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查看>全部纯度（尺码） 适用于合成 98% 99% 10% (w/v) cp,98% 欧洲药典, 适用于分析, acs, 优级品 95% 97% acs ≥98% 1.00 normal 20% (w/v) 48-50% in thf contains >0.5% sulfur dioxide as peroxide formation suppressor 8% (w/v) aqueous 99.5% ar, contains54-60% napo3 as stabilizer ≥97% ≥99.995% metals basis 医药级, pharmpure™, 欧洲药典, bp, jpe, nf, e 338 超纯级 适用于分析, 优级品 适用于合成, stabilized with hydroquinone monomethyl ether 高级纯, 试剂级, ≥99% +158 to +160℃ 0.01 molar (m/100) 0.03 m 0.2% (w/v) 0.6% (w/v) in 80% (v/v) acetic acid 1.0 m in methylene chloride 1.0 m in toluene 10% (w/v) aqueous 20% (v/v) 25 grams + 100 ml waterfor direct count for bacteria, yeast, and mold 25-27%bf3 30% (w/v) 33 wt. % in acetic acid 33.5-36.5% 39-43% 40% wt in sulfuric acid 49.5-50.5%,适用于hplc 50% (w/v) 60% 70 wt. % in h2o 85% 90% (v/v) 98%,98atom%d 99.95% metals basis acetic acid r (300 g/l) acs, ≥98% acs, ≥99.3% acs, ≥99.5% ar, 50 wt. % in h2o ar, ≥99% ar, ≥99.5% ar,90% ar,99% ar,99.5% bf3:17.5 - 19.0 % hno3 100 mm and rb 1000 μg/l in h2o(20×) pharmpure™,chp,jp,bp,欧洲药典(ph.eur),nf,e 334,powder,gmp standard for gc, ≥99.6% surface area 250 m2/g ultra, 电子级, ≥99.99998% metals basis, 49wt. % in h2o ultrabio™, 用于发光, 超纯级, ≥99.5%(gc) usp, bp, 欧洲药典, ≥99.5% usp, bp, 欧洲药典 ~60 wt. % in h2o ≥95% h4p2o7 basis ≥95% ≥96% ≥99 atom% 13c,≥98% ≥99.97% metals basis ≥99.99% metals basis, 48 wt. % in h2o ≥99.99% metals basis ≥99.998% metals basis ≥99.999% metals basis 优级试剂, ≥40% 优级试剂, ≥99% 化学纯(cp), ≥99.5% 医药级, pharmpure™, ≥98% 基础级试剂, ≥40% 无水级, ≥99% 无水级, 欧洲药典, 优级试剂, 适用于分析, acs 来源天然 欧洲药典(ph.eur), 适用于分析, acs, 优级品 熔点标准品 精馏级, ≥46.5% bf3 basis 约105%h3po4 试剂级, 115% h3po4 basis 适用于分析, acs 适用于无机痕量分析 钠基 k-10 比表面积 240m2 /g 钠基