≤ 9 mgkoh/g 酸值≤12 mgkoh/g,皂化值≤180 mgkoh/g 酸性, 二氧化硅含量 : 30%, 平均粒径: 100nm, 氧化钠含量<0.1wt% 酸性, 二氧化硅含量:20 %-30 % 醇溶液0.02% 醋酸盐, 95% 重蒸馏, ≥99.5% 金黄色,al2o3≥30% 钯含量 0.5% 钻井液和完井液助剂用 铂含量(干基10%) 铂含量,>99.9%,粒径10 nm 铂含量:52.0% 铂含量≥85.4% 铑含量(wt%) ,5% 铝含量:38%-41% 铱含量:43.0% 铱含量≥39% 锌: 20.5~22.0%, 磷: 19.5~21.0% 锑含量≥60% 锭, 99.9% metals basis,,液体石蜡保存 锭, 99.9% metals basis 锭, 存放于油中,99.9% metals basis 锭,99.5% 镀膜级,99.99% metals basis,3.5-5 mm 镀膜级,颗粒,99.9% metals basis 镁含量:57% 镍 45.0 - 52.5 % 闪烁纯,99% 阴离子型,1800万分子量,水解度:20-30% 阴离子型,1800万分子量,水解度:5-17% 阴离子型,2500-3000万分子量,水解度:5-17% 非离子剂, 酸值<5.5mgkoh/g 非离子剂 非离子型,分子量:1600万 非离子型,分子量:1800万 非离子型,分子量:2000万 非离子表面活性剂 顺反异构体混和物 食品级, ≥97% 食品级 饱和水溶液 饱和溶液 馏程: 161-179 °c 馏程: 186-202 °c 馏程: 270-311 °c 高度精炼, 酸度低 高级纯, 50% in h2o, medical grade 高级纯, ≥97%(hplc), 用于血液和生物学染色 高级纯, 试剂级, ≥99% 高纯,97.5% 高纯级,>99.5%(gc) 高纯级 黄腐酸fa ≥90% 黏度5000-12000cps25,含mehq稳定剂